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1. 发明授权

US06190805B1 Polymerizable compound, solid polymer electrolyte using the same and use thereof 有权
标题翻译：可聚合化合物，使用其的固体聚合物电解质及其用途
公开(公告)号：US06190805B1
公开(公告)日：2001-02-20
申请号：US09149093
申请日：1998-09-08
申请人： Masataka Takeuchi , Shuichi Naijo , Takashi Ohkubo , Ayako Nishioka , Masaaki Nishioka
发明人： Masataka Takeuchi , Shuichi Naijo , Takashi Ohkubo , Ayako Nishioka , Masaaki Nishioka
IPC分类号： H01M1040
CPC分类号： H01G9/038 , C07C69/96 , C07C271/16 , H01G9/025 , H01G11/56 , H01M6/181 , H01M10/052 , H01M10/0565 , Y02E60/13
摘要： The polymer compound of the present invention which contains a poly- or oligo-carbonate group and is preferably obtained by utilizing a polymerization reaction using a polymerizable functional group represented by formula (2) and/or formula (3) below: exhibits good strength even when it is formed into a thin film and has high ion conductivity and excellent workability. By the use of this polymer compound, solid polymer electrolyte, battery and/or electric double layer capacitor having high-temperature characteristics and large current characteristics are provided.
摘要翻译：含有聚碳酸酯或低碳酸酯基的本发明的高分子化合物优选通过使用由下述式（2）和/或式（3）表示的聚合性官能团进行聚合反应得到：即使当其形成薄膜并且具有高离子传导性和优异的可加工性时。通过使用该高分子化合物，提供具有高温特性和大电流特性的固体高分子电解质，电池和/或双电层电容器。

2. 发明授权

US07022264B2 Polymerizable composition and use thereof 失效
公开(公告)号：US07022264B2
公开(公告)日：2006-04-04
申请号：US10859364
申请日：2004-06-03
申请人： Masataka Takeuchi , Shuichi Naijo , Ayako Nishioka
发明人： Masataka Takeuchi , Shuichi Naijo , Ayako Nishioka
IPC分类号： H01B1/12 , H01G4/06 , H01G9/028 , C07C69/96
CPC分类号： H01G9/2009 , C07C69/96 , C07C271/16 , C08G64/0291 , G02F1/1525 , H01B1/122 , H01G11/48 , H01G11/56 , H01M6/181 , H01M10/052 , H01M10/0565 , Y02E10/542 , Y02E60/122 , Y02E60/13 , Y02P70/521 , Y02P70/54
摘要： The present invention provides a solid polymer electrolyte; a polymerizable composition having low viscosity and excellent processability for obtaining the solid polymer electrolyte; and a polymerizable compound having low viscosity, and good polymerizability and stability for use in the polymerizable composition. The present invention also provides primary and secondary batteries capable of working with high capacity and current; an electric double-layer capacitor ensuring high output voltage, large takeout current, and good processability; and an electrochromic device favored with high response speed. Each thereof use the solid polymer electrolyte of the present invention and are ensured with long life, excellent safety free of liquid leakage, high reliability and production at a low cost. A solid polymer electrolyte, including a carbonate-based polymer in which a branched chain is introduced and having a high dielectric constant and a wide electrochemical stability range, having excellent processability, good safety and high ionic conductivity, is provided.

3. 发明授权

US06878492B2 Polymerizable composition and use thereof 有权
标题翻译：可聚合组合物及其用途
公开(公告)号：US06878492B2
公开(公告)日：2005-04-12
申请号：US09901122
申请日：2001-07-10
申请人： Masataka Takeuchi , Shuichi Naijo , Ayako Nishioka
发明人： Masataka Takeuchi , Shuichi Naijo , Ayako Nishioka
IPC分类号： C07C69/96 , C07C271/16 , C08G64/02 , G02F1/15 , H01B1/12 , H01G9/20 , H01M6/18 , H01M10/052 , H01M10/0565 , H01M10/36
CPC分类号： H01G9/2009 , C07C69/96 , C07C271/16 , C08G64/0291 , G02F1/1525 , H01B1/122 , H01G11/48 , H01G11/56 , H01M6/181 , H01M10/052 , H01M10/0565 , Y02E10/542 , Y02E60/122 , Y02E60/13 , Y02P70/521 , Y02P70/54
摘要： The present invention provides a solid polymer electrolyte; a polymerizable composition having low viscosity and excellent processability for obtaining the solid polymer electrolyte; and a polymerizable compound having low viscosity, and good polymerizability and stability for use in the polymerizable composition. The present invention also provides primary and secondary batteries capable of working with high capacity and current; an electric double-layer capacitor ensuring high output voltage, large takeout current, and good processability; and an electrochromic device favored with high response speed. Each thereof use the solid polymer electrolyte of the present invention and are ensured with long life, excellent safety free of liquid leakage, high reliability and production at a low cost. A solid polymer electrolyte, including a carbonate-based polymer in which a branched chain is introduced and having a high dielectric constant and a wide electrochemical stability range, having excellent processability, good safety and high ionic conductivity, is provided.
摘要翻译：本发明提供固体聚合物电解质; 具有低粘度和优异的可获得固体聚合物电解质的加工性的可聚合组合物; 和可聚合的化合物，其粘度低，聚合性好，聚合性好，稳定性好。本发明还提供能够以高容量和电流工作的一次和二次电池; 确保高输出电压，大的取出电流和良好的加工性能的双电层电容器; 和具有高响应速度的电致变色器件。其均使用本发明的固体高分子电解质，寿命长，安全性低，易于泄漏，高可靠性，低成本生产。提供了具有优异的加工性，良好的安全性和高离子电导率的固体聚合物电解质，其包括其中引入支链并具有高介电常数和宽的电化学稳定性范围的碳酸酯基聚合物。

4. 发明申请

US20070181857A1 Antistatic agent, antistatic film and articles coated with antistatic film 有权
标题翻译：抗静电剂，抗静电膜和涂有抗静电膜的物品
公开(公告)号：US20070181857A1
公开(公告)日：2007-08-09
申请号：US11657550
申请日：2007-01-25
申请人： Ayako Nishioka , Takashi Ohkubo
发明人： Ayako Nishioka , Takashi Ohkubo
IPC分类号： H01B1/12
CPC分类号： C09K3/16 , C08L65/00 , C09D5/24 , G03F7/093 , C08L2666/04 , C08L2666/22 , C08L2666/26
摘要： The object of the invention is to provide an antistatic agent exhibiting an excellent property of preventing film-thinning phenomenon and fogging in chemically amplified resists, an antistatic film using the antistatic agent and a product coated therewith.The antistatic agent comprising the water-soluble electroconductive polymer, the solvent and the water-soluble polymer. By using a water-soluble polymer, especially a water-soluble polymer compound having a polypeptide bond or a specific water-soluble polymer compound having a polyvinyl structure in combination with a water-soluble electroconductive polymer in an antistatic agent, influences on resist (such as fogging, film-thinning phenomenons and dissolution of resist after developing of resist) can be suppressed even when surfactant is added into the antistatic agent for the purpose of imparting coatability inexpensively and easily, while maintaining coatability of the agent. An antistatic agent having improved coatability by comprising surfactant may cause mixing, which leads to development defects and changes in the developing time, not only in chemically amplified resist but also in non-chemically amplified resist used for microfabrication.
摘要翻译：本发明的目的是提供一种抗静电剂，其具有防止化学放大抗蚀剂中的薄膜化现象和起雾的优异性能，使用该抗静电剂的抗静电膜和涂覆该产品的产品。包含水溶性导电聚合物，溶剂和水溶性聚合物的抗静电剂。通过使用水溶性聚合物，特别是具有多肽键的水溶性高分子化合物或具有聚乙烯基结构的特定水溶性高分子化合物与抗静电剂中的水溶性导电聚合物组合，对抗蚀剂（如即使将表面活性剂添加到抗静电剂中，为了廉价且容易地赋予涂布性，同时保持试剂的涂布性，也可以抑制雾化，薄膜变稀现象和抗蚀剂显影后抗蚀剂的溶解。通过包含表面活性剂具有改善的涂布性的抗静电剂可能引起混合，这导致显影缺陷和显影时间的变化，不仅在化学增强的抗蚀剂中，而且在用于微细加工的非化学放大抗蚀剂中。

5. 发明授权

US08821761B2 Antistatic agent, antistatic film and articles coated with antistatic film 有权
标题翻译：抗静电剂，抗静电膜和涂有抗静电膜的物品
公开(公告)号：US08821761B2
公开(公告)日：2014-09-02
申请号：US11657550
申请日：2007-01-25
申请人： Ayako Nishioka , Takashi Ohkubo
发明人： Ayako Nishioka , Takashi Ohkubo
IPC分类号： H01B1/00 , C09D5/24 , G03F7/09 , C09K3/16 , C08L65/00
CPC分类号： C09K3/16 , C08L65/00 , C09D5/24 , G03F7/093 , C08L2666/04 , C08L2666/22 , C08L2666/26
摘要： An antistatic agent, a water-soluble electroconductive polymer, a solvent and a water-soluble polymer. In preferred embodiments, the water-soluble polymer has a polypeptide bond or a specific polyvinyl structure. Also disclosed is an antistatic film incorporating the antistatic agent, an article coated with an antistatic film and a pattern-forming method using the antistatic film.
摘要翻译：抗静电剂，水溶性导电聚合物，溶剂和水溶性聚合物。在优选的实施方案中，水溶性聚合物具有多肽键或特定的聚乙烯基结构。还公开了包含抗静电剂的抗静电膜，涂有抗静电膜的制品和使用该抗静电膜的图案形成方法。

6. 发明授权

US08178281B2 Method for improving sensitivity of resist 有权
标题翻译：提高抗蚀剂敏感性的方法
公开(公告)号：US08178281B2
公开(公告)日：2012-05-15
申请号：US13059877
申请日：2009-08-20
申请人： Hirofumi Ohki , Ayako Nishioka , Takashi Ohkubo
发明人： Hirofumi Ohki , Ayako Nishioka , Takashi Ohkubo
IPC分类号： G03C5/00
CPC分类号： G03F7/093 , G03F7/0757 , G03F7/168 , G03F7/2059 , Y10S430/143
摘要： It is an object of the present invention to improve sensitivity of a resist made from hydrosilsesquioxane when a pattern is formed in the resist by irradiation with a charged particle beam. The method for improving sensitivity of a resist of the present invention is a method to improve sensitivity of a resist formed from hydrosilsesquioxane to a charged particle beam when a pattern is formed in the resist by irradiation with a charged particle beam, and is characterized by including prebaking a resist formed from hydrosilsesquioxane and applied onto a substrate at t° C. (20≦t≦300), applying a composition containing a water-soluble conductive polymer compound to a charged particle beam irradiation surface of the prebaked resist, baking the thus applied composition at T° C. (0≦T
摘要翻译：本发明的目的是提高当用带电粒子束照射在抗蚀剂中形成图案时由氢硅倍半氧烷制成的抗蚀剂的灵敏度。提高本发明的抗蚀剂的灵敏度的方法是当通过照射带电粒子束在抗蚀剂中形成图案时，提高由氢化硅倍半氧烷形成的抗蚀剂对带电粒子束的敏感性的方法，其特征在于包括预烘烤由氢化倍半硅氧烷形成的抗蚀剂，并在t℃（20℃和100℃; 300℃）下涂布在基材上，将含有水溶性导电聚合物化合物的组合物涂布到预焙抗蚀剂的带电粒子束照射表面上，（0＆nlE; T

7. 发明申请

US20110143283A1 METHOD FOR IMPROVING SENSITIVITY OF RESIST 有权
标题翻译：提高耐药敏感性的方法
公开(公告)号：US20110143283A1
公开(公告)日：2011-06-16
申请号：US13059877
申请日：2009-08-20
申请人： Hirofumi Ohki , Ayako Nishioka , Takashi Ohkubo
发明人： Hirofumi Ohki , Ayako Nishioka , Takashi Ohkubo
IPC分类号： G03F7/20
CPC分类号： G03F7/093 , G03F7/0757 , G03F7/168 , G03F7/2059 , Y10S430/143
摘要： It is an object of the present invention to improve sensitivity of a resist made from hydrosilsesquioxane when a pattern is formed in the resist by irradiation with a charged particle beam. The method for improving sensitivity of a resist of the present invention is a method to improve sensitivity of a resist formed from hydrosilsesquioxane to a charged particle beam when a pattern is formed in the resist by irradiation with a charged particle beam, and is characterized by including prebaking a resist formed from hydrosilsesquioxane and applied onto a substrate at t° C. (20≦t≦300), applying a composition containing a water-soluble conductive polymer compound to a charged particle beam irradiation surface of the prebaked resist, baking the thus applied composition at T° C. (0≦T
摘要翻译：本发明的目的是提高当用带电粒子束照射在抗蚀剂中形成图案时由氢硅倍半氧烷制成的抗蚀剂的灵敏度。提高本发明的抗蚀剂的灵敏度的方法是当通过照射带电粒子束在抗蚀剂中形成图案时，提高由氢化硅倍半氧烷形成的抗蚀剂对带电粒子束的敏感性的方法，其特征在于包括预烘烤由氢化倍半硅氧烷形成的抗蚀剂，并在t℃（20℃和100℃; 300℃）下涂布在基材上，将含有水溶性导电聚合物化合物的组合物涂布到预焙抗蚀剂的带电粒子束照射表面上，（0＆nlE; T

8. 发明申请

US20060042502A1 Composition for polishing metal, polishing metod for metal layer, and production method for wafer 审中-公开
标题翻译：用于抛光金属的组合物，金属层的抛光及其制造方法
公开(公告)号：US20060042502A1
公开(公告)日：2006-03-02
申请号：US10532966
申请日：2003-10-31
申请人： Takashi Sato , Ayako Nishioka , Novuo Uotani
发明人： Takashi Sato , Ayako Nishioka , Novuo Uotani
IPC分类号： C09G1/08
CPC分类号： C09G1/14 , C09G1/02 , H01L21/3212
摘要： A metal polishing composition is used for polishing a metal layer and comprises a film forming compound which polymerizes on a surface of the metal layer, forming a polymer film on the surface of the metal layer. A polishing method for the metal layer comprises a step of polishing and planarizing the metal layer using the metal polishing composition. A production method for a wafer comprises a step of polishing and planarizing a metal layer which is formed on top of a wafer that contains recesses so as to fill and cover the recesses, by the polishing method for a metal layer. According to the composition and polishing method, dishing is prevented to improve the planarity, and the polishing rate for polishing metal layers, and particularly copper layers, is improved, enabling high speed polishing at low pressure. Furthermore, because scratching of the metal layer is also prevented, the yield improves.
摘要翻译：金属抛光组合物用于抛光金属层，并且包括在金属层的表面上聚合的成膜化合物，在金属层的表面上形成聚合物膜。金属层的抛光方法包括使用金属抛光组合物抛光和平坦化金属层的步骤。用于晶片的制造方法包括通过金属层的抛光方法来研磨和平面化金属层的步骤，该金属层形成在包含凹部的晶片顶部以填充和覆盖凹部。根据组成和抛光方法，防止了凹陷以提高平面度，并且提高了用于研磨金属层，特别是铜层的抛光速率，使得能够在低压下进行高速抛光。此外，由于也防止了金属层的划伤，所以产率提高。

9. 发明申请

US20050282387A1 Metal polish composition, polishing method using the composition and method for producing wafer using the polishing method 审中-公开
标题翻译：金属抛光组合物，使用该抛光方法使用该组合物的抛光方法和用于制造晶片的方法
公开(公告)号：US20050282387A1
公开(公告)日：2005-12-22
申请号：US10517149
申请日：2003-06-06
申请人： Takashi Sato , Ayako Nishioka , Daigo Ito
发明人： Takashi Sato , Ayako Nishioka , Daigo Ito
IPC分类号： C09G1/02 , C09G1/08 , C09K3/14 , C09K13/00 , C23F3/00 , H01L21/302 , H01L21/304 , H01L21/321 , H01L21/461
CPC分类号： C09G1/02 , C09K3/1463 , C23F3/00 , H01L21/3212
摘要： A metal polish composition contains an amine represented by general formula (1): wherein m represents an integer of from 1 to 3 and n represents an integer of from 0 to 2, with m and n being such that (3-n-m) is an integer of from 0 to 2; A represents a straight-chained or branched alkylene, phenylene or substituted phenylene group having 1 to 5 carbon atoms; R1 and R3 each independently represent hydrogen or a substituted or non-substituted hydrocarbon group having 1 to 5 carbon atoms; R3 represents a substituted or non-substituted hydrocarbon group having 1 to 20 carbon atoms; a combination of R1 and R2, a combination of R2 and R3 and a combination of A and R3 can form a ring structure; and R1, R2, R3 and A can individually form a ring structure.
摘要翻译：金属抛光组合物含有由通式（1）表示的胺：其中m表示1至3的整数，n表示0至2的整数，m和n使得（3-nm）为从0到2的整数; A表示具有1至5个碳原子的直链或支链亚烷基，亚苯基或取代亚苯基; R 1和R 3各自独立地表示氢或具有1至5个碳原子的取代或未取代的烃基; R3表示碳原子数1〜20的取代或未取代的烃基; R1和R2的组合，R2和R3的组合以及A和R3的组合可以形成环结构; 并且R1，R2，R3和A可以单独形成环结构。

10. 发明申请

US20070128872A1 Polishing composition and polishing method 审中-公开
标题翻译：抛光组合物和抛光方法
公开(公告)号：US20070128872A1
公开(公告)日：2007-06-07
申请号：US10579335
申请日：2004-11-15
申请人： Yuji Itoh , Ayako Nishioka , Nobuo Uotani
发明人： Yuji Itoh , Ayako Nishioka , Nobuo Uotani
IPC分类号： H01L21/44 , H01L21/302
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/32115 , H01L21/3212 , H01L21/7684
摘要： As a polishing composition which allows high-speed polishing while dishing and erosion are prevented and the flatness of metal film is maintained, there is provided a polishing composition for polishing a metal film provided on a substrate having trenches such that the metal film fills the trenches, so as to provide a planarized surface, wherein the composition comprises water, a phosphate ester having a C≧6 carbon atom alkyl group in its molecule, and an etchant for the metal, and has a pH of 5 to 11.
摘要翻译：作为能够防止凹陷和侵蚀而进行高速抛光并且保持金属膜的平坦度的抛光组合物，提供了一种用于抛光设置在具有沟槽的基底上的金属膜的抛光组合物，使得金属膜填充沟槽，以提供平坦化的表面，其中组合物包含水，分子中具有C> = 6个碳原子烷基的磷酸酯和金属的蚀刻剂，并且具有5至11的pH。

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