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101. 发明申请

US20080096140A1 Ferrule for optical wave guide 有权
标题翻译：光波导套管
公开(公告)号：US20080096140A1
公开(公告)日：2008-04-24
申请号：US11932570
申请日：2007-10-31
申请人： Masaki Hasegawa , Fumiaki Yamada , Yoichi Taira
发明人： Masaki Hasegawa , Fumiaki Yamada , Yoichi Taira
IPC分类号： G03C5/00 , B05D3/12 , B05D5/06
CPC分类号： G02B6/43 , G02B6/3882 , G02B2006/12166
摘要： An apparatus includes an optical wave guide and a ferrule. The optical wave guide has a prespecified horizontal-positioning surface and a prespecified vertical-positioning surface. The ferrule is to precisely couple with the optical wave guide. The ferrule defines a first datum plane mating with the prespecified vertical-positioning surface of the optical wave guide to precisely mechanically vertically position the optical wave guide within the ferrule. The ferrule defines a second datum plane mating with the prespecified horizontal-positioning surface of the optical wave guide to precisely mechanically horizontally position the optical wave guide within the ferrule.
摘要翻译：一种装置包括光波导和套圈。光波导具有预先指定的水平定位表面和预先指定的垂直定位表面。套圈要与光波导精密耦合。套圈限定与光波导的预先指定的垂直定位表面配合的第一基准平面，以将光波导精密机械地垂直定位在套圈内。套圈限定与光波导的预先指定的水平定位表面配合的第二基准平面，以将光波导精密机械地水平定位在套圈内。

102. 发明申请

US20070272857A1 Method and apparatus for pattern inspection 有权
标题翻译：图案检查方法和装置
公开(公告)号：US20070272857A1
公开(公告)日：2007-11-29
申请号：US11698025
申请日：2007-01-26
申请人： Masaki Hasegawa , Hisaya Murakoshi , Hiroshi Makino
发明人： Masaki Hasegawa , Hisaya Murakoshi , Hiroshi Makino
IPC分类号： G01N23/00
CPC分类号： H01J37/265 , G06T7/0004 , G06T2207/10056 , G06T2207/30148 , H01J37/29 , H01J2237/22 , H01J2237/24592
摘要： Because a mirror electron imaging type inspection apparatus for obtaining an inspection object image with mirror electrons has been difficult to optimize inspection conditions, since the image forming principles of the apparatus are different from those of conventional SEM type inspection apparatuses. In order to solve the above conventional problem, the present invention has made it possible for the user to examine such conditions as inspection speed, inspection sensitivity, etc. intuitively by displaying the relationship among the values of inspection speed S, inspection object digital signal image pixel size D, inspection object image size L, and image signal acquisition cycle P with use of a time delay integration method as a graph on an operation screen. The user can thus determine a set of values of a pixel size, an inspection image width, and a TDI sensor operation cycle easily with reference to the displayed graph.
摘要翻译：由于用于获得具有镜电子的检查对象图像的镜像电子成像型检查装置难以优化检查条件，因为该装置的图像形成原理与常规SEM型检查装置的图像形成原理不同。为了解决上述常规问题，本发明使得用户可以通过显示检查速度S，检查对象数字信号图像的值之间的关系来直观地检查诸如检查速度，检查灵敏度等条件像素尺寸D，检查对象图像尺寸L和图像信号采集周期P，使用时间延迟积分方法作为操作画面上的图形。因此，用户可以参照所显示的图形容易地确定像素尺寸，检查图像宽度和TDI传感器操作循环的一组值。

103. 发明授权

US07288948B2 Patterned wafer inspection method and apparatus therefor 有权
标题翻译：图案化晶圆检查方法及其设备
公开(公告)号：US07288948B2
公开(公告)日：2007-10-30
申请号：US11016990
申请日：2004-12-21
申请人： Masaki Hasegawa , Hisaya Murakoshi
发明人： Masaki Hasegawa , Hisaya Murakoshi
IPC分类号： G01R31/305
CPC分类号： G01N23/225 , H01J37/265 , H01J37/29 , H01J2237/24585 , H01J2237/24592
摘要： A defect inspection apparatus is provided which allows a technology for inspecting a pattern on a wafer by using an electron beam to implement a high-resolution and higher-speed inspection. A semiconductor wafer is irradiated with an electron beam and electrons reflected in the vicinity of the wafer are detected. The presence or absence of a defect and the location thereof are measured by forming an image from only a component which changes with a periodicity larger than a size of a circuit pattern or the repetition periodicity thereof by using lenses and comparing an image signal with a preset value. Since only the component which changes with a periodicity larger than the size of the circuit pattern with a surface potential distortion and the repetition periodicity thereof is observed with a resolution lower than required to observe the pattern itself instead of detecting a defect through a comparison between extremely small pattern images, an inspection throughput can be increased exponentially compared with that of a conventional SEM inspection.
摘要翻译：提供了一种缺陷检查装置，其允许通过使用电子束来检查晶片上的图案以实现高分辨率和高速检查的技术。用电子束照射半导体晶片，并检测在晶片附近反射的电子。缺陷的存在或不存在以及其位置是通过使用仅使用通过使用透镜的电路图案的尺寸或重复周期的周期性变化的分量形成图像来测量的，并且将图像信号与预设值。由于仅以比通过观察图案本身所需的分辨率低的分辨率观察周期性大于具有表面电位失真和重复周期的电路图案的尺寸的分量，而不是通过极端的比较来检测缺陷与传统SEM检查相比，小图案图像的检查吞吐量可以指数增加。

104. 发明申请

US20060105242A1 Negative electrode for non-aqueous electrolyte secondary battery and non-aqueous electrolyte secondary battery comprising the same 有权
公开(公告)号：US20060105242A1
公开(公告)日：2006-05-18
申请号：US11119208
申请日：2005-05-02
申请人： Toshitada Sato , Masaki Hasegawa , Teruaki Yamamoto , Yasuhiko Bito
发明人： Toshitada Sato , Masaki Hasegawa , Teruaki Yamamoto , Yasuhiko Bito
IPC分类号： H01M4/58
CPC分类号： H01M4/38 , H01M4/13 , H01M4/362 , H01M4/386 , H01M4/587 , H01M10/052
摘要： A negative electrode containing an alloying material and a graphite material for providing a non-aqueous electrolyte secondary battery with a high capacity and excellent cycle characteristics. The negative electrode includes graphite and an alloying material capable of electrochemically absorbing and desorbing Li. The alloying material includes an A phase composed mainly of Si and a B phase including an intermetallic compound of a transition metal element and Si. The A phase and/or the B phase include a microcrystalline or amorphous region. The weight percentage of the A phase relative to the total weight of the A phase and the B phase is greater than 40% and not greater than 95%. The weight percentage of the graphite relative to the total weight of the alloying material and the graphite is not less than 50% and not greater than 95%.

105. 发明申请

US20060011835A1 Electron microscope and electron beam inspection system 有权
标题翻译：电子显微镜和电子束检查系统
公开(公告)号：US20060011835A1
公开(公告)日：2006-01-19
申请号：US11180671
申请日：2005-07-14
申请人： Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
发明人： Hisaya Murakoshi , Masaki Hasegawa , Hideo Todokoro
IPC分类号： G21K7/00
CPC分类号： H01J37/29 , H01J37/147 , H01J2237/1508 , H01J2237/2538 , H01J2237/28
摘要： An electron microscope includes an illuminating lens system that illuminates an electron beam that is emitted from an electron source onto a specimen as a planar illuminating electron beam having a two-dimensional spread, an imaging lens system that projects and magnifies the reflecting electron beam emitted from the specimen to project and form a specimen image, a beam separator that separates the illuminating electron beam from the reflecting electron beam, and a controller. The controller controls the reflecting electron beam so as to go straight through the beam separator, and the illuminating electron beam so as to keep a deflection angle of the illuminating electron beam which is made by the beam separator substantially constant.
摘要翻译：电子显微镜包括照明透镜系统，其将从电子源发射的电子束照射到样本上作为具有二维扩展的平面照明电子束;成像透镜系统，其投影并放大从投影并形成标本图像的样本，将照射电子束与反射电子束分离的光束分离器和控制器。控制器控制反射电子束以直线通过光束分离器，并且照明电子束以保持由光束分离器制成的照明电子束的偏转角大致恒定。

106. 发明授权

US06797954B2 Patterned wafer inspection method and apparatus therefor 有权
标题翻译：图案化晶圆检查方法及其设备
公开(公告)号：US06797954B2
公开(公告)日：2004-09-28
申请号：US10400588
申请日：2003-03-28
申请人： Hiroyuki Shinada , Yusuke Yajima , Hisaya Murakoshi , Masaki Hasegawa , Mari Nozoe , Atsuko Takafuji , Katsuya Sugiyama , Katsuhiro Kuroda , Kaoru Umemura , Yasutsugu Usami
发明人： Hiroyuki Shinada , Yusuke Yajima , Hisaya Murakoshi , Masaki Hasegawa , Mari Nozoe , Atsuko Takafuji , Katsuya Sugiyama , Katsuhiro Kuroda , Kaoru Umemura , Yasutsugu Usami
IPC分类号： H01J37244
CPC分类号： H01J37/26 , G01N23/225 , H01J37/244 , H01J37/29 , H01J2237/20228 , H01J2237/221 , H01J2237/2447 , H01J2237/24475 , H01J2237/24485 , H01J2237/24592 , H01J2237/2482
摘要： An electron beam (area beam) having a fixed area is irradiated onto the surface of a semiconductor sample, and reflected electrons from the sample surface are imaged by the imaging lens, and images of a plurality of regions of the surface of the semiconductor sample are obtained and stored in the image storage unit, and the stored images of the plurality of regions are compared with each other, and the existence of a defect in the regions and the defect position are measured. By doing this, in an apparatus for testing a pattern defect of the same design, foreign substances, and residuals on a wafer in the manufacturing process of a semiconductor apparatus by an electron beam, speeding-up of the test can be realized.
摘要翻译：具有固定面积的电子束（区域光束）被照射到半导体样品的表面上，并且通过成像透镜对来自样品表面的反射电子进行成像，并且半导体样品的表面的多个区域的图像是获取并存储在图像存储单元中，并且将多个区域的存储图像相互比较，并且测量区域和缺陷位置中的缺陷的存在。通过这样做，在通过电子束在半导体装置的制造过程中测试相同设计的模式缺陷，异物和晶片上的残留物的装置可以实现测试的加速。

107. 发明授权

US06476390B1 Method and apparatus for inspecting integrated circuit pattern using a plurality of charged particle beams 有权
标题翻译：使用多个带电粒子束检查集成电路图案的方法和装置
公开(公告)号：US06476390B1
公开(公告)日：2002-11-05
申请号：US09646281
申请日：2000-09-15
申请人： Hisaya Murakoshi , Yusuke Yajima , Hiroyuki Shinada , Mari Nozoe , Atsuko Takafuji , Kaoru Umemura , Masaki Hasegawa , Katsuhiro Kuroda
发明人： Hisaya Murakoshi , Yusuke Yajima , Hiroyuki Shinada , Mari Nozoe , Atsuko Takafuji , Kaoru Umemura , Masaki Hasegawa , Katsuhiro Kuroda
IPC分类号： G01N2300
CPC分类号： H01J37/28 , G01N23/225 , G01N23/2255 , H01J2237/16 , H01J2237/18 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In a pattern inspection device of the present invention having at least three electron-optical systems, detection signals approximately simultaneously obtained from identical circuit patterns are compared with each other. Further, areas around plural electron sources can be maintained at high degrees of vacuum by evacuating an electron gun chamber mounted with plural electron guns independently of a sample chamber. Further, electric fields and magnetic fields are confined in each electron-optical system by a shield electrode which makes it possible to evacuate an electron beam path to a high degree of vacuum, and at the same time, secondary electrons and reflected electrons are detected in the same electron-optical system by setting the samples to a negative voltage and accelerating secondary electrons and reflected electrons toward the electron source side in the direction of the electron beam axis. Thus, defect determination in pattern inspection is performable substantially simultaneously, and at the same time, the throughput of the inspections is improvable in proportion to the number of the electron-optical systems. Further, three or more electron sources are operable in a stable manner in high vacuum states, and signals from closely arranged electron-optical systems are detectable with high accuracy, and accurate inspections are performable.
摘要翻译：在具有至少三个电子 - 光学系统的本发明的图案检查装置中，将从相同电路图形大致同时获得的检测信号彼此进行比较。此外，通过与安装有多个电子枪的电子枪室独立于样品室排出，可以将多个电子源周围的区域保持在高真空度。此外，通过屏蔽电极将电场和磁场限制在每个电子 - 光学系统中，该屏蔽电极使得可以将电子束路径排出到高真空度，同时二次电子和反射电子被检测到相同的电子 - 光学系统通过将样品设置为负电压并且在电子束轴的方向上将二次电子和反射电子加速朝向电子源侧。因此，图案检查中的缺陷确定可以基本上同时执行，并且同时，检查的吞吐量可以与电子 - 光学系统的数量成比例地改善。此外，三个或更多个电子源可以以高真空状态稳定地操作，并且来自紧密排列的电子 - 光学系统的信号可以高精度地检测，并且可以进行准确的检查。

108. 发明授权

US5651816A Cement, cement products, molding material, concrete member and a method of producing the same 失效
标题翻译：水泥，水泥制品，成型材料，混凝土构件及其制造方法
公开(公告)号：US5651816A
公开(公告)日：1997-07-29
申请号：US681085
申请日：1996-07-22
申请人： Tadashi Kobayashi , Game Kankanamge Dinilprem Pushpalal , Masaki Hasegawa
发明人： Tadashi Kobayashi , Game Kankanamge Dinilprem Pushpalal , Masaki Hasegawa
IPC分类号： B28B7/22 , B28B7/34 , B28B11/04 , B28B11/24 , B28B19/00 , B28B23/02 , C04B16/04 , C04B22/00 , C04B24/28 , C04B26/10 , C04B28/02 , C04B28/06 , C04B40/06 , E04C1/40 , E04C3/20 , E04C5/07 , C04B24/00 , C04B24/22
CPC分类号： B28B11/04 , B28B11/245 , B28B19/00 , B28B23/02 , C04B22/006 , C04B28/02 , C04B28/06 , C04B40/06 , C04B40/0633 , E04C1/40 , E04C3/20 , Y10S264/43
摘要： Cement comprising hydraulic cement and polymer precursor such as alcohol-soluble phenol resin precursor that is substantially anhydrous and generates water by polymerization.
摘要翻译：水泥包括水硬性水泥和聚合物前体，例如基本上无水的醇溶性酚醛树脂前体，并通过聚合产生水。

109. 发明授权

US5638203A Liquid crystal electrooptical device 失效
标题翻译：液晶电光装置
公开(公告)号：US5638203A
公开(公告)日：1997-06-10
申请号：US706484
申请日：1996-09-04
申请人： Masaki Hasegawa , Fuminori Sai , Fumiaki Yamada
发明人： Masaki Hasegawa , Fuminori Sai , Fumiaki Yamada
IPC分类号： G02F1/1337 , G02F1/1343 , G02F1/141 , G02F1/29 , G02F1/13
CPC分类号： G02F1/134309 , G02F1/29 , G02F1/141 , G02F2001/294
摘要： The present invention relates to obtain an electrooptical device having a high response speed by using a spontaneously polarized ferroelectric liquid crystal. Spontaneously polarized ferroelectric liquid crystal in the smectic-A state is sealed into a proper transparent case. An electric field is applied perpendicularly to a light path direction so as to change the orientation directions of liquid crystal molecules, thereby changing the refractive index distribution. A liquid crystal electrooptical device having both deflection and focusing functions is provided by adjusting the shape of the electrodes while maintaining the polarization state of an input light beam.
摘要翻译：本发明涉及通过使用自发极化的铁电液晶获得具有高响应速度的电光装置。在近晶A状态下的自发极化铁电液晶被密封成适当的透明壳体。垂直于光路方向施加电场，以改变液晶分子的取向方向，从而改变折射率分布。通过在保持输入光束的偏振状态的同时调节电极的形状来提供具有偏转和聚焦功能的液晶电光装置。

110. 发明授权

US5631105A Non-aqueous electrolyte lithium secondary battery 失效
标题翻译：非水电解质锂二次电池
公开(公告)号：US5631105A
公开(公告)日：1997-05-20
申请号：US651365
申请日：1996-05-22
申请人： Masaki Hasegawa , Yasuhiko Bito , Shuji Ito , Toshihide Murata , Yoshinori Toyoguchi
发明人： Masaki Hasegawa , Yasuhiko Bito , Shuji Ito , Toshihide Murata , Yoshinori Toyoguchi
IPC分类号： H01M4/48 , H01M4/485 , H01M4/52 , H01M4/525 , H01M10/052 , H01M10/36 , H01M10/40
CPC分类号： H01M10/052 , H01M4/485 , H01M4/525
摘要： A non-aqueous electrolyte secondary battery having a low manufacturing cost and a high energy density and being excellent in the high rate charge/discharge characteristic and in the characteristics in operation at high temperature provided by an improvement on its positive electrode active material is disclosed. The positive electrode active material comprises a specific compound wherein a part of nickel or lithium in LiNiO.sub.2 is substituted with another element in a specified range. The element for the substitution comprises Mg, Ca, Sr, Ba, Al Cr, B and Co which may be employed solely or in combination.
摘要翻译：公开了一种具有低制造成本和高能量密度并且通过改善其正极活性材料提供的高速率充放电特性和高温操作特性优异的非水电解质二次电池。正极活性物质包含其中LiNiO 2中的一部分镍或锂被特定范围内的另一元素取代的特定化合物。用于取代的元素包括可以单独使用或组合使用的Mg，Ca，Sr，Ba，AlCr，B和Co。

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