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131. 发明授权

US06746897B2 Fabrication process of semiconductor package and semiconductor package 失效
公开(公告)号：US06746897B2
公开(公告)日：2004-06-08
申请号：US10008616
申请日：2001-10-23
申请人： Naoki Fukutomi , Yoshiaki Tsubomatsu , Fumio Inoue , Toshio Yamazaki , Hirohito Ohhata , Shinsuke Hagiwara , Noriyuki Taguchi , Hiroshi Nomura
发明人： Naoki Fukutomi , Yoshiaki Tsubomatsu , Fumio Inoue , Toshio Yamazaki , Hirohito Ohhata , Shinsuke Hagiwara , Noriyuki Taguchi , Hiroshi Nomura
IPC分类号： H01L2144
CPC分类号： H01L21/568 , H01L21/4803 , H01L21/56 , H01L21/561 , H01L23/3121 , H01L23/3128 , H01L23/49811 , H01L23/49816 , H01L23/4985 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/73 , H01L24/83 , H01L24/97 , H01L2221/68377 , H01L2224/16237 , H01L2224/2919 , H01L2224/32057 , H01L2224/32225 , H01L2224/32245 , H01L2224/32503 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/48228 , H01L2224/48247 , H01L2224/73204 , H01L2224/73265 , H01L2224/83001 , H01L2224/83102 , H01L2224/8319 , H01L2224/83385 , H01L2224/8381 , H01L2224/8385 , H01L2224/85001 , H01L2224/92125 , H01L2224/97 , H01L2924/01005 , H01L2924/01006 , H01L2924/01015 , H01L2924/01019 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/0105 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/01327 , H01L2924/014 , H01L2924/0665 , H01L2924/07802 , H01L2924/07811 , H01L2924/12042 , H01L2924/14 , H01L2924/15153 , H01L2924/1517 , H01L2924/15183 , H01L2924/15184 , H01L2924/15311 , H01L2924/181 , H01L2924/203 , H01L2924/351 , H05K3/20 , H01L2224/85 , H01L2924/00014 , H01L2224/83 , H01L2224/92247 , H01L2924/00 , H01L2924/00012 , H01L2924/00015 , H01L2924/0002
摘要： A semiconductor package substrate is provided, which can meet the move toward high integration of semiconductors. A nickel layer is plated on an electroplated copper foil to form a wiring pattern. An LSI chip is mounted on the copper foil, and terminals of the LSI chip and the wiring pattern are connected by wire bonding, followed by sealing with a semiconductor-sealing epoxy resin. Only the copper foil is dissolved away with an alkali etchant to expose nickel. With a nickel stripper having low copper-dissolving power, the nickel layer is removed to expose the wiring pattern. A solder resist is coated, and a pattern is formed in such a way that connecting terminal portions are exposed. Solder balls are placed at the exposed portions of the wiring pattern and are then fused. The wiring pattern is connected to an external printed board via the solder balls.

132. 发明授权

US06741327B2 Method of correcting projection optical system and method of manufacturing semiconductor device 有权
标题翻译：投影光学系统校正方法及制造半导体器件的方法
公开(公告)号：US06741327B2
公开(公告)日：2004-05-25
申请号：US09893631
申请日：2001-06-29
申请人： Hiroshi Nomura , Kenji Konomi , Manabu Takakuwa
发明人： Hiroshi Nomura , Kenji Konomi , Manabu Takakuwa
IPC分类号： G03B2768
CPC分类号： G03F7/706 , G03F7/70258
摘要： The method of correcting a residual aberration of a projection optical system, which is used for projecting a pattern of a photo mask onto a photosensitive film located on a substrate, the method includes calculating an effect of a residual aberration on a given pattern on the basis of the residual aberration of the projection optical system obtained by measurement, calculating a moving amount of an adjustable aberration in the projection optical system such that the effect of the residual aberration becomes minimum in a given area, and moving the adjustable aberration in accordance with the calculated moving amount.
摘要翻译：校正用于将光掩模的图案投影到位于基板上的感光膜上的投影光学系统的残余像差的方法，该方法包括基于在基础上计算给定图案上的残余像差的影响通过测量获得的投影光学系统的残余像差，计算投影光学系统中的可变像差的移动量，使得在给定区域中残余像差的影响变得最小，并且根据计算移动量。

133. 发明授权

US06718275B2 Trimming circuit for a physical quantity sensor 有权
标题翻译：物理量传感器的微调电路
公开(公告)号：US06718275B2
公开(公告)日：2004-04-06
申请号：US10095081
申请日：2002-03-12
申请人： Kazuyoshi Nagase , Hiroshi Nomura
发明人： Kazuyoshi Nagase , Hiroshi Nomura
IPC分类号： G11C700
CPC分类号： G01D3/022
摘要： A trimming circuit includes a signal separation circuit for separating an input signal into a clock signal, a reset signal, a data signal, and a memory writing voltage signal in accordance with voltage levels. The memory circuit in the trimming voltage control circuit has at least first and second different error correction circuits. The first error correction circuit has a higher error correction capability but lower input-per-output bit efficiency than the second error correction circuit to correct important data such as a highest bit inputted to a D/A converter. The second error correction circuit such as SEC has a higher input-per-output bit efficiency than the first error correction circuit to correct data with an error correction code. The lowest or second lowest input bits are directly supplied to the D/A converter without error correction.
摘要翻译：修整电路包括用于根据电压电平将输入信号分离成时钟信号，复位信号，数据信号和存储器写入电压信号的信号分离电路。微调电压控制电路中的存储电路至少具有第一和第二不同的纠错电路。第一纠错电路具有比第二误差校正电路更高的纠错能力，但是输出比输出比特率更低，以校正诸如输入到D / A转换器的最高位的重要数据。诸如SEC的第二纠错电路具有比第一误差校正电路更高的输入/输出比特效率，以用纠错码纠正数据。最低或最低的输入位直接提供给D / A转换器，无误差校正。

134. 发明授权

US06674511B2 Evaluation mask, focus measuring method and aberration measuring method 有权
标题翻译：评估面膜，聚焦测量方法和像差测量方法
公开(公告)号：US06674511B2
公开(公告)日：2004-01-06
申请号：US09923443
申请日：2001-08-08
申请人： Hiroshi Nomura , Kenji Konomi
发明人： Hiroshi Nomura , Kenji Konomi
IPC分类号： G03B2752
CPC分类号： G03F7/706 , G03F7/70641
摘要： An evaluation mask for evaluating a projection-type exposure apparatus, the mask including at least one diffraction grating pattern for producing a diffracted light of the positive first-order and a diffracted light of negative first-order, diffraction efficiencies of the diffracted lights being different respectively, one of the diffracted lights having a magnitude that is zero, and an image of the at least one diffraction grating pattern being projected onto a test substrate by the projection-type exposure apparatus, and a reference pattern for obtaining a reference image to measure a displacement of the image of the diffraction grating pattern, and an image of the reference pattern being projected onto the test substrate or the image detector by the projection-type exposure apparatus, wherein the images of the diffraction grating pattern and the reference pattern projected onto the test substrate or the image detector are used for evaluating the projection-type exposure apparatus.
摘要翻译：用于评估投影型曝光装置的评估掩模，所述掩模包括至少一个用于产生正一级的衍射光的衍射光栅图案和负一级的衍射光，衍射光的衍射效率不同分别具有大小为零的衍射光中的一个，并且通过投影型曝光装置将至少一个衍射光栅图案的图像投影到测试基板上，以及用于获得用于测量的参考图像的参考图案衍射光栅图案的图像的位移和通过投影型曝光装置投影到测试基板或图像检测器上的参考图案的图像，其中衍射光栅图案和参考图案的图像投影到使用测试基板或图像检测器来评估投影型曝光装置。

135. 发明授权

US06661970B2 Lens barrel 失效
标题翻译：镜筒
公开(公告)号：US06661970B2
公开(公告)日：2003-12-09
申请号：US10283282
申请日：2002-10-30
申请人： Hiroshi Nomura , Takamitsu Sasaki , Kazunori Ishizuka
发明人： Hiroshi Nomura , Takamitsu Sasaki , Kazunori Ishizuka
IPC分类号： G03B500
CPC分类号： G02B7/08
摘要： A lens barrel includes an optical system having front and rear lens groups; a front lens frame which supports the front lens group; a rear lens frame which supports the rear lens group; a lens frame drive mechanism for driving the front and rear lens frames, and allows the rear lens frame to rotate relative to the front lens frame or move together in the optical axis direction while preventing relative rotation therebetween; a shutter unit having a shutter and a flexible printed wiring board, the shutter unit being relatively rotatable to, and movable together with, the rear lens frame in the optical axis direction; and a shutter unit guide mechanism for linearly guiding the shutter unit in the optical axis direction without rotating the shutter unit regardless of whether the rear lens frame rotates relative to the front lens frame.
摘要翻译：透镜镜筒包括具有前透镜组和后透镜组的光学系统; 支撑前透镜组的前透镜框; 支撑后透镜组的后透镜框; 用于驱动前透镜框和后透镜框的透镜框架驱动机构，并且允许后透镜框相对于前透镜框旋转或者在光轴方向上一起移动，同时防止其间的相对旋转; 具有快门和柔性印刷线路板的快门单元，所述快门单元可相对于所述后透镜框在所述光轴方向上相对旋转并与所述后透镜框一起移动; 以及用于在光轴方向线性地引导快门单元而不旋转快门单元的快门单元引导机构，而不管后透镜框是否相对于前透镜框旋转。

136. 发明授权

US06661586B2 Ring member shift mechanism and lens group shift mechanism 失效
公开(公告)号：US06661586B2
公开(公告)日：2003-12-09
申请号：US09960518
申请日：2001-09-24
申请人： Hiroshi Nomura , Takamitsu Sasaki , Kazunori Ishizuka , Maiko Takashima
发明人： Hiroshi Nomura , Takamitsu Sasaki , Kazunori Ishizuka , Maiko Takashima
IPC分类号： G02B1514
CPC分类号： G02B7/10
摘要： A shift mechanism includes first and second ring bodies which are relatively rotatable; a shift cam surface formed on the first ring body on an end surface thereof which faces the second ring body, the shift cam surface being inclined with respect to a circumferential direction of the first ring body; a follower projection formed on the second ring body for engaging with the shift cam surface; and a rotating mechanism for relatively rotating the first and second ring bodies. The shift cam surface and the follower projection are arranged to move the first and second ring bodies toward and away from each other in the axial direction as the first and second ring bodies are relatively rotated. An annular rib is formed along the circumference of the first ring body outside the shift cam surface over the follower projection of the second ring body.

137. 发明授权

US06657794B2 Movable lens hood mechanism of a zoom lens 失效
标题翻译：变焦镜头的可移动镜头遮光罩机构
公开(公告)号：US06657794B2
公开(公告)日：2003-12-02
申请号：US09772872
申请日：2001-01-31
申请人： Hiroshi Nomura , Nobuaki Aoki , Yoshihiro Yamazaki , Satoru Nakamura
发明人： Hiroshi Nomura , Nobuaki Aoki , Yoshihiro Yamazaki , Satoru Nakamura
IPC分类号： G02B1514
CPC分类号： G02B7/10
摘要： A movable lens hood mechanism of a zoom lens includes a plurality of lens groups guided linearly in a direction of an optical axis to change a focal length of the zoom lens; a first cam barrel rotatably driven to move the plurality of lens groups in the optical axis direction; a movable hood barrel having a photographic aperture positioned in front of the frontmost lens group and guided linearly in the optical axis direction; and a feed mechanism which drives the movable hood barrel forward/rearward in the optical axis direction relative to the frontmost lens group by rotation of the first cam barrel so that a space between the photographic aperture of the movable lens hood and the frontmost lens group in the optical axis direction varies in accordance with a variation of a focal length of the zoom lens.
摘要翻译：变焦透镜的可移动透镜罩机构包括沿光轴方向线性引导的多个透镜组，以改变变焦透镜的焦距; 第一凸轮筒，其被可旋转地驱动以在所述光轴方向上移动所述多个透镜组; 可移动的罩筒，具有位于最前面的透镜组的前方并沿光轴方向直线引导的照相孔; 以及馈送机构，其通过第一凸轮筒的旋转而相对于最前面的透镜组在光轴方向上向前/向后驱动可动罩筒，使得可移动透镜罩的照相孔与最前面的透镜组之间的空间光轴方向根据变焦透镜的焦距的变化而变化。

138. 发明授权

US06657793B2 Lens barrel 失效
公开(公告)号：US06657793B2
公开(公告)日：2003-12-02
申请号：US09961232
申请日：2001-09-24
申请人： Hiroshi Nomura , Takamitsu Sasaki , Kazunori Ishizuka , Maiko Takashima
发明人： Hiroshi Nomura , Takamitsu Sasaki , Kazunori Ishizuka , Maiko Takashima
IPC分类号： G02B1514
CPC分类号： G02B7/102
摘要： A lens barrel having a zoom lens system including variable power lens groups, at least one of which includes a switching lens group having two sub-lens groups, the lens barrel includes a first sub-lens group frame for supporting one of the sub-lens groups; a second sub-lens group frame for supporting the other sub-lens group; a switching lens group frame for supporting the first and second sub-lens group frames; a lens shutter mechanism secured to the switching lens group frame on the image side of the second sub-lens group frame; and a focusing mechanism for making the second sub-lens group frame advance or retreat, with respect to a reference position provided by the lens shutter mechanism secured to the switching lens group frame. The first and second sub-lens group frames are integrally moved along in the optical axis direction via the focusing mechanism.

139. 发明授权

US06627356B2 Photomask used in manufacturing of semiconductor device, photomask blank, and method of applying light exposure to semiconductor wafer by using said photomask 失效
标题翻译：用于制造半导体器件的光掩模，光掩模坯料，以及通过使用所述光掩模对半导体晶片进行曝光的方法
公开(公告)号：US06627356B2
公开(公告)日：2003-09-30
申请号：US09815005
申请日：2001-03-23
申请人： Daisuke Kawamura , Hiroshi Nomura
发明人： Daisuke Kawamura , Hiroshi Nomura
IPC分类号： G03F900
CPC分类号： G03F7/70941 , G03F1/32 , G03F1/38 , G03F7/091 , G03F7/70441
摘要： The photomask of the present invention comprises a transparent substrate, a pattern, and a calcium fluoride film. The transparent substrate has a first main surface and a second main surface opposite to the first main surface and is transparent to the exposed light. The pattern is formed on the first main surface of the transparent substrate and has at least one of a opaque film, a translucent film, and a phase control film. The opaque film does not transmit the exposed light. The translucent film partly transmits the exposed light. Further, the phase control film serves to control the phase of the exposed light. The calcium fluoride film is formed on the second main surface of the transparent substrate and performs the function of an antireflection coating for suppressing the re-reflection of light on the back surface of the transparent substrate.
摘要翻译：本发明的光掩模包括透明基板，图案和氟化钙膜。透明基板具有与第一主表面相对的第一主表面和第二主表面，并且对于暴露的光是透明的。图案形成在透明基板的第一主表面上，并且具有不透明膜，半透明膜和相位控制膜中的至少一个。不透明膜不透光。半透明膜部分地透射曝光的光。此外，相位控制膜用于控制曝光的相位。氟化钙膜形成在透明基板的第二主表面上，并且具有用于抑制透明基板的背面上的光的再反射的抗反射涂层的功能。

140. 发明授权

US06549341B2 Mechanism for rotating a cam barrel of a zoom lens 失效
标题翻译：旋转变焦镜头凸轮筒的机构
公开(公告)号：US06549341B2
公开(公告)日：2003-04-15
申请号：US09774113
申请日：2001-01-31
申请人： Hiroshi Nomura , Nobuaki Aoki , Yoshihiro Yamazaki , Satoru Nakamura
发明人： Hiroshi Nomura , Nobuaki Aoki , Yoshihiro Yamazaki , Satoru Nakamura
IPC分类号： G02B1514
CPC分类号： G02B7/102
摘要： A cam barrel rotating mechanism of a zoom lens includes a plurality of lens groups guided in a direction of an optical axis without rotating about the optical axis to change a focal length of the zoom lens; a cam barrel rotatably supported to move the plurality of lens groups in the optical axis direction; a rotational barrel positioned around the cam barrel, the rotational barrel being rotatably driven; a plurality of rotation transmission grooves formed on an outer peripheral surface of the cam barrel, at an equi-angular intervals, extending parallel to the optical axis; and a plurality of inward projections formed on an inner peripheral surface of the rotational barrel to be engaged in the plurality of rotation transmission grooves, respectively.
摘要翻译：变焦透镜的凸轮筒旋转机构包括沿光轴方向引导的多个透镜组，而不围绕光轴旋转以改变变焦透镜的焦距; 可旋转地支撑以在所述光轴方向上移动所述多个透镜组的凸轮筒; 围绕所述凸轮筒定位的旋转筒，所述旋转筒被可旋转地驱动; 在所述凸轮筒的外周面上以与所述光轴平行延伸的等角度间隔形成的多个旋转传递槽; 以及分别形成在所述旋转筒的内周面上的多个向内突起，以分别接合在所述多个旋转传递槽中。

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