会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 129. 发明授权
    • Methods of forming nitride read only memory and word lines thereof
    • 形成氮化物的方法只读存储器及其字线
    • US07544616B2
    • 2009-06-09
    • US11874061
    • 2007-10-17
    • Chi-Pin LuLing-Wu Yang
    • Chi-Pin LuLing-Wu Yang
    • H01L21/4763H01L21/44
    • H01L27/11568H01L21/0337H01L21/32139H01L29/513H01L29/792
    • A method of forming word lines of a memory includes providing a substrate and forming a conductive layer on the substrate. A metal silicide layer is formed on the conductive layer, and a mask pattern is formed on the metal silicide layer. A mask liner covering the mask pattern and the surface of the metal silicide layer is formed on the substrate to shorten distances between the word line regions. An etching process is performed on the mask liner and the mask pattern until the partial surface of the metal silicide layer is exposed. The metal silicide layer and the conductive layer are etched to form word lines by utilizing the mask liner and the mask pattern as a mask. A silicon content of the metal silicide layer must be less than or equal to 2 for reducing a bridge failure rate between the word lines.
    • 形成存储器字线的方法包括提供衬底并在衬底上形成导电层。 在导电层上形成金属硅化物层,在金属硅化物层上形成掩模图形。 覆盖掩模图案的掩模衬垫和金属硅化物层的表面形成在衬底上以缩短字线区域之间的距离。 对掩模衬垫和掩模图案进行蚀刻处理,直到暴露金属硅化物层的部分表面。 通过利用掩模衬垫和掩模图案作为掩模,蚀刻金属硅化物层和导电层以形成字线。 金属硅化物层的硅含量必须小于或等于2,以减少字线之间的桥接故障率。