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    • 91. 发明授权
    • Method and an apparatus for handling wafers
    • 用于处理波形的方法和装置
    • US5226758A
    • 1993-07-13
    • US812621
    • 1991-12-23
    • Kohichi TanakaMakoto TsukadaFumio Suzuki
    • Kohichi TanakaMakoto TsukadaFumio Suzuki
    • H01L21/304H01L21/00
    • B24B37/345H01L21/67023Y10S414/137
    • A semiconductor wafer handling apparatus and method for transferring a wafer, one of whose faces has been already polished, from a wafer holder, which holds the wafer with the wafer's polished face facing downward, to a wafer cassette submerged in water contained in a water tank; the apparatus includes a wafer receive assembly and a water tank and the wafer receive assembly has a flat surface and is adapted to swing between an up-facing position at which the flat surface faces upward and a down-facing position at which the flat surface faces downward, and the wafer receive assembly is provided with ejection nozzles which eject water with a force sufficient to keep the wafer floating, and the water tank contains a wafer cassette to receive the wafer, and is capable of forcing the wafer which is left to sink in the water to enter the wafer cassette; whereas the method comprises: dropping the wafer from the wafer holder with the polished face facing downward onto a thin water layer formed over the wafer receive assembly; swinging the wafer receive assembly together with the wafer through an angle of about 180.degree. so that the wafer is turned upside down and brought in the water tank, whereupon the wafer sinks through the water with the polished face facing upward; and forcing the wafer to enter the wafer cassette.
    • 100. 发明授权
    • Confocal scanning microscope
    • 共焦扫描显微镜
    • US09091845B2
    • 2015-07-28
    • US13613246
    • 2012-09-13
    • Fumio SuzukiNaoshi AikawaKotaro Yamaguchi
    • Fumio SuzukiNaoshi AikawaKotaro Yamaguchi
    • G02B27/14G02B21/00G02B27/00G02B26/10
    • G02B21/0036G02B21/0072G02B21/0076G02B26/105G02B27/0031
    • A confocal scanning microscope including: an objective system (second objective lens 23 and objective lens 24) illuminating a sample SA with illumination light; a scanning mechanism 31 scanning the sample SA to obtain an intensity signal; and a scanning optical system 32 provided between the scanning mechanism and the objective system. The scanning optical system composed of, in order from the scanning mechanism side, a first positive lens group G1, a second negative lens group G2, and a third positive lens group G3. The third lens group has two chromatic aberration correction portions each formed by a positive lens and a negative lens or negative lens and positive lens. Glass materials are selected such that one performs chromatization and the other performs achromatization, thereby providing a confocal scanning microscope capable of correcting lateral chromatic aberration generated in the objective system in the specific wavelength region by the scanning optical system.
    • 一种共焦扫描显微镜,包括:用照明光照射样品SA的物镜系统(第二物镜23和物镜24) 扫描机构31扫描样本SA以获得强度信号; 以及设置在扫描机构和物镜系统之间的扫描光学系统32。 扫描光学系统按照扫描机构侧的顺序由第一正透镜组G1,第二负透镜组G2和第三正透镜组G3构成。 第三透镜组具有由正透镜和负透镜或负透镜和正透镜形成的两个色像差校正部。 选择玻璃材料,使得一个进行着色,另一个进行消色化,从而提供能够通过扫描光学系统校正在特定波长区域中的物镜系统中产生的横向色差的共焦扫描显微镜。