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    • 113. 发明授权
    • Fluid control system and valve to be used therein
    • 流体控制系统和阀门用于其中
    • US5850853A
    • 1998-12-22
    • US630081
    • 1996-04-09
    • Tadahiro OhmiMichio YamajiNobukazu IkedaHiroshi Morokoshi
    • Tadahiro OhmiMichio YamajiNobukazu IkedaHiroshi Morokoshi
    • B01J4/00C30B25/14C30B31/16F16K31/122F16K31/42
    • C23C16/45561B01J4/008C30B25/14C30B31/16F16K31/1226F16K31/42Y10T137/87684
    • A fluid control system, and its valve assemblies, are used to control the feeding of fluids accurately (by operating (opening and closing) valves promptly and accurately), for the manufacture of semiconductors, magnetic thin films, biotechnical products, and other products. The fluid control system comprises a principal control line (L) and plural branch control lines (L.sub.1, L.sub.2, . . . ) for feeding plural types of fluid (G.sub.1, G.sub.2, . . . ) into a processing device (C) coupled to the principal control line, and plural valve assemblies (V) incorporated in the branch control lines (L.sub.1, L.sub.2, . . . ) for switching the fluids (G.sub.1, G.sub.2, . . . ) supplied into the processing device (C). Each of the valve assemblies (V) comprises a fluid drive valve (V') having a fluid pressure actuator (1), and an electromagnetic valve (V") integrally attached, in single housing, substantially without hoses, to the fluid drive valve (V') to feed a working fluid (A) into the fluid pressure actuator (1).
    • 流体控制系统及其阀门组件用于精确地控制流体的供给(通过快速准确地操作(打开和关闭)阀门),用于制造半导体,磁性薄膜,生物技术产品和其他产品。 流体控制系统包括主控制线(L)和多个分支控制线(L1,L2 ...),用于将多种类型的流体(G1,G2 ...)馈送到耦合到 主控制线和并入分支控制线(L1,L2 ...)中的多个阀组件(V),用于切换供给到处理装置(C)中的流体(G1,G2 ...)。 每个阀组件(V)包括具有流体压力致动器(1)的流体驱动阀(V')和在基本上没有软管的单个壳体中一体地附接到流体驱动器的电磁阀(V“) 阀(V')将工作流体(A)输送到流体压力致动器(1)中。
    • 114. 发明授权
    • Diaphragm valve for the vacuum exhaustion system
    • 用于真空排气系统的隔膜阀
    • US07416165B2
    • 2008-08-26
    • US10546032
    • 2004-02-09
    • Tadahiro OhmiNobukazu IkedaMichio YamajiMasafumi KitanoAkihiro Morimoto
    • Tadahiro OhmiNobukazu IkedaMichio YamajiMasafumi KitanoAkihiro Morimoto
    • F16K31/122F16K7/17
    • F16K7/16F16K51/02
    • A diaphragm valve 1 is provided with a body 2 having a flow-in passage 6, a flow-out passage 7, and a valve seat 8 formed between the passages; a diaphragm 3 installed in the body 2 and permitted to rest on and move away from the valve seat 8; and a driving means 4 installed on the body 2 to allow the diaphragm 3 to rest on and move away from the valve seat 8, wherein synthetic resin films 5 of predetermined thickness are coated on fluid-contacting parts 25 of the afore-mentioned body 2 and diaphragm 3. A diaphragm valve in accordance with the present invention prevents corrosion of the valve members caused by accumulation and adherence of substances produced by thermal decomposition, and prevents clogging caused by substances produced, and prevents seat leakage when applied in the vacuum exhaust system of a semiconductor manufacturing facility.
    • 隔膜阀1设置有主体2,主体2具有形成在通道之间的流入通道6,流出通道7和阀座8; 隔膜3安装在主体2中并允许搁置在阀座8上并远离阀座8; 以及安装在主体2上的驱动装置4,以允许隔膜3搁置在阀座8上并远离阀座8,其中预定厚度的合成树脂膜5涂覆在上述主体2的流体接触部分25上 和隔膜3.根据本发明的隔膜阀防止由热分解产生的物质的积聚和粘附引起的阀构件的腐蚀,并且防止由所产生的物质引起的堵塞,并且当应用于真空排气系统时防止阀座泄漏 的半导体制造设施。