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1. 发明授权

US09639004B2 Imaging optics and projection exposure installation for microlithography with an imaging optics 有权
公开(公告)号：US09639004B2
公开(公告)日：2017-05-02
申请号：US13218962
申请日：2011-08-26
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G03B27/54 , G03F7/20 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0652 , G02B17/0657
摘要： An imaging optics has at least six mirrors, which image an object field in an object plane in an image field in an image plane. An entry pupil of the imaging optics is arranged in the imaging beam path in front of the object field. At least one of the mirrors has a through-opening for the passage of imaging light. A mechanically accessible pupil, in which an obscuration stop is arranged for the central shading of the pupil of the imaging optics, is located in a pupil plane in the imaging beam path between the object field and a first of the through-openings. A first imaging part beam directly after a second mirror in the imaging beam path after the object field and a second imaging part beam directly after a fourth mirror in the imaging beam path after the object field intersect one another in an intersection region. The result is an imaging optics, in which a handleable combination of small imaging errors, manageable production and a good throughput for the imaging light is achieved.

2. 发明授权

US09201226B2 Imaging optics 有权
标题翻译：成像光学
公开(公告)号：US09201226B2
公开(公告)日：2015-12-01
申请号：US13438591
申请日：2012-04-03
申请人： Ulrich Loering , Ralf Mueller , Hans-Juergen Mann , Norman Baer
发明人： Ulrich Loering , Ralf Mueller , Hans-Juergen Mann , Norman Baer
IPC分类号： G03B27/54 , G02B17/06 , G02B5/00 , G02B27/00 , G03F7/20
CPC分类号： G02B17/0657 , G02B5/005 , G02B27/0018 , G03F7/70233 , G03F7/70275
摘要： An imaging optics includes a plurality of mirrors which reflect imaging light to image an object field in an object plane into an image field in an image plane. A mirror body of at least one of the mirrors has a through-opening for the imaging light to pass through. The through-opening has an internal region of a smallest opening width in the mirror body. The through-opening expands from the internal region towards both edge regions of the mirror body. A disturbing influence of unused light portions is reduced or eliminated completely.
摘要翻译：成像光学器件包括多个反射镜，其反射成像光以将物平面中的物场成像到图像平面中的图像场。至少一个反射镜的镜体具有用于成像光通过的通孔。通孔具有镜体中最小开口宽度的内部区域。通孔从内部区域向镜体的两个边缘区域扩展。未使用的光部分的干扰影响被完全消除或消除。

3. 发明授权

US09188771B2 Reflective optical imaging system 有权
标题翻译：反光光学成像系统
公开(公告)号：US09188771B2
公开(公告)日：2015-11-17
申请号：US13313641
申请日：2011-12-07
申请人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
发明人： Aurelian Dodoc , Christoph Zaczek , Sascha Migura , Gerhard Braun , Hans-Juergen Mann , Hans-Jochen Paul
IPC分类号： G03B27/68 , G02B17/06
CPC分类号： G02B17/0657 , G03F7/70233
摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.
摘要翻译：借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。每个反射镜具有镜面，反射层布置具有单个层序列。

4. 发明授权

US09134626B2 Microscope and microscopy method for space-resolved measurement of a predetermined structure, in particular a structure of a lithographic mask 有权
标题翻译：用于预定结构的空间分辨测量的显微镜和显微镜方法，特别是光刻掩模的结构
公开(公告)号：US09134626B2
公开(公告)日：2015-09-15
申请号：US12517583
申请日：2007-11-20
申请人： Hans-Juergen Mann , Michael Totzeck , Norbert Kerwien
发明人： Hans-Juergen Mann , Michael Totzeck , Norbert Kerwien
IPC分类号： G02B27/28 , G03F7/20 , G02B21/00 , G02B21/06 , G02B21/16 , G03F1/00
CPC分类号： G03F7/70625 , G02B21/0092 , G02B21/06 , G02B21/16 , G02B27/28 , G02B27/283 , G03F1/0092 , G03F1/84 , G03F7/70616
摘要： A microscope is provided for space-resolved measurement of a predetermined structure. The microscope includes a source of radiation, which emits electromagnetic radiation of a predetermined wavelength, an optical system, which irradiates the electromagnetic radiation onto the structure to be measured and images the structure, irradiated with the electromagnetic radiation, onto a detector. The optical system has two eigen polarization conditions, and the optical system includes a polarization module by which a polarization condition can be set for the electromagnetic radiation of the source of radiation, the polarization conditions corresponding to the eigen polarization conditions.
摘要翻译：提供了用于预定结构的空间分辨测量的显微镜。显微镜包括发射预定波长的电磁辐射的辐射源，将电磁辐射照射到待测量的结构上并将被电磁辐射照射的结构成像到检测器上的光学系统。光学系统具有两个本征极化条件，并且光学系统包括偏振模块，通过该偏振模块可以对辐射源的电磁辐射设置偏振条件，对应于特征极化条件的偏振条件。

5. 发明授权

US09013678B2 Projection objective having mirror elements with reflective coatings 有权
标题翻译：具有反射涂层的镜面元件的投影物镜
公开(公告)号：US09013678B2
公开(公告)日：2015-04-21
申请号：US13613390
申请日：2012-09-13
申请人： Danny Chan , Hans-Juergen Mann , Sascha Migura
发明人： Danny Chan , Hans-Juergen Mann , Sascha Migura
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20 , B82Y10/00 , G02B5/08 , G02B13/14 , G02B17/06 , G21K1/06
CPC分类号： G03F7/70308 , B82Y10/00 , G02B5/0891 , G02B13/143 , G02B17/0663 , G03F7/70233 , G21K1/062 , G21K2201/067
摘要： An optical system is disclosed that includes a plurality of elements arranged to image radiation at a wavelength λ from an object field in an object surface to an image field in an image surface. The elements include mirror elements have a reflective surface formed by a reflective coating positioned at a path of radiation. At least one of the mirror elements has a rotationally asymmetrical reflective surface deviating from a best-fit rotationally symmetric reflective surface by about λ or more at one or more locations. The elements include an apodization correction element effective to correct a spatial intensity distribution in an exit pupil of the optical system relative to the optical system without the apodization correcting element. The apodization correction element can be effective to increase symmetry of the spatial intensity distribution in the exit pupil relative to the optical system without the apodization correcting element.
摘要翻译：公开了一种光学系统，其包括多个元件，其被布置成将从物体表面中的物场到波长λ的辐射成像到图像表面中的图像场。元件包括镜元件具有由位于辐射路径上的反射涂层形成的反射表面。至少一个镜元件具有在一个或多个位置处偏离最佳拟合旋转对称反射表面约λ或更大的旋转非对称反射表面。这些元件包括有效地校正光学系统的出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的变迹校正元件。变迹校正元件可以有效地增加出射光瞳相对于没有变迹校正元件的光学系统的空间强度分布的对称性。

6. 发明授权

US08827467B2 Magnifying imaging optical unit and metrology system including same 有权
标题翻译：放大成像光学单元和包括其的计量系统
公开(公告)号：US08827467B2
公开(公告)日：2014-09-09
申请号：US13358026
申请日：2012-01-25
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G02B5/08 , G03F1/24 , G02B17/06 , G03F1/84 , G21K7/00 , B82Y40/00 , B82Y10/00
CPC分类号： G02B17/0657 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/84 , G21K7/00
摘要： An imaging optical unit includes at least four mirrors to image an object field in an object plane into an image field in an image plane. The ratio of the structural length of the imaging optical unit to the imaging scale of the imaging optical unit is less than 4.9 mm. The imaging optical unit provides improved handling properties, such as, for example, when used in a metrology system.
摘要翻译：成像光学单元包括至少四个反射镜，以将物平面中的物场映像成图像平面中的图像场。成像光学单元的结构长度与成像光学单元的成像尺度之比小于4.9mm。成像光学单元提供改进的处理性能，例如当用于计量系统时。

7. 发明授权

US08614785B2 Microlithography projection system with an accessible diaphragm or aperture stop 有权
公开(公告)号：US08614785B2
公开(公告)日：2013-12-24
申请号：US13173560
申请日：2011-06-30
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G03B27/70 , G02B17/06 , G02B27/18 , G03F7/20
CPC分类号： G03F7/70058 , G02B17/0647 , G03F7/70233 , G03F7/7025 , G03F7/70258 , G03F7/70275 , G03F7/708
摘要： The invention relates to a microlithography projection lens for wavelengths

8. 发明授权

US08355201B2 Catadioptric projection objective 有权
公开(公告)号：US08355201B2
公开(公告)日：2013-01-15
申请号：US13081394
申请日：2011-04-06
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1

9. 发明授权

US08339701B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08339701B2
公开(公告)日：2012-12-25
申请号：US12817628
申请日：2010-06-17
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0804 , G02B17/08 , G02B17/0812 , G02B17/0844 , G02B17/0856 , G02B17/0892 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的反射折射投射物镜包括：用于将设置在物平面中的图案成像为第一中间图像的第一物镜部分; 第二目标部分，用于将第一中间成像成像成第二中间图像; 用于将第二中间成像直接成像到图像平面上的第三目标部分; 其中具有第一连续镜面的第一凹面镜和具有第二连续镜面的至少一个第二凹面镜布置在所述第二中间图像的上游; 瞳孔表面形成在物平面与第一中间图像之间，第一和第二中间图像之间以及第二中间图像与图像平面之间; 并且所有凹面反射镜光学地远离光瞳表面布置。该系统具有中等透镜材料质量消耗的非常高的数值孔径的潜力。

10. 发明授权

US08317345B2 Catoptric objectives and systems using catoptric objectives 有权
标题翻译：使用反射目标的目标和系统
公开(公告)号：US08317345B2
公开(公告)日：2012-11-27
申请号：US13183823
申请日：2011-07-15
申请人： Hans-Juergen Mann , David Shafer , Wilhelm Ulrich
发明人： Hans-Juergen Mann , David Shafer , Wilhelm Ulrich
IPC分类号： G02B5/10
CPC分类号： G03F7/70233 , G02B13/143 , G02B17/061 , G02B17/0652 , G02B17/0657
摘要： In general, in one aspect, the invention features an objective arranged to image radiation from an object plane to an image plane, including a plurality of elements arranged to direct the radiation from the object plane to the image plane, wherein the objective has an image side numerical aperture of more than 0.55 and a maximum image side field dimension of more than 1 mm, and the objective is a catoptric objective.
摘要翻译：通常，在一个方面，本发明的特征在于设置成将从物体平面到图像平面的辐射成像的目标，包括布置成将来自物体平面的辐射引导到图像平面的多个元件，其中物镜具有图像侧面数值孔径大于0.55，最大像侧场尺寸大于1 mm，目标是一个反射目标。

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