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91. 发明授权

US08485513B2 System for calculating spine jacket width 有权
标题翻译：计算脊椎护套宽度的系统
公开(公告)号：US08485513B2
公开(公告)日：2013-07-16
申请号：US12363276
申请日：2009-01-30
申请人： Kunihiko Sugimoto , Tsuyoshi Morimoto , Atsushi Ito , Taro Yamamoto
发明人： Kunihiko Sugimoto , Tsuyoshi Morimoto , Atsushi Ito , Taro Yamamoto
IPC分类号： B65H37/04
CPC分类号： B42C11/02
摘要： A control apparatus obtains information identifying sheets stored in an MFP to be caused to perform printing for printing a printed object to be subjected to jacketed book binding, wherein this information is stored in the MFP. The control apparatus stores thicknesses of respective paper sheets as information about paper sheets. From this information and from the information obtained from the MFP, the control apparatus creates a table indicative of the correspondence between the respective paper sheets stored in the MFP and their thicknesses. Further, on receiving a selection of paper sheets to be used for printing for the printed object and a number of these paper sheets, the control apparatus determines a thickness of each paper sheet by making a reference to the table and calculates the spine jacket width by multiplying the thickness by the number of paper sheets.
摘要翻译：控制装置获取识别存储在MFP中的纸张的信息，以进行用于打印要进行夹克书装订的打印对象的打印，其中该信息存储在MFP中。控制装置存储各纸张的厚度作为关于纸张的信息。根据该信息和从MFP获得的信息，控制装置创建表示存储在MFP中的各个纸张与其厚度之间的对应关系的表格。此外，控制装置在接收到用于打印对象的打印用纸和多张这样的纸张的选择时，通过参照表格来确定各纸张的厚度，并且通过将厚度乘以纸张的数量。

92. 发明申请

US20130118533A1 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD 有权
标题翻译：液体加工设备和液体加工方法
公开(公告)号：US20130118533A1
公开(公告)日：2013-05-16
申请号：US13811522
申请日：2011-07-12
申请人： Yasushi Takiguchi , Taro Yamamoto , Tsutomu Yamahata , Akihiro Fujimoto , Kouji Fujimura
发明人： Yasushi Takiguchi , Taro Yamamoto , Tsutomu Yamahata , Akihiro Fujimoto , Kouji Fujimura
IPC分类号： B08B3/04
CPC分类号： B08B3/04 , G03F7/3021 , H01L21/6715 , H01L21/6719
摘要： To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module 1 and a second processing module 2. On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing module 1 and the second liquid processing module 2. The common developing nozzle is configured to wait on an intermediate position between the modules 1 and 2.
摘要翻译：为了提供一种液体处理装置，当水平保持在杯体中的基板通过向基板供应化学液体进行液体处理时，能够以较少数量的用于液体的喷嘴来处理具有高产量的基板的液体处理装置。以液体工艺为例的显影过程，为两种显影方法准备了两种类型的显影喷嘴。在喷嘴与该处理接合较长时间的方法中使用的显影喷嘴被单独地设置在第一处理模块1和第二处理模块2的每一个上。另一方面，在第一液体处理模块1和第二液体处理模块2中共同使用在喷嘴与该工艺相比较短时间接合的方法中使用的显影喷嘴。公知的显影喷嘴被配置等待模块1和2之间的中间位置。

93. 发明授权

US08330934B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08330934B2
公开(公告)日：2012-12-11
申请号：US12659066
申请日：2010-02-24
申请人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
发明人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70891
摘要： An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature.
摘要翻译：用于经由投影光学系统和液体将曝光光发射到基板上以暴露基板的曝光装置包括：供给液体的供给管; 一种回收液体的回收管; 连接供给管和回收管的连接管; 以及切换装置，其切换液体的流路，使得当液体供应停止时，流入供给管的液体经由连接管流向回收管。该装置还可以包括连接到供应管的温度调节装置，其对供应管供给的液体进行温度调节，并且具有大致调节液体的温度的粗略温度调节器，以及微调温度调节器，布置在粗调温器和供水管之间，并对该温度进行微调。

94. 发明申请

US20120183693A1 Coating Film Forming Apparatus, Use Of Coating Film Forming Apparatus, And Recording Medium 有权
标题翻译：涂膜成型装置，涂膜成型装置和记录介质的使用
公开(公告)号：US20120183693A1
公开(公告)日：2012-07-19
申请号：US13424011
申请日：2012-03-19
申请人： Nobuhiro Ogata , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
发明人： Nobuhiro Ogata , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
IPC分类号： B05D3/00
CPC分类号： H01L21/67051
摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
摘要翻译：一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

95. 发明授权

US07924402B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07924402B2
公开(公告)日：2011-04-12
申请号：US11374953
申请日：2006-03-15
申请人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
发明人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
IPC分类号： G03B27/68 , G03B27/52 , G03B27/42 , G03B27/54 , G03B27/58
CPC分类号： G03F7/70341
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate via a projection optical system and a liquid. The exposure apparatus includes a liquid supply device which supplies liquid onto the substrate from above the substrate through a first and second supply ports disposed in a vicinity of a projection area onto which the pattern image is projected, and a liquid recovery device which recovers liquid on the substrate from above the substrate through an inside recovery port disposed outside the first and second supply ports and an outside the second recovery port disposed outside the inside recovery port.
摘要翻译：曝光装置通过投影光学系统和液体将图案图像投影到基板上来曝光基板。曝光装置包括：液体供给装置，其通过布置在投影图案图像的投影区域附近的第一和第二供给口从基板的上方供给液体;液体回收装置，其将液体回收到所述基板从所述基板的上方经由设置在所述第一和第二供给口的外侧的内部回收口和设置在所述内侧回收口的外部的所述第二回收口的外部。

96. 发明授权

US07896254B2 Temperature regulation method and system for low flow rate liquid 有权
标题翻译：低流量液体的温度调节方法和系统
公开(公告)号：US07896254B2
公开(公告)日：2011-03-01
申请号：US11719347
申请日：2005-11-07
申请人： Hiroyasu Goto , Masahiro Fukuda , Taro Yamamoto
发明人： Hiroyasu Goto , Masahiro Fukuda , Taro Yamamoto
IPC分类号： F24F11/053 , G05D23/00 , B41J2/175 , B41J2/18
CPC分类号： G05D23/1919 , Y10T137/6416
摘要： A method and a system for controlling temperature of a liquid in small flow amount, for supplying a liquid whose temperature is highly accurately controlled, as a flow of a small flow amount or an intermittent flow. A liquid supplied from a supply path is pressurized and introduced into a circulation path, and is temperature-controlled by a temperature control device in the circulation path, while being circulated in the circulation path by a pump in the pressurized condition. The liquid is supplied to an exterior device through a discharge path caused to branch from the circulation path, as a consecutive flow in a small amount or an intermittent flow in a small amount in a flow amount less than at least ½ times the flow amount in the circulation path, by adjusting a discharge valve provided in the discharge path.
摘要翻译：用于以小流量或间歇流量流动用于将温度高度精确地控制的液体供给到小流量的液体的温度的方法和系统。从供给路径供给的液体被加压并引入循环路径，并且通过循环路径中的温度控制装置进行温度控制，同时在加压状态下通过泵在循环路径中循环。液体通过从循环路径分支的排出路径供给到外部装置，作为少量的连续流量或少量的少量的间歇流量，流量少于流量的至少1/2的流量循环路径，通过调节设置在排出路径中的排出阀。

97. 发明授权

US07809460B2 Coating and developing apparatus, coating and developing method and storage medium in which a computer-readable program is stored 有权
标题翻译：其中存储有计算机可读程序的涂覆和显影装置，涂覆和显影方法以及存储介质
公开(公告)号：US07809460B2
公开(公告)日：2010-10-05
申请号：US11608426
申请日：2006-12-08
申请人： Seiki Ishida , Taro Yamamoto
发明人： Seiki Ishida , Taro Yamamoto
IPC分类号： G06F19/00 , B28B19/00 , B29B15/10 , C23C18/00 , C23C26/00 , H01C17/06 , H05K3/00 , H01L21/20 , H01L21/31 , H01L21/469
CPC分类号： G03F7/2041 , H01L21/6715 , H01L21/67225 , H01L21/67276
摘要： A coating and developing apparatus comprises a washing section for washing the surface of a substrate after it has been subjected to a dipping exposure process in an exposing apparatus, and a first substrate carrying means adapted to transfer the substrate carried out from the exposing apparatus after the dipping exposure process to the washing section. The first substrate carrying means is controlled by a control means. Namely, the control means controls the first substrate carrying means such that the substrate can be washed in the washing section in a period of time prior to a time zone in which the size of liquid drops remaining on the substrate due to the dipping exposure process becomes smaller quite rapidly, based on a carrying-out ready signal for the substrate from the exposing apparatus, by using a relationship between the time elapsed from the end of the dipping exposure process and the size of liquid drops remaining on the substrate due to the dipping exposure process.
摘要翻译：一种涂料和显影装置，包括：洗涤部分，用于在曝光装置中进行浸渍曝光处理之后对基材的表面进行清洗;以及第一基材输送装置，其适于将经曝光装置执行的基板转印浸渍曝光过程到洗涤部分。第一基板承载装置由控制装置控制。也就是说，控制装置控制第一基板承载装置，使得可以在由于浸渍曝光处理而残留在基板上的液滴的尺寸变成为的时间段之前的一段时间内在洗涤部分中洗涤基板基于来自曝光装置的基板的准备就绪信号，通过使用从浸渍曝光处理结束之后的时间与由于浸渍而残留在基板上的液滴的尺寸之间的关系而相对快速地更小曝光过程。

98. 发明申请

US20100157262A1 Exposure apparatus and device manufacturing method 有权
公开(公告)号：US20100157262A1
公开(公告)日：2010-06-24
申请号：US12659066
申请日：2010-02-24
申请人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
发明人： Hiroyuki Nagasaka , Taro Yamamoto , Osamu Hirakawa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70891
摘要： An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature.

99. 发明授权

US07665918B2 Developing apparatus, developing method and storage medium 有权
标题翻译：显影装置，显影方法和存储介质
公开(公告)号：US07665918B2
公开(公告)日：2010-02-23
申请号：US12173262
申请日：2008-07-15
申请人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
发明人： Taro Yamamoto , Hirofumi Takeguchi , Shuichi Nagamine
IPC分类号： G03D5/00 , G03B27/32 , B05C11/02
CPC分类号： G03B27/42 , G03F7/3021 , H01L21/6715 , H01L21/67178
摘要： A developing apparatus includes, to process substrates each coated with a resist and processed by an exposure process by a developing process, includes: plural developing units each provided with a substrate holding device for stably pouring a developer onto the substrate, a first developer nozzle to be used in common by the plural developing units to pour the developer in a band-shaped flow onto the substrates held by each of the substrate holding devices, a nozzle driving mechanism for carrying the first developer nozzle from one to another of the developing units, and moving the first developer nozzle with one end of a band-shaped area into which the developer is to be poured through the first developer nozzle directed toward the center of the substrate in each of the developing units such that a part in a surface of the substrate onto which the developer is poured moves from a central part toward a peripheral part or from a peripheral part toward a central part in the surface of the substrate to coat the surface of the substrate entirely with a developer film, and second developer nozzles for pouring the developer into a circular area or a band-shaped area of a short length shorter than that of the band-shaped area into which the first developer nozzle pours the developer in a central part of the substrate on which the developer film has been formed by the first developer nozzle. The nozzles are used selectively for developing steps.
摘要翻译：显影装置包括：处理各自涂覆有抗蚀剂并通过显影处理曝光处理的基板的显影装置包括：多个显影单元，每个显影单元设置有用于将显影剂稳定地浇注到基板上的基板保持装置，第一显影剂喷嘴通过多个显影单元共同使用将显影剂倾倒在由每个基板保持装置保持的基板上的带状流中，用于将第一显影剂喷嘴从另一个承载到显影单元的喷嘴驱动机构，并且移动第一显影剂喷嘴，其中一个带状区域的一端，显影剂将通过第一显影剂喷嘴注入到每个显影单元中的基板的中心，使得其中的部分在显影剂注入的基板从中心部分向周边部分移动，或从周边部分朝向表面的中心部分移动 e基板，用显影剂膜整体地涂覆基板的表面;以及第二显影剂喷嘴，用于将显影剂倾倒到比带状区域的短的短的长度的圆形区域或带状区域中，显影剂喷嘴将显影剂倾倒在其上已由第一显影剂喷嘴形成有显影剂膜的基板的中心部分。喷嘴被选择性地用于显影步骤。

100. 发明申请

US20090306809A1 SYSTEM FOR CALCULATING SPINE JACKET WIDTH 有权
标题翻译：计算脊柱宽度的系统
公开(公告)号：US20090306809A1
公开(公告)日：2009-12-10
申请号：US12363276
申请日：2009-01-30
申请人： Kunihiko Sugimoto , Tsuyoshi Morimoto , Atsushi Ito , Taro Yamamoto
发明人： Kunihiko Sugimoto , Tsuyoshi Morimoto , Atsushi Ito , Taro Yamamoto
IPC分类号： G06F7/00 , B42B5/00 , B42C11/02
CPC分类号： B42C11/02
摘要： A control apparatus obtains information identifying sheets stored in an MFP to be caused to perform printing for printing a printed object to be subjected to jacketed book binding, wherein this information is stored in the MFP. The control apparatus stores thicknesses of respective paper sheets as information about paper sheets. From this information and from the information obtained from the MFP, the control apparatus creates a table indicative of the correspondence between the respective paper sheets stored in the MFP and their thicknesses. Further, on receiving a selection of paper sheets to be used for printing for the printed object and a number of these paper sheets, the control apparatus determines a thickness of each paper sheet by making a reference to the table and calculates the spine jacket width by multiplying the thickness by the number of paper sheets.
摘要翻译：控制装置获取识别存储在MFP中的纸张的信息，以进行用于打印要进行夹克书装订的打印对象的打印，其中该信息存储在MFP中。控制装置存储各纸张的厚度作为关于纸张的信息。根据该信息和从MFP获得的信息，控制装置创建表示存储在MFP中的各个纸张与其厚度之间的对应关系的表格。此外，控制装置在接收到用于打印对象的打印用纸和多张这样的纸张的选择时，通过参照表格来确定各纸张的厚度，并且通过将厚度乘以纸张的数量。

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