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    • 95. 发明授权
    • Substrate processing apparatus and substrate processing method
    • 基板加工装置及基板处理方法
    • US06878303B2
    • 2005-04-12
    • US10347845
    • 2003-01-17
    • Yoshio Okamoto
    • Yoshio Okamoto
    • G01N1/32G01N1/28G01N27/48H01L21/00H01B13/00C23C16/00
    • H01L21/67253Y10S134/902
    • A substrate processing apparatus for supplying a treatment liquid onto the surface of a substrate to treat the same. This apparatus is provided with: a spin chuck for holding and rotating a substrate; a nozzle for supplying a treatment liquid to the substrate held by the spin chuck; a circulating passage arranged such that the treatment liquid supplied to the substrate from the nozzle and used for substrate treatment is circulated to the nozzle and reutilized for substrate treatment; a metal contamination amount measuring device for measuring the metal contamination amount in the treatment liquid passing through the circulating passage; and a judgment processing unit for judging whether or not the value measured by the metal contamination amount measuring device has exceeded a predetermined set value.
    • 一种用于将处理液供给到基板表面以进行处理的基板处理装置。 该装置设有:用于保持和旋转衬底的旋转卡盘; 用于将处理液供给到由旋转卡盘保持的基板的喷嘴; 循环通道,其布置成使得从喷嘴供应到基板的处理液用于基板处理,循环到喷嘴并再利用以进行基板处理; 用于测量通过循环通道的处理液中的金属污染量的金属污染量测量装置; 以及判断处理单元,用于判断由金属污染量测量装置测量的值是否超过预定的设定值。
    • 96. 发明授权
    • Method of and apparatus for manufacturing semiconductors
    • 制造半导体的方法和装置
    • US06706647B1
    • 2004-03-16
    • US09524510
    • 2000-03-13
    • Yoshitsugu TsutsumiYoshio OkamotoHideki TomiokaAkira OhkawaToshio Ando
    • Yoshitsugu TsutsumiYoshio OkamotoHideki TomiokaAkira OhkawaToshio Ando
    • H01L21469
    • H01L21/6715
    • A method of and an apparatus for manufacturing semiconductors, in which a liquid raw material can be uniformly supplied onto a wafer and a gas required for film formation can be also uniformly supplied onto the wafer. A liquid raw material is sprayed from a tip end of a vaporizing nozzle into a vacuum chamber as liquid droplets, and is vaporized by heat generated from the wafer placed on a susceptor. When the liquid raw material is sprayed, a gas required for film forming reaction is supplied into the vacuum chamber from a gas supply pipe provided on an outer periphery of the vaporizing nozzle. The vaporizing nozzle and the gas supply pipe are formed to be concentric, and a liquid raw material spray port is formed centrally of the vaporizing nozzle. A gas supply port or ports on the gas supply pipe are formed on an outer peripheral portion of the vaporizing nozzle to be arranged in annular manner, and the liquid raw material spray port and the gas supply port or ports are formed to be in parallel to each other in a longitudinal direction. The gas supply port or ports are arranged in the same plane as the liquid raw material spray port is, or on an upstream side where the liquid raw material is supplied.
    • 可以将液体原料均匀地供给到晶片上,并且可以将均匀地供给到晶片上的成膜所需的气体的半导体制造方法和装置。 将液体原料从蒸发喷嘴的前端喷射到作为液滴的真空室中,并通过从放置在基座上的晶片产生的热量蒸发。 当喷射液体原料时,成膜反应所需的气体从设置在蒸发喷嘴的外周上的气体供给管供给到真空室中。 蒸发喷嘴和气体供给管形成为同心的,并且在蒸发喷嘴的中央形成液体原料喷射口。 气体供给管上的气体供给口形成在蒸发喷嘴的外周部,环状配置,液体原料喷射口和气体供给口形成为与 彼此沿纵向。 气体供给口配置在与液体原料喷射口相同的平面内,或配置在供给液体原料的上游侧。
    • 99. 发明授权
    • Optically active isocyanurate and optical resolver comprising derivative of the same
    • 光学活性异氰脲酸酯和包含其衍生物的光学旋转变压器
    • US06641784B1
    • 2003-11-04
    • US10048992
    • 2002-02-19
    • Yoshio OkamotoMotohiko Hidaka
    • Yoshio OkamotoMotohiko Hidaka
    • G01N3048
    • C07D405/14C07B57/00C07B2200/07C07B2200/11C07D403/04C07D403/14C07D413/04C07D417/04C07D417/14C07D471/04C07D487/04
    • An optical resolver comprising an optically active substance made of tris-(2,3-epoxypropyl)isocyanurate, is presented. The optical resolver comprises an optically active tris-(epoxyalkyl)isocyanurate or its derivative, or an optically active derivative of a tris-(epoxyalkyl)isocyanurate. Particularly, the optical resolver comprises optically active tris-(2,3-epoxypropyl)isocyanurate or its derivative, or an optically active derivative of tris-(2,3-epoxypropyl)isocyanurate. Having supported on a carrier, an optically active tris-(2,3-epoxypropyl)isocyanurate or its derivative, or an optically active derivative of tris-(2,3-epoxypropyl)isocyanurate, can be made to be a packing for use in high-performance liquid chromatography, whereby efficient optical resolution can be carried out.
    • 提供了包含由三 - (2,3-环氧丙基)异氰脲酸酯制成的光学活性物质的光学旋转变压器。 光学旋转变压器包括光学活性三(环氧烷基)异氰脲酸酯或其衍生物或三 - (环氧烷基)异氰脲酸酯的光学活性衍生物。 特别地,光学旋转变压器包括光学活性三(2,3-环氧丙基)异氰脲酸酯或其衍生物,或三 - (2,3-环氧丙基)异氰脲酸酯的光学活性衍生物。 负载在载体上的光学活性三(2,3-环氧丙基)异氰脲酸酯或其衍生物或三 - (2,3-环氧丙基)异氰脲酸酯的光学活性衍生物可以制成包装,用于 高效液相色谱法,可以进行有效的光学拆分。
    • 100. 发明授权
    • Fuel injection system for internal combustion engine
    • 内燃机燃油喷射系统
    • US06543419B2
    • 2003-04-08
    • US09805168
    • 2001-03-14
    • Yoshio OkamotoYuzo KadomukaiAyumu MiyajimaMasami NaganoTadashi Someno
    • Yoshio OkamotoYuzo KadomukaiAyumu MiyajimaMasami NaganoTadashi Someno
    • F02D4120
    • F02B31/06F02D41/20F02D2041/2034F02D2041/2051Y02T10/146
    • In a multi-port fuel injection system for a lean burn engine, the attaching of fuel particles from the fuel spray onto a wall surface, which is a problem in atomizing injected fuel, is reduced, and the quality and shape of the mixed gas in the cylinders of the engine is improved. The engine has a fuel injector 1; an intake valve 6 for opening and closing an intake port; and an intake air flow control device 10. The injected fuel is shaped to provide a low penetration fuel spray when the engine is operated in a low load state and at a low rotation speed, and the injected fuel is shaped to provide a high penetration fuel spray when the engine is operated in a high load state and at a high rotation speed. The fuel is injected in synchronism with the intake stroke of the engine, and it is transported by the air flow flowing through the intake air flow control device 10 to suppress the attaching of fuel particles from the fuel spray onto a wall surface of the intake manifold.
    • 在用于贫燃发动机的多端口燃料喷射系统中,将来自燃料喷雾的燃料颗粒附着到壁面上,这是雾化喷射燃料的问题,并且混合气体的质量和形状 发动机气缸得到改善。 发动机具有燃料喷射器1; 用于打开和关闭进气口的进气门6; 和进气流量控制装置10.喷射的燃料成型为当发动机以低负载状态和低转速运行时提供低穿透性燃料喷雾,并且喷射的燃料成形为提供高渗透性燃料 当发动机在高负载状态和高转速下运转时喷雾。 燃料与发动机的进气冲程同步地喷射,并且通过流过进气流量控制装置10的空气流输送,以抑制燃料颗粒从燃料喷雾附着到进气歧管的壁表面上 。