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    • 7. 发明授权
    • Polarization beam splitter for photolithography
    • 用于光刻的偏振分束器
    • US06680794B2
    • 2004-01-20
    • US10264318
    • 2002-10-04
    • James A. McClayRonald A. WilklowMatthew Gregoire
    • James A. McClayRonald A. WilklowMatthew Gregoire
    • G02B528
    • G03F7/70216G02B1/02G02B5/3033G02B5/3066G02B27/283
    • The present invention provides a photolithography system having a catadioptric system with a polarizing beam splitter cube. The beam splitter cube transmits light at wavelengths equal to or less than 170 nm. The polarizing beam splitter cube can image at high quality light incident over a wide range of angles and including a numeric aperture greater than 0.6. In one embodiment, the polarizing beam splitter cube comprises a pair of prisms that are made of at least a fluoride material, such as calcium fluoride, and a coating interface having at least one layer of a thin film fluoride material. Layers in a multi-layer stack can also be graded across the hypotenuse face of a prism to adjust layer thicknesses at any point so as to compensate for changes in the incidence angle of the light. In one embodiment, the prisms and coating interface are joined by optical contact.
    • 本发明提供了一种具有偏光分束器立方体的反射折射系统的光刻系统。 分束器立方体透射波长等于或小于170nm的光。 偏振分束器立方体可以在宽范围的角度入射的高质量光下成像,并且包括大于0.6的数值孔径。 在一个实施例中,偏振分束器立方体包括由至少氟化物材料如氟化钙制成的一对棱镜和具有至少一层薄膜氟化物材料的涂层界面。 多层叠层中的层也可以跨越棱镜的斜边分级,以调整任何点的层厚度,以补偿光入射角的变化。 在一个实施例中,棱镜和涂层界面通过光学接触连接。