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1. 发明申请

WO2008036266A9 ION SOURCE AND METALS USED IN MAKING COMPONENTS THEREOF AND METHOD OF MAKING SAME 审中-公开
标题翻译：用于制造其组件的离子源和金属及其制备方法
公开(公告)号：WO2008036266A9
公开(公告)日：2009-03-12
申请号：PCT/US2007020208
申请日：2007-09-17
申请人： GUARDIAN INDUSTRIES , MURPHY NESTOR P , ROCK DAVID E , WALTON HUGH A , FRATI MAXIMO
发明人： MURPHY NESTOR P , ROCK DAVID E , WALTON HUGH A , FRATI MAXIMO
IPC分类号： H01J7/24
CPC分类号： H01J27/143
摘要： An ion source is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, techniques for reducing the costs associated with producing ion sources and/or elements thereof are provided. Such techniques may include, for example, forming the inner and/or outer cathode(s) from 1018 mild steel and/or segmented pieces. Such techniques also or instead include, for example, forming the ion source body from a single steel U-channel, or from segmented pieces making up the same. These techniques may be used alone or in various combinations.
摘要翻译：离子源能够产生和/或发射可用于在衬底上沉积层或执行其它功能的离子束。在某些示例性实施例中，提供了用于降低与产生离子源和/或其元件相关的成本的技术。这样的技术可以包括例如从1018个软钢和/或分段件形成内部和/或外部阴极。这些技术也可以包括例如从单个钢U型通道形成离子源体，或者由组成其的分段构成。这些技术可以单独使用或以各种组合使用。

2. 发明申请

WO2008036266A3 ION SOURCE AND METALS USED IN MAKING COMPONENTS THEREOF AND METHOD OF MAKING SAME 审中-公开
标题翻译：用于制造其组件的离子源和金属及其制备方法
公开(公告)号：WO2008036266A3
公开(公告)日：2008-08-28
申请号：PCT/US2007020208
申请日：2007-09-17
申请人： GUARDIAN INDUSTRIES , MURPHY NESTOR P , ROCK DAVID E , WALTON HUGH A , FRATI MAXIMO
发明人： MURPHY NESTOR P , ROCK DAVID E , WALTON HUGH A , FRATI MAXIMO
IPC分类号： H01J7/24
CPC分类号： H01J27/143
摘要： An ion source is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, techniques for reducing the costs associated with producing ion sources and/or elements thereof are provided. Such techniques may include, for example, forming the inner and/or outer cathode(s) from 1018 mild steel and/or segmented pieces. Such techniques also or instead include, for example, forming the ion source body from a single steel U-channel, or from segmented pieces making up the same. These techniques may be used alone or in various combinations.
摘要翻译：离子源能够产生和/或发射可用于在衬底上沉积层或执行其它功能的离子束。在某些示例性实施例中，提供了用于降低与产生离子源和/或其元件相关的成本的技术。这样的技术可以包括例如从1018个软钢和/或分段件形成内部和/或外部阴极。这些技术也可以包括例如从单个钢U型通道形成离子源体，或者由组成其的分段构成。这些技术可以单独使用或以各种组合使用。

3. 发明申请

WO2005061404A3 SCRATCH RESISTANT COATED GLASS ARTICLE RESISTANT TO FLUORIDE-BASED ETCHANT(S) 审中-公开
标题翻译：基于氟化物的蚀刻剂的耐刮涂层玻璃制品（S）
公开(公告)号：WO2005061404A3
公开(公告)日：2005-11-17
申请号：PCT/US2004041018
申请日：2004-12-08
申请人： GUARDIAN INDUSTRIES , VEERASAMY VIJAYEN S , THOMSEN SCOTT V , MURPHY NESTOR P , PETRMICHI RUDOLPH HUGO
发明人： VEERASAMY VIJAYEN S , THOMSEN SCOTT V , MURPHY NESTOR P , PETRMICHI RUDOLPH HUGO
IPC分类号： C03C17/22 , C03C17/23 , C03C17/34 , C23C14/02 , C23C14/08 , C23C14/58
CPC分类号： C03C17/23 , C03C17/22 , C03C17/225 , C03C17/3417 , C03C17/3435 , C03C17/3441 , C03C17/3452 , C03C2217/215 , C03C2217/218 , C03C2217/228 , C03C2217/23 , C03C2217/281 , C03C2217/285 , C23C14/024 , C23C14/08 , C23C14/086 , C23C14/58 , Y10T428/26 , Y10T428/265 , Y10T428/30 , Y10T428/31627
摘要： A scratch resistant coated article is provided which is also resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time by means of an anti-etch layer(s). In certain example embodiments, the anti-etch layer(s) is substantially transparent to visible light. In certain embodiments, a DLC layer(s) may be provided over the anti-etch layer. An underlayer may be provided under the anti-etch layer(s) in certain example embodiments.
摘要翻译：提供了抗刮涂层制品，其还通过抗蚀刻层抵抗至少一些基于氟化物的蚀刻剂至少一段时间的侵蚀。在某些示例性实施例中，抗蚀刻层对可见光基本上是透明的。在某些实施例中，可以在抗蚀刻层上提供DLC层。在某些示例性实施例中，可以在抗蚀刻层下面设置底层。

4. 发明申请

WO2008010882A3 ION SOURCE WITH RECESS IN ELECTRODE 审中-公开
标题翻译：离子源在电极中回收
公开(公告)号：WO2008010882A3
公开(公告)日：2008-10-30
申请号：PCT/US2007013717
申请日：2007-06-12
申请人： GUARDIAN INDUSTRIES , MURPHY NESTOR P , ROCK DAVID
发明人： MURPHY NESTOR P , ROCK DAVID
IPC分类号： H01J7/24
CPC分类号： H01J37/08 , H01J27/024 , H01J27/143 , H01J2237/31
摘要： An ion source capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions is provided. The ion source includes at least one anode and at least one cathode. In certain example embodiments, the anode may. have a recess formed therein in which ions to be included in the ion beam may accelerate. Walls of the recess optionally may be insulated using, for example, ceramic. One or more holes may be provided to allow a supply of gas to flow into the recess, and those holes optionally may be tapered such that they narrow towards the recess. Thus, certain example embodiments produce an ion source having a higher energy efficiency (e.g., having increasing ion energy).
摘要翻译：提供了能够产生和/或发射离子束的离子源，该离子束可以用于在衬底上沉积层或执行其他功能。离子源包括至少一个阳极和至少一个阴极。在某些示例实施例中，阳极可以。具有在其中形成的凹部，离子束中包含的离子可以加速。可选地，凹槽的壁可以使用例如陶瓷来绝缘。可以提供一个或多个孔以允许气体供应流入凹槽中，并且这些孔任选地可以是锥形的，使得它们朝向凹槽变窄。因此，某些示例实施例产生具有较高能量效率（例如，具有增加的离子能量）的离子源。

5. 发明申请

WO2006057829A3 SCRATCH RESISTANT COATED ARTICLE AND METHOD OF MAKING 审中-公开
标题翻译：防刮涂层制品及其制造方法
公开(公告)号：WO2006057829A3
公开(公告)日：2007-11-22
申请号：PCT/US2005040974
申请日：2005-11-14
申请人： GUARDIAN INDUSTRIES , THOMSEN SCOTT V , PETRMICHL RUDOLPH HUGO , MURPHY NESTOR P , VEERASAMY VIJAYEN S
发明人： THOMSEN SCOTT V , PETRMICHL RUDOLPH HUGO , MURPHY NESTOR P , VEERASAMY VIJAYEN S
IPC分类号： C23C16/40 , B05D3/00 , B32B9/00 , C03C17/22 , C03C17/23 , C03C17/34 , C08J7/18 , C23C14/00 , C23C14/02 , C23C14/08 , C23C14/32 , C23C14/58 , C23C16/00 , C23C16/26 , G21H5/00 , H01L21/4763
CPC分类号： C23C14/06 , C03C17/22 , C03C17/225 , C03C17/23 , C03C17/245 , C03C17/2453 , C03C17/3417 , C03C17/3435 , C03C17/3441 , C03C17/3452 , C03C2217/215 , C03C2217/218 , C03C2217/228 , C03C2217/281 , C03C2217/282 , C03C2217/285 , C03C2218/15 , C03C2218/154 , C23C14/024 , C23C14/0635 , C23C14/08 , C23C14/086 , C23C14/58 , Y10T428/265 , Y10T428/30 , Y10T428/31612
摘要： A scratch resistant coated article is provided which is also resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) is provided on a glass substrate in order to protect the glass substrate from attacks by fluoride-based etchant(s), and an underlayer(s) deposited by flame pyrolysis may be provided under at least the anti-etch layer(s).
摘要翻译：提供了耐刮擦涂层制品，其还耐受至少一些基于氟化物的蚀刻剂至少一段时间的攻击。在某些示例性实施例中，在玻璃基板上提供防蚀刻层，以便保护玻璃基板免受基于氟化物的蚀刻剂的攻击，并且可以提供通过火焰热解沉积的底层在至少一个或多个抗蚀刻层之下。

6. 发明申请

WO2012078395A3 ARTICLES INCLUDING ANTICONDENSATION AND/OR LOW-E COATINGS AND/OR METHODS OF MAKING THE SAME 审中-公开
标题翻译：包括抗静电和/或低辐射涂层的制品和/或制造该制品的方法
公开(公告)号：WO2012078395A3
公开(公告)日：2012-08-16
申请号：PCT/US2011062283
申请日：2011-11-29
申请人： GUARDIAN INDUSTRIES , LEMMER JEAN-MARC , MURPHY NESTOR P , MCLEAN DAVID D , BLACKER RICHARD
发明人： LEMMER JEAN-MARC , MURPHY NESTOR P , MCLEAN DAVID D , BLACKER RICHARD
IPC分类号： C03C17/34
CPC分类号： E06B7/12 , B60J1/2094 , C03C17/3417 , C03C17/3435 , C03C17/3482 , C03C17/366 , C03C2217/212 , C03C2217/22 , C03C2217/231 , C03C2217/281 , C03C2217/29 , C03C2217/70 , C03C2217/948 , C03C2218/154 , E04D13/03 , E06B3/6715 , E06B7/00 , Y10T428/24942
摘要： Certain example embodiments of this invention relate to articles including anticondensation and/or low-E coatings that are exposed to an external environment, and/or methods of making the same. In certain example embodiments, the anticondensation and/or low-E coatings may be survivable in an outside environment. The coatings also may have a sufficiently low sheet resistance and hemispherical emissivity such that the glass surface is more likely to retain heat from the interior area, thereby reducing (and sometimes completely eliminating) the presence condensation thereon. The articles of certain example embodiments may be, for example, skylights, vehicle windows or windshields, IG units, VIG units, refrigerator/freezer doors, and/or the like.
摘要翻译：本发明的某些示例性实施例涉及包括暴露于外部环境的抗凝结和/或低-E涂层的制品和/或制造该制品的方法。在某些示例实施例中，防凝结和/或低辐射涂层可以在外部环境中存活。该涂层还可以具有足够低的薄层电阻和半球发射率，使得玻璃表面更可能保持来自内部区域的热量，由此减少（并且有时完全消除）其上存在的凝结物。特定示例实施例的物品可以是例如天窗，车窗或挡风玻璃，IG单元，VIG单元，冰箱/冷冻室门等。

7. 发明申请

WO2006055323A3 SCRATCH RESISTANT COATED GLASS ARTICLE INCLUDING CARBIDE LAYER(S) RESISTANT TO FLUORIDE-BASED ETCHANT(S) 审中-公开
标题翻译：耐刮涂层玻璃制品，包括耐氟化物基层的碳化物层（S）
公开(公告)号：WO2006055323A3
公开(公告)日：2006-11-09
申请号：PCT/US2005040317
申请日：2005-11-08
申请人： GUARDIAN INDUSTRIES , MURPHY NESTOR P , PETRMICHL RUDOLPH HUGO , VEERASAMY VIJAYEN S
发明人： MURPHY NESTOR P , PETRMICHL RUDOLPH HUGO , VEERASAMY VIJAYEN S
IPC分类号： C23C14/34 , B05D1/18 , C03C17/22 , C03C17/23 , C03C17/34 , C23C14/02 , C23C14/08 , C23C14/58
CPC分类号： C23C14/58 , C03C17/22 , C03C17/23 , C03C17/3441 , C03C2217/282 , C03C2217/78 , C03C2218/155 , C03C2218/156 , C23C14/0057 , C23C14/024 , C23C14/06 , C23C14/0635 , C23C14/08 , C23C14/086
摘要： A scratch resistant coated article is provided which is also resistant to attacks by at least some fluoride-based etchant(s) for at least a period of time. In certain example embodiments, an anti-etch layer(s) (2) is provided on a glass substrate (1) in order to protect the glass substrate (1) from attacks by fluoride-based etchant(s). In certain example embodiment, the anti-etch layer(s) (2) is substantially transparent to visible light. In certain embodiments, a DLC layer(s) (3) may be provided over the anti-etch layer (2). An underlayer (4) may be provided under the anti-etch layer(s) (2) in certain example embodiments. In certain example embodiments, the anti-etch layer(s) (2) may be of or include a carbide and/or oxycarbide of Zr, Sn or the like.
摘要翻译：提供了耐刮擦涂层制品，其还耐受至少一些基于氟化物的蚀刻剂至少一段时间的攻击。在某些示例性实施例中，在玻璃基板（1）上设置防蚀刻层（2），以保护玻璃基板（1）免受基于氟化物的蚀刻剂的攻击。在某些示例性实施例中，抗蚀刻层（2）对可见光基本上是透明的。在某些实施例中，DLC层（3）可以设置在抗蚀刻层（2）上。在某些示例性实施例中，可以在抗蚀刻层（2）下方设置底层（4）。在某些示例性实施例中，抗蚀刻层（2）可以是Zr或Sn等的碳化物和/或碳化物。

8. 发明专利

PL2539291T3 Wyroby zawierające powłoki przeciwkondensacyjne i/lub o niskim E i/lub sposoby ich wytwarzania 未知
公开(公告)号：PL2539291T3
公开(公告)日：2017-01-31
申请号：PL10795490
申请日：2010-12-06
申请人： GUARDIAN INDUSTRIES
发明人： LEMMER JEAN-MARC , MURPHY NESTOR P , MCLEAN DAVID D , BLACKER RICHARD
IPC分类号： C03C17/34

9. 发明专利

PL2057300T3 Źródło jonów z wnęką w elektrodzie 未知
公开(公告)号：PL2057300T3
公开(公告)日：2013-10-31
申请号：PL07835800
申请日：2007-06-12
申请人： GUARDIAN INDUSTRIES
发明人： MURPHY NESTOR P , ROCK DAVID
IPC分类号： H01J37/08 , H01J27/02 , H01J27/14

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