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91. 发明申请

US20100108913A1 Laser system 有权
公开(公告)号：US20100108913A1
公开(公告)日：2010-05-06
申请号：US11787180
申请日：2007-04-13
申请人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
发明人： Alexander I. Ershov , William N. Partlo , Daniel J. W. Brown , Igor V. Fomenkov , Robert A. Bergstedt , Richard L. Sandstrom , Ivan Lalovic
IPC分类号： G21G5/00 , H01S3/225 , H01S3/083
CPC分类号： H01S3/225 , H01S3/005 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/083 , H01S3/10092 , H01S3/2251 , H01S3/2258 , H01S3/2333 , H01S3/2383 , H01S2301/02
摘要： A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser output light beam of pulses, which may comprise a ring power amplification stage.

92. 发明申请

US20100074295A1 Immersion lithography laser light source with pulse stretcher 审中-公开
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US20100074295A1
公开(公告)日：2010-03-25
申请号：US12592228
申请日：2009-11-20
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edmond Arriola , Mike Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edmond Arriola , Mike Wyatt , Walter Crosby
IPC分类号： H01S3/22
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method are disclosed which may comprise a pulsed gas discharge laser lithography light source which may comprise a seed laser portion providing a seed laser output light beam of seed pulses; an amplifier portion receiving the seed laser output light beam and amplifying the optical intensity of each seed pulse to provide a high power laser system output light beam of output pulses; the amplifier portion may comprise a ring power amplifier comprising amplifier portion injection optics comprising at least one beam expanding prism, a beam reverser and an input/output coupler; the beam expansion optics and the output coupler may be mounted on an optics assembly with the beam expansion optics rigidly mounted with respect to the optics assembly and the input/output coupler mounted for relative movement with respect to the optics assembly for optical alignment purposes.
摘要翻译：公开了一种可以包括脉冲气体放电激光光刻光源的装置和方法，脉冲气体放电激光光刻光源可以包括提供种子脉冲的种子激光输出光束的种子激光部分; 接收种子激光输出光束并放大每个种子脉冲的光强度的放大器部分，以提供输出脉冲的大功率激光系统输出光束; 放大器部分可以包括环形功率放大器，其包括放大器部分注入光学器件，其包括至少一个光束扩展棱镜，光束反向器和输入/输出耦合器; 光束扩展光学器件和输出耦合器可以安装在光学组件上，其中光束扩展光学器件相对于光学组件刚性地安装，并且输入/输出耦合器被安装成相对于用于光学对准目的的光学组件的相对运动。

93. 发明申请

US20080267241A1 Laser system 失效
标题翻译：激光系统
公开(公告)号：US20080267241A1
公开(公告)日：2008-10-30
申请号：US11982152
申请日：2007-10-31
申请人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
发明人： Daniel J.W. Brown , William N. Partlo , Richard L. Sandstrom
IPC分类号： H01S3/22
CPC分类号： H01S3/2308 , G03F7/70025 , G03F7/70041 , G03F7/7055 , G03F7/70575 , G03F7/70583 , H01S3/005 , H01S3/0057 , H01S3/08036 , H01S3/225 , H01S3/2325 , H01S3/2383
摘要： An apparatus/method which may comprise: a very high power line narrowed lithography laser light source which may comprise: a solid state seed laser system which may comprise: a pre-seed laser providing a pre-seed laser output; a fiber amplifier receiving the pre-seed laser output and providing an amplified seed laser pulse which may comprise: a pulse having a nominal wavelength outside of the DUV range; a frequency converter converting to essentially the wavelength of the amplifier gain medium; a first and a second gas discharge laser amplifier gain medium operating at different repetition rates from that of the seed laser output; a beam divider providing the amplifier gain mediums with output pulses from the seed laser; a beam combiner combining the outputs of each respective amplifier gain medium to provide a laser output light pulse beam having the pulse repetition rate of the solid state seed laser system.
摘要翻译：可以包括：非常高的电力线狭窄的光刻激光光源，其可以包括：固态种子激光系统，其可以包括：提供种子间激光输出的种子间激光; 接收所述种子间激光输出并提供放大的种子激光脉冲的光纤放大器，其可以包括：具有在所述DUV范围之外的标称波长的脉冲; 变换器基本上转换为放大器增益介质的波长; 第一和第二气体放电激光放大器增益介质，与种子激光输出的重复频率不同; 一个分束器，为放大器增益介质提供来自种子激光器的输出脉冲; 组合各个放大器增益介质的输出的光束组合器，以提供具有固态种子激光器系统的脉冲重复率的激光输出光脉冲光束。

94. 发明授权

US07405416B2 Method and apparatus for EUV plasma source target delivery 有权
标题翻译：用于EUV等离子体源目标传递的方法和装置
公开(公告)号：US07405416B2
公开(公告)日：2008-07-29
申请号：US11067124
申请日：2005-02-25
申请人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
发明人： J. Martin Algots , Igor V. Fomenkov , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Oscar Hemberg , Alexander N. Bykanov , Dennis W. Cobb
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006
摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.
摘要翻译：公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

95. 发明授权

US07366219B2 Line narrowing module 有权
公开(公告)号：US07366219B2
公开(公告)日：2008-04-29
申请号：US11000684
申请日：2004-11-30
申请人： J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
发明人： J. Martin Algots , Robert A. Bergstedt , Walter D. Gillespie , Vladimir A. Kulgeyko , William N. Partlo , German E. Rylov , Richard L. Sandstrom , Brian Strate , Timothy S. Dyer
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G03F7/70025 , G03F7/70041 , H01S3/005 , H01S3/036 , H01S3/08 , H01S3/08004 , H01S3/08059 , H01S3/097 , H01S3/106 , H01S3/2251
摘要： A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse by changing the position of the dispersive center wavelength selection optic relative to the nominal optical path of the line narrowing module; wherein the second tuning mechanism coarsely selects a value for the center wavelength and the first tuning mechanism more finely selects the value for the center wavelength. The apparatus and method may further comprise at least one beam expanding and redirecting prism in the optical path of the line narrowing module; the first tuning mechanism selecting an angle of incidence of the at least a first spatially defined portion of the laser light pulse beam by changing the position of the at least one beam expanding prism relative to the nominal optical path of the line narrowing module. The first and second tuning mechanisms may be controlled by a center wavelength controller during a burst based upon feedback from a center wavelength detector detecting the center wavelength of at least one other pulse in the burst of pulses and the controller providing the feedback based upon an algorithm employing the detected center wavelength for the at least one other pulse in the burst. The first tuning mechanism may comprise an electro-mechanical course positioning mechanism and a fine positioning mechanism comprising an actuatable material that changes position or shape when actuated.

96. 发明授权

US07154928B2 Laser output beam wavefront splitter for bandwidth spectrum control 有权
标题翻译：激光输出光束波前分离器，用于带宽频谱控制
公开(公告)号：US07154928B2
公开(公告)日：2006-12-26
申请号：US10875662
申请日：2004-06-23
申请人： Richard L. Sandstrom , Daniel J. W. Brown , Alexander I. Ershov , Igor V. Fomenkov , William N. Partlo
发明人： Richard L. Sandstrom , Daniel J. W. Brown , Alexander I. Ershov , Igor V. Fomenkov , William N. Partlo
IPC分类号： H01S3/22 , H01S3/223
CPC分类号： H01S3/0812 , G03F7/70025 , G03F7/70575 , H01S3/08059 , H01S3/097 , H01S3/1055 , H01S3/1305
摘要： Apparatus/method providing bandwidth control in narrow band short pulse duration gas discharge laser output light pulse beam producing systems, producing a beam comprising pulses at selected pulse repetition races, e.g., comprising a dispersive bandwidth selection optic selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the beam containing the respective pulse on the optic; a tuning mechanism operative to select at least one angle of incidence of the beam containing the respective pulse upon the optic; the tuning mechanism comprising a plurality of incidence angle selection elements each defining an angle of incidence for a different spatially separated but not temporally separated portion of the pulse to return from the optic a laser light pulse comprising a plurality of spatially separated but not temporally separated portions, each having one of at least two different selected center wavelengths.
摘要翻译：在窄带短脉冲持续时间气体放电激光输出光脉冲光束产生系统中提供带宽控制的装置/方法，产生包括选定的脉冲重复轨迹的脉冲的波束，例如包括色散带宽选择光学器件，用于为每个脉冲选择至少一个中心波长至少部分地由在光学元件上包含相应脉冲的光束的入射角确定; 调谐机构，用于选择在光学元件上包含相应脉冲的光束的至少一个入射角; 所述调谐机构包括多个入射角选择元件，每个入射角选择元件限定所述脉冲的不同的空间分离但不是时间上分离的部分的入射角，以从所述光学器件返回包括多个空间分离但不时间分离的部分的激光脉冲每个具有至少两个不同选择的中心波长中的一个。

97. 发明授权

US06621846B1 Electric discharge laser with active wavelength chirp correction 有权
标题翻译：具有有源波长啁啾校正的放电激光器
公开(公告)号：US06621846B1
公开(公告)日：2003-09-16
申请号：US09501160
申请日：2000-02-09
申请人： Richard L. Sandstrom , Palash P. Das , George J. Everage , Frederick G. Erie , William N. Partlo , Igor V. Fomenkov
发明人： Richard L. Sandstrom , Palash P. Das , George J. Everage , Frederick G. Erie , William N. Partlo , Igor V. Fomenkov
IPC分类号： H01S322
CPC分类号： H01S3/104 , G03F7/70025 , G03F7/70333 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/225
摘要： Electric discharge laser with active chirp correction. This application discloses techniques for moderating and dispensing these pressure waves. In some lasers small predictable patterns remain which can be substantially corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Embodiments include stepper motors having very fine adjustments so that size of tuning steps are substantially reduced for more precise tuning. However, complete elimination of wavelength chirp is normally not feasible with structural changes in the laser chamber and advance tuning; therefore, Applicants have developed equipment and techniques for very fast active chirp correction. Improved techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.
摘要翻译：具有主动啁啾校正的放电激光器。本申请公开了用于调节和分配这些压力波的技术。在一些激光器中，可以使用现有技术的相对较慢的波长控制装置的主动波长控制基本上校正了小的可预测的图案。在优选实施例中，描述了一种简单的学习算法，以便在预期学习的啁啾模式中允许预调谐镜调节。实施例包括具有非常精细调节的步进电动机，使得调节步骤的尺寸被显着减小以便更精确的调谐。然而，完全消除波长啁啾通常不可行，在激光室的结构变化和提前调谐; 因此，申请人已经开发了用于非常快的主动啁啾校正的设备和技术。改进的技术包括相对较慢的步进电机和非常快的压电驱动器的组合。在另一个优选实施例中，在脉冲对脉冲基础上进行啁啾校正，其中测量一个脉冲的波长，并且基于测量校正下一个脉冲的波长。该校正技术能够以2000Hz及更高的重复速率工作。

98. 发明授权

US06480275B2 High resolution etalon-grating monochromator 有权
标题翻译：高分辨率标准光栅单色仪
公开(公告)号：US06480275B2
公开(公告)日：2002-11-12
申请号：US09772293
申请日：2001-01-29
申请人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
发明人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
IPC分类号： G01J318
CPC分类号： G01J3/12 , G01J1/4257 , G01J3/22 , G01J3/26 , G01J9/02
摘要： A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.
摘要翻译：高分辨率标准光栅单色仪。优选的实施例在紫外范围内呈现非常狭窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。表示对应于所选择的标准具条纹的波长的调度光的一部分通过第二狭缝并由光检测器监视。当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

99. 发明授权

US09516730B2 Systems and methods for buffer gas flow stabilization in a laser produced plasma light source 有权
标题翻译：激光产生等离子体光源中缓冲气体流动稳定的系统和方法
公开(公告)号：US09516730B2
公开(公告)日：2016-12-06
申请号：US13156188
申请日：2011-06-08
申请人： Vladimir B. Fleurov , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov
发明人： Vladimir B. Fleurov , William N. Partlo , Igor V. Fomenkov , Alexander I. Ershov
IPC分类号： G21K5/00 , H05G2/00
CPC分类号： H05G2/005 , H05G2/008
摘要： An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.
摘要翻译：一种极紫外（EUV）光源，包括光学元件，目标材料和沿着光束路径通过所述光学元件以照射所述目标材料的激光束。 EUV光源还包括沿着所述光束路径产生朝向所述目标材料的气流的系统，所述系统具有包围体积和多条气体管线的锥形构件，每条气体管线将气流输送到所述体积中。

100. 发明授权

US09029813B2 Filter for material supply apparatus of an extreme ultraviolet light source 有权
标题翻译：过滤器用于极紫外光源的材料供应装置
公开(公告)号：US09029813B2
公开(公告)日：2015-05-12
申请号：US13112784
申请日：2011-05-20
申请人： Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
发明人： Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
IPC分类号： G01J3/10 , B22F3/105 , B01D29/56
CPC分类号： B01D29/56 , B22F3/105 , H05G2/006 , H05G2/008 , H05H1/46
摘要： A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
摘要翻译：在目标材料供给装置中使用过滤器，并且包括具有第一平面和第二相对平坦面的片，以及多个通孔。第一平坦表面与储存包含目标材料和非目标颗粒的目标混合物的储存器流体连通。通孔从第二平坦表面延伸并且在第二平坦表面处流体耦合到喷嘴的孔口。片材具有暴露于目标混合物的表面积，暴露的表面积比具有与片材相当的横向程度的烧结过滤器的暴露表面积至少要低一百倍。

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