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    • 7. 发明申请
    • DEVICES AND METHODS FOR PATTERN GENERATION BY INK LITHOGRAPHY
    • 用于通过油墨光刻产生图案的装置和方法
    • WO2008055054A2
    • 2008-05-08
    • PCT/US2007082633
    • 2007-10-26
    • UNIV ILLINOISROGERS JOHN AMENARD ETIENNE
    • ROGERS JOHN AMENARD ETIENNE
    • G03B27/04G03C5/00
    • G03F7/0002B82Y10/00B82Y40/00G03F1/50H01L51/0017
    • The present invention provides methods, devices and device components for fabricating patterns on substrate surfaces, particularly patterns comprising structures having microsized and/or nanosized features of selected lengths in one, two or three dimensions and including relief and recess features with variable height, depth or height and depth. Composite patterning devices comprising a plurality of polymer layers each having selected mechanical and thermal properties and physical dimensions provide high resolution patterning on a variety of substrate surfaces and surface morphologies. Gray-scale ink lithography photomasks for gray-scale pattern generation or molds for generating embossed relief features on a substrate surface are provided. The particular shape of the fabricated patterned can be manipulated by varying the three-dimensional recess pattern on an elastomeric patterning device which is brought into conformal contact with a substrate to localize patterning agent to the recess portion of the pattern.
    • 本发明提供用于在衬底表面上制造图案的方法,装置和设备部件,具体地说图案包括具有在一维,二维或三维中具有选定长度的微细化和/或纳米化特征的结构,并包括具有可变高度,深度或 高度和深度。 包含多个聚合物层的复合图案形成装置各自具有选定的机械和热性能以及物理尺寸,从而在各种衬底表面和表面形态上提供高分辨率图案。 提供用于灰度图案生成的灰度油墨光刻光掩模或用于在衬底表面上产生浮雕浮雕特征的模具。 所制造的图案的特定形状可以通过改变弹性图案形成装置上的三维凹陷图案来操纵,所述弹性图案形成装置与衬底保形接触以将图案形成剂定位到图案的凹陷部分。