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    • 93. 发明授权
    • Luminance measuring device for liquid crystal display
    • 液晶显示器的亮度测量装置
    • US06657712B2
    • 2003-12-02
    • US10401562
    • 2003-03-31
    • Akira Yamaguchi
    • Akira Yamaguchi
    • G01J100
    • G01J1/32G01J1/0271G02F1/1309H04N17/04
    • A luminance measuring device for a LCD includes a photometric unit having a contact type luminance meter, a light shielding cushion member surrounding a vicinity of a light receiving portion of the contact type luminance meter and a holding unit for fixing the contact type luminance meter to the LCD a converting unit for converting a first luminance measurement result by the contact type luminance meter into a second luminance measurement result corresponding to a telescopic luminance meter and a processing unit for conducting conversion processing using the converting unit to a luminance measurement result of the LCD by the photometric unit.
    • 一种用于LCD的亮度测量装置包括具有接触型亮度计的光度测量单元,围绕接触型亮度计的光接收部分附近的遮光缓冲部件和用于将接触型亮度计固定到 LCD转换单元,用于将接触型亮度计的第一亮度测量结果转换为对应于伸缩式亮度计的第二亮度测量结果;以及处理单元,用于使用转换单元进行到LCD的亮度测量结果的转换处理, 测光单元。
    • 96. 发明授权
    • Color printer and exposure head therefor
    • 彩色打印机和曝光头
    • US06195115B1
    • 2001-02-27
    • US09310979
    • 1999-05-13
    • Akira Yamaguchi
    • Akira Yamaguchi
    • B41J245
    • B41J2/45
    • Compact and inexpensive color printers can be manufactured. An exposure head using linearly-aligned organic EL elements each composed of subpixels each emitting light of R, G, and B is used as a light source. Input color image data are dealt with as color data corresponding to each of the color components R, G, and B. For each color data, each of the organic EL elements is caused to emit light in accordance with line data for one line corresponding to all organic EL elements composing the exposure head, and a photosensitive material is exposed to the light. After completion of the exposure, vertical scan means moves the photosensitive material by a predetermined amount in the vertical scan direction and the photosensitive material is exposed in accordance with image data corresponding to a subsequent line, as has been described above. By repeating this procedure, exposure corresponding to all image data is carried out.
    • 可以制造紧凑且便宜的彩色打印机。 使用每个由发射R,G和B的光的子像素组成的线性排列的有机EL元件的曝光头作为光源。 输入彩色图像数据作为与每个颜色分量R,G和B相对应的颜色数据处理。对于每个颜色数据,使每个有机EL元件根据对应于 构成曝光头的所有有机EL元件和感光材料暴露于光。 在曝光完成之后,如上所述,垂直扫描装置使感光材料沿垂直扫描方向移动预定量,并且根据与后续行对应的图像数据曝光感光材料。 通过重复该过程,执行对应于所有图像数据的曝光。
    • 98. 发明授权
    • Silicon nitride ceramic sliding material and process for producing the
same
    • 氮化硅陶瓷滑动材料及其制造方法
    • US5922629A
    • 1999-07-13
    • US847746
    • 1997-04-22
    • Jin-Joo ParkYasushi MochidaAkira KuibiraOsamu KomuraAkira Yamaguchi
    • Jin-Joo ParkYasushi MochidaAkira KuibiraOsamu KomuraAkira Yamaguchi
    • F16C33/24C04B35/584C04B35/593C04B35/64C04B38/00C10M103/06C04B35/587
    • C04B35/5935C04B35/584C04B38/0051C04B2111/00353
    • A silicon nitride ceramic sliding material comprising silicon nitride crystal grains and a grain boundary phase and having a porosity of 2 to 10% and a maximum pore size of 20 to 100 .mu.m. The silicon nitride ceramic sliding material preferably has a textural structure wherein the proportion of the total area of silicon nitride crystal grains of 0.1 to 10 .mu.m.sup.2 in area to the total area of all the silicon nitride crystal grains present in an arbitrary two-dimensional cross section is 30 to 90% and the proportion of the number of silicon nitride crystal grains of 2 to 10 in aspect ratio to the number of all the silicon nitride crystal grains present in that cross section is at least 20%. The material is produced by mixing a silicon nitride powder with a sintering aid powder, molding the resulting mixture, then heat-treating the resulting molded body in a nitrogen-containing atmosphere under reduced pressure at 1,000 to 1,500.degree. C., and then sintering it in a nonoxidizing atmosphere under ordinary pressure or under pressure, at 1,550 to 1,800.degree. C.
    • 一种氮化硅陶瓷滑动材料,其包含氮化硅晶粒和晶界相,并且具有2至10%的孔隙率和20至100μm的最大孔径。 氮化硅陶瓷滑动材料优选具有纹理结构,其中氮化硅晶粒的总面积与面积中的所有氮化硅晶粒的总面积的相对于任意二维十字形中的全部氮化硅晶粒的面积为0.1-10μm 截面积为30〜90%,氮化硅晶粒数的比例为纵横比为2〜10的比例与存在于该截面中的全部氮化硅晶粒的数量的比例为20%以上。 通过将氮化硅粉末与烧结助剂粉末混合,将所得混合物成型,然后在含氮气氛中,在减压下在1000〜1500℃下对所得成形体进行热处理,然后烧结 在常压或压力下的非氧化性气氛中,在1550〜1800℃。