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1. 发明授权

US08582080B2 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage 有权
标题翻译：具有测量系统初始化，振动补偿，低传输性和轻质细阶段的舞台装配
公开(公告)号：US08582080B2
公开(公告)日：2013-11-12
申请号：US12178240
申请日：2008-07-23
申请人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
发明人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/709
摘要： A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240). In addition, the stage assembly (220) can include a control system (24) that directs power to the mover (255) to position the second stage (240) and to compensate for vibration of the first stage (238).
摘要翻译：围绕第一轴线并沿着第一轴线移动工件（200）的平台组件（220）包括：第一阶段（238）;保持工件（200）的第二阶段（240）;第二推动组件（244），测量系统和初始化系统（1081A）。第二移动器组件（244）围绕第一轴线相对于第一阶段（238）移动第二阶段（240）。当第二级（240）位于围绕第一轴的工作范围内时，测量系统（22）监测第二级（240）围绕第一轴的位置。当第二级（240）围绕工作范围外的第一轴线旋转时，初始化系统（1081A）有助于第二级（240）围绕第一轴的移动。第二移动器组件（244）可以包括减小从第一级（238）到第二级（240）的振动传递的移动器（255）和阻尼器（410）。另外，台架组件（220）可以包括控制系统（24），该控制系统（24）将电力引导到动子（255）以定位第二级（240）并补偿第一级（238）的振动。

2. 发明申请

US20060101928A1 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage 有权
标题翻译：具有测量系统初始化，振动补偿，低传输性和轻质细阶段的舞台装配
公开(公告)号：US20060101928A1
公开(公告)日：2006-05-18
申请号：US11258249
申请日：2005-10-24
申请人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
发明人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
IPC分类号： A47J43/08
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/709
摘要： A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240). In addition, the stage assembly (220) can include a control system (24) that directs power to the mover (255) to position the second stage (240) and to compensate for vibration of the first stage (238).
摘要翻译：围绕第一轴线并沿着第一轴线移动工件（200）的台架组件（220）包括第一台（238），保持工件（200）的第二台（240），第二推动组件（244），测量系统和初始化系统（1081A）。第二移动器组件（244）围绕第一轴线相对于第一阶段（238）移动第二阶段（240）。当第二级（240）位于围绕第一轴的工作范围内时，测量系统（22）监测第二级（240）围绕第一轴的位置。当第二级（240）围绕工作范围外的第一轴线旋转时，初始化系统（1081A）有助于第二级（240）围绕第一轴的移动。第二移动器组件（244）可以包括减小从第一级（238）到第二级（240）的振动传递的移动器（255）和阻尼器（410）。另外，台架组件（220）可以包括控制系统（24），该控制系统（24）将电力引导到动子（255）以定位第二级（240）并补偿第一级（238）的振动。

3. 发明申请

US20080278705A1 STAGE ASSEMBLY WITH MEASUREMENT SYSTEM INITIALIZATION, VIBRATION COMPENSATION, LOW TRANSMISSIBILITY, AND LIGHTWEIGHT FINE STAGE 有权
标题翻译：具有测量系统初始化，振动补偿，低传输和轻量级精细级的阶段组装
公开(公告)号：US20080278705A1
公开(公告)日：2008-11-13
申请号：US12178240
申请日：2008-07-23
申请人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
发明人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
IPC分类号： G03B27/58
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/709
摘要： A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240). In addition, the stage assembly (220) can include a control system (24) that directs power to the mover (255) to position the second stage (240) and to compensate for vibration of the first stage (238).
摘要翻译：围绕第一轴线并沿着第一轴线移动工件（200）的台架组件（220）包括第一台（238），保持工件（200）的第二台（240），第二推动组件（244），测量系统和初始化系统（1081A）。第二移动器组件（244）围绕第一轴线相对于第一阶段（238）移动第二阶段（240）。当第二级（240）位于围绕第一轴的工作范围内时，测量系统（22）监测第二级（240）围绕第一轴的位置。当第二级（240）围绕工作范围外的第一轴线旋转时，初始化系统（1081A）有助于第二级（240）围绕第一轴的移动。第二移动器组件（244）可以包括减小从第一级（238）到第二级（240）的振动传递的移动器（255）和阻尼器（410）。另外，台架组件（220）可以包括控制系统（24），该控制系统（24）将电力引导到动子（255）以定位第二级（240）并补偿第一级（238）的振动。

4. 发明授权

US06523695B1 Method and apparatus for operating a vibration isolation system having electronic and pneumatic control systems 失效
公开(公告)号：US06523695B1
公开(公告)日：2003-02-25
申请号：US09662840
申请日：2000-09-15
申请人： Toshio Ueta , Michael Binnard
发明人： Toshio Ueta , Michael Binnard
IPC分类号： F16F15023
CPC分类号： F16F15/0275 , G03F7/709
摘要： A method and apparatus for implementing an active vibration isolation system (AVIS) is provided. The AVIS includes a pneumatic control system and an electronic control system. The pneumatic control system supports a mass sensitive to vibration and isolates the mass from high frequency external disturbances. The electronic control system isolates the mass from low frequency external disturbances. The pneumatic control system includes a compliance chamber filled with a fluid to pneumatically support the mass, pressure sensor to measure the pressure level in the compliance chamber, and pneumatic actuator to control the pressure level to minimize the effects of pressure variation in the compliance chamber. The electronic control system includes at least one motion sensor to measure the actual position of the mass as the mass moves due to vibration, at least one feedback system to generate a corresponding signal, an electronic controller to generate signal(s) representing the calculated electronic force needed to compensate for the vibration, and an electronic actuator to generate the electric force to isolate the mass from the external disturbances. The pneumatic and electronic control systems work together to provide high frequency response and eliminate heat dissipation from the electronic control system.

5. 发明授权

US06618120B2 Devices and methods for compensating for tilting of a leveling table in a microlithography apparatus 失效
公开(公告)号：US06618120B2
公开(公告)日：2003-09-09
申请号：US09976303
申请日：2001-10-11
申请人： Toshio Ueta
发明人： Toshio Ueta
IPC分类号： G03B2758
CPC分类号： G03F9/7034 , G03F7/70725
摘要： With respect to exposure apparatus, apparatus and methods are disclosed for compensating for lateral shift of a leveling table caused by a tilt (&thgr;) of the leveling table. One embodiment includes a wafer-stage-position loop servo, a leveling-table tilt-position loop servo, and a first feed-forward loop from the leveling-table tilt-position loop servo to the wafer-stage-position loop servo. The first feed-forward loop converts a torque-control signal for the leveling table to a linear-acceleration-control signal for the wafer stage. Thus, the wafer stage moves laterally to compensate for lateral shift of the leveling table. If the exposure apparatus includes a reticle stage controlled by a reticle-stage-position loop servo, then the subject apparatus can include (in addition to or in place of the first feed-forward loop) a second feed-forward loop from the leveling-table tilt-position loop servo to the reticle-stage-position loop servo. The second feed-forward loop converts a positional signal for the leveling table to a position-control signal for the reticle stage, to cause the reticle stage to undergo lateral compensatory motion. The methods and apparatus provide a faster and more accurate compensation for lateral shifts of the leveling table.

6. 发明授权

US07417714B2 Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage 有权
标题翻译：具有测量系统初始化，振动补偿，低传输性和轻质细阶段的舞台装配
公开(公告)号：US07417714B2
公开(公告)日：2008-08-26
申请号：US11258249
申请日：2005-10-24
申请人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
发明人： Michael Binnard , Wen-Hou Ma , Toshio Ueta , Pai-Hsueh Yang , Ting-Chien Teng , Bausan Yuan
IPC分类号： G03B27/58 , G03B27/62 , G03B27/42
CPC分类号： G03F7/70775 , G03F7/70716 , G03F7/709
摘要： A stage assembly (220) that moves a work piece (200) about a first axis and along a first axis includes a first stage (238), a second stage (240) that retains the work piece (200), a second mover assembly (244), a measurement system, and an initialization system (1081A). The second mover assembly (244) moves the second stage (240) relative to the first stage (238) about the first axis. The measurement system (22) monitors the position of the second stage (240) about the first axis when the second stage (240) is positioned within a working range about the first axis. The initialization system (1081A) facilitates movement of the second stage (240) about the first axis when the second stage (240) is rotated about the first axis outside the working range. The second mover assembly (244) can include a mover (255) and a dampener (410) that reduces the transmission of vibration from the first stage (238) to the second stage (240). In addition, the stage assembly (220) can include a control system (24) that directs power to the mover (255) to position the second stage (240) and to compensate for vibration of the first stage (238).
摘要翻译：围绕第一轴线并沿着第一轴线移动工件（200）的台架组件（220）包括第一台（238），保持工件（200）的第二台（240），第二推动组件（244），测量系统和初始化系统（1081A）。第二移动器组件（244）围绕第一轴线相对于第一阶段（238）移动第二阶段（240）。当第二级（240）位于围绕第一轴的工作范围内时，测量系统（22）监测第二级（240）围绕第一轴的位置。当第二级（240）围绕工作范围外的第一轴线旋转时，初始化系统（1081A）有助于第二级（240）围绕第一轴的移动。第二移动器组件（244）可以包括减小从第一级（238）到第二级（240）的振动传递的移动器（255）和阻尼器（410）。另外，台架组件（220）可以包括控制系统（24），该控制系统（24）将电力引导到动子（255）以定位第二级（240）并补偿第一级（238）的振动。

7. 发明授权

US06963821B2 Stage counter mass system 失效
标题翻译：舞台柜体系
公开(公告)号：US06963821B2
公开(公告)日：2005-11-08
申请号：US10361700
申请日：2003-02-11
申请人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
发明人： Michael Binnard , W. Thomas Novak , Toshio Ueta , Bausan Yuan
IPC分类号： B23Q11/00 , G03F7/20 , G01B11/24
CPC分类号： G03F7/70766 , B23Q11/0032 , G03F7/70725
摘要： A wafer stage countermass assembly generally includes a base supporting one or more stages and first and second countermasses. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom and, under ideal conditions, move to counter the movement of the stages in operation and thus preserve the systems center of gravity to avoid unwanted body motion. However, under actual conditions the countermasses may under travel or over travel their ideal trajectory. To more closely track the ideal trajectory, a controller actuates trim motors to apply small forces to the countermasses to push them towards a reference position in the Y direction. A second embodiment also takes into account the X position the stage(s) to cancel torque.
摘要翻译：晶片台反质量组件通常包括支撑一个或多个阶段的基座和第一和第二反作用力。第一和第二阶段以一个或多个自由度移动。反恐怖主义至少有一个自由度，在理想条件下，可以抵抗运行阶段的运动，从而保持系统的重心，避免不必要的身体运动。然而，在实际情况下，反恐怖主义可能在行进或超越其理想轨迹。为了更紧密地跟踪理想轨迹，控制器启动微调电机，以将小的力施加到反作用体上，将其推向Y方向的参考位置。第二实施例还考虑到X位置，以消除扭矩的阶段。

8. 发明授权

US06686991B1 Wafer stage assembly, servo control system, and method for operating the same 失效
标题翻译：晶圆台组装，伺服控制系统及其操作方法
公开(公告)号：US06686991B1
公开(公告)日：2004-02-03
申请号：US09705953
申请日：2000-11-06
申请人： Michael Binnard , Toshio Ueta
发明人： Michael Binnard , Toshio Ueta
IPC分类号： G03B2758
CPC分类号： G03F9/7026 , G03F7/70716
摘要： A wafer stage assembly, wafer table servo control system, and method for operating the same, are provided for use in combination with a projection lens assembly in a semiconductor wafer manufacturing process. The wafer stage assembly includes a wafer stage base supporting a wafer stage to position the semiconductor wafer, a wafer table connected to the wafer stage to support the wafer, a plurality of sensors, and an actuator. The sensors include a first sensor to determine a position of an exposure point on the wafer relative to the projection lens assembly, and a second sensor to determine a position of a focal point of the projection lens assembly relative to the exposure point. To increase focusing properties of the projection lens assembly, in response to the determined positions of the exposure point and the focal point, the actuator moves the wafer table so that the exposure point substantially coincides with the focal point. The wafer table servo control system is provided to operate the wafer stage assembly. The servo control system includes a first sensor controller to generate a first position signal of an exposure point on the wafer table relative to a projection lens assembly, and a second sensor controller to generate a second position signal of a focal point of the projection lens assembly relative to the exposure point. The servo control system also includes a wafer table controller to determine and generate a correction force corresponding to the first and second position signals. The correction force is then exerted onto the wafer table to bring the exposure point to substantially coincide with the focal point.
摘要翻译：提供晶片台组件，晶片台伺服控制系统及其操作方法，用于与半导体晶片制造工艺中的投影透镜组件结合使用。晶片台组件包括支撑晶片台以定位半导体晶片的晶片台基座，连接到晶片台以支撑晶片的晶片台，多个传感器和致动器。传感器包括：第一传感器，用于确定相对于投影透镜组件的晶片上的曝光点的位置;以及第二传感器，用于确定投影透镜组件相对于曝光点的焦点的位置。为了增加投影透镜组件的聚焦性能，响应于确定的曝光点和焦点的位置，致动器移动晶片台，使得曝光点基本上与焦点一致。提供晶片台伺服控制系统以操作晶片台组件。伺服控制系统包括：第一传感器控制器，用于相对于投影透镜组件产生晶片台上的曝光点的第一位置信号;以及第二传感器控制器，用于产生投影透镜组件的焦点的第二位置信号相对于曝光点。伺服控制系统还包括晶片台控制器，用于确定并产生对应于第一和第二位置信号的校正力。然后将校正力施加到晶片台上以使曝光点与焦点基本一致。

9. 发明授权

US06504162B1 Stage device, control system, and method for stabilizing wafer stage and wafer table 失效
标题翻译：舞台装置，控制系统和稳定晶片台和晶圆台的方法
公开(公告)号：US06504162B1
公开(公告)日：2003-01-07
申请号：US09662843
申请日：2000-09-15
申请人： Michael Binnard , Toshio Ueta
发明人： Michael Binnard , Toshio Ueta
IPC分类号： H01J37304
CPC分类号： G03F7/70725
摘要： A wafer stage device and control system are provided to stabilize a wafer stage and a wafer table in a wafer manufacturing process. The wafer table supports the semiconductor wafer, while the wafer stage is accelerated in response to a wafer manufacturing control system to position the wafer table. The wafer stage device includes a set of flexures connecting the wafer table to the wafer stage. The flexures are positioned in a plane which is substantially in alignment with an upper surface of the wafer. The flexure's configuration causes a rotational error, such as pitching or rolling, of the wafer table as the wafer stage moves. The wafer stage device further includes a plurality of actuators to control the rotational error by exerting a stabilizing torque to the wafer table. The control system determines the stabilizing torque necessary to correct the pitching or rolling error of the wafer table.
摘要翻译：提供晶片台装置和控制系统以在晶片制造过程中稳定晶片台和晶片台。晶片台支撑半导体晶片，同时响应于晶片制造控制系统来加速晶片台以定位晶片台。晶片台装置包括将晶片台连接到晶片台的一组挠曲件。挠曲件位于与晶片的上表面基本上对准的平面中。当晶片台移动时，弯曲构造导致晶片台的旋转误差，例如俯仰或滚动。晶片台装置还包括多个致动器，以通过向晶片台施加稳定转矩来控制旋转误差。控制系统确定校正晶片台的俯仰或滚动误差所需的稳定转矩。

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