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101. 发明授权

US07323703B2 EUV light source 有权
标题翻译： EUV光源
公开(公告)号：US07323703B2
公开(公告)日：2008-01-29
申请号：US11647007
申请日：2006-12-27
申请人： I. Roger Oliver , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov , Norbert Bowering , John Viatella , David W. Myers
发明人： I. Roger Oliver , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov , Norbert Bowering , John Viatella , David W. Myers
IPC分类号： H01J35/20
CPC分类号： G03F7/70033 , B82Y10/00 , G03F7/70175 , G03F7/70916 , G21K1/062 , G21K2201/061 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape having a focus; the shell having a sufficient size and thermal mass to carry operating heat away from the multilayer reflector and to radiate the heat from the surface of the shell on a side of the shell opposite from the focus. The material of the shell may comprise a material selected from a group which may comprise silicon carbide, silicon, Zerodur or ULE glass, aluminum, beryllium, molybdenum, copper and nickel. The apparatus and method may comprise at least one radiative heater directed at the shell to maintain the steady state temperature of the shell within a selected range of operating temperatures.
摘要翻译：描述了可以包括可以包括等离子体形成室的等离子体产生的极紫外（“EUV”）光源多层收集器的装置和方法; 等离子体形成室内的壳体，具有焦点的收集器形状; 壳体具有足够的尺寸和热质量以将工作热量从多层反射器散开，并且在壳体的与焦点相对的一侧上从壳体的表面辐射热量。壳的材料可以包括选自可以包括碳化硅，硅，Zerodur或ULE玻璃，铝，铍，钼，铜和镍的组的材料。装置和方法可以包括指向壳体的至少一个辐射加热器，以将壳体的稳态温度维持在所选择的工作温度范围内。

102. 发明授权

US07277466B2 High power gas discharge laser with helium purged line narrowing unit 有权
标题翻译：大功率气体放电激光器与氦气吹扫线变窄单元
公开(公告)号：US07277466B2
公开(公告)日：2007-10-02
申请号：US10820261
申请日：2004-04-07
申请人： William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
发明人： William N. Partlo , Richard L. Sandstrom , Raymond F. Cybulski , Igor V. Fomenkov , Alexander I. Ershov
IPC分类号： H01S3/22 , H01S3/08
CPC分类号： G03F7/70025 , G03F7/70575 , H01S3/027 , H01S3/036 , H01S3/0401 , H01S3/1055 , H01S3/225
摘要： A helium purge for a grating based line narrowing device for minimizing thermal distortions in line narrowed lasers producing high energy laser beams at high repetition rates. Applicants have shown substantial improvement in performance with the use of helium purge as compared to prior art nitrogen purges. In preferred embodiments a stream of helium gas is directed across the face of the grating. In other embodiments the purge gas pressure is reduced to reduce the optical effects of the hot gas layer.
摘要翻译：用于基于光栅的线窄化装置的氦气吹扫，用于最大限度地减少线性窄激光器中的热失真，以高重复率产生高能激光束。与现有技术的氮气清洗相比，使用氦气吹扫的申请人已经显示出实质性的改善。在优选实施例中，氦气流被引导穿过光栅的表面。在其它实施例中，减少吹扫气体压力以减少热气体层的光学效应。

103. 发明授权

US07218661B2 Line selected F2 two chamber laser system 失效
标题翻译：线选F2双腔激光系统
公开(公告)号：US07218661B2
公开(公告)日：2007-05-15
申请号：US10854614
申请日：2004-05-25
申请人： David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scot T. Smith , William G. Hulburd
发明人： David S. Knowles , Daniel J. W. Brown , Richard L. Sandstrom , German E. Rylov , Eckehard D. Onkels , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Richard C. Ujazdowski , Richard M. Ness , Scot T. Smith , William G. Hulburd
IPC分类号： H01S3/22
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line selection package for selecting the strongest F2 spectral line.
摘要翻译：一种注射种子模块化气体放电激光系统，其能够以约4,000Hz或更大的脉冲速率和约5mJ或更大的脉冲能量产生高质量的脉冲激光束。提供两个单独的放电室，其中之一是主振荡器的一部分，其产生在第二放电室中放大的非常窄的带状晶体束。可以单独控制室，允许主振荡器中的波长参数的单独优化和放大室中的脉冲能量参数的优化。配置为MOPA并被专门设计用作集成电路光刻的光源的F 2 N 2激光系统中的优选实施例。在优选的MOPA实施例中，每个腔室包括单个切向风扇，其通过在比脉冲之间的大约0.25毫秒更短的时间内清除来自放电区域的碎屑来提供足够的气流以允许以4000Hz或更高的脉冲速率操作。主振荡器配备有用于选择最强的F 2/2谱线的线选择包。

104. 发明授权

US06744060B2 Pulse power system for extreme ultraviolet and x-ray sources 有权
标题翻译：用于极紫外和X射线源的脉冲电力系统
公开(公告)号：US06744060B2
公开(公告)日：2004-06-01
申请号：US10120655
申请日：2002-04-10
申请人： Richard M. Ness , Igor V. Fomenkov , William N. Partlo
发明人： Richard M. Ness , Igor V. Fomenkov , William N. Partlo
IPC分类号： H05H104
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： The present invention provides a pulse power system for extreme ultraviolet and x-ray light sources. The pulse power system produces electrical pulses of at least 12 J at pulse repetition rates of at least 2000 Hz. The system is extremely reliable and has design lifetime substantially in excess of 10 billion pulses. The system includes a charging capacitor bank, a fast charger for charging the charging capacitor bank in time periods of less than 0.5 seconds. A voltage control circuit is provided for controlling the charging voltage capacitor to within less than 0.5 percent of desired values. The system includes a magnetic compression circuit for creating, compressing in duration and amplifying voltage pulses. A trigger circuit discharges the charging capacitor bank into the pulse compression circuit so as to produce EUV or x-ray light pulses with a timing accuracy of less than 10 ns. In a preferred embodiment a pulse transformer with at least two one-turn primary windings and a single one turn secondary winding is included in the pulse compression circuit and increases the pulse voltage by at least a factor of 3. The pulse power system described herein is useful for providing high energy electrical pulses at repetition rates in excess of 2000 Hz for several high temperature discharge EUV or x-ray light sources. These include dense plasma focus devices, Z pinch devices, hollow cathode Z-pinch devices and capillary discharge devices. Inclusion of the pulse transformer is recommended when the system is used for dense plasma focus, and the two types of Z-pinch devices.
摘要翻译：本发明提供一种用于极紫外和X射线光源的脉冲电力系统。脉冲功率系统产生至少为12 J的脉冲重复频率至少为2000 Hz的电脉冲。该系统非常可靠，设计寿命基本上超过100亿个脉冲。该系统包括充电电容器组，用于在小于0.5秒的时间段内对充电电容器组充电的快速充电器。提供了一种电压控制电路，用于将充电电压电容器控制在所需值的0.5％以内。该系统包括用于产生，压缩持续时间并放大电压脉冲的磁压缩电路。触发电路将充电电容器组放电到脉冲压缩电路中，以便产生具有小于10ns的定时精度的EUV或X射线光脉冲。在优选实施例中，具有至少两个单匝初级绕组和单个匝次级绕组的脉冲变压器包括在脉冲压缩电路中，并且将脉冲电压增加至少3倍。本文描述的脉冲功率系统是对于几个高温放电EUV或X射线光源，以超过2000Hz的重复率提供高能电脉冲是有用的。这些包括致密等离子体聚焦装置，Z夹紧装置，空心阴极Z夹点装置和毛细管放电装置。当系统用于等离子体浓度较高时，推荐使用脉冲变压器，以及两种类型的Z夹式器件。

105. 发明授权

US06713770B2 High resolution spectral measurement device 有权
标题翻译：高分辨率光谱测量装置
公开(公告)号：US06713770B2
公开(公告)日：2004-03-30
申请号：US10098975
申请日：2002-03-15
申请人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith , Daniel J. W. Brown
发明人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith , Daniel J. W. Brown
IPC分类号： G01J314
CPC分类号： G01J3/26 , G01J1/4257 , G01J3/02 , G01J3/0205 , G01J3/12 , G01J3/1804 , G01J3/22 , G01J9/02
摘要： A high resolution spectral measurement device. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow-band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the insulator and scanning the laser wavelength over a range which includes the monochromator slit wavelength. In a second embodiment the second slit and the light detector is replaced by a photodiod array and the bandwidth of a laser beam is determined by analyzing a set of scan data from the photodiode array. Alternately, the laser wavelength can be fixed near the middle of the spectrum range of the grating spectrometer, and the etalon can be scanned.
摘要翻译：高分辨率光谱测量装置。优选的实施例在紫外线范围内呈现非常窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。表示对应于所选择的标准具条纹的波长的调度光的一部分通过第二狭缝并由光检测器监视。当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。通过激光束的引导部分进入绝缘体并且在包括单色器狭缝波长的范围内扫描激光波长，可以非常精确地测量激光束的带宽。在第二实施例中，第二狭缝和光检测器由光电二极管阵列替代，并且通过分析来自光电二极管阵列的一组扫描数据来确定激光束的带宽。或者，激光波长可以固定在光栅光谱仪的光谱范围附近，可以扫描标准具。

106. 发明授权

US06567450B2 Very narrow band, two chamber, high rep rate gas discharge laser system 有权
公开(公告)号：US06567450B2
公开(公告)日：2003-05-20
申请号：US09943343
申请日：2001-08-29
申请人： David W. Myers , Herve A. Besaucele , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Xiaojiang J. Pan , Eckehard D. Onkels , Richard M. Ness , Daniel J. W. Brown
发明人： David W. Myers , Herve A. Besaucele , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Xiaojiang J. Pan , Eckehard D. Onkels , Richard M. Ness , Daniel J. W. Brown
IPC分类号： H01S322
CPC分类号： H01S3/2366 , G01J9/00 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

107. 发明授权

US06566668B2 Plasma focus light source with tandem ellipsoidal mirror units 有权
公开(公告)号：US06566668B2
公开(公告)日：2003-05-20
申请号：US09875721
申请日：2001-06-06
申请人： John E. Rauch , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx , Richard L. Sandstrom , Stephan T. Melnychuk
发明人： John E. Rauch , William N. Partlo , Igor V. Fomenkov , Richard M. Ness , Daniel L. Birx , Richard L. Sandstrom , Stephan T. Melnychuk
IPC分类号： H05H104
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.

108. 发明授权

US06541786B1 Plasma pinch high energy with debris collector 失效
标题翻译：等离子体夹杂高能量与碎片收集器
公开(公告)号：US06541786B1
公开(公告)日：2003-04-01
申请号：US09324526
申请日：1999-06-02
申请人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
发明人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation collector-director is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid or liquid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration. Other preferred embodiments utilize a conical nested debris collector upstream of the radiation collector-director.
摘要翻译：高能光子源。一对等离子体夹紧电极位于真空室中。一种工作气体，其包括贵金属缓冲气体和选择用于提供所需光谱线的活性气体。脉冲电源提供电压足够高的电脉冲以在电极之间产生电放电，以在工作气体中产生非常高温，高密度的等离子体夹紧，从而在活性气体的谱线处提供辐射。外部反射辐射收集器 - 导向器收集在等离子体夹中产生的辐射，并将辐射引导到期望的方向。在一个优选的实施方式中，活性气体是锂，缓冲气体是氦气，并且辐射收集器导向器涂覆有用于电极的材料。材料的一个不错的选择是钨。在第二优选实施例中，缓冲气体是氩气，并且通过沿着同轴电极配置的中心电极的轴的孔中的固体或液体锂的汽化来产生锂气体。其他优选实施例利用在辐射收集器 - 导向器上游的锥形嵌套碎片收集器。

109. 发明授权

US06532247B2 Laser wavelength control unit with piezoelectric driver 有权
公开(公告)号：US06532247B2
公开(公告)日：2003-03-11
申请号：US09794782
申请日：2001-02-27
申请人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
发明人： Ronald L. Spangler , Robert N. Jacques , George J. Everage , Stuart L. Anderson , Frederick A. Palenschat , Igor V. Fomenkov , Richard L. Sandstrom , William N. Partlo , John M. Algots , Daniel J. W. Brown
IPC分类号： H01S322
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

110. 发明授权

US06026103A Gas discharge laser with roller bearings and stable magnetic axial positioning 有权
标题翻译：气体放电激光与滚子轴承和稳定的磁轴定位
公开(公告)号：US06026103A
公开(公告)日：2000-02-15
申请号：US290852
申请日：1999-04-13
申请人： I. Roger Oliver , Igor V. Fomenkov , William N. Partlo
发明人： I. Roger Oliver , Igor V. Fomenkov , William N. Partlo
IPC分类号： H01S3/036 , H01S3/00
CPC分类号： H01S3/036
摘要： An electric discharge gas laser having a laser cavity in which is contained a laser gas and a fan for circulating the laser gas. The fan is supported in position radially by a roller bearing system and axially at least in part by magnetic forces. In a preferred embodiment the magnetic forces are supplied by a brushless DC motor in which the rotor of the motor is sealed within the gas environment of the laser cavity and the motor stator is located outside the gas environment. The magnetic center of the rotor is offset from the center of the stator to produce a magnetic reluctance generated force on the shaft that acts axially on the shaft toward the non-drive end and is reacted by a ball and plate bearing assembly mounted along the axis of rotation at the opposite end of the shaft.
摘要翻译：一种具有激光腔的放电气体激光器，其中包含激光气体和用于使激光气体循环的风扇。风扇通过滚子轴承系统径向支撑在位置，并至少部分地由磁力轴向地支撑。在优选实施例中，磁力由无刷直流电动机提供，其中电机的转子在激光腔的气体环境内被密封，并且电动机定子位于气体环境的外部。转子的磁心偏离定子的中心，以产生轴上的磁阻产生力，该轴在轴上朝向非驱动端轴向作用，并且通过沿着轴线安装的球和轴承组件反作用在轴的相对端旋转。

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