专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06415421B1 Integrated verification and manufacturability tool 有权
公开(公告)号：US06415421B1
公开(公告)日：2002-07-02
申请号：US09747190
申请日：2000-12-22
申请人： Leigh C. Anderson , Nicolas B. Cobb , Laurence W. Grodd , Emile Sahouria , Siqiong You
发明人： Leigh C. Anderson , Nicolas B. Cobb , Laurence W. Grodd , Emile Sahouria , Siqiong You
IPC分类号： G06F1750
摘要： An integrated verification and manufacturability tool provides more efficient verification of integrated device designs than verification using several different verification tools. The integrated verification and manufacturability includes a hierarchical database to store shared design data accessed by multiple verification tool components (e.g., layout versus schematic, design rule check, optical process correction, phase shift mask assignment and machine language conversion). The hierarchical database includes representations of one or more additional, or intermediate layer structures that are created and used by the verification tool components for operations performed on the design being verified. Use of a single hierarchical database having shared data for access and use by multiple verification components streamlines the verification process, which provides an improved verification tool.

2. 发明授权

US07017141B2 Integrated verification and manufacturability tool 有权
公开(公告)号：US07017141B2
公开(公告)日：2006-03-21
申请号：US10112223
申请日：2002-03-27
申请人： Leigh C. Anderson , Nicolas B. Cobb , Laurence W. Grodd , Emile Sahouria , Siqiong You
发明人： Leigh C. Anderson , Nicolas B. Cobb , Laurence W. Grodd , Emile Sahouria , Siqiong You
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/26
摘要： An integrated verification and manufacturability tool provides more efficient verification of integrated device designs than verification using several different verification tools. The integrated verification and manufacturability includes a hierarchical database to store shared design data accessed by multiple verification tool components (e.g., layout versus schematic, design rule check, optical process correction, phase shift mask assignment and machine language conversion). The hierarchical database includes representations of one or more additional, or intermediate layer structures that are created and used by the verification tool components for operations performed on the design being verified. Use of a single hierarchical database having shared data for access and use by multiple verification components streamlines the verification process, which provides an improved verification tool.

3. 发明授权

US06668367B2 Selective promotion for resolution enhancement techniques 有权
公开(公告)号：US06668367B2
公开(公告)日：2003-12-23
申请号：US10057309
申请日：2002-01-24
申请人： Nicolas B. Cobb , Laurence W. Grodd , George P. Lippincott , Emile Sahouria
发明人： Nicolas B. Cobb , Laurence W. Grodd , George P. Lippincott , Emile Sahouria
IPC分类号： G06F1750
CPC分类号： G03F1/36
摘要： A tool for optimizing the layout of a microdevice adds fragmentation points to polygons in a first hierarchical database layer in a manner suitable for application of a tool to apply a resolution enhancement technique (RET) such as optical and process correction (OPC). Portions of polygons in a database level that interact with polygons of a second level in the database are promoted to the second database level, and refragmented. The RET operates on the polygons of the first and second levels of the database to determine how polygons of each of the first and second levels should be adjusted, if necessary, such that the layout is optimized.

4. 发明授权

US07240321B2 Selective promotion for resolution enhancement techniques 有权
标题翻译：选择性推广分辨率增强技术
公开(公告)号：US07240321B2
公开(公告)日：2007-07-03
申请号：US10730765
申请日：2003-12-08
申请人： Nicolas B. Cobb , Laurence W. Grodd , George P. Lippincott , Emile Sahouria
发明人： Nicolas B. Cobb , Laurence W. Grodd , George P. Lippincott , Emile Sahouria
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A tool for optimizing the layout of a microdevice adds fragmentation points to polygons in a first hierarchical database layer in a manner suitable for application of a tool to apply a resolution enhancement technique (RET) such as optical and process correction (OPC). Portions of polygons in a database level that interact with polygons of a second level in the database are promoted to the second database level, and refragmented. The RET operates on the polygons of the first and second levels of the database to determine how polygons of each of the first and second levels should be adjusted, if necessary, such that the layout is optimized.
摘要翻译：用于优化微设备的布局的工具以适于应用工具以应用诸如光学和过程校正（OPC）的分辨率增强技术（RET）的方式向第一分层数据库层中的多边形添加碎片点。与数据库中第二级多边形交互的数据库级别中的多边形部分将升级到第二个数据库级别，并进行重新碎片整理。 RET对数据库的第一和第二级别的多边形进行操作，以确定如果需要，如何调整第一级和第二级中的每一级的多边形，使得布局被优化。

5. 发明授权

US06301697B1 Streamlined IC mask layout optical and process correction through correction reuse 有权
标题翻译：流线型IC掩模布局光学和过程校正通过校正重用
公开(公告)号：US06301697B1
公开(公告)日：2001-10-09
申请号：US09302561
申请日：1999-04-30
申请人： Nicolas B. Cobb
发明人： Nicolas B. Cobb
IPC分类号： G06F760
CPC分类号： G03F7/70441 , G03F1/36
摘要： An EDA tool is provided with an OPC module that performs optical and/or process pre-compensations on an IC mask layout in a streamlined manner, reusing determined corrections for a first area on a second area, when the second area is determined to be equivalent to the first area for OPC purposes. The OPC module performs the correction on the IC mask layout on an area-by-area basis, and the corrections are determined iteratively using model-based simulations, which in one embodiment, include resist model-based simulations as well as optical model-based simulations.
摘要翻译： EDA工具具有OPC模块，其以流线型的方式对IC掩模布局进行光学和/或处理预补偿，当第二区域被确定为等效时，对第二区域上的第一区域重新进行确定的校正到OPC目的的第一个区域。 OPC模块在逐个区域的基础上对IC掩模布局进行校正，并且使用基于模型的模拟来迭代地确定校正，在一个实施例中，该模拟包括基于抗模型的模拟以及基于光学模型的模拟模拟。

6. 发明授权

US07073162B2 Site control for OPC 有权
标题翻译： OPC的现场控制
公开(公告)号：US07073162B2
公开(公告)日：2006-07-04
申请号：US10698596
申请日：2003-10-31
申请人： Nicolas B. Cobb , Eugene Miloslavsky
发明人： Nicolas B. Cobb , Eugene Miloslavsky
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A method for processing objects to be created via photolithography. Each object to be created is defined as a polygon that is fragmented into a number of edge segments that extend around the perimeter of the polygon. At least some of the edge segments have an associated control site where the edge placement error for the edge segment is to be minimal. A smoothing filter is applied to the polygon to identify those control sites that may cause an OPC tool to produce erroneous results. The identified control sites are moved and/or eliminated from the polygon, and polygon and the adjusted control sites are supplied to an OPC tool.
摘要翻译：一种用于处理通过光刻创建的物体的方法。要创建的每个对象被定义为多边形，该多边形被分割成围绕多边形的周边延伸的多个边缘段。至少一些边缘段具有关联的控制位置，其中边缘段的边缘放置误差将是最小的。平滑滤波器应用于多边形，以识别可能导致OPC工具产生错误结果的那些控制站点。所识别的控制站点从多边形移动和/或移除，并且将多边形和调整后的控制位置提供给OPC工具。

7. 发明授权

US07024655B2 Mixed-mode optical proximity correction 有权
标题翻译：混合模式光学邻近校正
公开(公告)号：US07024655B2
公开(公告)日：2006-04-04
申请号：US10202039
申请日：2002-07-23
申请人： Nicolas B. Cobb
发明人： Nicolas B. Cobb
IPC分类号： G06F17/50
CPC分类号： G03F7/70541 , G03F1/36 , G03F7/70441
摘要： A mask is prepared by processing design data with various combinations of rule-based and model-based optical proximity correction. In one embodiment, the design data is first processed with a set of optical proximity correction rules to produce a rule-corrected design. The rule-corrected design is examined to identify a set of features to process with model-based optical proximity correction. Then, the set of features are processed with the model-based optical proximity correction.
摘要翻译：通过基于规则和基于模型的光学邻近校正的各种组合处理设计数据来准备掩模。在一个实施例中，首先用一组光学邻近校正规则处理设计数据，以产生规则校正的设计。检查规则校正的设计，以识别一组要基于模型的光学邻近校正进行处理的特征。然后，使用基于模型的光学邻近校正来处理该组特征。

8. 发明申请

US20110161894A1 FRAGMENTATION POINT AND SIMULATION SITE ADJUSTMENT FOR RESOLUTION ENHANCEMENT TECHNIQUES 有权
标题翻译：分辨率增强技术的分解点和模拟场址调整
公开(公告)号：US20110161894A1
公开(公告)日：2011-06-30
申请号：US12972097
申请日：2010-12-17
申请人： James Word , Nicolas B. Cobb , Patrick J. LaCour
发明人： James Word , Nicolas B. Cobb , Patrick J. LaCour
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/70 , G06F17/5009 , G06F17/5072 , G06F2217/12 , Y02P90/265
摘要： A method of performing a resolution enhancement technique such as OPC on an initial layout description involves fragmenting a polygon that represents a feature to be created into a number of edge fragments. One or more of the edge fragments is assigned an initial simulation site at which the image intensity is calculated. Upon calculation of the image intensity, the position and/or number of initial simulation sites is varied. New calculations are made of the image intensity with the revised placement or number of simulation sites in order to calculate an OPC correction for the edge fragment. In other embodiments, fragmentation of a polygon is adjusted based on the image intensities calculated at the simulation sites. In one embodiment, the image intensity gradient vector calculated at the initial simulation sites is used to adjust the simulation sites and/or fragmentation of the polygon.
摘要翻译：在初始布局描述上执行诸如OPC的分辨率增强技术的方法涉及将表示要创建的特征的多边形分段成多个边缘片段。一个或多个边缘片段被分配有计算图像强度的初始模拟位置。在计算图像强度时，初始模拟位置的位置和/或数量是变化的。通过修改的位置或模拟位置数量对图像强度进行新的计算，以计算边缘片段的OPC校正。在其他实施例中，基于在模拟位置处计算的图像强度来调整多边形的碎裂。在一个实施例中，使用在初始模拟位置处计算的图像强度梯度矢量来调整多边形的模拟位置和/或碎片。

9. 发明授权

US07926002B2 Selective optical proximity layout design data correction 有权
标题翻译：选择性光学邻近布局设计数据校正
公开(公告)号：US07926002B2
公开(公告)日：2011-04-12
申请号：US12039720
申请日：2008-02-28
申请人： James C. Word , Dragos S. Dudau , Nicolas B. Cobb
发明人： James C. Word , Dragos S. Dudau , Nicolas B. Cobb
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： After layout design data has been modified using an OPC process, a repair flow is initiated. This repair flow includes analyzing the modified data to identify any remaining or new potential print errors in the layout data. Regions then are formed around the identified potential print errors, and a subsequent OPC process is performed only on the data within these regions using a different set of process parameters from the process parameters employed by the initial OPC process. This repair flow is iteratively repeated, where a different set of process parameter values for the subsequent OPC process is used during each iteration.
摘要翻译：在使用OPC过程修改布局设计数据之后，启动修复流程。该修复流程包括分析修改的数据以识别布局数据中的任何剩余或新的潜在打印错误。然后围绕所识别的潜在打印错误形成区域，并且仅使用来自这些区域内的数据的后续OPC处理，使用来自初始OPC过程采用的处理参数的不同的一组过程参数。迭代地重复该修复流程，其中在每次迭代期间使用用于随后的OPC过程的不同的一组过程参数值。

10. 发明授权

US07324930B2 Method and apparatus for performing OPC using model curvature 有权
标题翻译：使用模型曲率执行OPC的方法和装置
公开(公告)号：US07324930B2
公开(公告)日：2008-01-29
申请号：US10696276
申请日：2003-10-29
申请人： Nicolas B. Cobb
发明人： Nicolas B. Cobb
IPC分类号： G06G7/62 , G06F17/50 , G03F1/00
CPC分类号： G03F7/70441 , G03F1/36
摘要： A method of preparing a file that stores layout of devices to be created with photolithography for optical and process correction (OPC). Polygons that define structures to be created are initially fragmented into edge segments and a simulation of how the edge segments will be printed under process conditions is performed. The results of the simulation are used to adjust/refragment the edge segments. In one embodiment, the curvature of light intensity at the edge segments is used to adjust the fragmentation of the polygons.
摘要翻译：一种准备文件的方法，该文件存储用于光学和过程校正（OPC）的用于光刻的要创建的设备的布局。定义要创建的结构的多边形最初被分割成边缘段，并且进行如何在工艺条件下打印边缘段的模拟。模拟结果用于调整/重新组合边缘段。在一个实施例中，边缘片段处的光强度的曲率用于调整多边形的碎片。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式