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101. 发明授权

US06709174B2 Apparatus and method for development 有权
标题翻译：仪器和开发方法
公开(公告)号：US06709174B2
公开(公告)日：2004-03-23
申请号：US10271588
申请日：2002-10-17
申请人： Taro Yamamoto , Akihiro Fujimoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi
发明人： Taro Yamamoto , Akihiro Fujimoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi
IPC分类号： G03D500
CPC分类号： H01L21/6715 , B05C5/0208 , B05C5/0254 , B05C11/08 , G03F7/3021
摘要： A solution-receiving plate having solution-passing holes for passing a developer solution therethrough toward the back side of the plate is provided. Respective surfaces of the solution-receiving plate and a substrate are at the same height, and the solution-receiving plate is placed on the front-end side of the substrate and separated slightly from the front end of the substrate. A supply nozzle is moved to apply a developer solution. Accordingly, when the developer solution extended continuously between the perimeter of the substrate and the supply nozzle is severed, the severed developer solution is prevented from returning to the developer solution already spread over the substrate and thus flow and waves are prevented from occurring in the developer solution spread on the surface of the substrate. A resist pattern with a highly uniform line width is thus produced.
摘要翻译：提供一种溶液接收板，其具有用于使显影剂溶液通过其朝向板的背面的溶液通过孔。溶液接收板和基板的相应表面处于相同的高度，并且溶液 - 接收板被放置在基板的前端侧并与基板的前端稍微分离。移动供应喷嘴以施加显影剂溶液。因此，当在基板的周边和供给喷嘴之间连续延伸的显影剂溶液被切断时，切断的显影剂溶液被防止返回已经铺展在基板上的显影剂溶液，从而防止在显影剂中发生波浪溶液扩散在基材的表面上。因此产生具有高度均匀线宽的抗蚀剂图案。

102. 发明授权

US06625400B2 Brownie film and camera 失效
标题翻译：布朗尼电影和相机
公开(公告)号：US06625400B2
公开(公告)日：2003-09-23
申请号：US09845163
申请日：2001-05-01
申请人： Akihiro Sanda , Taro Yamamoto
发明人： Akihiro Sanda , Taro Yamamoto
IPC分类号： G03B1724
CPC分类号： G03B17/245
摘要： A Brownie film is wound about a spool such that a leader covers outside. A filmstrip has first and second lateral side portions. Upon manufacturing the filmstrip, film information is printed as latent images in the first lateral side portion. The first lateral side portion comes to upper side of the filmstrip when the filmstrip is pulled from the spool to leftward, viewed from a base surface side of the filmstrip. A data exposure head of the camera imprints photographic information as individual printing patterns.
摘要翻译：布朗尼电影围绕线轴缠绕，使领导者覆盖在外面。胶片具有第一和第二侧面侧部分。在制造胶卷时，将胶片信息作为潜像印刷在第一横向侧部分中。当从胶片的基面侧观察时，当胶卷从卷轴向左拉时，第一横向侧部分到达胶片的上侧。相机的数据曝光头将照片信息印记为单独的打印图案。

103. 发明授权

US08920922B2 Polyurethane urea elastic fiber 有权
标题翻译：聚氨酯脲弹性纤维
公开(公告)号：US08920922B2
公开(公告)日：2014-12-30
申请号：US12307332
申请日：2007-07-03
申请人： Taro Yamamoto , Junichi Kojima
发明人： Taro Yamamoto , Junichi Kojima
IPC分类号： D02G3/00 , F16J15/20 , D03D15/08 , D04B1/18 , D01F6/94
CPC分类号： D01F6/94 , Y10T428/2913 , Y10T428/2915 , Y10T442/3024 , Y10T442/413
摘要： Disclosed is a polyurethane urea elastic fiber containing 5-40% by weight of a polyurethane compound, wherein the compression deformation starting temperature determined by thermomechanical analysis (TMA) is not less than 150° C. but not more than 180° C. and time for thermal cutting at 180° C. is not less than 30 seconds.
摘要翻译：公开了含有5-40重量％的聚氨酯化合物的聚氨酯脲弹性纤维，其中通过热机械分析（TMA）测定的压缩变形开始温度不低于150℃，但不超过180℃，时间在180℃下进行热切割不小于30秒。

104. 发明申请

US20130213257A1 Transport Vehicle and Transport System 有权
标题翻译：运输车辆和运输系统
公开(公告)号：US20130213257A1
公开(公告)日：2013-08-22
申请号：US13877278
申请日：2011-09-08
申请人： Taro Yamamoto , Yusuke Fujiwara
发明人： Taro Yamamoto , Yusuke Fujiwara
IPC分类号： H01L21/677
CPC分类号： H01L21/677 , B61B3/02 , H01L21/6773 , H01L21/67733
摘要： A transport vehicle that reduces shaking of a transport article includes a travelling unit, a transport unit, a fall prevention member, and a shaking reduction member. The travelling unit travels along a rail provided on a ceiling. The transport unit transports a transport article. The fall prevention member is rotatably supported such that it can rotate between a fall prevention position and a retracted position. The fall prevention member is, at the fall prevention position, below the transport article. A pushing portion of the shaking reduction member pushes against a side surface of the transport article with a pushing surface thereof in conjunction with the rotating of the fall prevention member from the retracted position to the fall prevention position. A lever portion of the shaking reduction member has one end supporting the pushing portion and the other end rotatably supported in a manner coaxial with the fall prevention member).
摘要翻译：减少运输物品晃动的运送车辆包括行驶单元，运送单元，防跌落构件和减震构件。旅行单位沿着设在天花板上的轨道行进。运输单位运输运输物品。防坠落构件被可旋转地支撑，使得其能够在防坠落位置和缩回位置之间旋转。防坠落成员在防坠落位置处在运输物品的下面。摇动减速部件的推动部分随着其推动表面与防倒下部件从缩回位置的旋转到防止摔倒位置一起推动输送物品的侧表面。减震构件的杠杆部分具有支撑推动部分的一端，而另一端以与防坠落构件同轴的方式可旋转地支撑）。

105. 发明授权

US08474396B2 Developing apparatus, resist pattern forming method and storage medium 有权
标题翻译：显影装置，抗蚀剂图案形成方法和存储介质
公开(公告)号：US08474396B2
公开(公告)日：2013-07-02
申请号：US12836137
申请日：2010-07-14
申请人： Masahiro Fukuda , Atsushi Ookouchi , Taro Yamamoto
发明人： Masahiro Fukuda , Atsushi Ookouchi , Taro Yamamoto
IPC分类号： B05B7/16
CPC分类号： H01L21/6715 , G03F7/3021 , H01L21/67173 , H01L21/6719 , H01L21/68771
摘要： Provided is a developing apparatus configured to slim the resist pattern while reducing the number of developing modules. A room temperature developing liquid and a high temperature developing liquid to modify the surface layer of a resist pattern can be supplied from a common nozzle to a substrate disposed on a mount table. Although both developing liquids may be sequentially discharged by switching between the supply line for the room temperature developing liquid and the supply line for the high temperature developing liquid, it is also possible to join these supply lines for supplying the room temperature developing liquid from the former supply line, and then adjust the ratio of the flow rates between both supply lines, and then supply the mixed liquid of the developing liquids as a high temperature developing liquid.
摘要翻译：提供了一种显影装置，其被配置为在减少显影模块的数量的同时使抗蚀剂图案变薄。室温显影液和高温显影液可以从公共喷嘴供给到设置在安装台上的基板上。虽然通过在室温显影液的供给线和高温显影液的供给路之间切换来顺序地排出显影液，但是也可以将这些供给管线从前者供给室温显影液供应线，然后调整两条供应线之间的流量比，然后将显影液体的混合液体作为高温显影液供应。

106. 发明授权

US08398319B2 Developing apparatus, developing method, and storage medium 有权
标题翻译：显影装置，显影方法和存储介质
公开(公告)号：US08398319B2
公开(公告)日：2013-03-19
申请号：US12718104
申请日：2010-03-05
申请人： Hiroshi Arima , Yuichi Yoshida , Taro Yamamoto , Kousuke Yoshihara
发明人： Hiroshi Arima , Yuichi Yoshida , Taro Yamamoto , Kousuke Yoshihara
IPC分类号： G03D5/00
CPC分类号： G03F7/3021 , H01L21/6715
摘要： A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies a developer onto the substrate to which the substrate treatment liquid has been sprayed. The surface tension of the atomized surface treatment liquid with respect to the substrate is lower than the surface tension of the surface treatment liquid with respect to the substrate. The atomization suppresses the fact that the surface treatment liquid gathers on a certain portion of the surface of the substrate. The surface treatment liquid can be easily supplied onto the entire surface of the substrate, and improve wettability of the substrate with the developer.
摘要翻译：一种显影装置，包括：水平保持基板的基板支架; 用于使用显影剂使用于改善基材的润湿性的表面处理液体雾化的装置; 将雾化的表面处理液体喷射到基板上的第一喷嘴; 以及将显影剂供给到已经喷射了基板处理液的基板上的显影剂供给喷嘴。雾化表面处理液相对于基材的表面张力低于表面处理液相对于基材的表面张力。雾化抑制了表面处理液体聚集在基材表面的某一部分上的事实。可以容易地将表面处理液体提供到基板的整个表面上，并且改善基板与显影剂的润湿性。

107. 发明授权

US08216389B2 Substrate cleaning method and substrate cleaning apparatus 有权
标题翻译：基板清洗方法和基板清洗装置
公开(公告)号：US08216389B2
公开(公告)日：2012-07-10
申请号：US12400419
申请日：2009-03-09
申请人： Kousuke Yoshihara , Yuichi Yoshida , Taro Yamamoto
发明人： Kousuke Yoshihara , Yuichi Yoshida , Taro Yamamoto
IPC分类号： B08B7/00 , B08B3/02
CPC分类号： G03F7/168 , B08B3/024 , G03F7/3021 , H01L21/67051
摘要： A substrate cleaning method that includes: a step in which, while a substrate holder is being continuously rotated, a to-be-discharged position of the cleaning liquid on the substrate is changed to an eccentric position deviated from the central part of the substrate, and a gas is discharged from a gas nozzle to the central part of the substrate so as to form a dried area of the cleaning liquid under a condition in which a shortest distance between an edge of a cleaning liquid flow output from the cleaning-liquid nozzle and an edge of a gas flow output from the gas nozzle is set between 9 mm and 15 mm.
摘要翻译：一种基板清洗方法，其特征在于，包括：在基板保持件持续旋转的同时，将基板上的清洗液的排出位置变更为偏离基板的中心部的偏心位置，气体从气体喷嘴排出到基板的中心部分，以便在从清洗液喷嘴输出的清洗液流的边缘之间的最短距离的条件下形成清洁液体的干燥区域并且从气体喷嘴输出的气流的边缘被设定在9mm和15mm之间。

108. 发明授权

US08154106B2 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US08154106B2
公开(公告)日：2012-04-10
申请号：US11562648
申请日：2006-11-22
申请人： Seiki Ishida , Taro Yamamoto
发明人： Seiki Ishida , Taro Yamamoto
IPC分类号： H01L29/08 , H01L23/58
CPC分类号： G03F7/70341 , G03F7/70525 , G03F7/70991 , H01L21/0257
摘要： A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the substrate is capable of reducing difference in property among resist films formed on substrates.The coating and developing system includes: a cleaning unit for cleaning a surface of a substrate coated with a resist film; a carrying means for taking out the substrate from the cleaning unit and carrying the substrate to an exposure system that carries out an immersion exposure process; and a controller for controlling the carrying means such that a time interval between a wetting time point when the surface of the substrate is wetted with the cleaning liquid by the cleaning unit and a delivery time point when the substrate is delivered to the exposure system is equal to a predetermined set time interval. The set time interval is determined such that the substrate is subjected to the immersion exposure process after contact angle drop rate at which contact angle between the cleaning liquid and a surface of the substrate drops has dropped from an initial level at the wetting time point when the surface of the substrate is wetted with the cleaning liquid to a level far lower than the initial level.
摘要翻译：一种用于在基板上形成抗蚀剂膜的涂覆和显影系统，其中通过用液体抗蚀剂涂覆基板并在抗蚀剂膜已经通过在基板表面上形成液体层的浸渍曝光进行处理之后显影抗蚀剂膜，降低在基板上形成的抗蚀剂膜之间的性能差异。该涂覆和显影系统包括：用于清洁涂覆有抗蚀剂膜的基材的表面的清洁单元; 用于从所述清洁单元取出所述基板并将所述基板运送到进行浸没曝光处理的曝光系统的承载装置; 以及控制器，用于控制所述承载装置，使得当所述基板的表面被所述清洁单元与所述清洁液体接触的润湿时间点与所述基板被输送到所述曝光系统时的传送时间点之间的时间间隔相等到预定的设定时间间隔。确定设定时间间隔，使得在清洗液与基材表面之间的接触角下降的接触角下降率在浸润时间点的浸润时间点的初始水平下，使基板经受浸渍曝光处理衬底的表面被清洗液体润湿至远低于初始水平的水平。

109. 发明授权

US08133663B2 Pattern forming method and apparatus 有权
标题翻译：图案形成方法和装置
公开(公告)号：US08133663B2
公开(公告)日：2012-03-13
申请号：US11782233
申请日：2007-07-24
申请人： Taro Yamamoto , Hitoshi Kosugi , Yoshiaki Yamada , Yasuhito Saiga
发明人： Taro Yamamoto , Hitoshi Kosugi , Yoshiaki Yamada , Yasuhito Saiga
IPC分类号： G03F7/26
CPC分类号： G03F7/38 , G03F7/2041 , G03F7/70341
摘要： A pattern forming method includes forming a resist film or sequentially forming a resist film and a protection film in this order on a surface of a substrate; then, performing immersion light exposure that includes immersing the resist film or the resist film and the protection film formed on the substrate in a liquid during light exposure, thereby forming a predetermined light exposure pattern on the resist film; and performing a development process of the light exposure pattern by use of a development liquid, thereby forming a predetermined resist pattern. After the immersion light exposure and before the development process, the method further includes performing a hydrophilic process of turning a surface of the resist film or the protection film serving as a substrate surface into a hydrophilic state to allow the substrate surface to be wetted with the development liquid overall.
摘要翻译：图案形成方法包括在基板的表面上依次形成抗蚀剂膜或依次形成抗蚀剂膜和保护膜; 然后，在曝光期间进行浸渍曝光，其中包括将抗蚀剂膜或抗蚀剂膜和形成在基板上的保护膜浸入液体中，从而在抗蚀剂膜上形成预定的曝光图案; 并通过使用显影液进行曝光图案的显影处理，由此形成预定的抗蚀剂图案。在浸没曝光之后和显影处理之前，该方法还包括进行将抗蚀剂膜或用作基板表面的保护膜的表面转动成亲水性的亲水处理，以允许基板表面被开发液体整体。

110. 发明授权

US08037890B2 Substrate cleaning device and substrate cleaning method 有权
标题翻译：基板清洗装置和基板清洗方法
公开(公告)号：US08037890B2
公开(公告)日：2011-10-18
申请号：US11509737
申请日：2006-08-25
申请人： Taro Yamamoto , Hideharu Kyouda , Tetsu Kawasaki , Satoru Shimura
发明人： Taro Yamamoto , Hideharu Kyouda , Tetsu Kawasaki , Satoru Shimura
IPC分类号： B08B3/00
CPC分类号： H01L21/67051
摘要： A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto the surface of a substrate such that a region onto which the cleaning liquid is poured moves from a central part toward the circumference of the substrate. A gas is jetted radially outward at a region on the surface of the substrate behind a region onto which the cleaning liquid is poured with respect to the rotating direction of the substrate. The gas forces a liquid film of the cleaning liquid flowing on the surface of the substrate to flow in a circumferential direction and a radially outward direction.
摘要翻译：基板清洁装置和基板清洗方法减少了残留在基板上的液滴，以防止由于基板上残留液滴或水痕而导致的加热过程对基板的不规则加热。将清洗液通过清洗液注入喷嘴注入到基板的表面上，使清洗液注入的区域从基板的中心部朝向圆周方向移动。在衬底表面上的相对于衬底的旋转方向倾倒有清洁液体的区域之后的区域处，径向向外喷射气体。气体迫使在基板表面流动的清洗液体的液膜在圆周方向和径向向外的方向上流动。

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