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1. 发明专利

JP2003066173A Alarm clock with sleep inducing function for stimulating sense of smell and sense of taste 审中-公开
标题翻译：具有休眠诱导功能的报警时钟用于刺激感觉和感觉感觉
公开(公告)号：JP2003066173A
公开(公告)日：2003-03-05
申请号：JP2001298467
申请日：2001-08-24
申请人： Yuichi Honma , 裕一本間
发明人： HONMA YUICHI
IPC分类号： G04G15/00 , G04C23/00 , G04G99/00 , G04G1/00
摘要： PROBLEM TO BE SOLVED: To provide a device used to relax troubles about a problem having individual differences such the sleep or getting-up of a user. SOLUTION: The user's sensor of smell and the user's sense of taste are stimulated by using the clock at a desired time, the sleep of the user is induced, the user can make up, and the user can stabilize a state of mind.
摘要翻译：要解决的问题：提供一种用于放松关于具有诸如用户的睡眠或起床之间的个体差异的问题的麻烦的装置。解决方案：通过在所需时间使用时钟来刺激用户的嗅觉传感器和用户的口味感，诱发用户的睡眠，用户可以补充，用户可以稳定心态。

2. 发明专利

JP2006044625A Braking operation device by weight shift 审中-公开
标题翻译：通过重量移动制动操作装置
公开(公告)号：JP2006044625A
公开(公告)日：2006-02-16
申请号：JP2004254965
申请日：2004-08-06
申请人： Yuichi Honma , 裕一本間
发明人： HONMA YUICHI
IPC分类号： B62L3/00 , B62J1/00
摘要： PROBLEM TO BE SOLVED: To realize stability by dispersing concentration of operation at braking and at stopping of a bicycle.
SOLUTION: A wire connected to the braking device is braked by weight shift and pushing a press plate provided on a saddle while center of gravity is rearwardly moved. The person can concentrate to steering and performs braking while firmly putting the leg on ground even at stopping.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：通过在制动和停止自行车时分散集中操作来实现稳定性。
解决方案：连接到制动装置的线通过重量移动而制动，并且在重心向后移动时推动设置在鞍座上的压板。即使在停止时，人们也可以集中精力转向并执行制动，同时牢固地将腿放在地面上。版权所有（C）2006，JPO＆NCIPI

3. 发明授权

US07226500B2 Additive for heating asphalt 有权
标题翻译：沥青加热添加剂
公开(公告)号：US07226500B2
公开(公告)日：2007-06-05
申请号：US10501506
申请日：2003-01-15
申请人： Yuichi Honma , Ryoichi Tamaki , Takashi Mukai
发明人： Yuichi Honma , Ryoichi Tamaki , Takashi Mukai
IPC分类号： C09D195/00 , C08L95/00
CPC分类号： C08K5/134 , C08L95/00 , C08L2666/74
摘要： The invention provides an additive for heated asphalt that can further improve a peeling prevention effect between asphalt and aggregates. The invention relates to an additive which is added to heated asphalt containing a particular gallic acid ester with or combination of gallic acid and an alcohol.
摘要翻译：本发明提供了一种加热沥青的添加剂，可进一步提高沥青与聚集体之间的防脱落效果。本发明涉及一种添加剂，其添加到含有没食子酸和醇的特定的没食子酸酯的加热沥青中。

4. 发明申请

US20060030243A1 Polishing composition 审中-公开
标题翻译：抛光组成
公开(公告)号：US20060030243A1
公开(公告)日：2006-02-09
申请号：US11184960
申请日：2005-07-20
申请人： Kazuhiko Nishimoto , Kouji Taira , Kenichi Suenaga , Yuichi Honma
发明人： Kazuhiko Nishimoto , Kouji Taira , Kenichi Suenaga , Yuichi Honma
IPC分类号： B24D3/02 , B24B1/00
CPC分类号： G11B5/8404 , B24B37/0056 , B24B37/044 , C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition containing an abrasive and water, wherein the polishing composition has a pH of from 0.1 to 7, and satisfies the following conditions: (1) that the number of polishing particles having sizes of 0.56 μm or more and less than 1 μm is 500,000 or less per 1 cm3 of the polishing composition; and (2) that the ratio of polishing particles having sizes of 1 μm or more is 0.001% by weight or less to the entire polishing particles in the polishing composition. The polishing composition is suitable for polishing substrates for precision parts including, for example, recording disk substrates, such as magnetic disks, optical disks, and opto-magnetic disks, photomask substrates, optical lenses, optical mirrors, optical prisms and semiconductor substrates, and the like.
摘要翻译： 1.一种抛光组合物，其含有研磨剂和水，其中，所述研磨用组合物的pH为0.1〜7，满足以下条件：（1）尺寸为0.56μm以上且小于1μm的研磨粒子数为每抛光组合物1cm 3以上500,000以下; （2）研磨用组合物中的研磨粒子的整体的比例为1μm以上的研磨粒子的比例为0.001重量％以下。抛光组合物适用于抛光用于精密部件的基板，例如磁盘，光盘，光磁盘，光掩模基板，光学透镜，光学镜，光学棱镜和半导体基板等记录盘基板，以及类似。

5. 发明授权

US06840991B2 Asphalt emulsion composition 失效
标题翻译：沥青乳液组成
公开(公告)号：US06840991B2
公开(公告)日：2005-01-11
申请号：US10041491
申请日：2002-01-10
申请人： Yuichi Honma , Ryoichi Tamaki , Hirotaka Sasaki
发明人： Yuichi Honma , Ryoichi Tamaki , Hirotaka Sasaki
IPC分类号： E01C7/24 , C08K5/17 , C08L95/00 , C08L97/00 , C09D197/00 , C09J197/00
CPC分类号： C08L95/005 , C08L97/00 , C08L2666/26
摘要： Provided is, particularly, a cationic asphalt emulsion composition which is scarcely affected by temperature during paving and by the characteristics of the aggregates to be used, can secure a sufficient time required to mix aggregates and enables slurry fluidity suitable for paving. The asphalt emulsion composition contains asphalt and water, the composition comprising kraft lignin (A) having a molecular weight of 4000 to 60000 and a specific polyamine (B) in each specific ratio to the asphalt emulsion composition.
摘要翻译：特别地，特别地，在铺路期间几乎不受温度影响的阳离子沥青乳液组合物和所使用的聚集体的特性，可以确保混合聚集体所需的足够的时间并且使浆料流动性适合于铺路。该沥青乳液组合物含有沥青和水，该组合物包含分子量为4000-60000的牛皮纸木质素（A）和与沥青乳液组合物各特定比例的特定多胺（B）。

6. 发明授权

US07425040B1 Outdoor vehicle seat 失效
标题翻译：户外车座
公开(公告)号：US07425040B1
公开(公告)日：2008-09-16
申请号：US11837205
申请日：2007-08-10
申请人： Yuichi Honma
发明人： Yuichi Honma
IPC分类号： A47C7/02
CPC分类号： B60N2/5825 , B60N2/5883 , B62J1/12 , B62J1/18
摘要： An outdoor vehicle seat is formed by placing a cushioning material on a bottom plate, and covering them with a surface skin, and fixing a surface skin end portion onto the bottom plate. Further, a highly water absorbing, highly moisture absorbing, and highly expanding member is arranged between the surface skin end portion and the bottom plate.
摘要翻译：通过将缓冲材料放置在底板上并用表面皮肤覆盖而形成户外车辆座椅，并将表面皮肤端部固定在底板上。此外，在表皮端部和底板之间布置有高吸水性，高吸湿性和高度膨胀的部件。

7. 发明申请

US20050221726A1 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US20050221726A1
公开(公告)日：2005-10-06
申请号：US11095564
申请日：2005-04-01
申请人： Yuichi Honma , Kouji Taira , Shigeaki Takashina
发明人： Yuichi Honma , Kouji Taira , Shigeaki Takashina
IPC分类号： B24B1/00 , B24B37/00 , B24D3/02 , C09G1/02 , C09K3/14
CPC分类号： C09K3/1463 , C09G1/02 , C09K3/1409
摘要： The present invention relates to a polishing composition containing an abrasive having an average particle size of from 1 to 30 nm and water, wherein the abrasive has a packing ratio of from 79 to 90% by weight; a method for manufacturing a substrate, including the steps of introducing the above polishing composition between a substrate and a polishing pad, and polishing the substrate, while contacting the substrate with the polishing composition; and a method for reducing scratches of a substrate to be polished, including the step of polishing the substrate to be polished with the above polishing composition. The polishing composition is suitable for polishing substrates for precision parts including, for example, substrates for magnetic recording media, such as magnetic disks, and opto-magnetic disks, photomask substrates, optical disks, optical lenses, optical mirrors, optical prisms and semiconductor substrates, and the like.
摘要翻译：本发明涉及一种含有平均粒径为1〜30nm的研磨剂和水的抛光组合物，其中研磨剂的填充率为79〜90重量％一种制造基板的方法，包括以下步骤：在基板和抛光垫之间引入上述抛光组合物，并在将基板与抛光组合物接触的同时研磨基板; 以及减少待研磨的基板的划痕的方法，包括用上述抛光组合物抛光待抛光的基板的步骤。抛光组合物适用于抛光用于精密部件的基板，例如磁记录介质如磁盘，光磁盘，光掩模基板，光盘，光学透镜，光学镜，光学棱镜和半导体基板，等等。

8. 发明授权

US06786961B2 Stabilizer for asphalt emulsion 有权
标题翻译：沥青乳液稳定剂
公开(公告)号：US06786961B2
公开(公告)日：2004-09-07
申请号：US10276095
申请日：2002-11-13
申请人： Yuichi Honma , Ryoichi Tamaki , Hirotaka Sasaki
发明人： Yuichi Honma , Ryoichi Tamaki , Hirotaka Sasaki
IPC分类号： C08I9500
CPC分类号： C08J3/03 , C08J2395/00 , C08K5/06 , C08K5/101 , C08L95/005 , C08L95/00
摘要： The present invention provides a stabilizer for asphalt emulsion by which asphalt emulsion having a good chemical stability and being excellent in stationary stability and storage stability can be obtained. A polyoxyethylene adduct compound having a terminal group A selected from a C8-22 alkyl group etc., a terminal group B selected from C1-4 alkyl group etc., and 130 to 500 oxyethylene groups on the average for bonding the terminal groups A and B is used as a stabilizer for asphalt emulsion.
摘要翻译：本发明提供了一种沥青乳液稳定剂，通过该稳定剂可获得具有良好化学稳定性和稳定稳定性和储存稳定性优异的沥青乳液。具有选自C 8-22烷基等的末端基团A，选自C 1-4烷基等的末端基团B，以及平均来说，130〜500个氧化乙烯基团的端基A和 B被用作沥青乳液的稳定剂。

9. 发明申请

US20100190413A1 POLISHING COMPOSITION 审中-公开
标题翻译：抛光组合物
公开(公告)号：US20100190413A1
公开(公告)日：2010-07-29
申请号：US12754385
申请日：2010-04-05
申请人： Kazuhiko NISHIMOTO , Kouji Taira , Kenichi Suenaga , Yuichi Honma
发明人： Kazuhiko NISHIMOTO , Kouji Taira , Kenichi Suenaga , Yuichi Honma
IPC分类号： B24B1/00 , C09K3/14 , C09G1/02
CPC分类号： G11B5/8404 , B24B37/0056 , B24B37/044 , C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition containing an abrasive and water, wherein the polishing composition has a pH of from 0.1 to 7, and satisfies the following conditions: (1) that the number of polishing particles having sizes of 0.56 μm or more and less than 1 μm is 500,000 or less per 1 cm3 of the polishing composition; and (2) that the ratio of polishing particles having sizes of 1 μm or more is 0.001% by weight or less to the entire polishing particles in the polishing composition. The polishing composition is suitable for polishing substrates for precision parts including, for example, recording disk substrates, such as magnetic disks, optical disks, and opto-magnetic disks, photomask substrates, optical lenses, optical mirrors, optical prisms and semiconductor substrates, and the like.
摘要翻译： 1.一种抛光组合物，其含有研磨剂和水，其中，所述研磨用组合物的pH为0.1〜7，满足以下条件：（1）尺寸为0.56μm以上且小于1μm的研磨粒子数为每1cm3抛光组合物500,000或更少; （2）研磨用组合物中的研磨粒子的整体的比例为1μm以上的研磨粒子的比例为0.001重量％以下。抛光组合物适用于抛光用于精密部件的基板，例如磁盘，光盘，光磁盘，光掩模基板，光学透镜，光学镜，光学棱镜和半导体基板等记录盘基板，以及类似。

10. 发明申请

US20050208883A1 Polishing composition 审中-公开
标题翻译：抛光组成
公开(公告)号：US20050208883A1
公开(公告)日：2005-09-22
申请号：US11081560
申请日：2005-03-17
申请人： Hiroyuki Yoshida , Yuichi Honma , Shigeaki Takashina , Toshiya Hagihara
发明人： Hiroyuki Yoshida , Yuichi Honma , Shigeaki Takashina , Toshiya Hagihara
IPC分类号： B24B1/00 , B24B7/24 , B24B37/04 , B24D3/02 , C09G1/02 , C09K3/14
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1436 , C09K3/1463
摘要： The present invention relates to a polishing composition containing an aqueous medium and silica particles, wherein the silica particles in the polishing composition has a zeta potential of from −15 to 40 mV; a method for manufacturing a substrate including the step of polishing a substrate to be polished with a polishing composition containing an aqueous medium and silica particles, wherein the silica particles in the polishing composition has a zeta potential of from −15 to 40 mV; and a method for reducing scratches on a substrate to be polished with a polishing composition containing an aqueous medium and silica particles, including the step of adjusting a zeta potential of silica particles in the polishing composition to −15 to 40 mV. The polishing composition can be favorably used in polishing the substrate for precision parts, including substrates for magnetic recording media such as magnetic discs, optical discs and opto-magnetic discs; photomask substrates; optical lenses; optical mirrors; optical prisms; semiconductor substrates; and the like.
摘要翻译：本发明涉及含有水性介质和二氧化硅颗粒的抛光组合物，其中抛光组合物中的二氧化硅颗粒的ζ电位为-15至40mV; 一种基板的制造方法，其特征在于，包括使用含有水性介质和二氧化硅粒子的研磨用组合物研磨待研磨基板的工序，其中，研磨用组合物中的二氧化硅粒子的ζ电位为-15〜40mV，以及包括将研磨用组合物中的二氧化硅粒子的ζ电位调整为-15〜40mV的步骤的减少含有水性介质和二氧化硅粒子的研磨用组合物的研磨用基板上的划痕的方法。抛光组合物可以有利地用于抛光用于精密部件的基板，包括用于诸如磁盘，光盘和光磁盘的磁记录介质的基板; 光掩模基板; 光学镜片; 光学镜; 光学棱镜半导体衬底; 等等。

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