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    • 91. 发明申请
    • SEMICONDUCTOR PHOTO DETECTING ELEMENT, MANUFACTURING METHOD OF THE SAME, AND MANUFACTURING METHOD OF OPTOELECTRONIC INTEGRATED CIRCUIT
    • 半导体照相检测元件及其制造方法,以及光电集成电路的制造方法
    • US20080001245A1
    • 2008-01-03
    • US11771588
    • 2007-06-29
    • Yoshihiro YONEDARyuji YAMABI
    • Yoshihiro YONEDARyuji YAMABI
    • H01L31/00
    • H01L31/105H01L31/03046H01L31/1035H01L31/18
    • A semiconductor photo detecting element includes a PIN-type photo detecting element and window semiconductor layer. The PIN-type photo detecting element has a semiconductor substrate, a first semiconductor layer, a second semiconductor layer and a third semiconductor layer. The first semiconductor layer is provided on the semiconductor substrate, is lattice-matched to the semiconductor substrate, includes a first conductivity type dopant, and has first band gap energy. The second semiconductor layer is provided on the first semiconductor layer, has the first band gap energy, and has a concentration of the first conductivity type dopant lower than that of the first semiconductor layer or is substantially undoped. The third semiconductor layer is provided on the second semiconductor layer. The window semiconductor layer has second band gap energy larger than the first band gap energy at a light-incoming side with respect to the second semiconductor layer and has a thickness of 5 nm to 50 nm.
    • 半导体光电检测元件包括PIN型光检测元件和窗半导体层。 PIN型光检测元件具有半导体衬底,第一半导体层,第二半导体层和第三半导体层。 第一半导体层设置在半导体衬底上,与半导体衬底晶格匹配,包括第一导电型掺杂剂,并且具有第一带隙能量。 第二半导体层设置在第一半导体层上,具有第一带隙能量,并且第一导电类型掺杂物的浓度低于第一半导体层的浓度或基本上未掺杂。 第三半导体层设置在第二半导体层上。 窗口半导体层具有比相对于第二半导体层的光入射侧的第一带隙能量大的第二带隙能量,并且具有5nm至50nm的厚度。
    • 93. 发明授权
    • Semiconductor light-receiving device with multiple potentials applied to layers of multiple conductivities
    • 具有多个电位的半导体光接收装置应用于多个电导率层
    • US07105798B2
    • 2006-09-12
    • US10665259
    • 2003-09-22
    • Gang WangYoshihiro Yoneda
    • Gang WangYoshihiro Yoneda
    • H01L31/00
    • H01L27/1443H01L31/02019H01L31/105H01L31/107H01L2224/48091H01L2224/48137H01L2924/30107H01L2924/00014H01L2924/00
    • A semiconductor light-receiving device includes: a substrate that has a first surface and a second surface facing each other; a first semiconductor layer that is formed on the first surface of the substrate and includes at least one semiconductor layer of a first conductivity type; a light absorption layer that is formed on the first semiconductor layer and generates carriers in accordance with incident light; a second semiconductor layer that is formed on the light absorption layer and includes at least one semiconductor layer of a second conductivity type; a first electrode part that is electrically connected to the first semiconductor layer and applies a first potential thereto; a second electrode part that is electrically connected to the second semiconductor layer and applies a second potential thereto; and a third semiconductor layer of the second conductivity type that is interposed between the first surface of the substrate and the first semiconductor layer.
    • 半导体光接收装置包括:具有彼此面对的第一表面和第二表面的基板; 第一半导体层,其形成在所述基板的所述第一表面上,并且包括至少一个第一导电类型的半导体层; 形成在第一半导体层上并根据入射光产生载流子的光吸收层; 第二半导体层,其形成在所述光吸收层上并且包括至少一个第二导电类型的半导体层; 电连接到第一半导体层并向其施加第一电位的第一电极部分; 电连接到第二半导体层并向其施加第二电位的第二电极部分; 以及介于基板的第一表面和第一半导体层之间的第二导电类型的第三半导体层。