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111. 发明授权

US5976760A Chemical-sensitization resist composition 失效
标题翻译：化学增感抗蚀剂组合物
公开(公告)号：US5976760A
公开(公告)日：1999-11-02
申请号：US898105
申请日：1997-07-22
申请人： Katsumi Oomori , Hideo Hada , Fumitake Kaneko , Mitsuru Sato , Kazufumi Sato , Toshimasa Nakayama
发明人： Katsumi Oomori , Hideo Hada , Fumitake Kaneko , Mitsuru Sato , Kazufumi Sato , Toshimasa Nakayama
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： Proposed is a novel chemical-sensitization resist composition capable of giving a positively or negatively patterned resist layer of excellent pattern resolution and cross sectional profile of the patterned resist layer with high sensitivity. Characteristically, the resist composition is formulated, as combined with a resinous ingredient which is subject to changes in the solubility behavior in an alkaline developer solution by interaction with an acid, with a specific oximesulfonate compound as the radiation-sensitive acid-generating agent represented by the general formulaR.sup.1 --C(CN).dbd.N--O--SO.sub.2 --R.sup.2,in which R.sup.1 is an inert organic group and R.sup.2 is an unsubstituted or substituted polycyclic monovalent hydrocarbon group selected from the group consisting of polycyclic aromatic hydrocarbon groups such as naphthyl and polycyclic non-aromatic hydrocarbon groups such as a terpene or camphor residue.
摘要翻译：提出了一种能够以高灵敏度赋予图案化抗蚀剂层优异图案分辨率和截面轮廓的正或负图案化抗蚀剂层的新型化学增感抗蚀剂组合物。特别地，将抗蚀剂组合物配制成与通过与酸相互作用而在碱性显影剂溶液中溶解度行为发生变化的树脂成分与特定的肟磺酸酯化合物作为辐射敏感性产酸剂，通式为R1-C（CN）= NO-SO2-R2，其中R1为惰性有机基团，R2为未取代或取代的多环一价烃基，选自多环芳烃基如萘基和多环非芳族烃基如萜烯或樟脑残基。

112. 发明授权

US5929271A Compounds for use in a positive-working resist composition 失效
标题翻译：用于正性抗蚀剂组合物的化合物
公开(公告)号：US5929271A
公开(公告)日：1999-07-27
申请号：US912123
申请日：1997-08-15
申请人： Hideo Hada , Kazufumi Sato , Hiroshi Komano , Toshimasa Nakayama
发明人： Hideo Hada , Kazufumi Sato , Hiroshi Komano , Toshimasa Nakayama
IPC分类号： C07C69/013 , G03F7/004 , G03F7/039 , C07C69/74
CPC分类号： C07C69/013 , G03F7/0045 , G03F7/039 , Y10S430/115 , Y10S430/122
摘要： Proposed is novel compounds for use in a chemical-sensitization positive-working photoresist composition used in the photolithographic patterning process for the manufacture of fine electronic devices, which is capable of giving, with high photosensitivity to ArF excimer laser beams, a patterned resist layer having an excellently orthogonal cross sectional profile and high resistance against dry etching and exhibiting good adhesion to the substrate surface. While the composition comprises (A) a film-forming resinous ingredient which causes an increase of alkali solubility by interacting with an acid and (B) a radiation-sensitive acid-generating agent, the most characteristic feature of the invention consists in the use of a specific acrylic resin as the component (A), which comprises the monomeric units of a (meth)acrylic acid ester of hydroxy bicyclo�3.1.1!heptanone unsubstituted or substituted by an alkyl group such as hydroxypinanone (meth)acrylate, optionally, in combination with the monomeric units derived from (meth)acrylic acid and/or tert-butyl (meth)acrylate in a molar fraction of 3:7 to 7:3.
摘要翻译：提出了用于制造精细电子器件的光刻图案化方法中使用的化学增感正性光致抗蚀剂组合物中的新化合物，其能够赋予ArF准分子激光束具有高光敏性的图案化抗蚀剂层，其具有具有优异的正交横截面轮廓和高耐干腐蚀性，并且对基材表面表现出良好的粘合性。虽然组合物包含（A）通过与酸相互作用引起碱溶解度增加的成膜树脂成分和（B）辐射敏感的酸产生剂，但是本发明的最特征在于使用作为组分（A）的特定丙烯酸树脂，其包含未被取代或被烷基如羟基酮（甲基）丙烯酸酯取代的羟基双环[3.1.1]庚酮的（甲基）丙烯酸酯的单体单元，与来自（甲基）丙烯酸和/或（甲基）丙烯酸叔丁酯的单体单元组合，摩尔分数为3:7至7:3。

113. 发明授权

US5800964A Photoresist composition 失效
标题翻译：光刻胶组成
公开(公告)号：US5800964A
公开(公告)日：1998-09-01
申请号：US717779
申请日：1996-09-24
申请人： Mitsuru Sato , Kazuyuki Nitta , Hideo Hada , Tatsuya Hashiguchi , Hiroshi Komano , Toshimasa Nakayama
发明人： Mitsuru Sato , Kazuyuki Nitta , Hideo Hada , Tatsuya Hashiguchi , Hiroshi Komano , Toshimasa Nakayama
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： Disclosed is a novel and improved photoresist composition which comprises: (A) a film-forming resinous compound which is, in the presence of an acid, subject to a change in the solubility in an alkaline solution; and (B) an acid-generating agent capable of releasing an acid by the exposure to actinic rays which is an oxime sulfonate compound represented by the general formula NC--CR.sup.1 .dbd.N--O--SO.sub.2 --R.sup.2, in which R.sup.1 and R.sup.2 are, each independently from the other, an unsubstituted or halogen-substituted monovalent aliphatic hydrocarbon group, e.g., alkyl, cycloalkyl, alkenyl and cycloalkenyl groups. By virtue of the non-aromatic nature of the component (B) as well as good solubility thereof in organic solvents and high acid strength of the acid released therefrom, the composition is highly transparent to deep ultraviolet light even when the content of the component (B) is relatively large and the photosensitivity of the composition is very high so that the photoresist composition is capable of giving a patterned resist layer having excellent characteristics.
摘要翻译：公开了一种新颖且改进的光致抗蚀剂组合物，其包含：（A）在酸存在下，在碱溶液中溶解度变化的成膜树脂化合物; 和（B）能够通过暴露于由通式NC-CR1 = NO-SO2-R2表示的肟磺酸盐化合物的光化射线释放酸的酸产生剂，其中R 1和R 2各自独立地为另一个，未取代或卤素取代的一价脂族烃基，例如烷基，环烷基，烯基和环烯基。由于组分（B）的非芳香性质以及其在有机溶剂中的良好溶解性和从其释放的酸的高酸强度，组合物对于深紫外光是高度透明的，即使组分（ B）相对较大并且组合物的光敏性非常高，使得光致抗蚀剂组合物能够提供具有优异特性的图案化抗蚀剂层。

114. 发明授权

US09040220B2 Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern 有权
标题翻译：化合物及其制造方法，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US09040220B2
公开(公告)日：2015-05-26
申请号：US13410613
申请日：2012-03-02
申请人： Hideo Hada , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Fumitake Kaneko , Kyoko Ohshita , Hiroaki Shimizu , Yasuhiro Yoshii
发明人： Hideo Hada , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Fumitake Kaneko , Kyoko Ohshita , Hiroaki Shimizu , Yasuhiro Yoshii
IPC分类号： G03F7/004 , G03F7/30 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07C381/12 , C07C309/17 , C07D333/46 , C07D493/18 , G03F7/038 , G03F7/039 , C08K5/19 , C08K5/42
CPC分类号： C07C381/12 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/17 , C07C309/19 , C07C2603/74 , C07D333/46 , C07D493/18 , C08K5/19 , C08K5/42 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出改变的溶解性的基础成分和暴露时产生酸的酸发生剂成分，所述酸发生剂包括由通式（b1）表示的化合物 -1），其中RX表示可以具有不包括氮原子的取代基的烃基; Q2和Q3各自独立地表示单键或二价连接基团; Y1表示1〜4个碳原子的亚烷基或氟代烷基; Z +表示除通式（w-1）表示的离子的有机阳离子。

115. 发明授权

US09034556B2 Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern 有权
标题翻译：化合物及其制造方法，酸发生剂，抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US09034556B2
公开(公告)日：2015-05-19
申请号：US12338661
申请日：2008-12-18
申请人： Hideo Hada , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Fumitake Kaneko , Kyoko Ohshita , Hiroaki Shimizu , Yasuhiro Yoshii
发明人： Hideo Hada , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Fumitake Kaneko , Kyoko Ohshita , Hiroaki Shimizu , Yasuhiro Yoshii
IPC分类号： G03F7/004 , G03F7/30 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/19 , C07C381/12 , C07C309/17 , C07D333/46 , C07D493/18 , G03F7/038 , G03F7/039 , C08K5/19 , C08K5/42
CPC分类号： C07C381/12 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/17 , C07C309/19 , C07C2603/74 , C07D333/46 , C07D493/18 , C08K5/19 , C08K5/42 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸发生剂（B1）由下述通式（b1-1）表示的化合物组成：其中RX表示可以具有不包括氮原子的取代基的烃基; Q2和Q3各自独立地表示单键或二价连接基团; Y1表示1〜4个碳原子的亚烷基或氟代烷基; Z +表示除通式（w-1）表示的离子的有机阳离子。

116. 发明申请

US20120164580A1 NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
标题翻译：新型化合物及其制造方法，酸发生器，耐蚀组合物和形成耐蚀图案的方法
公开(公告)号：US20120164580A1
公开(公告)日：2012-06-28
申请号：US13410613
申请日：2012-03-02
申请人： Hideo Hada , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Fumitake Kaneko , Kyoko Ohshita , Hiroaki Shimizu , Yasuhiro Yoshii
发明人： Hideo Hada , Yoshiyuki Utsumi , Keita Ishiduka , Kensuke Matsuzawa , Fumitake Kaneko , Kyoko Ohshita , Hiroaki Shimizu , Yasuhiro Yoshii
IPC分类号： G03F7/20 , C07C309/17 , G03F7/027 , C07D493/18 , G03F7/004 , C07C309/19 , C07C303/22
CPC分类号： C07C381/12 , C07C303/32 , C07C309/06 , C07C309/12 , C07C309/17 , C07C309/19 , C07C2603/74 , C07D333/46 , C07D493/18 , C08K5/19 , C08K5/42 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , Y10S430/111 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).
摘要翻译：一种抗蚀剂组合物，其包含在酸的作用下在碱性显影液中显示出改变的溶解性的碱成分和在曝光时产生酸的酸发生剂成分，所述酸发生剂包括由通式（b1）表示的化合物 -1），其中RX表示可以具有不包括氮原子的取代基的烃基; Q2和Q3各自独立地表示单键或二价连接基团; Y1表示1〜4个碳原子的亚烷基或氟代烷基; Z +表示除通式（w-1）表示的离子的有机阳离子。

117. 发明授权

US08187789B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08187789B2
公开(公告)日：2012-05-29
申请号：US12428133
申请日：2009-04-22
申请人： Koji Yonemura , Makiko Irie , Hideo Hada
发明人： Koji Yonemura , Makiko Irie , Hideo Hada
IPC分类号： G03F7/00 , G03F7/004 , G03F7/028
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： A positive resist composition, including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of an acid, and an acid generator component (B) which generates an acid upon exposure, wherein the component (A) includes a structural unit (a1) derived from a hydroxystyrene, and a structural unit (a2) containing an acid dissociable, dissolution inhibiting group; and the component (B) includes an acid generator (B1) composed of a compound represented by the general formula (b1) shown below: [Chemical Formula 1] X-Q1-Y1—SO3−A+ (b1) (in the formula, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms which may contain a substituent or a fluorinated alkylene group of 1 to 4 carbon atoms which may contain a substituent; X represents a hydrocarbon group of 3 to 30 carbon atoms which may contain a substituent; and A+ represents an organic cation).
摘要翻译：一种正型抗蚀剂组合物，包括在酸作用下在碱性显影液中显示出增加的溶解性的树脂组分（A）和暴露时产生酸的酸产生剂组分（B），其中组分（A）包括由羟基苯乙烯衍生的结构单元（a1）和含有酸解离的溶解抑制基团的结构单元（a2）组分（B）包括由以下通式（b1）表示的化合物构成的酸产生剂（B1）：[化学式1] X-Q1-Y1-SO3-A +（b1）（式中， Q1表示含有氧原子的二价连接基团; Y1表示可以含有取代基的1〜4个碳原子的亚烷基或可含有取代基的1〜4个碳原子的氟化亚烷基; X表示 3〜30个可含有取代基的碳原子; A +表示有机阳离子）。

118. 发明申请

US20120009521A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR 有权
标题翻译：抗菌组合物，形成耐药性图案，化合物和酸产生剂的方法
公开(公告)号：US20120009521A1
公开(公告)日：2012-01-12
申请号：US13233832
申请日：2011-09-15
申请人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
发明人： Akiya Kawaue , Yoshiyuki Utsumi , Takehiro Seshimo , Tsuyoshi Nakamura , Naoto Motoike , Hiroaki Shimizu , Kensuke Matsuzawa , Hideo Hada
IPC分类号： G03F7/20 , G03F7/027 , C07C309/17 , C07D493/18 , C07C309/24 , C07D327/04 , C07D213/79 , C07D285/15 , G03F7/004 , C07C317/46
CPC分类号： G03F7/0045 , C07C309/09 , C07C309/10 , C07C309/17 , C07C311/48 , C07C311/51 , C07C317/04 , C07C317/10 , C07C381/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D307/92 , C07D307/94 , C07D493/18 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/12 , Y10S430/121 , Y10S430/122
摘要： A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
摘要翻译：一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A）和产生酸的酸发生剂组分（B），其中所述酸产生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“至 R9“各自独立地表示芳基或烷基，其中R7”至R9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个表示取代的芳基具有下述通式（I）表示的基团作为取代基的基团; X-表示阴离子; Rf表示氟化烷基。

119. 发明授权

US07901865B2 Resist composition and process for formation of resist patterns 有权
标题翻译：抗蚀剂图案的抗蚀剂组成和工艺
公开(公告)号：US07901865B2
公开(公告)日：2011-03-08
申请号：US11574805
申请日：2005-09-02
申请人： Taku Hirayama , Daiju Shiono , Hideo Hada
发明人： Taku Hirayama , Daiju Shiono , Hideo Hada
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0048 , Y10S430/114
摘要： A resist composition that includes a base material component (A), which contains acid-dissociable, dissolution-inhibiting groups and exhibits increased alkali solubility under the action of acid, an acid generator component (B) that generates acid on exposure, and an organic solvent (C), in which the components (A) and (B) are dissolved in the organic solvent (C), wherein the base material component (A) contains a protected form (A1) of a polyhydric phenol compound (a) having two or more phenolic hydroxyl groups and a molecular weight within a range from 300 to 2,500, in which either a portion of, or all of, the phenolic hydroxyl groups are protected with acid-dissociable, dissolution-inhibiting groups, and the organic solvent (C) comprises an alcohol.
摘要翻译：一种抗蚀剂组合物，其包含基质成分（A），其含有酸解离的溶解抑制基团，并且在酸的作用下显示出增加的碱溶解性，在曝光时产生酸的酸产生剂组分（B）和有机其中组分（A）和（B）溶解在有机溶剂（C）中的溶剂（C），其中基材组分（A）含有多元酚化合物（a）的保护形式（A1）两个或更多个酚羟基和分子量在300-2,500的范围内，其中酚羟基的一部分或全部被酸解离的溶解抑制基团保护，并且有机溶剂（ C）包含醇。

120. 发明授权

US07862981B2 Compound, positive resist composition and method of forming resist pattern 失效
标题翻译：化合物，正性抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US07862981B2
公开(公告)日：2011-01-04
申请号：US11917458
申请日：2006-06-07
申请人： Daiju Shiono , Taku Hirayama , Hideo Hada
发明人： Daiju Shiono , Taku Hirayama , Hideo Hada
IPC分类号： G03C1/00 , C07C39/12
CPC分类号： C07C69/712 , C07C2603/74 , G03F7/0392 , G03F7/0397
摘要： A compound including a polyhydric phenol compound represented by general formula (I) shown below (wherein R11 to R17 each independently represents an alkyl group of 1 to 10 carbon atoms or aromatic hydrocarbon group which may contain a hetero atom in the structure thereof, and X represents an aliphatic cyclic group) and having a molecular weight of 300 to 2,500, in which some or all of the hydrogen atoms of the phenolic hydroxyl groups are substituted with acid dissociable, dissolution inhibiting groups; a positive resist composition containing the compound; and a method of forming a resist pattern using the positive resist composition.
摘要翻译：含有下述通式（I）表示的多元酚化合物的化合物（其中，R 11〜R 17各自独立地表示碳原子数1〜10的烷基或其结构中可含有杂原子的芳香族烃基，X 代表脂族环基），其分子量为300-2,500，其中酚羟基的一些或全部氢原子被酸解离的溶解抑制基团取代; 含有该化合物的正性抗蚀剂组合物; 以及使用正性抗蚀剂组合物形成抗蚀剂图案的方法。

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