会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 100. 发明授权
    • Self-aligned contact plugs
    • 自对准接触插头
    • US6060783A
    • 2000-05-09
    • US225593
    • 1999-01-06
    • Werner JuenglingKirk PrallGordon HallerDavid KellerTyler Lowrey
    • Werner JuenglingKirk PrallGordon HallerDavid KellerTyler Lowrey
    • H01L21/28H01L21/60H01L21/768H01L21/8242H01L23/485H01L23/48
    • H01L27/10888H01L21/28H01L21/768H01L21/76897H01L23/485H01L2924/0002Y10S438/978
    • Within an integrated circuit, a contact plug with a height not extending above the level of the gate/wordline nitride is nonetheless provided with a relatively large contact area or landing pad, significantly larger than the source/drain region to which the contact plug is electrically connected. Methods for producing the inventive contact plug include (1) use of a nitride facet etch, either (a) during a nitride spacer formation etch or (b) during a BPSG etch; (2) using at least one of (a) an isotropic photoresist etch or partial descum to narrow BPSG spacers above the gate/wordline nitride, and (b) a nitride step etch to etch the shoulder area of the gate/wordline nitride exposed by a BPSG etch; and (3) polishing a BPSG layer down to the top of a gate/wordline nitride before any doped polysilicon plug fill, masking for BPSG etch and performing a BPSG etch, etching the photoresist layer through a partial descum, and etching the shoulder area of the gate/wordline nitride exposed thereby.
    • 在集成电路中,具有不延伸在栅极/字线氮化物的高度之上的高度的接触插塞仍然设置有相对较大的接触面积或着陆焊盘,其明显大于接触插塞电接触的源极/漏极区域 连接的。 用于制造本发明接触塞的方法包括(1)在氮化物间隔物形成蚀刻期间使用氮化物刻面蚀刻(a)或(b)在BPSG蚀刻期间; (2)使用(a)各向同性光致抗蚀剂蚀刻或部分除去中的至少一种来窄化栅极/字线氮化物之上的BPSG间隔区,以及(b)氮化物步骤蚀刻以蚀刻暴露于栅极/字线氮化物的肩部区域 BPSG蚀刻; 并且(3)在任何掺杂的多晶硅插塞填充之前将BPSG层向下抛光到栅极/字线氮化物的顶部,掩蔽用于BPSG蚀刻和执行BPSG蚀刻,通过部分除去蚀刻光致抗蚀剂层,并蚀刻 栅极/字线氮化物被曝光。