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141. 发明授权

US06741941B2 Method and apparatus for analyzing defect information 失效
标题翻译：用于分析缺陷信息的方法和装置
公开(公告)号：US06741941B2
公开(公告)日：2004-05-25
申请号：US10449528
申请日：2003-05-29
申请人： Kenji Obara , Yuji Takagi , Hisae Shibuya
发明人： Kenji Obara , Yuji Takagi , Hisae Shibuya
IPC分类号： G06F1900
CPC分类号： H01L21/67253
摘要： To efficiently extract identification of apparatuses causing problems in a thin-film device manufacturing process, candidates for the problem-generating manufacturing apparatus are extracted by evaluating data obtained in relation to produced inspections and data indicating the states of the manufacturing apparatus, with respect to products that enable efficient extraction of problem-generated apparatuses in a thin-film devise manufacturing process. This facilitates inferring the identification of the problem-generating apparatus.
摘要翻译：为了有效地提取在薄膜器件制造过程中导致问题的装置的识别，通过对与产生的检查获得的数据和指示制造装置的状态的数据相关的产品，提取问题产生制造装置的候选这能够在薄膜设计制造过程中有效地提取问题产生的装置。这有助于推断问题产生装置的识别。

142. 发明授权

US06622054B1 Method monitoring a quality of electronic circuits and its manufacturing condition and system for it 失效
标题翻译：监控电子电路质量的方法及其制造条件和系统
公开(公告)号：US06622054B1
公开(公告)日：2003-09-16
申请号：US09413468
申请日：1999-10-06
申请人： Hirohito Okuda , Toshifumi Honda , Hisae Yamamura , Yuji Takagi , Hideaki Doi , Shigeshi Yoshinaga
发明人： Hirohito Okuda , Toshifumi Honda , Hisae Yamamura , Yuji Takagi , Hideaki Doi , Shigeshi Yoshinaga
IPC分类号： G05B1302
CPC分类号： G05B19/41875 , G05B23/0216 , G05B23/024 , G05B2219/37572 , G05B2219/45029 , H05K1/0269 , H05K3/0005 , H05K3/3484 , Y02P90/04 , Y02P90/22
摘要： With a view to providing a monitoring system for the quality and manufacturing conditions of electronic circuits capable of facilitating the grasping of correlation's between diverse manufacturing conditions and manufacturing states, statistically characteristic images are selected out of a group of images retrieved from a detection information database by specifying at least one out of the values of feature quantities, design information and manufacturing conditions, and are displayed.
摘要翻译：为了提供电子电路的质量和制造条件的监测系统，能够便于掌握不同的制造条件和制造状态之间的相关性，从通过检测信息数据库检索的一组图像中选出统计特征图像指定特征量，设计信息和制造条件的值中的至少一个，并且被显示。

143. 发明授权

US06614923B1 Pattern inspecting method and apparatus thereof, and pattern inspecting method on basis of electron beam images and apparatus thereof 失效
标题翻译：图案检查方法和装置，以及基于电子束图像的图案检查方法及其装置
公开(公告)号：US06614923B1
公开(公告)日：2003-09-02
申请号：US09225512
申请日：1999-01-06
申请人： Chie Shishido , Yuji Takagi , Shuji Maeda , Takanori Ninomiya , Takashi Hiroi , Masahiro Watanabe , Hideaki Doi
发明人： Chie Shishido , Yuji Takagi , Shuji Maeda , Takanori Ninomiya , Takashi Hiroi , Masahiro Watanabe , Hideaki Doi
IPC分类号： G06K932
CPC分类号： G06T7/001 , G06T5/006 , G06T2207/10061 , G06T2207/30148 , H01J37/226 , H01J37/28 , H01J2237/2448 , H01J2237/24592 , H01J2237/2482 , H01J2237/2806 , H01J2237/2817
摘要： For purpose of providing a defect inspecting method and an apparatus thereof and a defect inspecting method on basis of electron beam image and an apparatus thereof, reducing possibility of bringing erroneous or false reports due to the test objection side and the inspecting apparatus side, being caused by discrepancies, such as the minute difference in pattern shapes, the difference in gradation values, the distortion or deformation of the patterns, the position shift, thereby enabling the detection of the defects or the defective candidates in more details, wherein an image which is small in distortion by controlling the electron beam scanning is detected and divided into a size so as to be able to neglect therefrom, and then position shift detection and defect decision are carried out in an accuracy less or finer than pixel for each division unit. In the defect decision, a desired tolerance can be set up depending upon changes in gradation values and the position shift.
摘要翻译：为了提供基于电子束图像的缺陷检查方法及其装置和缺陷检查方法及其装置，减少由于检测对象侧和检查装置侧引起错误或错误的报告的可能性通过差异，例如图案形状的微小差异，灰度值的差异，图案的变形或变形，位置偏移，从而能够更详细地检测缺陷或缺陷候选物，其中，图像是检测出通过控制电子束扫描而具有较小的失真，并将其分割成能够忽略的尺寸，然后针对每个分割单元以比像素少的精度执行位移检测和缺陷判定。在缺陷判定中，可以根据灰度值和位置偏移的变化来建立期望的公差。

144. 发明授权

US06546308B2 Method and system for manufacturing semiconductor devices, and method and system for inspecting semiconductor devices 失效
公开(公告)号：US06546308B2
公开(公告)日：2003-04-08
申请号：US09812822
申请日：2001-03-21
申请人： Yuji Takagi , Hideaki Doi , Makoto Ono
发明人： Yuji Takagi , Hideaki Doi , Makoto Ono
IPC分类号： G06F1900
CPC分类号： G01N21/94
摘要： The present invention relates to a method and system of inspecting a product, including extracting defects from the product, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data of the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects for inspection. The method and system is characterized in that the extracted feature data of the defects is fed back for inspecting the product. The present invention also relates to a method of manufacturing a semiconductor electric or electronic device, including extracting defects from the semiconductor electric or electronic device, classifying the defects on the basis of information about the extracted defects representing the analogy of the defects, extracting the feature data on the defects on the basis of the result of defect classification, and feeding back the feature data of the extracted defects to an apparatus for manufacturing the semiconductor electric or electronic device.

145. 发明授权

US5517484A Optical disk and optical disk recording and reproducing apparatus 失效
标题翻译：光盘和光盘记录和再现装置
公开(公告)号：US5517484A
公开(公告)日：1996-05-14
申请号：US193502
申请日：1994-02-08
申请人： Yuji Takagi , Isao Satoh , Motoshi Ito , Yuji Hisakado
发明人： Yuji Takagi , Isao Satoh , Motoshi Ito , Yuji Hisakado
IPC分类号： G11B7/007 , G11B20/12 , G11B20/18
CPC分类号： G11B20/1833
摘要： A reproduction type optical disk having same sector structure as that of a recordable optical disk, can reproduce data even if a plurality of sectors are disabled from correction. The disk has data sectors for recording data, parity sectors obtained by a new error correction coding between a plurality of data sectors, wherein the error correction coding between the data sectors is performed by arranging a plurality of data sectors into a matrix and by coding them in directions of row and column doubly to make a product code.
摘要翻译：具有与可记录光盘相同的扇区结构的再现型光盘即使禁止多个扇区进行校正，也可以再现数据。磁盘具有用于记录数据的数据扇区，通过多个数据扇区之间的新的纠错编码获得的奇偶校验扇区，其中数据扇区之间的纠错编码通过将多个数据扇区排列成矩阵并通过对它们进行编码来执行在行和列的方向上双重制作产品代码。

146. 发明授权

US5469418A Optical information write/read device and method for writing data 失效
标题翻译：光信息写/读设备和数据写入方法
公开(公告)号：US5469418A
公开(公告)日：1995-11-21
申请号：US091276
申请日：1993-07-15
申请人： Isao Satoh , Yuji Takagi , Yuji Hisakado
发明人： Isao Satoh , Yuji Takagi , Yuji Hisakado
IPC分类号： G11B7/00 , G11B7/0045 , G11B7/14 , G11B20/18
CPC分类号： G11B7/14 , G11B7/0045
摘要： A write/read device includes two optical heads for writing data on an optical disk. The two heads are moved simultaneously after data is written in a track, the written data is read and checked for writing errors. This write verify is performed by the two optical heads in parallel, and data can be written on an optical disk at a fast rate.
摘要翻译：写/读设备包括用于在光盘上写入数据的两个光头。将数据写入轨道后，两个磁头同时移动，读取写入的数据并检查写入错误。该写入验证由并行的两个光头执行，并且可以以快速的速率将数据写入光盘。

147. 发明授权

US5406534A Double-sided recordable optical disk suitable for a substituting process and a method for performing defect management 失效
标题翻译：适用于替代处理的双面可记录光盘和执行缺陷管理的方法
公开(公告)号：US5406534A
公开(公告)日：1995-04-11
申请号：US191369
申请日：1994-02-03
申请人： Yuji Hisakado , Isao Satoh , Yuji Takagi , Motoshi Ito
发明人： Yuji Hisakado , Isao Satoh , Yuji Takagi , Motoshi Ito
IPC分类号： G11B7/0045 , G11B20/18 , G11B17/22 , G11B7/00
CPC分类号： G11B20/1883 , G11B7/0045 , G11B2220/20
摘要： An optical disk apparatus for an optical disk having two sides for which data can be simultaneously recorded. Each of the two sides includes a spare area for alternative recording. In the optical disk apparatus, a series of data to be recorded is distributed into first data for the first one of the two sides and second data for the second one of the two sides. The apparatus of this invention detects any defective sector into which data cannot be recorded which occurs in either one or both sides during the simultaneous recording. If there is a defective sector in one side, an alternative recording process is performed for alternatively recording data that was to be recorded into the detected defective sector, and data to be recorded into a sector in the other side corresponding to the defective sector, into alternative sectors in the spare areas of the two sides, respectively. Also, defect information relating to the defective sector is recorded into a predetermined area of the optical disk. When the first data and the second data are reproduced, the first and second data are integrated and rearranged, so as to reproduce the series of data.
摘要翻译：一种用于光盘的光盘装置，具有可以同时记录数据的两侧。双方各有一个备用地区供备用录音。在光盘装置中，要记录的一系列数据被分配到两侧的第一个的第一数据和两侧的第二个的第二数据中。本发明的装置在同时记录期间检测出在一侧或两侧不能记录数据的缺陷扇区。如果在一侧存在缺陷扇区，则执行备选记录处理，以备选记录要被记录到检测到的缺陷扇区中的数据，以及要记录到与缺陷扇区相对应的另一侧的扇区中的数据，分别在双方备用地区的替代行业。此外，与缺陷扇区相关的缺陷信息被记录在光盘的预定区域中。当第一数据和第二数据被再现时，第一和第二数据被整合和重新排列，以再现一系列数据。

148. 发明授权

US08675949B2 Reviewed defect selection processing method, defect review method, reviewed defect selection processing tool, and defect review tool 有权
标题翻译：审查缺陷选择处理方法，缺陷审查方法，审查缺陷选择处理工具和缺陷审查工具
公开(公告)号：US08675949B2
公开(公告)日：2014-03-18
申请号：US13266800
申请日：2010-03-25
申请人： Yuji Takagi , Minoru Harada , Yuichi Hamamura
发明人： Yuji Takagi , Minoru Harada , Yuichi Hamamura
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8867 , H01L22/12 , H01L22/20
摘要： The present invention relates to semiconductor inspection and provides a technology capable of efficiently detecting a systematic defect. In the present system, with regard to the process (S7, S8) of matching hot spot (HS) points that can be simulated in advance and defect points obtained as a result of a visual inspection each other and the unmatched defect points, a process (S6, S9) of classifying the defect points into groups based on similarity of pattern layout at the defect points to determine the defects belonging to a pattern layout where defects frequently occur, thereby reliably detecting the systematic defect. Also, with a process (S11) of acquiring an uneven distribution in a defect occurrence distribution on a wafer, the systematic defect occurring due to topography of the wafer can also be detected.
摘要翻译：本发明涉及半导体检查，并且提供能够有效地检测系统缺陷的技术。在本系统中，关于可以预先模拟的热点（HS）点和作为目视检查的结果获得的缺陷点与不匹配的缺陷点的处理（S7，S8），处理（S6，S9），根据缺陷点的图案布局的相似度将缺陷点分类成组，以确定属于频繁发生缺陷的图案布局的缺陷，从而可靠地检测系统缺陷。此外，通过获取晶片上的缺陷发生分布中的不均匀分布的处理（S11），也可以检测由于晶片的形貌而发生的系统缺陷。

149. 发明申请

US20140072204A1 DEFECT CLASSIFICATION METHOD, AND DEFECT CLASSIFICATION SYSTEM 有权
标题翻译：缺陷分类方法和缺陷分类系统
公开(公告)号：US20140072204A1
公开(公告)日：2014-03-13
申请号：US14112105
申请日：2012-04-16
申请人： Yohei Minekawa , Yuji Takagi , Minoru Harada , Takehiro Hirai , Ryo Nakagaki
发明人： Yohei Minekawa , Yuji Takagi , Minoru Harada , Takehiro Hirai , Ryo Nakagaki
IPC分类号： G06T7/00 , G06K9/62
CPC分类号： G06T7/001 , G01N21/9501 , G01N23/225 , G01N2223/421 , G01N2223/611 , G01N2223/646 , G06K9/6267 , G06T5/00 , G06T2207/10061 , G06T2207/30148 , H01L22/12 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： In automatic defect classification, a classification recipe must be set for each defect observation device. If a plurality of devices operate at the same stage, the classification class in the classification recipes must be the same. Problems have arisen whereby differences occur in the classification class in different devices when a new classification recipe is created. This defect classification system has a classification recipe storage unit; an information specification unit, the stage of a stored image, and device information. A corresponding defect specification unit specifies images of the same type of defect from images obtained from different image pickup devices at the same stage. An image conversion unit converts the images obtained from the different image pickup devices at the same stage into comparable similar images; and a recipe update unit records the classification classes in the classification recipes corresponding to the specified images of the same type of defect.
摘要翻译：在自动缺陷分类中，必须为每个缺陷观察装置设定分类处方。如果多个设备在同一阶段进行操作，则分类配方中的分类等级必须相同。当创建新的分类配方时，出现了在不同装置中的分类等级中发生差异的问题。该缺陷分类系统具有分类配方存储单元; 信息指定单元，存储图像的级和设备信息。相应的缺陷指定单元从在相同阶段从不同图像拾取装置获得的图像中指定相同类型的缺陷的图像。图像转换单元将从相同阶段的不同图像拾取装置获得的图像转换成可比较的相似图像; 并且配方更新单元将分类类别记录在与相同类型的缺陷的指定图像相对应的分类配方中。

150. 发明授权

US08595666B2 Semiconductor defect classifying method, semiconductor defect classifying apparatus, and semiconductor defect classifying program 有权
标题翻译：半导体缺陷分类方法，半导体缺陷分类装置和半导体缺陷分类程序
公开(公告)号：US08595666B2
公开(公告)日：2013-11-26
申请号：US13382437
申请日：2010-05-14
申请人： Koichi Hayakawa , Takehiro Hirai , Yutaka Tandai , Tamao Ishikawa , Tsunehiro Sakai , Kazuhisa Hasumi , Kazunori Nemoto , Katsuhiko Ichinose , Yuji Takagi
发明人： Koichi Hayakawa , Takehiro Hirai , Yutaka Tandai , Tamao Ishikawa , Tsunehiro Sakai , Kazuhisa Hasumi , Kazunori Nemoto , Katsuhiko Ichinose , Yuji Takagi
IPC分类号： G06F17/50
CPC分类号： G01N21/8851 , G01N21/95607
摘要： A defect is efficiently and effectively classified by accurately determining the state of overlap between a design layout pattern and the defect. This leads to simple identification of a systematic defect. A defective image obtained through defect inspection or review of a semiconductor device is automatically pattern-matched with design layout data. A defect is superimposed on a design layout pattern for at least one layer of a target layer, a layer immediately above the target layer, and a layer immediately below the target layer. The state of overlap of the defect is determined as within the pattern, over the pattern, or outside the pattern, and the defect is automatically classified.
摘要翻译：通过精确地确定设计布局图案和缺陷之间的重叠状态，有效地和有效地分类缺陷。这导致系统缺陷的简单识别。通过半导体器件的缺陷检查或检查获得的缺陷图像与设计布局数据自动匹配。缺陷叠加在目标层的至少一层，目标层上方的层和目标层正下方的层的设计布局图案上。缺陷的重叠状态被确定为图案内，图案上或图案之外，并且缺陷被自动分类。

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