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11. 发明申请

WO2006086815A3 CHARGED-PARTICLE EXPOSURE APPARATUS 审中-公开
公开(公告)号：WO2006086815A3
公开(公告)日：2006-08-24
申请号：PCT/AT2006/000060
申请日：2006-02-16
申请人： IMS NANOFABRICATION GMBH , PLATZGUMMER, Elmar , CERNUSCA, Stefan , STENGL, Gerhard
发明人： PLATZGUMMER, Elmar , CERNUSCA, Stefan , STENGL, Gerhard
IPC分类号： H01J37/317
摘要： A particle-beam projection processing apparatus (100) for irradiating a target (41), with an illumination system (101) for forming a wide-area illuminating beam (Ip) of energetic electrically charged particles; a pattern definition means (102) for positioning an aperture pattern (21) in the path of the illuminating beam; and a projection system (103) for projecting the beam thus patterned (pb) onto a target (41) to be positioned after the projection system. A foil (34, 35) located across the path of the patterned beam (pb) is positioned between the pattern definition means (102) and the position of the target (41) at a location close to an image (i0) of the aperture pattern (21) formed by the projection system.

12. 发明申请

WO2006086815A2 CHARGED-PARTICLE EXPOSURE APPARATUS 审中-公开
标题翻译：充电粒子曝光装置
公开(公告)号：WO2006086815A2
公开(公告)日：2006-08-24
申请号：PCT/AT2006000060
申请日：2006-02-16
申请人： IMS NANOFABRICATION GMBH , PLATZGUMMER ELMAR , CERNUSCA STEFAN , STENGL GERHARD
发明人： PLATZGUMMER ELMAR , CERNUSCA STEFAN , STENGL GERHARD
IPC分类号： H01J37/317
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3175 , H01J2237/31788 , H01J2237/31793
摘要： A particle-beam projection processing apparatus (100) for irradiating a target (41), with an illumination system (101) for forming a wide-area illuminating beam (Ip) of energetic electrically charged particles; a pattern definition means (102) for positioning an aperture pattern (21) in the path of the illuminating beam; and a projection system (103) for projecting the beam thus patterned (pb) onto a target (41) to be positioned after the projection system. A foil (34, 35) located across the path of the patterned beam (pb) is positioned between the pattern definition means (102) and the position of the target (41) at a location close to an image (i0) of the aperture pattern (21) formed by the projection system.
摘要翻译：一种用于对目标物（41）照射用于形成能量带电粒子的广域照明光束（Ip）的照明系统（101）的粒子束投影处理装置（100）用于将光圈图案（21）定位在照明光束的路径中的图案定义装置（102）以及投影系统（103），用于将如此图案化的光束（pb）投影到目标（41）上以在投影系统之后定位。位于图案化光束（pb）的路径上的箔片（34,35）位于图案定义装置（102）和目标（41）的靠近孔径图像（i0）的位置之间图案（21）由投影系统形成。

13. 发明申请

WO2006053359A1 PATTERN LOCK SYSTEM FOR MASKLESS PARTICLE-BEAM EXPOSURE APPARATUS 审中-公开
标题翻译：用于无障碍颗粒光束曝光装置的图案锁定系统
公开(公告)号：WO2006053359A1
公开(公告)日：2006-05-26
申请号：PCT/AT2005/000455
申请日：2005-11-15
申请人： IMS NANOFABRICATION GMBH , STENGL, Gerhard , BUSCHBECK, Herbert , NOWAK, Robert
发明人： STENGL, Gerhard , BUSCHBECK, Herbert , NOWAK, Robert
IPC分类号： H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3177
摘要： In a pattern-lock system of particle-beam, apparatus reference marks are imaged upon registering means to determine the position of the particle-beam, with the registering means being positioned at locations of nominal positions of images of the reference marks. Exposure pauses are used for applying a lateral movement of the reference beamlets by means of the projecting system and the resulting varying signals from the image detection are used to determine a suitable operation point. Then, the lateral movement is stopped to obtain a stable image position for the duration of an exposure.
摘要翻译：在粒子束的图案锁定系统中，设备参考标记在注册装置上成像以确定粒子束的位置，其中登记装置位于参考标记的图像的标称位置的位置。曝光暂停用于通过投影系统施加参考子束的横向移动，并且使用来自图像检测的所得到的变化信号来确定合适的操作点。然后，停止横向运动以在曝光期间获得稳定的图像位置。

14. 发明申请

WO2006084298A1 CHARGED-PARTICLE EXPOSURE APPARATUS WITH ELECTROSTATIC ZONE PLATE 审中-公开
标题翻译：带静电带的充电颗粒曝光装置
公开(公告)号：WO2006084298A1
公开(公告)日：2006-08-17
申请号：PCT/AT2006/000049
申请日：2006-02-09
申请人： IMS NANOFABRICATION GMBH , PLATZGUMMER, Elmar , CERNUSCA, Stefan
发明人： PLATZGUMMER, Elmar , CERNUSCA, Stefan
IPC分类号： H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A particle-beam projection processing apparatus for irradiating a target by means of a beam of energetic electrically charged particles, comprising an illumination system, a pattern definition system for positioning an aperture arrangement composed of apertures transparent to the energetic particles in the path of the illuminating beam, and a projection system to project the beam onto a target, further comprising at least one plate electrode means (8), which has openings corresponding to the apertures of the pattern definition system and comprising a composite electrode (281) composed of a number of partial electrodes (830,831) being arranged non-overlapping and adjoining to each other, the total lateral dimensions of the composite electrode covering the aperture arrangement (21) of the pattern definition system. The partial electrodes can be applied different electrostatic potentials.
摘要翻译：一种粒子束投射处理装置，用于通过能量带电粒子束照射目标物，所述粒子束包括照明系统，用于定位孔径装置的图案定义系统，所述孔组件由在所述照射路径中的所述能量粒子透明的孔组成光束和投影系统以将光束投影到目标上，还包括至少一个平板电极装置（8），其具有对应于图案定义系统的孔的开口，并且包括由数字组成的复合电极（281）部分电极（830,831）被布置成彼此不重叠和相邻，覆盖图案定义系统的孔布置（21）的复合电极的总横向尺寸。部分电极可以施加不同的静电电位。

15. 发明申请

WO2006053360A1 REGISTERING DEVICE AND METHOD FOR A PATTERN LOCK SYSTEM IN A PARTICLE-BEAM EXPOSURE APPARATUS 审中-公开
标题翻译：颗粒束曝光装置中的图案锁定系统的注册装置和方法
公开(公告)号：WO2006053360A1
公开(公告)日：2006-05-26
申请号：PCT/AT2005/000456
申请日：2005-11-15
申请人： IMS NANOFABRICATION GMBH , STENGL, Gerhard , BUSCHBECK, Herbert , NOWAK, Robert
发明人： STENGL, Gerhard , BUSCHBECK, Herbert , NOWAK, Robert
IPC分类号： H01J37/317
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3177
摘要： In a pattern-lock system of particle-beam apparatus, reference marks are imaged upon registering means to determine the position of the particle-beam. The registering means are positioned at locations of nominal positions at the imaging plane in order to detect the location of respective images of the reference marks. A registering means comprises a multitude of detective areas arranged beside each other; detection signals produced by the detective areas when bit by radiation from the reference mark are added to a sum signal, wherein the detective areas yield different contributions to the detection signal in relation to a unit of impingent radiation, respectively, resulting in a sum signal varying in dependence of the position of the reference mark image with respect to the detection means.
摘要翻译：在粒子束装置的图案锁定系统中，参考标记在登记装置上成像以确定粒子束的位置。登记装置位于成像平面上的标称位置的位置处，以便检测参考标记的各个图像的位置。登记装置包括彼此相邻布置的大量侦测区域; 检测区域当基准标记的位逐位加上时，由检测区域产生的检测信号被加到和信号中，其中检测区域分别产生相对于有害辐射单位的检测信号的不同贡献，导致总和信号变化根据参考标记图像相对于检测装置的位置。

16. 发明专利

NL1034588C INRICHTING VOOR HET BELICHTEN MET GELADEN DEELTJES. 未知
公开(公告)号：NL1034588C
公开(公告)日：2010-09-21
申请号：NL1034588
申请日：2007-10-29
申请人： IMS NANOFABRICATION GMBH
发明人： PLATZGUMMER ELMAR
IPC分类号： H01J37/317
CPC分类号： H01J37/3007 , B82Y10/00 , B82Y40/00 , H01J37/02 , H01J37/045 , H01J37/09 , H01J37/3174 , H01J2237/022 , H01J2237/0435 , H01J2237/0451 , H01J2237/0453 , H01J2237/0458 , H01J2237/0835

17. 发明专利

GB2412494A Maskless particle-beam system for exposing a pattern on a substrate 未知
公开(公告)号：GB2412494A
公开(公告)日：2005-09-28
申请号：GB0512347
申请日：2003-01-13
申请人： IMS NANOFABRICATION GMBH
发明人： PLATZGUMMER ELMAR , LOESCHNER HANS , STENGL GERHARD , VONACH HERBERT , CHALUPKA ALFRED , LAMMER GERTRAUD , BUSCHBECK HERBERT , NOWAK ROBERT , WINDISCHBAUER TILL
IPC分类号： H01J37/04 , H01J37/30 , H01J37/305
摘要： A method for forming a pattern on a surface of a substrate (41) by means of a beam (lb, pb) of energetic electrically charged particles, comprising the following steps: ```producing said particle beam, ```directing said particle beam (lb, pb) through a pattern definition means (102) producing a number of beamlets (bm) using an aperture array means (203) having a plurality of regularly arranged apertures (230) of substantially identical shape defining the shape of said beamlets (bin), and using a blanking means (202) to switch off the passage of selected beamlets (bin), the others forming, as a whole, a patterned particle beam, and ```projecting said patterned particle beam onto said substrate (41) surface to form an image of those apertures (230) which are switched on, each aperture (230) corresponding to an image element on the substrate (41) surface during a uniform exposure time, ```wherein a subset of the apertures (230) is switched on during a fraction of the exposure time and switched off for the remaining fraction of the exposure time, thus causing a fractional exposure at a value lower than a threshold of exposure of image elements on the substrate (41) surface, which threshold is lower than or equal to the value corresponding to a full exposure as caused by an aperture (230) switched on during the full exposure time.

18. 发明专利

GB0423152D0 Charged-particle multi-beam exposure apparatus 未知
公开(公告)号：GB0423152D0
公开(公告)日：2004-11-24
申请号：GB0423152
申请日：2004-10-18
申请人： IMS NANOFABRICATION GMBH
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027
摘要： A charged-particle multi-beam exposure apparatus ( 1 ) for exposure of a target ( 41 ) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target ( 41 ). For each particle beam an illumination system ( 10 ), a pattern definition means ( 20 ) and a projection optics system ( 30 ) are provided. The illuminating system ( 10 ) and/or the projection optics system ( 30 ) comprise particle-optical lenses having lens elements (L 1 , L 2 , L 3 , L 4 , L 5 ) common to more than one particle beam. The pattern definition means ( 20 ) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target ( 41 ), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.

19. 发明公开

US20240304415A1 Method for Determining Focal Properties in a Target Beam Field of a Multi-Beam Charged-Particle Processing Apparatus 审中-公开
公开(公告)号：US20240304415A1
公开(公告)日：2024-09-12
申请号：US18596458
申请日：2024-03-05
申请人： IMS Nanofabrication GmbH
发明人： Christoph Spengler , Wolf Naetar , Matthias Liertzer
IPC分类号： H01J37/317 , H01J37/153
CPC分类号： H01J37/3177 , H01J37/153 , H01J2237/0435 , H01J2237/1516 , H01J2237/1532
摘要： A method for determining focal properties in a target beam field of a charged-particle multi-beam processing apparatus is presented, where the focal properties relate to aperture images formed by the beamlets at or near the target within this apparatus, such as height of focus, astigmatic length, or size of blur. By modifying an electrostatic voltage of a lens or another suitable operating parameter of the projection optics, the landing angles of the beamlets are tilted by a small tilting angle, causing a small displacement of the positions where the beamlets hit the target surface. Using the amounts of displacement and the change of landing angles a map is generated that describes a mapping from the change of landing angles to the amounts of displacement as a function of the position, for instance by using a best fit to a predefined model; this map is then used to extract the focal properties, which in turn can be used to correct for imaging errors in the processing apparatus.

20. 发明公开

US20230360878A1 Adjustable Permanent Magnetic Lens Having Shunting Device 审中-公开
公开(公告)号：US20230360878A1
公开(公告)日：2023-11-09
申请号：US18313995
申请日：2023-05-08
申请人： IMS Nanofabrication GmbH
发明人： Dietmar Puchberger , Johannes Leitner , Patrick Mayrhofer , Christoph Spengler , Elmar Platzgummer
IPC分类号： H01J37/317 , H01J37/141 , H01J37/143 , G03F7/20
CPC分类号： H01J37/143 , G03F7/7015 , G03F7/704 , H01J37/141 , H01J37/3177 , H01J37/21 , H01J2237/1415 , H01J2237/1516
摘要： A fine-adjustable charged particle lens comprises a magnetic circuit assembly including permanent magnets, a yoke body, and a shunting device comprising a shunting component, and this assembly surrounds a beam passage extending along the longitudinal axis (cx). The shunting device is placed in the yoke body besides the permanent magnets and may be composed of several sector components, comprising different high magnetically permeable materials. The permanent magnet and the yoke body form a magnetic circuit having at least two gaps, in order to generate a magnetic field reaching inwards into the beam passage, into which a sleeve insert having electrostatic electrodes can be inserted, which may also generate an electric field spatially overlapping said magnetic field. The shunting device partially bypasses the magnetic flux of said circuit assembly and thus reduces the magnetic field to a desired value.

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