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1. 发明授权

US06180313B2 Poly (disulfonyl diazomethane) compound and positive-working chemical-amplification photoresist composition containing the same 有权
标题翻译：聚（二磺酰基重氮甲烷）化合物和含有该化合物的正性化学扩增光致抗蚀剂组合物
公开(公告)号：US06180313B2
公开(公告)日：2001-01-30
申请号：US09384284
申请日：1999-08-27
申请人： Hiroto Yukawa , Waki Ohkubo , Kouki Tamura
发明人： Hiroto Yukawa , Waki Ohkubo , Kouki Tamura
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , C07C317/28 , C07C2601/14 , G03F7/0163 , Y10S430/106 , Y10S430/12 , Y10S430/122 , Y10S430/124
摘要： Disclosed is a poly(disulfonyl diazomethane) compound as a class of novel compounds represented by the general formula R-SO2-C(N2)-SO2&Brketopenst; Z-SO2-C(N2)-SO2&Brketclosest; nR in which the subscript n is 1 to 5, each R is a monovalent hydrocarbon group and Z is a divalent hydrocarbon group. The invention also discloses a chemical-amplification positive-working photoresist composition which comprises the above mentioned poly(disulfonyl diazomethane) compound as the radiation-sensitive acid-generating agent in combination with a film-forming resin capable of being imparted with increased solubility in an aqueous alkaline solution by the interaction with an acid, such as a polyhydroxystyrene resin of which a part of the hydroxyl groups are substituted by acid-dissociable solubility-reducing groups, e.g., tert-butoxycarbonyl groups.
摘要翻译：公开了一种由下式n为1〜5的一般形式表示的一类新型化合物的聚（二磺酰基重氮甲烷）化合物，各R为一价烃基，Z为二价烃基。本发明还公开了一种化学扩增正性光致抗蚀剂组合物，其包含上述聚（二磺酰基重氮甲烷）化合物作为辐射敏感性酸产生剂与能够赋予溶解度增加的成膜树脂通过与酸相互作用的碱性水溶液，例如其一部分羟基被酸解离的溶解性降低基团例如叔丁氧基羰基取代的多羟基苯乙烯树脂。

2. 发明授权

US6153733A (Disulfonyl diazomethane compounds) 有权
标题翻译：聚（二磺酰基重氮甲烷）化合物
公开(公告)号：US6153733A
公开(公告)日：2000-11-28
申请号：US310858
申请日：1999-05-13
申请人： Hiroto Yukawa , Waki Ohkubo , Kouki Tamura , Toshiharu Shimamaki , Kei Mori
发明人： Hiroto Yukawa , Waki Ohkubo , Kouki Tamura , Toshiharu Shimamaki , Kei Mori
IPC分类号： C07C317/28 , G03F7/004 , G03F7/016 , C07C245/14
CPC分类号： G03F7/0045 , C07C317/28 , G03F7/0163 , C07C2101/14 , Y10S430/106 , Y10S430/12 , Y10S430/122 , Y10S430/124
摘要： Disclosed is a poly(disulfonyl diazomethane) compound as a class of novel compounds represented by the general formula ##STR1## in which the subscript n is 1 to 5, each R is a monovalent hydrocarbon group and Z is a divalent hydrocarbon group. The invention also discloses a chemical-amplification positive-working photoresist composition which comprises the above mentioned poly(disulfonyl diazomethane) compound as the radiation-sensitive acid-generating agent in combination with a film-forming resin capable of being imparted with increased solubility in an aqueous alkaline solution by the interaction with an acid, such as a polyhydroxystyrene resin of which a part of the hydroxyl groups are substituted by acid-dissociable solubility-reducing groups, e.g., tert-butoxycarbonyl groups.
摘要翻译：公开了作为一类由下式表示的新型化合物的聚（二磺酰基重氮甲烷）化合物，其中下标n为1至5，每个R为单价烃基，Z为二价烃基。本发明还公开了一种化学扩增正性光致抗蚀剂组合物，其包含上述聚（二磺酰基重氮甲烷）化合物作为辐射敏感性酸产生剂与能够赋予溶解度增加的成膜树脂通过与酸相互作用的碱性水溶液，例如其一部分羟基被酸解离的溶解性降低基团例如叔丁氧基羰基取代的多羟基苯乙烯树脂。

3. 发明申请

US20070281098A1 Composition for forming antireflection coating 审中-公开
标题翻译：用于形成抗反射涂层的组合物
公开(公告)号：US20070281098A1
公开(公告)日：2007-12-06
申请号：US11882254
申请日：2007-07-31
申请人： Taku Hirayama , Tomotaka Yamada , Daisuke Kawana , Kouki Tamura , Kazufumi Sato
发明人： Taku Hirayama , Tomotaka Yamada , Daisuke Kawana , Kouki Tamura , Kazufumi Sato
IPC分类号： B05D3/00
CPC分类号： C08G77/14 , C08G77/04 , C08G77/70 , C09D5/32 , C09D183/04 , C09D183/06 , G02B1/111 , G03F7/0757 , G03F7/091 , C08L2666/04
摘要： A composition for forming an antireflection coating, characterized in that it comprises an organic solvent and, dissolved therein, (A) a ladder silicone copolymer containing (a1) 10 to 90 mole % of a (hydroxyphenylalkyl)silsesquioxane unit, (a2) 0 to 50 mole % of a (alkoxyphenylalkyl)silsesquioxane unit and (a3) 10 to 90 mole % of an alkyl or phenylsilsesquioxane unit, (B) an acid generator generating an acid upon exposure to heat or light, and (C) a crosslinking agent, and is capable of forming an antireflection coating exhibiting an optional parameter (k value) for an ArF laser of the range of 0.002 to 0.95. The composition is soluble in an organic solvent, can be applied by a conventional spin coating method with ease, has good storage stability, and can exhibit an adjusted preventive capability for reflection through the introduction of a chromophoric group absorbing a radiation ray thereto.
摘要翻译：一种用于形成抗反射涂层的组合物，其特征在于，其包含有机溶剂，并且溶解于其中（A）含有（〜1/10）10〜90摩尔％的（羟基苯基烷基）倍半硅氧烷单元，（a 2 O 2）0〜50摩尔％的（烷氧基苯基烷基）倍半硅氧烷单元和（〜3）10〜90摩尔％的烷基或苯基倍半硅氧烷单元，（B）在暴露于热或光时产生酸的酸发生剂，和（C）交联剂，并且能够形成对于0.002至约0.002的范围的ArF激光显示可选参数（k值）的抗反射涂层 0.95。该组合物可溶于有机溶剂，可以通过常规的旋涂法容易地进行涂布，具有良好的储存稳定性，并且通过引入吸收辐射线的发色团，可以显示调整的防止反射能力。

4. 发明授权

US4894355A Flexible, water-repellent baked carbon plate, its production, fuel cell electrode, fuel cell electrode plate and its production and fuel cell 失效
标题翻译：柔性，防水的烘烤碳板，其生产，燃料电池电极，燃料电池电极板及其生产和燃料电池
公开(公告)号：US4894355A
公开(公告)日：1990-01-16
申请号：US146192
申请日：1988-01-20
申请人： Seiji Takeuchi , Katsuya Ebara , Tomoichi Kamo , Kazuo Iwamoto , Tatsuo Horiba , Teruo Kumagai , Kouki Tamura , Kunko Kitami
发明人： Seiji Takeuchi , Katsuya Ebara , Tomoichi Kamo , Kazuo Iwamoto , Tatsuo Horiba , Teruo Kumagai , Kouki Tamura , Kunko Kitami
IPC分类号： H01M4/96 , H01M8/00
CPC分类号： H01M8/00 , H01M4/96 , Y02P70/56
摘要： A fuel cell electrode having a catalyst layer comprising electroconductive particles carrying a catalytically active component and a binder on a water-repellent baked plate comprising a carbon paper comprising carbon fiber and an organic binder and polytetrafluoroethylene infiltrated into voids of said carbon paper, characterized in that the carbon fiber of said baked plate has at least 20 cutting edges per square millimeter, and said polytetrafluoroethylene is infiltrated into at least one of said cutting edges to render the plate flexible.
摘要翻译：一种燃料电池电极，其具有催化剂层，该催化剂层包含载持催化活性成分的导电颗粒和粘合剂，所述导电颗粒包含碳纤维和有机粘合剂的碳纸和浸渍在所述碳纸的空隙中的聚四氟乙烯的疏水性烘烤板，其特征在于，所述烘烤板的碳纤维每平方毫米具有至少20个切割刃，并且所述聚四氟乙烯渗入至少一个所述切削刃以使板柔性。

5. 发明申请

US20060021964A1 Composition for forming antireflection coating 审中-公开
标题翻译：用于形成抗反射涂层的组合物
公开(公告)号：US20060021964A1
公开(公告)日：2006-02-02
申请号：US11237913
申请日：2005-09-29
申请人： Taku Hirayama , Tomotaka Yamada , Daisuke Kawana , Kouki Tamura , Kazufumi Sato
发明人： Taku Hirayama , Tomotaka Yamada , Daisuke Kawana , Kouki Tamura , Kazufumi Sato
IPC分类号： H01B13/00
CPC分类号： C08G77/14 , C08G77/04 , C08G77/70 , C09D5/32 , C09D183/04 , C09D183/06 , G02B1/111 , G03F7/0757 , G03F7/091 , C08L2666/04
摘要： A composition for forming an antireflection coating, characterized in that it comprises an organic solvent and, dissolved therein, (A) a ladder silicone copolymer containing (a1) 10 to 90 mole % of a (hydroxyphenylalkyl)silsesquioxane unit, (a2) 0 to 50 mole % of a (alkoxyphenylalkyl)silsesquioxane unit and (a3) 10 to 90 mole % of an alkyl or phenylsilsesquioxane unit, (B) an acid generator generating an acid upon exposure to heat or light, and (C) a crosslinking agent, and is capable of forming an antireflection coating exhibiting an optional parameter (k value) for an ArF laser of the range of 0.002 to 0.95. The composition is soluble in an organic solvent, can be applied by a conventional spin coating method with ease, has good storage stability, and can exhibit an adjusted preventive capability for reflection through the introduction of a chromophoric group absorbing a radiation ray thereto.
摘要翻译：一种用于形成抗反射涂层的组合物，其特征在于，其包含有机溶剂，并且溶解于其中（A）含有（〜1/10）10〜90摩尔％的（羟基苯基烷基）倍半硅氧烷单元，（a 2 O 2）0〜50摩尔％的（烷氧基苯基烷基）倍半硅氧烷单元和（〜3）10〜90摩尔％的烷基或苯基倍半硅氧烷单元，（B）在暴露于热或光时产生酸的酸发生剂，和（C）交联剂，并且能够形成对于0.002至约0.002的范围的ArF激光显示可选参数（k值）的抗反射涂层 0.95。该组合物可溶于有机溶剂，可以通过常规的旋涂法容易地进行涂布，具有良好的储存稳定性，并且通过引入吸收辐射线的发色团，可以显示调整的防止反射能力。

6. 发明申请

US20060003252A1 Chemical amplification type silicone based positive photoresist composition 审中-公开
标题翻译：化学放大型硅胶正性光致抗蚀剂组合物
公开(公告)号：US20060003252A1
公开(公告)日：2006-01-05
申请号：US10537290
申请日：2003-12-01
申请人： Taku Hirayama , Tomotaka Yamada , Daisuke Kawana , Kouki Tamura , Kazufumi Sato
发明人： Taku Hirayama , Tomotaka Yamada , Daisuke Kawana , Kouki Tamura , Kazufumi Sato
IPC分类号： G03F7/021
CPC分类号： G03F7/0757 , C08G77/04 , C08L83/06 , G03F7/0045
摘要： A chemical-amplification type silicone-based positive-working resist composition that can be prepared from compounds of good availability as the base materials through simple means and can provide a bilayer resist material from which a fine pattern of high resolution, high aspect ratio, desirable cross-sectional profile and low line edge roughness can be formed. In particular, a chemical-amplification type positive-working resist composition comprising an alkali soluble resin (A) and a photoacid generator (B) wherein a ladder-type silicone copolymer comprising (hydroxyphenylalkyl)silsesquioxane units (a1), (alkoxyphenylalkyl)silsesquioxane units (a2) and alkyl- or phenylsilsesquioxane units (a3) is used as the alkali soluble resin (A). The copolymer wherein, in the component (A), the units (a3) are phenylsilsesquioxane units is a novel compound.
摘要翻译：一种化学扩增型硅氧烷正性抗蚀剂组合物，其可以通过简单的方法由具有良好可用性的化合物制备，并且可以提供双层抗蚀剂材料，由此可以获得高分辨率，高纵横比的精细图案可以形成横截面轮廓和低线边缘粗糙度。特别是包含碱溶性树脂（A）和光酸产生剂（B）的化学增幅型正性抗蚀剂组合物，其中包含（羟基苯基烷基）倍半硅氧烷单元（a 1 SUB / >），（烷氧基苯基烷基）倍半硅氧烷单元（a 2 N 2）和烷基 - 或苯基倍半硅氧烷单元（a 3 SUB）用作碱溶性树脂（A）。在组分（A）中，单元（a 3 SUB）是苯基倍半硅氧烷单元的共聚物是新的化合物。

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