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101. 发明授权

US07982882B2 Optical wave interference measuring apparatus 有权
标题翻译：光波干涉测量仪
公开(公告)号：US07982882B2
公开(公告)日：2011-07-19
申请号：US12571993
申请日：2009-10-01
申请人： Zongtao Ge , Hideo Kanda , Takayuki Saito , Noboru Koizumi
发明人： Zongtao Ge , Hideo Kanda , Takayuki Saito , Noboru Koizumi
IPC分类号： G01B11/02
CPC分类号： G01B11/2441 , G01M11/025 , G01M11/0271
摘要： The relative position of a test surface is sequentially changed from a reference position where a surface central axis is aligned with a measurement optical axis such that the measurement optical axis is sequentially moved to a plurality of annular regions obtained by dividing the test surface in a diametric direction. The test surface is rotated on a rotation axis whenever the relative position is changed. Measurement light that travels while being converged by a Mirau objective interference optical system is radiated to the rotating test surface, and a one-dimensional image sensor captures interference fringes at each of a plurality of rotational positions. The shape information of each annular region is calculated on the basis of the captured interference fringes at each rotational position, and the shape information is connected to calculate the shape information of the entire measurement region.
摘要翻译：测试表面的相对位置从表面中心轴与测量光轴对准的参考位置顺序地改变，使得测量光轴顺序地移动到通过将测试表面分成直径而获得的多个环形区域方向。每当相对位置改变时，测试表面都会在旋转轴上旋转。在由Mirau物镜干涉光学系统会聚的同时行进的测量光被照射到旋转测试表面，并且一维图像传感器在多个旋转位置的每一个处捕获干涉条纹。基于每个旋转位置处的捕获的干涉条纹来计算每个环形区域的形状信息，并且形状信息被连接以计算整个测量区域的形状信息。

102. 发明申请

US20100091299A1 OPTICAL WAVE INTERFERENCE MEASURING APPARATUS 失效
标题翻译：光波干扰测量装置
公开(公告)号：US20100091299A1
公开(公告)日：2010-04-15
申请号：US12578997
申请日：2009-10-14
申请人： Zongtao GE , Hideo Kanda , Takayuki Saito , Noboru Koizumi
发明人： Zongtao GE , Hideo Kanda , Takayuki Saito , Noboru Koizumi
IPC分类号： G01B11/24
CPC分类号： G01M11/0271 , G01M11/025
摘要： The relative position of a test surface is sequentially changed from a reference position where a surface central axis is aligned with a measurement optical axis such that the measurement optical axis is sequentially moved to a plurality of annular regions obtained by dividing the test surface in a diametric direction. The test surface is rotated on a rotation axis whenever the relative position is changed. Measurement light composed of a plane wave is radiated to the rotating test surface, and a one-dimensional image sensor captures interference fringes at each of a plurality of rotational positions. The shape information of each annular region is calculated on the basis of the captured interference fringes at each rotational position, and the shape information is connected to calculate the shape information of the entire measurement region.
摘要翻译：测试表面的相对位置从表面中心轴与测量光轴对准的参考位置顺序地改变，使得测量光轴顺序地移动到通过将测试表面分成直径而获得的多个环形区域方向。每当相对位置改变时，测试表面都会在旋转轴上旋转。由平面波构成的测量光被照射到旋转测试表面，并且一维图像传感器在多个旋转位置中的每一个处捕获干涉条纹。基于每个旋转位置处的捕获的干涉条纹来计算每个环形区域的形状信息，并且形状信息被连接以计算整个测量区域的形状信息。

103. 发明申请

US20090039519A1 SEMICONDUCTOR DEVICE, PHOTOMASK, SEMICONDUCTOR DEVICE PRODUCTION METHOD, AND PATTERN LAYOUT METHOD 审中-公开
标题翻译：半导体器件，光电子器件，半导体器件生产方法和图案布局方法
公开(公告)号：US20090039519A1
公开(公告)日：2009-02-12
申请号：US12187786
申请日：2008-08-07
申请人： Takayuki Saito , Takeo Ishibashi , Itaru Kanai
发明人： Takayuki Saito , Takeo Ishibashi , Itaru Kanai
IPC分类号： H01L23/48 , G03F1/00
CPC分类号： G03F1/36 , G03F1/00 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor device according to an aspect of the invention includes plural line pattern and plural pad patterns. The line patterns are repeatedly disposed with a space pattern interposed therebetween. The pad pattern straddles plural columns of the line patterns. The pad pattern is connected to the line pattern located on one side of the pad pattern in one of the plural columns, the pad pattern is connected to the line pattern located on the other side of the pad pattern in another column of the plural columns, and the line pattern located on one side of the pad pattern includes an open-circuit portion in another column. Therefore, a semiconductor device in which an interconnection pattern including the fine line-and-space-shape line pattern and the pad pattern is accurately formed at low cost, a semiconductor device production method, and a photomask used to produce the semiconductor device can be provided.
摘要翻译：根据本发明的一个方面的半导体器件包括多个线图案和多个衬垫图案。线图案重复地设置有插入其间的空间图案。焊盘图案跨越多列线图案。焊盘图案连接到位于多列之一中的焊盘图案的一侧的线图案，焊盘图案连接到位于多列的另一列中的焊盘图案另一侧的线图案，并且位于焊盘图案的一侧上的线图案包括另一列中的开路部分。因此，以低成本精确地形成包括细线和空间形线图案和焊盘图案的布线图形的半导体器件可以是用于制造半导体器件的半导体器件制造方法和光掩模提供。

104. 发明授权

US07092104B2 Speckle interferometer apparatus 失效
标题翻译：散斑干涉仪
公开(公告)号：US07092104B2
公开(公告)日：2006-08-15
申请号：US10779599
申请日：2004-02-18
申请人： Masatoshi Hizuka , Hideo Kanda , Takayuki Saito
发明人： Masatoshi Hizuka , Hideo Kanda , Takayuki Saito
IPC分类号： G01B11/02
CPC分类号： G01B9/02022 , G01B9/02007 , G01B9/02069 , G01B9/02095 , G01B9/02096 , G01B11/162
摘要： In a speckle interferometer apparatus 2, an optical member mounting device 10 mounted with optical members including a pair of luminous flux outputting devices 9a, 9b, 9c, 9d is disposed on the object side of a main unit of an imaging device 3 while being separated from the imaging device 3. A light-transmitting area 14 is formed between the pair of luminous flux outputting devices 9a, 9b, 9c, 9d so as to transmit therethrough interference light from an object surface.
摘要翻译：在散斑干涉仪装置2中，安装有包括一对光束输出装置9a，9b，9c，9d的光学构件的光学构件安装装置10设置在成像装置的主单元的物体侧同时与成像装置3分离。在一对光束输出装置9a，9b，9c，9d之间形成透光区域14，以便透射来自物体表面的干涉光。

105. 发明申请

US20050270543A1 Wavefront-measuring interferometer apparatus, and light beam measurement apparatus and method thereof 失效
标题翻译：波前测量干涉仪装置及其光束测量装置及方法
公开(公告)号：US20050270543A1
公开(公告)日：2005-12-08
申请号：US11144709
申请日：2005-06-06
申请人： Zongtao Ge , Takayuki Saito , Minoru Kurose
发明人： Zongtao Ge , Takayuki Saito , Minoru Kurose
IPC分类号： G01B9/02 , G01J1/42 , G01J9/02 , G02B5/00
CPC分类号： G01J9/02 , G01J1/4257 , G02B5/005
摘要： The light beam measurement apparatus comprises a beam splitter that divides a light beam emitted from a light source unit into two luminous fluxes, a semi-transmitting/reflecting surface that reflects part of one of the divided luminous fluxes back in the opposite direction to the direction of incidence as a sample luminous flux, and reflection-type reference light producing means that converts part of the luminous flux transmitted through the semi-transmitting/reflecting surface into a wavefront-shaped reference luminous flux and outputs this reference luminous flux; this light beam measurement apparatus can carry out both wavefront measurement and light beam spot characteristic measurement on a light beam simultaneously.
摘要翻译：光束测量装置包括：分束器，其将从光源单元发射的光束分成两个光束;半透射/反射表面，其将一个分割光束的一部分反向与方向相反的方向作为样品光通量的入射角，以及反射型参照光产生装置，其将通过半透射/反射表面透射的光束的一部分转换为波前参考光通量并输出该参考光通量; 该光束测量装置可以同时对光束进行波前测量和光束点特性测量。

106. 发明申请

US20050150515A1 Gas dissolved water producing apparatus and method thereof and ultrasonic cleaning equipment and method thereof 审中-公开
标题翻译：气体溶解水生产设备及其方法和超声波清洗设备及其方法
公开(公告)号：US20050150515A1
公开(公告)日：2005-07-14
申请号：US11067650
申请日：2005-02-28
申请人： Suguru Ozawa , Ryoichi Shinjo , Minoru Harada , Takayuki Saito , Kenichi Sasaki , Keiichi Murakawa , Kazuhide Shimamura
发明人： Suguru Ozawa , Ryoichi Shinjo , Minoru Harada , Takayuki Saito , Kenichi Sasaki , Keiichi Murakawa , Kazuhide Shimamura
IPC分类号： B01F1/00 , B01D53/22 , B01D61/00 , B01F3/04 , B01F15/04 , C02F1/36 , C02F1/44 , C02F1/68 , C02F1/74 , C02F1/78 , H01L21/00 , B08B3/12
CPC分类号： H01L21/67051 , B01D53/22 , B01D61/00 , B01D63/02 , B01D2313/083 , B01D2313/90 , B01F3/04269 , B01F3/04985 , B01F2003/04404 , C02F1/24 , C02F1/36 , C02F1/44 , C02F1/444 , C02F1/68 , C02F1/74 , C02F1/78 , C02F2103/026 , C02F2103/04 , C02F2103/346 , C02F2209/38 , C02F2209/40
摘要： A gas dissolved water producing apparatus includes a gas dissolving section, a gas channel for guiding a gas into the dissolving section, a first water channel for guiding water into the dissolving section, a gas dissolved water discharge channel, and a second water channel for guiding the water without passing through the dissolving section. The second water channel joins the gas dissolved water discharge channel to control the solution gas dissolved in the gas dissolved water can be controlled to a prescribed level of concentration.
摘要翻译：气体溶解水生成装置包括气体溶解部，用于将气体导入溶解部的气体通道，将水引导到溶解部的第一水通道，气体溶解水排出通道和用于引导的第二水通道水不经过溶解部分。第二个水道连接气体溶解水排放通道，控制溶解在气体中的溶解气溶解的水可以控制在规定的浓度水平。

107. 发明授权

US06323560B1 Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof 有权
标题翻译：注册精度测量标记，修理标记缺陷的方法，具有标记的光掩模，制造光掩模的方法及其曝光方法
公开(公告)号：US06323560B1
公开(公告)日：2001-11-27
申请号：US09492750
申请日：2000-01-27
申请人： Koichiro Narimatsu , Shigenori Yamashita , Nobuyuki Yoshioka , Shinya Soeda , Atsushi Hachisuka , Koji Taniguchi , Yuki Miyamoto , Takayuki Saito , Ayumi Minamide
发明人： Koichiro Narimatsu , Shigenori Yamashita , Nobuyuki Yoshioka , Shinya Soeda , Atsushi Hachisuka , Koji Taniguchi , Yuki Miyamoto , Takayuki Saito , Ayumi Minamide
IPC分类号： H01L2358
CPC分类号： G03F7/706 , G03F7/70633 , Y10T428/24802 , Y10T428/24917
摘要： The present invention includes a first semiconductor element forming member formed in a first layer, a first measurement mark formed by the same manufacturing step as the first semiconductor element forming member, a second semiconductor element forming member formed in a second layer above the first layer, and a second measurement mark formed in the same manufacturing step as the second semiconductor element forming member for measuring registration accuracy between the first and second semiconductor element forming members. The first measurement mark has a pattern which receives same influence of aberration as the first semiconductor element forming member when irradiated with light, and the second measurement mark has a pattern which receives same influence of aberration as the second semiconductor element forming member when irradiated with light. Thus, a registration accuracy measurement mark taking into consideration the influence of aberration can be provided.
摘要翻译：本发明包括形成在第一层中的第一半导体元件形成元件，通过与第一半导体元件形成元件相同的制造步骤形成的第一测量标记，形成在第一层之上的第二层中的第二半导体元件形成元件，以及在与第二半导体元件形成部件相同的制造步骤中形成的用于测量第一和第二半导体元件形成部件之间的配准精度的第二测量标记。第一测量标记具有在照射光时受到与第一半导体元件形成部件相同的像差影响的图案，并且第二测量标记具有受光照射时受到与第二半导体元件形成部件相同的像差影响的图案。因此，可以提供考虑到像差影响的配准精度测量标记。

108. 发明授权

US06243576B1 Radio communication analyzer suited for measurement of plurality of types of digital communication systems 有权
标题翻译：适用于测量多种数字通信系统的无线电通信分析仪
公开(公告)号：US06243576B1
公开(公告)日：2001-06-05
申请号：US09361492
申请日：1999-07-26
申请人： Takashi Seike , Yuji Honma , Takayuki Saito , Mamoru Akada
发明人： Takashi Seike , Yuji Honma , Takayuki Saito , Mamoru Akada
IPC分类号： H04B100
CPC分类号： H04B17/23 , H04B17/16
摘要： A radio communication analyzer can test a radio device under test which corresponds to one of a plurality of types of digital communication systems in accordance with the digital communication system to which the radio device under test corresponds. The radio communication analyzer includes a modulation section, a demodulation section, a modulation/demodulation processing section, and a control section. The modulation section has a first rewritable memory, and converts modulation data indicating the contents of a first test signal to be transmitted to the radio device under test into a digital modulated signal by executing a program written in the first memory. The demodulation section has a second rewritable memory, and generates demodulated data from a second test signal received from the radio device under test by executing a program written in the second memory. The modulation/demodulation processing section has a third memory. The modulation/demodulation processing section generates data to be input to the modulation section and processes the demodulated data obtained by the demodulation section on the basis of a protocol for the digital communication system used by the radio device under test by executing a program written in the third memory. The control section reads out program data corresponding to the respective types of digital communication systems and stored in a storage unit and writes the program data in the first, second, and third memories.
摘要翻译：无线电通信分析器可以根据被测无线电设备对应的数字通信系统来测试对应于多种类型的数字通信系统中的一种的被测试的无线电设备。无线电通信分析器包括调制部分，解调部分，调制/解调处理部分和控制部分。调制部分具有第一可重写存储器，并且通过执行写在第一存储器中的程序，将表示要发送到被测无线电设备的第一测试信号的内容的调制数据转换为数字调制信号。解调部分具有第二可重写存储器，并且通过执行写在第二存储器中的程序，从被测无线电设备接收的第二测试信号产生解调数据。调制/解调处理部分具有第三存储器。调制/解调处理部分产生要输入到调制部分的数据，并且通过执行写入到该调制部分中的程序，根据由被测无线电设备使用的数字通信系统的协议，处理由解调部分获得的解调数据第三记忆控制部分读出与各种类型的数字通信系统对应的程序数据并存储在存储单元中，并将程序数据写入第一，第二和第三存储器。

109. 发明授权

US6068952A Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereof 有权
标题翻译：注册精度测量标记，修理标记缺陷的方法，具有标记的光掩模，制造光掩模的方法及其曝光方法
公开(公告)号：US6068952A
公开(公告)日：2000-05-30
申请号：US231664
申请日：1999-01-15
申请人： Koichiro Narimatsu , Shigenori Yamashita , Nobuyuki Yoshioka , Shinya Soeda , Atsushi Hachisuka , Koji Taniguchi , Yuki Miyamoto , Takayuki Saito , Ayumi Minamide
发明人： Koichiro Narimatsu , Shigenori Yamashita , Nobuyuki Yoshioka , Shinya Soeda , Atsushi Hachisuka , Koji Taniguchi , Yuki Miyamoto , Takayuki Saito , Ayumi Minamide
IPC分类号： G03F1/36 , G03F1/42 , G03F7/20 , G03F9/00 , H01L21/027 , H05K1/02
CPC分类号： G03F7/706 , G03F7/70633 , Y10T428/24802 , Y10T428/24917
摘要： The present invention includes a first semiconductor element forming member formed in a first layer, a first measurement mark formed by the same manufacturing step as the first semiconductor element forming member, a second semiconductor element forming member formed in a second layer above the first layer, and a second measurement mark formed in the same manufacturing step as the second semiconductor element forming member for measuring registration accuracy between the first and second semiconductor element forming members. The first measurement mark has a pattern which receives same influence of aberration as the first semiconductor element forming member when irradiated with light, and the second measurement mark has a pattern which receives same influence of aberration as the second semiconductor element forming member when irradiated with light. Thus, a registration accuracy measurement mark taking into consideration the influence of aberration can be provided.
摘要翻译：本发明包括形成在第一层中的第一半导体元件形成元件，通过与第一半导体元件形成元件相同的制造步骤形成的第一测量标记，形成在第一层之上的第二层中的第二半导体元件形成元件，以及在与第二半导体元件形成部件相同的制造步骤中形成的用于测量第一和第二半导体元件形成部件之间的配准精度的第二测量标记。第一测量标记具有在照射光时受到与第一半导体元件形成部件相同的像差影响的图案，并且第二测量标记具有受光照射时受到与第二半导体元件形成部件相同的像差影响的图案。因此，可以提供考虑到像差影响的配准精度测量标记。

110. 发明授权

US5939593A Brominated 1,3-dimethyl-3-phenyl-1-(2-methyl-2-phenylpropyl)-indane and method for preparing the same 失效
标题翻译：溴化1,3-二甲基-3-苯基-1-（2-甲基-2-苯基丙基） - 茚满及其制备方法
公开(公告)号：US5939593A
公开(公告)日：1999-08-17
申请号：US110818
申请日：1998-07-07
申请人： Atsushi Fujioka , Kiyotaka Mashita , Takayuki Saito , Akihiro Kobayashi , Fumiaki Kanega
发明人： Atsushi Fujioka , Kiyotaka Mashita , Takayuki Saito , Akihiro Kobayashi , Fumiaki Kanega
IPC分类号： C07C17/12 , C07C25/22 , C07C22/00
CPC分类号： C07C25/22 , C07C17/12
摘要： A brominated 1,3-dimethyl-3-phenyl-1-(2-methyl-2-phenylpropyl) indane herein disclosed is represented by the following general formula (I): ##STR1## (wherein x and z each independently represents an integer ranging from 0 to 5, y represents an integer ranging from 0 to 4, provided that x+y+z>1). The compound can be prepared by a method which comprises the step of reacting 1,3-dimethyl-3-phenyl-1-(2-methyl-2-phenylpropyl) indane with a bromination agent. The brominated indane is excellent in flame-resistance, has a high thermal decomposition temperature and never generates brominated dioxine and/or brominated dibenzofuran when burning at a specific temperature. Therefore, the compound is suitably used for imparting flame-resistance to a variety of thermoplastic and thermosetting resins.
摘要翻译：本文公开的溴化1,3-二甲基-3-苯基-1-（2-甲基-2-苯基丙基）二氢化茚由以下通式（I）表示：（其中x和z各自独立地表示0以上的整数至5，y表示0至4的整数，条件是x + y + z> 1）。该化合物可以通过包括使1,3-二甲基-3-苯基-1-（2-甲基-2-苯基丙基）二氢化茚与溴化剂反应的步骤的方法制备。溴化二环烷具有优异的耐火性，热分解温度高，在特定温度下燃烧时，不会产生溴化二恶英和/或溴化二苯并呋喃。因此，该化合物适合用于赋予各种热塑性和热固性树脂的阻燃性。

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