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1. 发明授权

US06947519B2 X-ray exposure apparatus and method, semiconductor manufacturing apparatus, and microstructure 失效
标题翻译： X射线曝光装置和方法，半导体制造装置和微结构
公开(公告)号：US06947519B2
公开(公告)日：2005-09-20
申请号：US09951456
申请日：2001-09-14
申请人： Kenji Itoga , Shunichi Uzawa , Yutaka Watanabe , Toyoki Kitayama
发明人： Kenji Itoga , Shunichi Uzawa , Yutaka Watanabe , Toyoki Kitayama
IPC分类号： G03F1/22 , G03F7/20 , G21K1/06 , G21K1/10 , G21K5/02 , G21K5/04 , H01L21/027 , H05H13/04 , G21K5/00
CPC分类号： G21K1/10 , G03F7/70008 , G03F7/70191 , G03F7/70941 , G21K1/06
摘要： An X-ray exposure apparatus extracts exposure X-rays from light called synchrotron radiation from a synchrotron radiation source by an optical path including an X-ray mirror and performs exposure using the extracted X-rays. The X-ray mirror contains a material having an absorption edge in at least one of a wavelength range of less than 0.45 nm and a wavelength range exceeding 0.7 nm, thereby implementing exposure using the X-ray in the range of 0.45 nm to 0.7 nm. The X-ray mirror contains at least one material selected from the group consisting of iron, cobalt, nickel, copper, manganese, chromium, and their alloys, nitrides, carbides, and borides.
摘要翻译： X射线曝光装置通过包括X射线反射镜的光路从同步加速器辐射源的称为同步加速器辐射的光提取曝光X射线，并使用所提取的X射线进行曝光。 X射线镜含有在波长范围小于0.45nm，波长范围超过0.7nm的吸收边缘的材料，从而使用在0.45nm〜0.7nm的范围内的X射线进行曝光。 X射线镜包含选自铁，钴，镍，铜，锰，铬及其合金，氮化物，碳化物和硼化物中的至少一种材料。

2. 发明授权

US06947518B2 X-ray exposure apparatus, X-ray exposure method, X-ray mask, X-ray mirror, synchrotron radiation apparatus, synchrotron radiation method and semiconductor device 失效
标题翻译： X射线曝光装置，X射线曝光方法，X射线掩模，X射线镜，同步加速器辐射装置，同步辐射法和半导体装置
公开(公告)号：US06947518B2
公开(公告)日：2005-09-20
申请号：US09769490
申请日：2001-01-26
申请人： Kenji Itoga , Toyoki Kitayama , Yutaka Watanabe , Shunichi Uzawa
发明人： Kenji Itoga , Toyoki Kitayama , Yutaka Watanabe , Shunichi Uzawa
IPC分类号： G21K5/02 , G03F7/20 , G21K1/06 , G21K1/10 , G21K5/04 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/708 , G21K1/06 , G21K1/10 , G21K5/04
摘要： An X-ray exposure apparatus comprises an X-ray mirror containing a material having an absorption edge only in at least either one of a wavelength region of less than 0.45 nm and a wavelength region exceeding 0.7 nm as to X-rays.
摘要翻译： X射线曝光装置包括仅在波长小于0.45nm的波长区域和与X射线相比超过0.7nm的波长区域中具有吸收边缘的材料的X射线镜。

3. 发明授权

US06735275B2 X-ray exposure method, x-ray exposure apparatus, fine structure and semiconductor device 失效
标题翻译： X射线曝光方法，x射线曝光装置，精细结构和半导体装置
公开(公告)号：US06735275B2
公开(公告)日：2004-05-11
申请号：US10140066
申请日：2002-05-08
申请人： Kenji Itoga , Toyoki Kitayama
发明人： Kenji Itoga , Toyoki Kitayama
IPC分类号： H01L2130
CPC分类号： G03F7/70141 , G03F7/702 , G21K1/10
摘要： An X-ray exposure method and an X-ray exposure apparatus using exposure X-rays having short wavelengths for formation of a fine pattern in X-ray lithography and suppressing fogging due to secondary electrons from a substrate bearing a resin film. The X-ray exposure method includes forming, by coating, a resist film on a substrate made of a material having an absorption-edge in or near an illumination wavelength range; and illuminating the resist film with X-rays having a wavelength range, including the absorption-edge wavelength, through an X-ray mask. The X-ray intensity is reduced in the wavelength range of an absorption spectrum including the absorption-edge of the material of the substrate in an optical path leading to the substrate.
摘要翻译： X射线曝光方法和X射线曝光装置，其使用在X射线光刻中形成微细图案的具有短波长的曝光X射线，并抑制由于带有树脂膜的基板引起的二次电子的起雾。 X射线曝光方法包括通过在由照射波长范围内或附近具有吸收边缘的材料制成的基板上涂布抗蚀剂膜，并通过X射线掩模对具有包括吸收边缘波长在内的波长范围的X射线照射抗蚀剂膜。在包括通向基板的光路中的基板的材料的吸收边缘的吸收光谱的波长范围内，X射线强度降低。

4. 发明授权

US08348490B2 Planar light source device and method of manufacturing divided prism mold 有权
标题翻译：平面光源装置及分割棱镜模具的制造方法
公开(公告)号：US08348490B2
公开(公告)日：2013-01-08
申请号：US12919382
申请日：2009-02-19
申请人： Akimasa Yuuki , Kenji Itoga , Naoko Iwasaki , Suguru Nagae
发明人： Akimasa Yuuki , Kenji Itoga , Naoko Iwasaki , Suguru Nagae
IPC分类号： F21V7/04
CPC分类号： G02B6/0036 , G02B6/0038 , G02B6/0053 , G02F1/133615
摘要： A planar light source device capable of increasing light use efficiency and preventing color breakup without using any reflection polarizing plate nor performing multiple reflection. The planar light source device includes a planar light guide plate, light sources arranged as to be opposed to end surfaces of the light guide plate on its both sides, and a divided prism formed in a back surface inside the light guide plate and that reflects light incident upon the light guide plate from the light sources toward a front surface side of the light guide plate. The divided prism includes a prism portion and a dividing portion both of which have a width equal to or less than the wavelength of light from the light sources and is formed with the prism portion and the dividing portion alternately repeated along a direction parallel to the end surfaces of the light guide plate which are opposed to the light sources.
摘要翻译：一种平面光源装置，能够提高光的使用效率，防止在不使用反射偏光板的情况下分色，也不进行多次反射。平面光源装置包括平面导光板，被布置成与导光板的两侧的端面相对的光源和形成在导光板内部的背面的分割棱镜，并且反射光在导光板上从光源入射到导光板的前表面侧。分割棱镜包括棱镜部分和分隔部分，两者均具有等于或小于来自光源的光的波长的宽度，并且形成有棱镜部分和分割部分沿着平行于端部的方向交替重复导光板的与光源相对的表面。

5. 发明授权

US5155651A Levitator with rotation control 失效
标题翻译：悬臂旋转控制
公开(公告)号：US5155651A
公开(公告)日：1992-10-13
申请号：US815837
申请日：1991-12-30
申请人： Shinichi Yoda , Kenji Itoga , Souichiro Okuda , Kazunori Ikegami
发明人： Shinichi Yoda , Kenji Itoga , Souichiro Okuda , Kazunori Ikegami
IPC分类号： B64G1/22 , G05D3/12
CPC分类号： B64G1/22 , G05D3/12
摘要： A levitator which is mounted on a space station; for example, for use in material science experiments in space. The levitator has a position detector for detecting the position of a sample, a variable power supply whose output voltage varies in accordance with the signal output from the position detector, a pair of planar electrodes connected to two ends, respectively, of the variable power supply and disposed in opposing relation to each other, and a ring electrode disposed so as to surround each of the planar electrodes and to which is applied a higher voltage than that applied to the corresponding planar electrode from a DC power supply, thereby holding the sample stationary at a desired position by means of the planar and ring electrodes. The levitator further has a means for rotating the sample being held stationary. Thus, it is possible to rotate the sample in a controlled manner and hence possible to carry out an experiment in which the sample is uniformly heated in a microgravity environment.
摘要翻译：安装在空间站上的升降机; 例如，用于空间材料科学实验。升降器具有位置检测器，用于检测样品的位置，输出电压根据从位置检测器输出的信号而变化的可变电源，连接到可变电源的两端的一对平面电极并且彼此相对设置，并且设置成围绕每个平面电极设置的环形电极，并且施加比从直流电源施加到相应的平面电极的电压更高的电压，从而保持样品静止通过平面和环形电极在期望的位置。升降器还具有用于使保持静止的样品旋转的装置。因此，可以以受控的方式旋转样品，因此可以进行在微重力环境中样品被均匀加热的实验。

6. 发明申请

US20110002142A1 FLAT SURFACE LIGHT SOURCE DEVICE AND METHOD FOR MANUFACTURING METALLIC MOLD FOR DIVIDING PRISM 有权
标题翻译：平面光源装置及制造金属模具的分类方法
公开(公告)号：US20110002142A1
公开(公告)日：2011-01-06
申请号：US12919382
申请日：2009-02-19
申请人： Akimasa Yuuki , Kenji Itoga , Naoko Iwasaki , Suguru Nagae
发明人： Akimasa Yuuki , Kenji Itoga , Naoko Iwasaki , Suguru Nagae
IPC分类号： F21V7/22 , B29D11/00
CPC分类号： G02B6/0036 , G02B6/0038 , G02B6/0053 , G02F1/133615
摘要： A planar light source device capable of increasing light use efficiency and preventing color breakup without using any reflection polarizing plate nor performing multiple reflection. The planar light source device includes a planar light guide plate, light sources arranged as to be opposed to end surfaces of the light guide plate on its both sides, and a divided prism formed in a back surface inside the light guide plate and that reflects light incident upon the light guide plate from the light sources toward a front surface side of the light guide plate. The divided prism includes a prism portion and a dividing portion both of which have a width equal to or less than the wavelength of light from the light sources and is formed with the prism portion and the dividing portion alternately repeated along a direction parallel to the end surfaces of the light guide plate which are opposed to the light sources.
摘要翻译：一种平面光源装置，能够提高光的使用效率，防止在不使用反射偏光板的情况下分色，也不进行多次反射。平面光源装置包括平面导光板，被布置成与导光板的两侧的端面相对的光源和形成在导光板内部的背面的分割棱镜，并且反射光在导光板上从光源入射到导光板的前表面侧。分割棱镜包括棱镜部分和分隔部分，两者均具有等于或小于来自光源的光的波长的宽度，并且形成有棱镜部分和分割部分沿着平行于端部的方向交替重复导光板的与光源相对的表面。

7. 发明申请

US20050074676A1 Method of fabricating X-ray mask and method of fabricating semiconductor device with X-ray mask fabricated by this method 失效
标题翻译：制造X射线掩模的方法和通过该方法制造的具有X射线掩模的半导体器件的制造方法
公开(公告)号：US20050074676A1
公开(公告)日：2005-04-07
申请号：US10627611
申请日：2003-07-28
申请人： Hiroshi Watanabe , Koji Kise , Kenji Itoga
发明人： Hiroshi Watanabe , Koji Kise , Kenji Itoga
IPC分类号： C23C16/00 , C23C16/26 , G03F1/22 , G03F1/54 , G03F7/00 , G03F9/00 , G21K5/00 , H01L21/027
CPC分类号： G03F1/22
摘要： In fabricating an X-ray mask, a chromium oxide film serving as an etching stopper is formed on a diamond film serving as an X-ray transmitter. Then, a diamond layer serving as a first X-ray absorber is formed on the chromium oxide film. Thereafter, a tungsten layer serving as a second X-ray absorber is formed on the diamond layer. Consequently, the diamond layer and the tungsten layer form an X-ray absorber having a laminated structure. When the X-ray absorber has a laminated structure including substances having different compositions, the transmittance and the phase shift quantity of the overall X-ray absorber can be readily adjusted. Thus, a method of fabricating an X-ray mask providing improved resolution of the pattern of a semiconductor device or the like is obtained.
摘要翻译：在制造X射线掩模时，在用作X射线发射器的金刚石膜上形成用作蚀刻阻挡层的氧化铬膜。然后，在氧化铬膜上形成用作第一X射线吸收体的金刚石层。此后，在金刚石层上形成用作第二X射线吸收体的钨层。因此，金刚石层和钨层形成具有层叠结构的X射线吸收体。当X射线吸收体具有包含不同成分的物质的层叠结构时，可以容易地调节整个X射线吸收体的透射率和相移量。因此，获得了制造提供半导体器件等的图案的改进的分辨率的X射线掩模的方法。

8. 发明授权

US06521889B1 Dust particle inspection apparatus, and device manufacturing method using the same 失效
标题翻译：粉尘检查装置及其制造方法
公开(公告)号：US06521889B1
公开(公告)日：2003-02-18
申请号：US09689860
申请日：2000-10-13
申请人： Hideki Ina , Kenji Itoga
发明人： Hideki Ina , Kenji Itoga
IPC分类号： G01N2189
CPC分类号： G01N21/88
摘要： A dust particle inspection apparatus for detecting size information and height information of a dust particle on the surface of a mask or a wafer, as well as a device manufacturing method using the same, are disclosed. Light from a light source is directed to a predetermined surface to be inspected, and reflection light from a dust particle on the predetermined surface is detected by a detecting system. An output signal of the detecting system is processed by a signal processing system, so that size information of the dust particle along the predetermined surface and height information thereof with respect to a direction of a normal to the predetermined surface are detected.
摘要翻译：公开了一种用于检测掩模或晶片表面上的灰尘颗粒的尺寸信息和高度信息的灰尘颗粒检查装置及其装置的制造方法。来自光源的光被引导到要检查的预定表面，并且通过检测系统检测来自预定表面上的灰尘颗粒的反射光。检测系统的输出信号由信号处理系统处理，从而检测出沿着预定表面的灰尘颗粒的尺寸信息和相对于预定表面的法线方向的高度信息。

9. 发明授权

US08885118B2 Illumination device and liquid crystal display having a light guide plate with protrusions of multiple heights 有权
标题翻译：照明装置和具有多个高度突起的导光板的液晶显示器
公开(公告)号：US08885118B2
公开(公告)日：2014-11-11
申请号：US13297708
申请日：2011-11-16
申请人： Akimasa Yuuki , Kenji Itoga , Naoko Iwasaki , Takafumi Kokusho , Yuji Tsuchiyama , Seiji Sakai
发明人： Akimasa Yuuki , Kenji Itoga , Naoko Iwasaki , Takafumi Kokusho , Yuji Tsuchiyama , Seiji Sakai
IPC分类号： G02F1/1335 , F21V8/00
CPC分类号： G02B6/002 , G02B6/0068
摘要： It is an object of the invention to provide a technique capable of suppressing variations in luminance in the vicinity of a light entrance surface of a light guide plate. An illumination device includes a point light source, and a light guide plate having a side surface serving as a light entrance surface opposed to the point light source, and a main surface serving as a light exit surface. The light entrance surface of the light guide plate is provided with unevenness formed by arraying at predetermined pitches a plurality of protrusions each projecting from the light entrance surface and extending in a direction perpendicular to the light exit surface. Each of the top surface and the bottom surface of the unevenness is provided with a plurality of micro protrusions each extending in the direction perpendicular to the light exit surface and having a height smaller than the above protrusion.
摘要翻译：本发明的目的是提供一种能够抑制导光板的光入射面附近的亮度变化的技术。照明装置包括点光源和具有作为与点光源相对的光入射面的侧面和作为光出射面的主面的导光板。导光板的光入射表面设置有以预定间距排列多个突起形成的凹凸，每个突起从光入射表面突出并沿垂直于光出射表面的方向延伸。凹凸部的上表面和下表面均设置有多个微突起，每个微突起沿垂直于光出射面的方向延伸，并且具有比上述突起小的高度。

10. 发明申请

US20120127400A1 ILLUMINATION DEVICE AND LIQUID CRYSTAL DISPLAY 有权
标题翻译：照明装置和液晶显示
公开(公告)号：US20120127400A1
公开(公告)日：2012-05-24
申请号：US13297708
申请日：2011-11-16
申请人： Akimasa YUUKI , Kenji Itoga , Naoko Iwasaki , Takafumi Kokusho , Yuji Tsuchiyama , Seiji Sakai
发明人： Akimasa YUUKI , Kenji Itoga , Naoko Iwasaki , Takafumi Kokusho , Yuji Tsuchiyama , Seiji Sakai
IPC分类号： G02F1/1335 , F21V8/00
CPC分类号： G02B6/002 , G02B6/0068
摘要： It is an object of the invention to provide a technique capable of suppressing variations in luminance in the vicinity of a light entrance surface of a light guide plate. An illumination device includes a point light source, and a light guide plate having a side surface serving as a light entrance surface opposed to the point light source, and a main surface serving as a light exit surface. The light entrance surface of the light guide plate is provided with unevenness formed by arraying at predetermined pitches a plurality of protrusions each projecting from the light entrance surface and extending in a direction perpendicular to the light exit surface. Each of the top surface and the bottom surface of the unevenness is provided with a plurality of micro protrusions each extending in the direction perpendicular to the light exit surface and having a height smaller than the above protrusion.
摘要翻译：本发明的目的是提供一种能够抑制导光板的光入射面附近的亮度变化的技术。照明装置包括点光源和具有作为与点光源相对的光入射面的侧面和作为光出射面的主面的导光板。导光板的光入射表面设置有以预定间距排列多个突起形成的凹凸，每个突起从光入射表面突出并沿垂直于光出射表面的方向延伸。凹凸部的上表面和下表面均设置有多个微突起，每个微突起沿垂直于光出射面的方向延伸，并且具有比上述突起小的高度。

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