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    • 7. 发明申请
    • SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
    • 半导体器件及其制造方法
    • US20090321902A1
    • 2009-12-31
    • US12555832
    • 2009-09-09
    • Hidekazu TakahashiDaiki YamadaKyosuke ItoEiji SugiyamaYoshitaka Dozen
    • Hidekazu TakahashiDaiki YamadaKyosuke ItoEiji SugiyamaYoshitaka Dozen
    • H01L23/552
    • H01L23/66H01L23/49855H01L2924/0002H01L2924/00
    • The semiconductor device of the invention includes a transistor, an insulating layer provided over the transistor, a first conductive layer (corresponding to a source wire or a drain wire) electrically connected to a source region or a drain region of the transistor through an opening portion provided in the insulating layer, a first resin layer provided over the insulating layer and the first conductive layer, a layer containing conductive particles which is electrically connected to the first conductive layer through an opening portion provided in the first resin layer, and a substrate provided with a second resin layer and a second conductive layer serving as an antenna. In the semiconductor device having the above-described structure, the second conductive layer is electrically connected to the first conductive layer with the layer containing conductive particles interposed therebetween. In addition, the second resin layer is provided over the first resin layer.
    • 本发明的半导体器件包括晶体管,设置在晶体管上的绝缘层,通过开口部分电连接到晶体管的源极区域或漏极区域的第一导电层(对应于源极线或漏极线) 设置在所述绝缘层中的第一树脂层,设置在所述绝缘层和所述第一导电层上的第一树脂层,包含通过设置在所述第一树脂层中的开口部与所述第一导电层电连接的导电粒子的层和设置在所述第一树脂层上的基板 具有第二树脂层和用作天线的第二导电层。 在具有上述结构的半导体器件中,第二导电层与第一导电层电连接,其间含有导电粒子的层。 此外,第二树脂层设置在第一树脂层上。
    • 8. 发明授权
    • Method of manufacturing a semiconductor device including separation by physical force
    • 制造半导体器件的方法,包括通过物理力分离
    • US07605056B2
    • 2009-10-20
    • US11436090
    • 2006-05-18
    • Hidekazu TakahashiDaiki YamadaKyosuke ItoEiji SugiyamaYoshitaka Dozen
    • Hidekazu TakahashiDaiki YamadaKyosuke ItoEiji SugiyamaYoshitaka Dozen
    • H01L23/48
    • H01L23/66H01L23/49855H01L2924/0002H01L2924/00
    • The semiconductor device of the invention includes a transistor, an insulating layer provided over the transistor, a first conductive layer (corresponding to a source wire or a drain wire) electrically connected to a source region or a drain region of the transistor through an opening portion provided in the insulating layer, a first resin layer provided over the insulating layer and the first conductive layer, a layer containing conductive particles which is electrically connected to the first conductive layer through an opening portion provided in the first resin layer, and a substrate provided with a second resin layer and a second conductive layer serving as an antenna. In the semiconductor device having the above-described structure, the second conductive layer is electrically connected to the first conductive layer with the layer containing conductive particles interposed therebetween. In addition, the second resin layer is provided over the first resin layer.
    • 本发明的半导体器件包括晶体管,设置在晶体管上的绝缘层,通过开口部分电连接到晶体管的源极区域或漏极区域的第一导电层(对应于源极线或漏极线) 设置在所述绝缘层中的第一树脂层,设置在所述绝缘层和所述第一导电层上的第一树脂层,包含通过设置在所述第一树脂层中的开口部与所述第一导电层电连接的导电粒子的层和设置在所述第一树脂层上的基板 具有第二树脂层和用作天线的第二导电层。 在具有上述结构的半导体器件中,第二导电层与第一导电层电连接,其间含有导电粒子的层。 此外,第二树脂层设置在第一树脂层上。
    • 9. 发明授权
    • Method for manufacturing semiconductor device
    • 制造半导体器件的方法
    • US07354801B2
    • 2008-04-08
    • US11229497
    • 2005-09-20
    • Eiji SugiyamaKyosuke Ito
    • Eiji SugiyamaKyosuke Ito
    • H01L21/44
    • H01L27/1266H01L21/7806H01L27/1214
    • In the case where an integrated circuit formed of a thin film is formed over a substrate and peeled from the substrate, a fissure (also referred to as crack) is generated in the integrated circuit in some cases. The present invention is to restrain the generation of a fissure by fixing the proceeding direction of etching in one direction to make a peeled layer warp in one direction in accordance with the proceeding of etching. For example, the proceeding of etching can be controlled by utilizing the fact that a portion where a substrate is in contact with a base insulating layer is not etched in the case of patterning a peeling layer provided over the substrate, then forming the base insulating layer, and then fixing a peeled layer by the portion where the substrate is in contact with the base insulating layer.
    • 在由薄膜形成的集成电路形成在基板上并从基板剥离的情况下,在某些情况下,在集成电路中产生裂缝(也称为裂纹)。 本发明是通过在一个方向上固定前进方向的蚀刻来抑制裂缝的产生,以便根据蚀刻的进行使剥离层在一个方向上翘曲。 例如,可以通过利用以下事实来控制蚀刻的进行:在图案化设置在基板上的剥离层的情况下,基板与基底绝缘层接触的部分不被蚀刻,然后形成基底绝缘层 ,然后通过基板与基底绝缘层接触的部分固定剥离层。