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    • 95. 发明申请
    • ILLUMINATION DEVICE
    • 照明装置
    • WO1991017483A1
    • 1991-11-14
    • PCT/DE1991000375
    • 1991-05-02
    • FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...VOGT, HolgerKÜCK, HeinzHESS, GuntherGEHNER, Andreas
    • FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
    • G03F07/20
    • G03F7/70283G03F7/70291G03F7/70358G03F7/70425
    • The illumination device (1) proposed is designed to produce patterns (6), or for the direct illumination of electronic elements, and includes a light source (2) and an original generator (3). In order to shorten the exposure time necessary with a simplified illumination-device structure, the original generator (3) includes an optical schlieren system (15, 17) and an active, matrix-addressable surface light modulator (13) which has a visco-elastic control film with a reflective surface (19). Disposed between the schlieren lens (15) and the projection lens (16) in the schlieren system (14) is a mirror (17) which preferably has two functions, not only reflecting the light from the light source (2) to the light modulator (13) but also filtering out undiffracted reflected light. The schlieren lens is located at a distance from the light modulator (13) which is short relative to the focal length of the lens. A positioning table (7) designed to hold the pattern (6) or the electronic element is disposed in such a way that sharp images of areas (19a, 19b) on the surface of the light modulator (13) can be produced on the pattern or the electronic element.
    • 提出的照明装置(1)被设计成产生图案(6)或用于电子元件的直接照明,并且包括光源(2)和原始发生器(3)。 为了缩短使用简化的照明装置结构所需的曝光时间,原始发生器(3)包括光学施胶系统(15,17)和有源矩阵寻址表面光调制器(13) 具有反射表面的弹性控制膜(19)。 布置在施莱伦系统(14)中的均匀透镜(15)和投影透镜(16)之间的是镜子(17),其优选地具有两个功能,不仅将来自光源(2)的光反射到光调制器 (13),而且滤除未衍射的反射光。 色散透镜位于离调制器(13)一段距离处,该光调制器相对于透镜的焦距较短。 设计成保持图案(6)或电子元件的定位台(7)以这样的方式设置,使得可以在图案上产生光调制器(13)表面上的区域(19a,19b)的清晰图像 或电子元件。
    • 99. 发明申请
    • PROCESS AND DEVICE FOR MONITORING MACHINING OF A WORKPIECE
    • 用于监测工件加工的工艺和装置
    • WO1990002944A1
    • 1990-03-22
    • PCT/DE1989000572
    • 1989-09-02
    • FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...WASCHKIES, EckhardHEPP, Klaus
    • FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ...
    • G01N29/00
    • G01N29/14G01N29/449
    • A device for analysing noise emission is useful for monitoring machining quality and tool wear in a machining process. A transducer (1) lodged in a tool holder is connected via a band-pass filter (3) to a broad-band amplifier (5). The broad-band amplifier (5) feeds a buffer stage (6) in which the fractions of the continuous ground noise signal resulting from the cutting noise and frictional noise contained in the noise emission signal are separated from the pulsed machining stop signal of higher amplitude superimposed on the latter. A ground noise signal processor (10) which evaluates the ground noise signal and a machining stop signal processor (7) which evaluates the machining stop signal are arranged after the buffer stage (6). An assessment unit (11) analyses the recorded and analysed data from the noise signal processor (10) and the machining stop signal processor (7).
    • 用于分析噪声排放的装置在加工过程中用于监测加工质量和刀具磨损。 置于工具架中的传感器(1)经由带通滤波器(3)连接到宽带放大器(5)。 宽带放大器(5)馈送缓冲级(6),其中由噪声发射信号中包含的切割噪声和摩擦噪声产生的连续接地噪声信号的分数与较高幅度的脉冲加工停止信号分离 叠加在后者上。 评估接地噪声信号的接地噪声信号处理器(10)和评估加工停止信号的加工停止信号处理器(7)被布置在缓冲级(6)之后。 评估单元(11)分析来自噪声信号处理器(10)和加工停止信号处理器(7)的记录和分析数据。