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    • 1. 发明授权
    • Alignment apparatus for use in exposure system for optically
transferring pattern onto object
    • 用于将图案光学转印到物体上的曝光系统中的对准装置
    • US5329354A
    • 1994-07-12
    • US872216
    • 1992-04-22
    • Masaki YamamotoKeishi KuboTakeo SatohUshio SangawaHiroyuki Takeuchi
    • Masaki YamamotoKeishi KuboTakeo SatohUshio SangawaHiroyuki Takeuchi
    • G03F7/23G03F9/00G01B9/02G01B11/00
    • G03F9/70
    • An alignment apparatus for use in an exposure system for exposing fine patterns on a wafer, the alignment apparatus comprising a light source optical system for emitting coherent alignment light, a positional deviation detecting optical system for receiving the alignment light reflected from the wafer, and a light-receiving optical system for detecting a positional deviation of the wafer on the basis of the alignment light received by the positional deviation detecting optical system. These three optical systems are arranged to be coupled through flexible optical fibers to each other. This coupling arrangement using the flexible optical fiber can reduce the size of the positional deviation detecting optical system whereby the positional deviation detecting optical system can be disposed directly under a projection lens of the exposure system, thereby accurately effecting the alignment of the wafer with respect to the projection lens.
    • 一种用于曝光系统中用于在晶片上曝光精细图案的对准装置,该对准装置包括用于发射相干对准光的光源光学系统,用于接收从晶片反射的对准光的位置偏差检测光学系统,以及 光接收光学系统,用于基于由位置偏差检测光学系统接收到的对准光检测晶片的位置偏差。 这三个光学系统被布置成通过柔性光纤彼此耦合。 使用柔性光纤的这种耦合布置可以减小位置偏差检测光学系统的尺寸,由此位置偏移检测光学系统可以直接设置在曝光系统的投影透镜下方,从而精确地实现晶片相对于 投影镜头。
    • 2. 发明授权
    • Apparatus and method for measuring flatness of thin plate
    • 测量薄板平整度的装置和方法
    • US06710883B2
    • 2004-03-23
    • US10140883
    • 2002-05-09
    • Keiichi YoshizumiKeishi KuboHiroyuki TakeuchiKouji Handa
    • Keiichi YoshizumiKeishi KuboHiroyuki TakeuchiKouji Handa
    • G01B902
    • G01B11/2441G01B11/306
    • The invention measures a thickness variation at a high accuracy around a wide range of a thin plate by a comparatively large spot diameter between 0.5 mm and 2 mm. A polarization beam splitter separating a laser beam emitted from a laser generator and transmitting through an isolator into a measurement light and a reference light is provided. A quarter wavelength plate is provided between the polarization beam splitter and a measurement surface, and between the polarization beam splitter and a reference surface. A focusing and reflecting means for focusing and reflecting the measurement light reflected by the measurement surface and reflected by the polarization beam splitter, and the reference light reflecting by the reference surface and transmitting through the polarization beam splitter is provided. A half mirror reflecting the measurement light and the reference light which return from the polarization beam splitter is provided. A light receiving portion receiving the measurement light and the reference light which are reflected by the half mirror so as to interfere, converting an interference light intensity change into an electric signal, and counting the electric signal so as to measure a flatness of the measurement surface is provided.
    • 本发明通过0.5mm至2mm之间的较大的光点直径来测量薄板宽范围内的高精度的厚度变化。 提供了将从激光发生器发射的激光束分离并通过隔离器传输到测量光和参考光的偏振分束器。 四分之一波长板设置在偏振分束器和测量表面之间以及偏振分束器与参考表面之间。 提供了用于聚焦和反射由测量表面反射并由偏振分束器反射的测量光以及由参考表面反射并通过偏振分束器透射的参考光的聚焦和反射装置。 提供了反射从偏振分束器返回的测量光和参考光的半反射镜。 接收由半反射镜反射的测量光和参考光的光接收部分,其干涉,将干涉光强度变化转换成电信号,并对电信号进行计数,以便测量测量表面的平坦度 被提供。
    • 6. 发明授权
    • Profilometer and method for measuring, and method for manufacturing object of surface profiling
    • 曲面测量仪和测量方法,以及表面成型对象的制造方法
    • US06763319B2
    • 2004-07-13
    • US10159565
    • 2002-05-31
    • Koji HandaKeiichi YoshizumiKeishi KuboHiroyuki Takeuchi
    • Koji HandaKeiichi YoshizumiKeishi KuboHiroyuki Takeuchi
    • G01B1124
    • G01B5/012
    • A stylus having a curvature radius of 1 mm or less is attached to the extremity of a probe. When the profile of an object is measured with high precision by causing the stylus to follow a measurement surface of the object, a reference ball for calibration is first measured, thereby surface profiling the object. From the measurement data, a contact position where the stylus contacts with the object is determined. A positional error caused by a curvature radius of the stylus is corrected by using an angle of inclination of the measurement surface in that contact position. The amount of profile error in the contact position is extracted by using the profile error data pertaining to the stylus determined by measurement of the reference ball. The amount of profile error is added to the measurement data, thereby correcting the profile error caused by the curvature radius of the stylus.
    • 将具有1mm或更小的曲率半径的触针连接到探针的末端。 当通过使触针跟随对象的测量表面来高精度地测量对象的轮廓时,首先测量用于校准的参考球,从而对对象进行表面轮廓。 从测量数据确定触针与对象接触的接触位置。 通过使用在该接触位置的测量表面的倾斜角来校正由触针的曲率半径引起的位置误差。 通过使用与通过测量参考球确定的触控笔有关的简档误差数据来提取接触位置中的轮廓误差量。 轮廓误差量被添加到测量数据中,从而校正由触针的曲率半径引起的轮廓误差。
    • 7. 发明授权
    • Shape measuring apparatus and method
    • 形状测量装置及方法
    • US6026583A
    • 2000-02-22
    • US988397
    • 1997-12-10
    • Keiichi YoshizumiHiroyuki TakeuchiKeishi KuboYukio ImadaKoji Handa
    • Keiichi YoshizumiHiroyuki TakeuchiKeishi KuboYukio ImadaKoji Handa
    • G01B11/00G01B11/24
    • G01B11/005G01B11/24
    • A shape measuring apparatus includes an object measuring device, a holding base, a reference plane measuring device, and a length measuring unit. The holding base holds an object-to-be-measured on its surface and has a reference plane provided on its back side so that a measured surface of the object and the reference plane can be simultaneously scanned by the object measuring device and the reference plane measuring device, respectively. Therefore, the object and the reference plane can sway integrally with each other, and the accuracy of measurement of the measured surface is not influenced by any moving straightness deviation of the holding base unless any change occurs in relative positions of the reference plane and the measured surface. Therefore, the shape of the measured surface can be measured with the flatness accuracy of the reference plane.
    • 一种形状测量装置,包括物体测量装置,保持基座,基准平面测量装置和长度测量单元。 保持基座在其表面上保持要测量的物体,并且具有设置在其背面的参考平面,使得物体和参考平面的测量表面可以被物体测量装置和参考平面同时扫描 测量装置。 因此,物体和参考平面可以彼此一体摆动,并且测量表面的测量精度不受保持基座的任何移动直线度偏差的影响,除非在参考平面的相对位置和测量的相对位置发生变化 表面。 因此,可以用参考平面的平坦度精度来测量被测表面的形状。
    • 9. 发明授权
    • Method of measuring a minute displacement
    • 测量微小位移的方法
    • US5315373A
    • 1994-05-24
    • US904730
    • 1992-06-26
    • Keishi KuboYoshihiro IkemotoTatsuo Itou
    • Keishi KuboYoshihiro IkemotoTatsuo Itou
    • G01B9/02G01B11/02G01B11/30G01B21/30G01C3/06G01N21/88G01N37/00G01Q20/02G01Q60/24G01Q70/02G01B7/34
    • G01Q20/02B82Y35/00G01B11/026G01B11/303
    • A method for detecting a minute displacement of a probe includes an emission from a light source of two light beams having different polarizing directions. The light beams are subsequently diverged by a first lens so as to pass through a beam splitter towards a separating prism. The light beams having passed through the prism are separated into first and second measuring beams which are subsequently focused by a second lens on first and second, spaced reflecting surfaces. The first and second measuring beams are then reflected by the first and second reflecting surfaces, respectively, so as to enter respective photodetectors after having passed through the separating prism, the beam splitter and a polarizing beam splitter for passing therethrough the first and second measuring beams or reflecting them depending on the polarizing direction of the incoming light. The first and second photodetectors outputs respective signals indicative of the associated positions of foci which are then processed by a signal processing circuit to provide an indication of the minute displacement of the probe.
    • 用于检测探头的微小位移的方法包括来自具有不同偏振方向的两个光束的光源的发射。 光束随后被第一透镜发散,以便穿过分束器朝向分离棱镜。 已经穿过棱镜的光束被分离成第一和第二测量光束,其随后由第二透镜聚焦在第一和第二间隔的反射表面上。 然后第一和第二测量光束分别被第一和第二反射表面反射,以便在穿过分离棱镜,分束器和偏振分束器之后进入相应的光电检测器,用于穿过第一和第二测量光束 或者根据入射光的偏振方向反射它们。 第一和第二光电检测器输出指示相关联的焦点位置的相应信号,然后由信号处理电路对其进行处理,以提供探针的微小位移的指示。
    • 10. 发明授权
    • Minute displacement detector using optical interferometry
    • 使用光学干涉测量的分位移检测器
    • US5164791A
    • 1992-11-17
    • US664623
    • 1991-03-04
    • Keishi KuboTatsuo Itou
    • Keishi KuboTatsuo Itou
    • G01B9/02G01B11/00G01D5/38G01Q10/00G01Q20/02G01Q60/24
    • G01D5/38B82Y35/00G01Q20/02
    • A displacement detector device has a source of laser beam; a diffraction grating for separating the laser beam into a plurality of beam components; a filter for shielding the beam components other than the two beam components of .+-. primary order produced by the diffraction grating; a wavelength plate operable to vary the polarized state of one of the two beam components of .+-. primary order; a lens element for focusing the two beam components of .+-. primary order on a displacement plane and a reference plane, respectively; and a photosensor. The two beam components of .+-. primary order focused on the reference and displacement planes, respectively, are subsequently reflected therefrom and are then collimated by the lens element after having again entered the lens element in substantially overlapped relationship. The two beam components emerging from the lens element are again diffracted by the diffraction grating, and the photosensor detects an interfering component of the beam components of primary order.
    • 位移检测器装置具有激光束源; 用于将激光束分离成多个光束分量的衍射光栅; 用于屏蔽由衍射光栅产生的+/-一级的两个光束分量以外的光束分量的滤光器; 波长板,其可操作以改变+/-一阶的两个光束分量之一的偏振状态; 一个透镜元件,分别用于将+/-一级的两个光束分量聚焦在位移平面和参考平面上; 和光电传感器。 分别聚焦在参考位移平面上的+/-一级的两个光束分量随后从其反射,然后在基本上重叠的关系再次进入透镜元件之后被透镜元件准直。 从透镜元件出射的两个光束分量再次被衍射光栅衍射,并且光电传感器检测一阶光束分量的干扰分量。