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    • 3. 发明授权
    • Scanning tunneling potentio-spectroscopic microscope and a data
detecting method
    • 扫描隧道电位显微镜和数据检测方法
    • US5378983A
    • 1995-01-03
    • US977572
    • 1992-11-17
    • Akira YagiTakao OkadaSeizo MoritaNobuo Mikoshiba
    • Akira YagiTakao OkadaSeizo MoritaNobuo Mikoshiba
    • G01Q60/12G01B7/34G01Q30/04G01Q60/14G01K1/16
    • G01Q60/12B82Y35/00G01B7/34G01Q30/04G01Q60/14Y10S977/852
    • A scanning tunneling potentio-spectroscopic microscope, includes a conductive probe and a circuit for selectively applying one of first, second and third bias voltages to a sample. A tunnel current flowing between the probe and sample is detected, and a tunnel current signal is produced upon detection thereof. A servo circuit controls a distance between the probe and sample on the basis of the tunnel current signal by producing a servo signal as a feedback signal. A hold circuit switches the servo circuit between operating and non-operating states. Configuration data on a surface of the sample is obtained, on the basis of the servo signal, with the first bias voltage applied to the sample and with the servo circuit in the operating state. A first dependence of the tunnel current on the bias voltage is obtained, from the tunnel current signal and the second bias voltage, with the second bias voltage applied to the sample and with the servo circuit in the non-operating state. A second dependence of the tunnel current on the bias voltage is obtained from the tunnel current signal and the third bias voltage, with the third bias voltage applied to the sample and with the servo circuit in the non-operating state. Electron state data is obtained on the basis of the first dependence, and potential data is obtained on the basis of the first and second dependencies.
    • 扫描隧道电位分光显微镜包括导电探针和用于选择性地将一个第一,第二和第三偏置电压施加到样品的电路。 检测在探针和样品之间流动的隧道电流,并且在检测到隧道电流信号时产生隧道电流信号。 伺服电路通过产生伺服信号作为反馈信号,根据隧道电流信号来控制探头和样品之间的距离。 保持电路在操作状态和非工作状态之间切换伺服电路。 基于伺服信号获得样品表面上的配置数据,其中施加到样品的第一偏置电压和处于操作状态的伺服电路。 从隧道电流信号和第二偏置电压获得隧道电流对偏置电压的第一依赖性,其中第二偏置电压施加到样品并且伺服电路处于非操作状态。 从隧道电流信号和第三偏置电压获得隧道电流对偏置电压的第二依赖性,其中第三偏压施加到样品并且伺服电路处于非操作状态。 基于第一依赖性获得电子状态数据,并且基于第一和第二依赖性获得潜在数据。
    • 9. 发明授权
    • Plasma CVD of aluminum films
    • 铝膜等离子体CVD
    • US5091210A
    • 1992-02-25
    • US584637
    • 1990-09-19
    • Nobuo MikoshibaKazuo TsubouchiKazuya Masu
    • Nobuo MikoshibaKazuo TsubouchiKazuya Masu
    • C23C16/20C23C16/452C23C16/50H01L21/28H01L21/285
    • C23C16/452C23C16/20
    • A deposited film formation method which forms an aluminum film by use of the plasma CVD method,wherein a substrate having an electron donative surface (A) and a non-electron donative surface (B) is arranged in a space for deposited film formation having a portion which is increased in cross-sectional area toward said substrate is arranged, and a gas of trimethylaluminum and hydrogen gas are introduced into said space for deposited film formation to deposit an aluminum film selectively on said electron donative surface (A).A deposited film formation method which forms an aluminum film by use of the plasma CVD method, comprising:(a) the step of arranging a substrate having an electron donative surface (a) and a non-electron donative surface (B) in a space for deposited film formation equipped with a reverse flow preventive means into plasma, and(b) the step of introducing a gas of trimethylaluminum and hydrogen gas into said space for deposited film formation, said aluminum film being selectively formed on said electron donative surface (A).
    • 使用等离子体CVD法形成铝膜的沉积膜形成方法,其中具有给电子表面(A)和非电子给体表面(B)的基板被布置在用于沉积膜形成的空间中,具有 布置了朝向所述基板的横截面面积增加的部分,并且将三甲基铝和氢气的气体引入所述用于沉积膜形成的空间中以在所述给电子表面(A)上选择性地沉积铝膜。 一种通过使用等离子体CVD法形成铝膜的沉积膜形成方法,包括:(a)将具有给电子表面(a)和非电子给体表面(B)的衬底排列在空间中的步骤 (b)将三甲基铝和氢气的气体引入所述用于沉积膜形成的空间中的步骤,所述铝膜选择性地形成在所述给电子表面(A )。