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1. 发明申请

US20070272357A1 Substrate Treatment Apparatus 审中-公开
标题翻译：基板处理装置
公开(公告)号：US20070272357A1
公开(公告)日：2007-11-29
申请号：US10592311
申请日：2005-03-07
申请人： Tamio Endo , Ryoichi Okura , Tatsuro Yoshida , Yoshishige Takikawa
发明人： Tamio Endo , Ryoichi Okura , Tatsuro Yoshida , Yoshishige Takikawa
IPC分类号： H01L21/306
CPC分类号： H01L21/67051 , H01L21/6708
摘要： A plurality of liquid chemicals are fed onto a substrate to be treated, which is held and spinned, and the liquid chemicals scattered from the substrate to be treated by a rotator are separately recovered in respective recovery tanks (16 to 19) by each chemical. A lifting mechanism controls lifting operation of respective fences (3a to 3s) which form respective recovery tanks (16 to 19) so as to recover the liquid chemical into a certain recovery tank, while at the time, inlets of the other recovery tanks are closed at that time. Such a lifting mechanism includes a fence lifting plate provided with a cams portions 29a engaging with the respective fences (3a to 3d) to lift the corresponding fence, and performs lifting operation of the respective fences (3a to 3d) by rotating the fence lifting plate (29) around the shaft of the fence lifting plate (29) by a motor (34) so that the liquid chemical to be recovered is prevented from mixing in other recovery tanks.
摘要翻译：多个液体化学品被供给到待保持和旋转的待处理基板上，并且通过旋转器从待处理的基板散射的液体化学品通过每种化学品分别回收到相应的回收罐（16至19）中。提升机构控制形成相应的回收罐（16至19）的相应栅栏（3 a至3 s）的提升操作，以便将液体化学品回收到某个回收罐中，而在其他回收罐的入口处当时关闭。这种提升机构包括：栅栏提升板，其具有与相应围栏（3a至3d）接合的凸轮部分29a，以提升对应的围栏，并且通过以下方式执行各个栅栏（3a至3d）的提升操作：通过马达（34）将围栏提升板（29）围绕围栏提升板（29）的轴旋转，使得要回收的液体化学品被防止在其他回收罐中混合。

2. 发明授权

US5474643A Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US5474643A
公开(公告)日：1995-12-12
申请号：US169551
申请日：1993-12-20
申请人： Junichi Arami , Tamio Endo , Shiro Koyama , Kazuo Kikuchi , Teruaki Shiraishi , Isahiro Hasegawa , Keiji Horioka , Haruo Okano , Katsuya Okumura
发明人： Junichi Arami , Tamio Endo , Shiro Koyama , Kazuo Kikuchi , Teruaki Shiraishi , Isahiro Hasegawa , Keiji Horioka , Haruo Okano , Katsuya Okumura
IPC分类号： H01J37/32 , H05H1/00 , H05H11/00
CPC分类号： H01J37/32431 , H01J2237/16
摘要： A plasma processing apparatus has a process chamber for receiving an article to be processed, a monitoring window forming part of the peripheral wall of the process chamber, a pressure leading-out port, gates, and a plasma generating device for forming an electric field and generating plasma in the process chamber. The process chamber is defined by the peripheral wall having a circular cross section. Members forming parts of the peripheral wall each have an inner face continuous with the surface of the peripheral wall and curved substantially at the same radius of curvature as the surface of the peripheral wall.
摘要翻译：等离子体处理装置具有用于接收被处理物的处理室，形成处理室的周壁的一部分的监视窗口，压力输出端口，栅极和用于形成电场的等离子体产生装置，在处理室中产生等离子体。处理室由具有圆形横截面的周壁限定。形成周壁的部件的部件各自具有与周壁的表面连续的内表面，并且基本上以与周壁的表面相同的曲率半径弯曲。

3. 发明申请

US20120156454A1 FILM-PROTECTED FIBER FOR INTERIOR AUTOMOTIVE TRIM AND INTERIOR AUTOMOTIVE MEMBER 审中-公开
标题翻译：内部汽车和室内汽车零部件的防护光纤
公开(公告)号：US20120156454A1
公开(公告)日：2012-06-21
申请号：US13392719
申请日：2009-08-30
申请人： Eiji Sugiyama , Tamio Endo
发明人： Eiji Sugiyama , Tamio Endo
IPC分类号： B32B7/02 , D02G3/00
CPC分类号： D04H1/541 , B60R13/02 , D01F8/06 , D01F8/12 , D01F8/14 , D04H1/544 , D04H1/549 , D04H1/55 , D10B2505/12 , Y10T428/24942 , Y10T428/2933
摘要： Provided is a fiber which is equal to conventional fibers in heat resistance and which, even when heated during thermoforming, maintains the shape thereof and suffers no change in texture. This fiber is suitable for forming an interior automotive member. Also provided is an interior automotive member formed from the fiber. The film-protected fiber comprises: a core fiber constituted of a material having a relatively low melting point; and a protective film which is constituted of a material having a relatively high melting point and with which the periphery of the core fiber is surrounded. Even when the film-protected fiber is thermoformed, at a temperature sufficient for melting the core fiber, into a shape conforming to, e.g., an inner part of an automotive body, the original structure of the fiber can be maintained due to the protective film.
摘要翻译：本发明提供一种与传统的耐热性纤维相同的纤维，即使在热成形时加热，也保持其形状，并且质地没有变化。该纤维适用于形成内部汽车部件。还提供了由纤维形成的内部汽车构件。膜保护纤维包括：由具有相对低熔点的材料构成的芯纤维; 以及保护膜，其由具有较高熔点的材料构成，并且芯纤维的周围被围绕。即使当将受保护的纤维热成型时，在足以熔化芯纤维的温度下，形成符合例如汽车车体的内部的形状，由于保护膜可以保持纤维的原始结构。

4. 发明授权

US5971696A System for carrying-in of cassette for substrates to be processed 失效
标题翻译：用于承载待处理基板的盒的系统
公开(公告)号：US5971696A
公开(公告)日：1999-10-26
申请号：US937593
申请日：1997-09-29
申请人： Tamio Endo , Yoshiyuki Harima
发明人： Tamio Endo , Yoshiyuki Harima
IPC分类号： B65G49/07 , H01L21/677 , B65G21/00
CPC分类号： H01L21/67781 , Y10S414/136 , Y10S414/14
摘要： There is provided a cassette carrying-in system, which can rotate a cassette housing therein substrates to be treated so that the substrates are changed from a vertical state to a horizontal state and which can carry the cassette in, e.g., a load-lock chamber of a vacuum processing unit. The cassette carrying-in system is provided for carrying a cassette, in which a plurality of substrates to be processed are arranged in parallel, in a processing unit for treating the substrates. The cassette carrying-in system comprises: a moving body having a first supporting portion for holding a bottom portion of the cassette so that the substrates to be processed are arranged vertically, and a second supporting portion, which is rotatable with the first supporting portion and which supports thereon a side of the cassette when the cassette is inclined, the second supporting portion supporting thereon the side serving as a bottom of the cassette when the substrates to be processed are arranged horizontally; a rotating mechanism for rotating the first and second supporting portions so that the substrates in the cassette are changed between a vertical state and a horizontal state; and a running mechanism for running the moving body so that the cassette supported on the first and second supporting portions moves between inside and outside the processing unit.
摘要翻译：提供了一种盒式磁带进入系统，其可以将待处理的基板中的盒壳旋转，使得基板从垂直状态改变到水平状态，并且可以将盒携带在例如装载锁定室的真空处理单元。盒式磁带进入系统被提供用于在用于处理基板的处理单元中携带其中待处理的多个基板并联布置的盒。盒式录入系统包括：移动体，具有用于保持盒的底部的第一支撑部分，使得待处理的基板垂直布置;以及第二支撑部分，其可与第一支撑部分一起旋转;以及第二支撑部分，当所述盒子倾斜时，所述第二支撑部分在所述盒子的一侧支撑在所述盒子的一侧，当所述被处理基板水平布置时，所述第二支撑部分在所述盒子的底部支撑在所述盒子的底部; 旋转机构，用于旋转第一和第二支撑部分，使得盒中的基板在垂直状态和水平状态之间改变; 以及用于使运动体运行的运行机构，使得支撑在第一和第二支撑部分上的盒在处理单元的内部和外部之间移动。

5. 发明申请

US20100154833A1 Resist film removing apparatus, resist film removing method, organic matter removing apparatus and organic matter removing method 审中-公开
标题翻译：抗蚀剂除去装置，抗蚀剂除去方法，有机物去除装置和有机物去除方法
公开(公告)号：US20100154833A1
公开(公告)日：2010-06-24
申请号：US10510244
申请日：2003-04-15
申请人： Tamio Endo , Atsushi Sato , Yasuhiko Amano , Tetsuji Tamura , Naoyuki Nishimura , Tadahiro Ohmi , Ikunori Yokoi
发明人： Tamio Endo , Atsushi Sato , Yasuhiko Amano , Tetsuji Tamura , Naoyuki Nishimura , Tadahiro Ohmi , Ikunori Yokoi
IPC分类号： B08B3/00
CPC分类号： H01L21/6715 , B08B3/02 , B08B2203/007 , G03F7/3057 , G03F7/422 , H01L21/02052 , H01L21/31133 , H01L21/67051 , H01L21/6708
摘要： A sheetfed resist removing apparatus having a substrate (111) being a cleaning object placed therein, includes a treatment chamber (101) forming a closed space, and a spray nozzle (102) to spray a cleaning liquid in a form so-called liquid drops over a surface of the substrate (111), in which the treatment chamber (101) forms the closed space containing the substrate (111) such that the placed substrate (111) faces the spray nozzle (102). This structure allows a cleaning liquid to be in the form of liquid drops in consideration of energy reduction, and permits desirable regulation of the temperature of the liquid drops when the liquid drops contact with the resist film in spraying the cleaning liquid over the resist film on the surface of the substrate (111) to thereby remove the resist film, so that secure removal of the resist film can be accomplished.
摘要翻译：一种具有放置在其中的清洁对象的基板（111）的单张纸抗蚀剂去除装置，包括形成封闭空间的处理室（101）和喷射所谓液滴形式的清洗液的喷嘴（102）在基板（111）的表面上，处理室（101）形成包含基板（111）的封闭空间，使得放置的基板（111）面向喷嘴（102）。考虑到能量降低，这种结构允许清洗液体呈液滴形式，并且当液体在抵抗膜上喷射清洁液体时在抗蚀剂膜上喷溅时允许期望调节液滴的温度，基板（111）的表面，从而去除抗蚀剂膜，从而可以完全去除抗蚀剂膜。

6. 发明申请

US20050241673A1 Resist removing apparatus and method of removing resist 审中-公开
标题翻译：抗蚀剂去除装置和去除抗蚀剂的方法
公开(公告)号：US20050241673A1
公开(公告)日：2005-11-03
申请号：US10510245
申请日：2003-04-15
申请人： Tamio Endo , Atsushi Sato , Yasuhiko Amano , Tetsuji Tamura
发明人： Tamio Endo , Atsushi Sato , Yasuhiko Amano , Tetsuji Tamura
IPC分类号： G03F7/42 , H01L21/027 , H01L21/304 , H01L21/306 , H01L21/311 , C25F1/00 , B08B1/02 , B08B3/00 , B08B6/00 , C25F3/30 , C25F5/00
CPC分类号： G03F7/423 , H01L21/02052 , H01L21/31133
摘要： In a resist removing apparatus of the present invention, a distance between a surface of a substrate (10) and an ultraviolet rays transmission plate (3) is adjusted to a predetermined distance by an upward and downward moving mechanism (2b) of a substrate stage (2), and O3 water is supplied from an O3 water supply section (12) to a treatment space formed between the surface of the substrate (10) and the ultraviolet ray transmission plate (3) to form a liquid film (41). Various kinds of active oxygen are generated by emitting ultraviolet rays of wavelengths of 172 nm to 310 nm to the liquid film (41) by an ultraviolet lamp, and dissolving O3, and thereby the resist is dissolved and removed. This construction makes it possible to form the liquid film on the resist and dissolve and remove the resist by using the active oxygen generated in the liquid film, and achieve a breakaway from the resources and energy-intensive technique, namely, realization of an environmentally compatible technique which does not depend on high energy and chemical solvents for removing a resist.
摘要翻译：在本发明的抗蚀剂除去装置中，通过基板的上下移动机构（2b）将基板（10）的表面与紫外线透射板（3）之间的距离调整为规定的距离，阶段（2）和O 3 3水从O 3 3供水部分（12）供应到形成在基板（10）的表面和紫外线透射板（3）形成液膜（41）。通过用紫外线灯向液膜（41）发射波长为172nm〜310nm的紫外线，溶解O 3 3，从而使抗蚀剂溶解，生成各种活性氧，删除。这种结构使得可以在抗蚀剂上形成液膜并通过使用在液膜中产生的活性氧来溶解并去除抗蚀剂，并实现与资源和能源密集型技术的分离，即实现环境兼容不依赖于高能量和化学溶剂去除抗蚀剂的技术。

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