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1. 发明授权

US07829871B2 Sheet beam-type testing apparatus 有权
标题翻译：片式梁式试验机
公开(公告)号：US07829871B2
公开(公告)日：2010-11-09
申请号：US12177733
申请日：2008-07-22
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
IPC分类号： H01J40/14 , G02B26/08
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.
摘要翻译：诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器; 具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达正在测试的基底2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及用于在基板2006上显示或存储缺陷位置的控制系统2017。

2. 发明申请

US20100213370A1 Electron Beam Apparatus 有权
标题翻译：电子束装置
公开(公告)号：US20100213370A1
公开(公告)日：2010-08-26
申请号：US11884367
申请日：2006-02-17
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Hirosi Sobukawa
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Hirosi Sobukawa
IPC分类号： H01J37/26 , H01J37/141 , H01J37/147 , G01N23/22 , H01J37/06
CPC分类号： H01J37/244 , G01N23/225 , G02F2001/136254 , H01J37/226 , H01J2237/15 , H01J2237/2482 , H01J2237/2817 , H01L27/146 , H01L27/14601
摘要： The present invention provides an electron beam apparatus which can capture images at high speeds even using an area sensor which senses a small number of frames per second, by deflecting a primary electron beam by a deflector to irradiate each of sub-visual fields which are formed by dividing an evaluation area on a sample surface, and detecting secondary electrons containing information on the sample surface in each of the sub-visual fields by a detecting device. For this purpose, the detecting device 26 of the electron beam apparatus comprises a plurality of unit detectors 24-1 each including an area sensor CCD 1 (˜CCD 14), a bundle of optical fibers 25 having one end coupled to a detection plane of the area sensor, an FOP coated on the other end of the bundle of optical fibers and formed with a scintillator, on which a secondary electron beam emitted from the sub-visual fields are focused. An electromagnetic deflector deflects the secondary electron beam emitted from the sub-visual fields each time the electron beam is irradiated to a next sub-visual field to move the secondary electron beams over the surfaces of the FOPs of the unit detectors. Since image information can be fetched from each unit detector during exposure of the other unit detectors, images can be captured at high speeds.
摘要翻译：本发明提供了一种电子束装置，其即使使用通过偏转器偏转一次电子束来照射形成的每个子视场，也可以高速捕获图像，甚至使用每秒感测少量帧数的区域传感器通过划分样品表面上的评估区域，并且通过检测装置检测在每个子视野中包含样品表面上的信息的二次电子。为此，电子束装置的检测装置26包括多个单元检测器24-1，每个单元检测器24-1包括区域传感器CCD 1（〜CCD 14），一束光纤25，其一端耦合到检测平面区域传感器，涂覆在光纤束的另一端并形成有闪烁体的FOP，其上从副视野发射的二次电子束聚焦。每当电子束照射到下一个副视野时，电磁偏转器偏转从副视野发射的二次电子束，以将二次电子束移动到单位检测器的FOP的表面上。由于在其他单元检测器的曝光期间可以从每个单元检测器获取图像信息，因此可以高速捕获图像。

3. 发明申请

US20090014649A1 ELECTRON BEAM APPARATUS 审中-公开
标题翻译：电子束设备
公开(公告)号：US20090014649A1
公开(公告)日：2009-01-15
申请号：US11909409
申请日：2006-03-22
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toru Kaga , Hirosi Sobukawa , Takeshi Murakami , Tsutomu Karimata
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toru Kaga , Hirosi Sobukawa , Takeshi Murakami , Tsutomu Karimata
IPC分类号： G01N23/00
CPC分类号： H01J37/153 , H01J37/26 , H01J2237/1534 , H01J2237/2446 , H01J2237/28
摘要： Secondary electrons emitted from a sample (W) by an electron beam irradiation is deflected by a beam separator (77), and is deflected again in a perpendicular direction by an aberration correction electrostatic deflector (711) to form a magnified image on the principal plane of an auxiliary lens (712). The secondary electron beam diverged from the auxiliary lens (712) passes through axial chromatic aberration correction lenses (714-717) and images on a principal plane of an auxiliary lens (718) for a magnifying lens (719). The magnified image is formed in a position spaced apart from the optical axis. Therefore, when the secondary electron beam diverged from the auxiliary lens (712) is incident on the axial chromatic aberration correction lenses without any change, large abaxial aberration occurs. To avoid it, the auxiliary lens (712) is used to form the image of an NA aperture (724) in substantially a middle (723) in the light axis direction of the axial chromatic aberration correction lenses (714-717).
摘要翻译：通过电子束照射从样品（W）发射的二次电子被光束分离器（77）偏转，并通过像差校正静电偏转器（711）在垂直方向上再次偏转，以在主平面上形成放大图像的辅助透镜（712）。从辅助透镜（712）发散的二次电子束通过轴向色差校正透镜（714-717）和用于放大透镜（719）的辅助透镜（718）的主平面上的图像。放大图像形成在与光轴间隔开的位置。因此，当从辅助透镜（712）发散的二次电子束没有任何变化地入射到轴向色像差校正透镜时，发生大的背轴像差。为了避免这种情况，辅助透镜（712）用于在轴向色像差校正透镜（714-717）的光轴方向上形成基本上中间（723）中的NA孔径（724）的图像。

4. 发明授权

US07423267B2 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 失效
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US07423267B2
公开(公告)日：2008-09-09
申请号：US11528673
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： G01N23/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

5. 发明授权

US07417236B2 Sheet beam-type testing apparatus 有权
标题翻译：片式梁式试验机
公开(公告)号：US07417236B2
公开(公告)日：2008-08-26
申请号：US11360704
申请日：2006-02-24
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
IPC分类号： H01J37/20
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.
摘要翻译：诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器; 具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达正在测试的基底2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及用于在基板2006上显示或存储缺陷位置的控制系统2017。

6. 发明申请

US20080173815A1 Electron beam apparatus and device production method using the electron beam apparatus 审中-公开
公开(公告)号：US20080173815A1
公开(公告)日：2008-07-24
申请号：US12068589
申请日：2008-02-08
申请人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
发明人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： G01N23/00
CPC分类号： H01J37/20 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.

7. 发明授权

US07241993B2 Inspection system by charged particle beam and method of manufacturing devices using the system 失效
标题翻译：带电粒子束的检测系统及使用该系统的制造装置的方法
公开(公告)号：US07241993B2
公开(公告)日：2007-07-10
申请号：US09891511
申请日：2001-06-27
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Toshifumi Kimba , Hirosi Sobukawa , Shoji Yoshikawa , Takeshi Murakami , Kenji Watanabe , Tsutomu Karimata , Shin Oowada , Mutsumi Saito , Yuichiro Yamazaki , Takamitsu Nagai , Ichirota Nagahama
IPC分类号： H01J37/28
CPC分类号： H01J29/70 , G01N23/225 , G01N23/2251 , G01N23/227 , H01J37/06 , H01J37/073 , H01J37/141 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/266 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817 , H01L21/6719 , H01L21/67213
摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.
摘要翻译：电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器，光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。

8. 发明授权

US07109484B2 Sheet beam-type inspection apparatus 有权
标题翻译：片状梁型检查装置
公开(公告)号：US07109484B2
公开(公告)日：2006-09-19
申请号：US10989368
申请日：2004-11-17
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Hirosi Sobukawa , Tsutomu Karimata , Shin Oowada , Shoji Yoshikawa , Mutsumi Saito
IPC分类号： H01J37/28 , G01N23/22
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system. Specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.
摘要翻译：诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器。具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达待测基板2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及用于在基板2006上显示或存储缺陷位置的控制系统2017。

9. 发明申请

US20060118719A1 Electron beam inspection system and inspection method and method of manufacturing devices using the system 有权
公开(公告)号：US20060118719A1
公开(公告)日：2006-06-08
申请号：US11290688
申请日：2005-12-01
申请人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
发明人： Kenji Watanabe , Hirosi Sobukawa , Nobuharu Noji , Tohru Satake , Shoji Yoshikawa , Tsutomu Karimata , Mamoru Nakasuji , Masahiro Hatakeyama , Takeshi Murakami , Yuichiro Yamazaki , Ichirota Nagahama , Takamitsu Nagai , Kazuyoshi Sugihara
IPC分类号： G21K7/00
CPC分类号： H01J37/28 , H01J37/224 , H01J37/244 , H01J2237/006 , H01J2237/20221 , H01J2237/2445 , H01J2237/2817
摘要： An electron beam inspection system of the image projection type includes a primary electron optical system for shaping an electron beam emitted from an electron gun into a rectangular configuration and applying the shaped electron beam to a sample surface to be inspected. A secondary electron optical system converges secondary electrons emitted from the sample. A detector converts the converged secondary electrons into an optical image through a fluorescent screen and focuses the image to a line sensor. A controller controls the charge transfer time of the line sensor at which the picked-up line image is transferred between each pair of adjacent pixel rows provided in the line sensor in association with the moving speed of a stage for moving the sample.

10. 发明申请

US20080121804A1 Method for inspecting substrate, substrate inspecting system and electron 审中-公开
标题翻译：检查基板，基板检查系统和电子的方法
公开(公告)号：US20080121804A1
公开(公告)日：2008-05-29
申请号：US12000126
申请日：2007-12-10
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Masahiro Hatakeyama , Kenji Watanabe , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Toshifumi Kimba , Masahiro Hatakeyama , Kenji Watanabe , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： H01J37/285
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention relates to a substrate inspection apparatus for inspecting a pattern formed on a substrate by irradiating a charged particle beam onto the substrate. The substrate inspection apparatus comprises: an electron beam apparatus including a charged particle beam source for emitting a charged particle beam, a primary optical system for irradiating the charged particle beam onto the substrate, a secondary optical system into which a secondary charged particle beam is introduced, the secondary charged particle beam being emitted from the substrate by an irradiation of the charged particle beam, a detection system for detecting the secondary charged particle beam introduced into said secondary optical system and outputting as an electric signal, and a process control system for processing and evaluating the electric signal; a stage unit for holding the substrate and moving the substrate relatively to said electron beam apparatus; a working chamber capable of shielding at least an upper region of the stage unit form outside to control under desired atmosphere; and a substrate load-unload mechanism for transferring the substrate into or out of the stage.
摘要翻译：本发明涉及一种基板检查装置，用于通过将带电粒子束照射到基板上来检查形成在基板上的图案。基板检查装置包括：电子束装置，其包括用于发射带电粒子束的带电粒子束源，用于将带电粒子束照射到基板上的主光学系统，引入二次带电粒子束的二次光学系统通过照射带电粒子束从基板发射的二次带电粒子束，用于检测引入到所述二次光学系统中并输出作为电信号的二次带电粒子束的检测系统和用于处理的过程控制系统并评估电信号; 用于保持基板并相对于所述电子束装置移动基板的载物台单元; 能够至少屏蔽舞台单元的上部区域的工作室形成外部以在期望的气氛下进行控制; 以及用于将衬底转移到或离开工作台的衬底装载 - 卸载机构。

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