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    • 1. 发明申请
    • PROCESS FOR PRODUCING SPUTTERING TARGET
    • 生产喷射目标的方法
    • WO1996036746A1
    • 1996-11-21
    • PCT/JP1996001312
    • 1996-05-17
    • ASAHI GLASS COMPANY LTD.NAKAGAMA, SusumuHIGETA, MasaoHAYASHI, Atsushi
    • ASAHI GLASS COMPANY LTD.
    • C23C14/34
    • C23C14/3414
    • A process for producing uniform and high-density composite sputtering targets composed of a high-melting substance and a low-melting metal, which comprises molding a mixture of a powder of a high-melting substance having a melting point of 900 DEG C or above with a powder of a low-melting metal having a melting point of 700 DEG C or below at a temperature below the melting point of the metal under heat and pressure. This process if freed from the problem of the conventional production processes comprising melting, hot pressing or atmospheric pressure sintering such that it has been impossible to produce uniform and high-density composite sputtering targets because of the compositional change due to different melting points of the components and the exudation of the low-melting metal as a result of melting thereof.
    • 一种由高熔点物质和低熔点金属组成的均匀高密度复合溅射靶的制造方法,其特征在于,将熔点为900℃以上的高熔点物质的粉末混合成型 在低于金属熔点的温度下,在热和压力下,熔点为700℃以下的低熔点金属粉末。 该方法如果免于常规生产方法的问题,包括熔融,热压或大气压力烧结,使得由于组分的不同熔点导致的组成变化不可能产生均匀和高密度的复合溅射靶 以及由于熔融而使低熔点金属渗出。
    • 3. 发明申请
    • TARGET, PROCESS FOR PRODUCTION THEREOF, AND METHOD OF FORMING HIGHLY REFRACTIVE FILM
    • 目标,其生产方法和形成高折射膜的方法
    • WO1997008359A1
    • 1997-03-06
    • PCT/JP1996000767
    • 1996-03-25
    • ASAHI GLASS COMPANY LTD.KIDA, OtojiroMITSUI, AkiraSUZUKI, EriOSAKI, HisashiHAYASHI, Atsushi
    • ASAHI GLASS COMPANY LTD.
    • C23C14/34
    • C23C14/083C23C4/02C23C4/11C23C14/3414
    • A target to be used in forming a transparent thin oxide film having a high refractive index by direct-current sputtering and a method of forming the film by using the target. Although it has been a practice to form a highly refractive film by direct-current sputtering wherein a metallic target is sputtered in an oxygenic atmosphere, this method is problematic owing to the extremely low speed of film formation. An alternative method therefor comprises using oxide ceramics as the target, but this method is also problematic in that the ceramics are nonconductive and hence direct-current sputtering is difficult. The invention method enables a highly refractive film to be produced rapidly by direct-current sputtering by using a target mainly comprising a metal oxide, MOx, wherein oxygen is contained in a stoichiometrically insufficient quantity and M represents at least one metal selected among Ti, Nb, Ta, Mo, W, Zr and Hf.
    • 用于通过直流溅射形成具有高折射率的透明薄氧化膜的目标以及通过使用靶材形成膜的方法。 尽管通过直接溅射形成高折射膜已成为实践,其中金属靶在氧气氛中溅射,但是由于成膜速度极低,所以该方法是有问题的。 其替代方法包括使用氧化物陶瓷作为靶,但是该方法的问题在于陶瓷是非导电的,因此直接溅射是困难的。 本发明方法能够通过使用主要包含金属氧化物MOx的靶,通过直接溅射快速制备高折射膜,其中氧以化学计量不足量包含氧,M表示选自Ti,Nb中的至少一种金属 ,Ta,Mo,W,Zr和Hf。
    • 8. 发明申请
    • DISPLAY DEVICE
    • 显示设备
    • WO1995023996A1
    • 1995-09-08
    • PCT/JP1995000321
    • 1995-03-01
    • ASAHI GLASS COMPANY LTD.OZEKI, MasaoHIRAI, YoshinoriOOI, Yoshiharu
    • ASAHI GLASS COMPANY LTD.
    • G02F01/1335
    • G02F1/133526G02F1/1334G02F1/133555G02F1/133615G02F2001/13756
    • The display device using a transparent-scattering type liquid crystal element has such a structure that the light quantity to an observer is controlled as possible when a black image (transparent state) is provided, and a high efficiency of light is maintained when a white image (scattering state) is provided. A prism array (12) is disposed at the back surface of the transparent-scattering type display element so that a sawteeth-like surface of the prism array (12) faces the display element (11) and a light absorber (13) is disposed at the back surface of the prism array. A light source (14) can be disposed at a side face of the prism array (12), with a reflector (16) at the opposite side of the light source (14) with respect to the prism array (12). A display device having high contrast ratio is obtainable.
    • 使用透明散射型液晶元件的显示装置具有这样的结构,即当设置黑色图像(透明状态)时可以控制观察者的光量,并且当白色图像保持高效率的光时 (散射状态)。 棱镜阵列(12)设置在透明散射型显示元件的背面,使得棱镜阵列(12)的锯齿状表面面向显示元件(11)并设置光吸收体(13) 在棱镜阵列的后表面。 光源(14)可以设置在棱镜阵列(12)的侧面,反射器(16)相对于棱镜阵列(12)位于光源(14)的相对侧。 可以获得具有高对比度的显示装置。
    • 10. 发明申请
    • METHOD OF FORMING ELECTRODES
    • 形成电极的方法
    • WO1992003030A1
    • 1992-02-20
    • PCT/JP1990000978
    • 1990-07-31
    • NFE CO., LTD.ASAHI GLASS COMPANY LTD.IIDA, MasaruKONNO, AkihiroYAMADA, Michio
    • NFE CO., LTD.ASAHI GLASS COMPANY LTD.
    • H05K03/12
    • H05K1/0266H05K1/0269H05K1/092H05K2201/0108H05K2203/161
    • A method of forming electrodes characterized in that a thick-film paste (a) obtained by dispersing an inorganic powder consisting of an inorganic pigment as a chief component in an organic binder is printed on one side of a glass substrate and is dried, a thick-film paste (b) obtained by dispersing an inorganic powder consisting of a metal powder and a powdery glass as chief components in an organic binder is printed being overlapped on at least a portion of the thick-film paste (a), the pastes (a and b) are baked at 400 to 800 DEG C, and the paste (a) is partly removed from the portions where it is not overlapped on the paste (b), thereby to form an electrode that exhibits appearance of a desired color when viewed from the side opposite to the printed surface. According to the invention, on one side of a glass substrate there can be formed an electrode exhibiting a desired color when viewed from the side where no electrode is formed, and the productivity is very high.
    • 一种形成电极的方法,其特征在于将由无机颜料组成的无机粉末作为主要成分的无机粉末分散在有机粘合剂中而获得的厚膜浆料(a)印刷在玻璃基板的一面上并干燥, 将由金属粉末和粉末状玻璃构成的无机粉末作为主要成分分散在有机粘合剂中而得到的膜糊(b)与厚膜糊(a)的至少一部分重叠,粘贴( a和b)在400〜800℃下进行烘烤,并且将糊状物(a)部分地从不与糊料(b)重叠的部分除去,从而形成表现出期望颜色的外观的电极, 从与印刷表面相对的一侧观察。 根据本发明,在玻璃基板的一侧,当从没有形成电极的一侧观察时,可以形成具有所需颜色的电极,并且生产率非常高。