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121. 发明专利

JPH04209500A ION BEAM ACCELERATION AND DECELERATION UNIT 失效
公开(公告)号：JPH04209500A
公开(公告)日：1992-07-30
申请号：JP33970390
申请日：1990-11-30
申请人： HITACHI LTD
发明人： AMAMIYA KENSUKE , TOKIKUCHI KATSUMI , HAKAMATA YOSHIMI , SAKUMICHI KUNIYUKI
IPC分类号： H05H7/04 , H05H9/00
摘要： PURPOSE:To obtain the accelerated or decelerated beam of substantial current for increasing the current capacity of an ion beam acceleration and deceleration unit by providing a high frequency quadrupole electrode with a permanent magnet to enlarge a beam focusing force. CONSTITUTION:A plurality of permanent magnets 2 are mounted at the predetermined pitch on the opposite edge of serrated edges of two pairs of poles 1a and 1b. The magnets 2 are so arranged as to have the same poles faced to each other in vertical and horizontal directions, and the polarity thereof alternately reversed in an axial direction. An ion beam incident to a high frequency quadrupole 1 progresses under exposure to the focusing effect of both pole 1 and magnet 2 concurrently. Consequently, the expansion of the beam due to own charge can be restrained, and the loss of the beam in progress can be reduced.

122. 发明专利

JPH03257747A ION SOURCE 失效
公开(公告)号：JPH03257747A
公开(公告)日：1991-11-18
申请号：JP5367890
申请日：1990-03-07
申请人： HITACHI LTD
发明人： MATSUO HISAHIDE , SAKUMICHI KUNIYUKI , TOKIKUCHI KATSUMI , SEKI TAKAYOSHI , IGA TAKASHI
IPC分类号： H01J27/14 , H01J37/08
摘要： PURPOSE:To always obtain a stable ion beam for various operating conditions without regard to or not to use an exciting coil as a magnetic field generating means by providing a magnetic substance driving mechanism able to adjust the magnetic field intensity or distribution in a discharge chamber. CONSTITUTION:Microwaves generated in a microwave generating source and passed through a wave guide 2 are introduced into a discharge chamber 1 constructed between discharge electrodes 5, 5 through a dielectric 4 such as boron nitride placed in vacuum, to generate a strong microwave electric field. In addition, in order to apply a magnetic field perpendicular to the microwave electric field in the discharge chamber 1, permanent magnets 7 are provided outside of the discharge chamber 1. Here, a magnetic substance driving mechanism 11 is provided to enable to control positions of the permanent magnets 7 from outside. Thereby even when no exciting coil is used, the magnetic field intensity or distribution in the discharge chamber 1 can be adjusted to obtain a stable ion beam.

123. 发明专利

JPH0313571A VAPOR DEPOSITION DEVICE, VAPORIZATION SOURCE AND FORMATION OF THIN FILM 失效
公开(公告)号：JPH0313571A
公开(公告)日：1991-01-22
申请号：JP14661289
申请日：1989-06-12
申请人： HITACHI LTD
发明人： KETSUSAKO MITSUNORI , MIYAKE KIYOSHI , NATSUI KENICHI , SAKUMICHI KUNIYUKI , OHATA KOKICHI , NAKAJIMA SHOICHI , AMAMIYA KENSUKE , ARIMATSU KEIJI
IPC分类号： C23C14/34 , C23C14/46
摘要： PURPOSE:To effectively utilize sputtered particles to form a thin film by irradiating a target material with an energy beam while moving the irradiation position. CONSTITUTION:The ions of Ar, etc., are drawn out by a focusing electrode 6, focused by an Einzel lens formed along with an ion beam deflecting electrode 4 and a source gas supply plate 8 and introduced to a sputtering region. A periodical voltage is impressed on the electrode 4, and the beam is deflected, rotated and scanned. Furthermore, the beam is modulated in a serrated form with a slow cycle, and the focused point of the beam is scanned over the whole region of a condensed source 13 in its axial direction. The inner surface of a condensed target 1 is irradiated with the focused beam which is moved in its axial direction and draws a circle, and the condensed source 13 is also irradiated. The sputtered surface is cooled until the beam comes next time, and a fresh source gas is condensed. The sputtered particles are deposited on a sample substrate 10 to form a thin film.

124. 发明专利

JPH02138477A METHOD AND DEVICE FOR FILM FORMING BY MICROWAVE PLASMA 失效
公开(公告)号：JPH02138477A
公开(公告)日：1990-05-28
申请号：JP18035989
申请日：1989-07-14
申请人： HITACHI LTD
发明人： TOKIKUCHI KATSUMI , SAKUMICHI KUNIYUKI , SUZUKI KEIZO , NINOMIYA TAKESHI
IPC分类号： C23C16/50 , B01J19/08 , C23C16/27 , C23C16/48 , C23C16/511
摘要： PURPOSE:To easily form a hard carbon film even on a substrate contg. low melting components by locally heating up only the surface to be treated of the substrate to a high temp. by irradiation of laser light at the time of forming the hard carbon film on the surface of the substrate by microwave plasma. CONSTITUTION:Miorowaves are introduced from a magnetron 1 by a waveguide 2 into a quartz discharge tube 4. The substrate 6 consisting of an alloy, etc., is disposed in the quartz discharge tube 4 and a gaseous mixture composed of H2+CH4 is supplied as a gaseous raw material into the tube. The substrate 6 is heated to a high temp. in a heating furnace 5 and the C formed by exciting and dissociating of the CH4 by the microwave plasma is deposited as the hard C film as hard as about diamond on the surface of the substrate 6. The heating of the substrate to a high temp. is not possible if the low alloy components are incorporated in the substrate 6 in this case and, therefore, a quartz window 14 is provided to the front end of the quartz discharge tube 4 and only the surface of the substrate 6 in the quartz discharge tube 4 is irradiated by the Ar laser light 8 of

125. 发明专利

JPS63224197A QUADRUPLE-POLE PARTICLE ACCELERATOR 失效
公开(公告)号：JPS63224197A
公开(公告)日：1988-09-19
申请号：JP5401687
申请日：1987-03-11
申请人： HITACHI LTD
发明人： SAKUMICHI KUNIYUKI , TOKIKUCHI KATSUMI , KOIKE HIDEKI , SEKI TAKAYOSHI , AMAMIYA KENSUKE
IPC分类号： H05H9/00 , H01J37/06 , H01J37/317

126. 发明专利

JPS63213248A CHARGED PARTICLE SOURCE 失效
公开(公告)号：JPS63213248A
公开(公告)日：1988-09-06
申请号：JP4255787
申请日：1987-02-27
申请人： HITACHI LTD
发明人： SAKUMICHI KUNIYUKI , TAMURA HIFUMI
IPC分类号： H01J3/02 , H01J27/26 , H01J37/073 , H01J37/08
摘要： PURPOSE:To make a pulse focusing beam of a C Hz band to be produced without expanding an energy width by generating a standing wave with a mechanical vibration wave sent to a liquid material covering a needle-state electrode, periodically changing a shape of a charged particle radiant point, and periodically changing on electric field strength of the radiant point. CONSTITUTION:A liquid material 2 adhered to the surface of a needle-state electrode 1 is made to a conical shape by a static electricity strength by an electric field produced by the electrode 1, an auxiliary electrode 5, and drawer type electrode 6 in which a suitable electric potential is impressed respectively. When an oscillator 8 is driven in the condition, a mechanical vibration wave is produced in the material 2, and standing waves 3 and 4 are generated. In this case, a wave length and shape of the standing wave change by a driving frequency and a surface tension or density of the material 2. This causes a radius of curvature of the tip to be periodically changed also an electric field strength to be periodically changed, and the use of a ultrasonic oscillator as an oscillator for giving a mechanical vibration enables a pulse from several K Hz to several G Hz to be produced.

127. 发明专利

JPS63193499A QUADRUPOLE PARTICLE ACCELERATOR 失效
公开(公告)号：JPS63193499A
公开(公告)日：1988-08-10
申请号：JP2231287
申请日：1987-02-04
申请人： HITACHI LTD
发明人： SAKUMICHI KUNIYUKI , TOKIKUCHI KATSUMI , KOIKE HIDEMI , SEKI TAKAYOSHI , OKADA OSAMI
IPC分类号： H05H9/00 , H01J37/04 , H01J37/317
摘要： PURPOSE:To make it possible to obtain a low-energy consuming and compact quadrupole particle accelerator by using a superconductive coil for a coil which otherwise consumes a large part of electricity. CONSTITUTION:Quadrupole electrodes 1-4 are insulated through insulating matters 5 for direct current from an accelerating tube 6, and a resonance circuit consisting of a coil 7 of inductance L and a variable capacitor 8 of capacity C is disposed outside the accelerating tube. The output of an oscillator 9 is amplified by an amplifier 10 and then supplied to said resonance circuit through a coupling coil 11. The coil 7 is made of superconductive material and contained in a low temp tank 12. Said low temp tank is driven by a power source 13, and its temp is kept lower than the superconductivity critical temp Tc of the coil material. Thus the coil is made superconductive, and electric consumption can be eliminated at the coil which otherwise consumes a large part of a supply of high frequency current.

128. 发明专利

JPS62250168A MICROWAVE PLASMA FILM FORMING DEVICE 失效
公开(公告)号：JPS62250168A
公开(公告)日：1987-10-31
申请号：JP9209486
申请日：1986-04-23
申请人： HITACHI LTD
发明人： SAKUMICHI KUNIYUKI , TOKIKUCHI KATSUMI , KOIKE HIDEMI , SEKI TAKAYOSHI , OKADA OSAMI
IPC分类号： C23C14/32 , C23C14/22
摘要： PURPOSE:To form a metallic film with high adhesive power on a work by passing large current to a fine metallic wire to generate plasma by explosion and evaporation and ionizing vapor particles by microwave discharge. CONSTITUTION:The work 2 to be deposited with the metallic film by evaporation is placed on a processing chamber 1 and the fine wire 3 of the metal for vapor deposition is disposed to the central part thereof. The large current is passed to the fine metallic wire by connecting a switch 9 to discharge the charge of a capacitor 8 charged by a power source 7. The wire 3 is instantaneously melted and evaporated and the plasma generated in this stage is ionized by the microwaves from a magnetron 11 driven by a power source 10, by which the temp. and density are increased and the good-quality metallic film is deposited on the surface of the work 2 with the high adhesive power.

129. 发明专利

JPS62108441A MICROWAVE PLASMA SOURCE 失效
公开(公告)号：JPS62108441A
公开(公告)日：1987-05-19
申请号：JP24802685
申请日：1985-11-07
申请人： HITACHI LTD
发明人： SAKUMICHI KUNIYUKI , TOKIKUCHI KATSUMI , KOIKE HIDEKI , SEKI TAKAYOSHI , OKADA OSAMI
IPC分类号： H01J27/08 , H01J27/16 , H01J37/08
摘要： PURPOSE:To increase the degree of freedom of choice of a dielectric material and enhance the reliability of a microwave plasma source, by providing an electroconductive material in tight contact with a part of the outside circumferential surface of the dielectric material. CONSTITUTION:An electroconductive film 13 of metal or the like is deposited by vacuum evaporation coating on the entire outside circumferential surface of a dielectric material 2 which is for limiting a discharge area. The film 13 is used to act as a discharge box and a discharge electrode. For that reason, the accuracy of machining of the dielectric material 2 does not need to be high, so that steatite or the like can be used as the dielectric material. This results in heightening the reliability as to maintenance.

130. 发明专利

JPS62108428A EXTRACTION ELECTRODE SYSTEM FOR ION SOURCE 失效
公开(公告)号：JPS62108428A
公开(公告)日：1987-05-19
申请号：JP24702685
申请日：1985-11-06
申请人： HITACHI LTD
发明人： TOKIKUCHI KATSUMI , SAKUMICHI KUNIYUKI , KOIKE HIDEMI , SEKI TAKAYOSHI , OKADA OSAMI
IPC分类号： H01J27/02 , H01J27/16 , H01J37/08
摘要： PURPOSE:To greatly reduce the number of times of minute discharge, by making the surface of a deceleration electrode convex in the face of a third electrode whose potential is kept between those of an acceleration electrode and the deceleration electrode, to suppress an electrical current loss resulting from the divergence of a beam. CONSTITUTION:The surface of a deceleration electrode 2' is made convex in the face of a third electrode 3 to make equipotential lines concave on the upside. As a result, an electric field is directed toward a center so that a force oriented toward the center acts to positive ions in a deceleration space between the electrodes 2', 3. For that reason, the divergence of an ion beam is diminished to decrease the quantity of the ion beam which collides against the electrode 3. This results in reducing the number of times of minute discharge.

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