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    • 98. 发明授权
    • MEMFET RAM
    • US08120071B2
    • 2012-02-21
    • US12685494
    • 2010-01-11
    • Alexandre M. BratkovskiR. Stanley Williams
    • Alexandre M. BratkovskiR. Stanley Williams
    • H01L29/80H01L31/112H01L29/792
    • H01L27/101H01L29/803
    • A non-volatile field-effect device. The non-volatile field-effect device includes a source, a drain, a channel-formation portion and a memristive gate. The channel-formation portion is disposed between and coupled with the source and the drain. The memristive gate is disposed over the channel-formation portion and coupled with the channel-formation portion. The memristive gate includes a plurality of mobile ions and a confinement structure for the plurality of mobile ions. Moreover, the memristive gate is configured to switch the channel-formation portion from a first conductivity state to a second conductivity state in response to migration of the plurality of mobile ions within the confinement structure.
    • 非易失性场效应器件。 非易失性场效应器件包括源极,漏极,沟道形成部分和忆阻栅极。 通道形成部分设置在源极和漏极之间并与源极耦合。 忆阻门设置在通道形成部分上方并与通道形成部分联接。 忆阻门包括多个移动离子和多个移动离子的约束结构。 此外,忆阻门被配置为响应于限制结构内的多个移动离子的迁移,将沟道形成部分从第一导电状态切换到第二导电状态。
    • 99. 发明申请
    • MEMFET RAM
    • US20110169052A1
    • 2011-07-14
    • US12685494
    • 2010-01-11
    • Alexandre M. BratkovskiR. Stanley Williams
    • Alexandre M. BratkovskiR. Stanley Williams
    • H01L27/085H01L29/80
    • H01L27/101H01L29/803
    • A non-volatile field-effect device. The non-volatile field-effect device includes a source, a drain, a channel-formation portion and a memristive gate. The channel-formation portion is disposed between and coupled with the source and the drain. The memristive gate is disposed over the channel-formation portion and coupled with the channel-formation portion. The memristive gate includes a plurality of mobile ions and a confinement structure for the plurality of mobile ions. Moreover, the memristive gate is configured to switch the channel-formation portion from a first conductivity state to a second conductivity state in response to migration of the plurality of mobile ions within the confinement structure.
    • 非易失性场效应器件。 非易失性场效应器件包括源极,漏极,沟道形成部分和忆阻栅极。 通道形成部分设置在源极和漏极之间并与源极耦合。 忆阻门设置在通道形成部分上方并与通道形成部分联接。 忆阻门包括多个移动离子和多个移动离子的约束结构。 此外,忆阻门被配置为响应于限制结构内的多个移动离子的迁移,将沟道形成部分从第一导电状态切换到第二导电状态。