基本信息:
- 专利标题： APPARATUS AND METHODS FOR VACUUM-COMPATIBLE SUBSTRATE THERMAL MANAGEMENT
- 专利标题（中）：用于真空兼容衬底热管理的装置和方法
- 申请号：PCT/US2011049768 申请日：2011-08-30
- 公开(公告)号：WO2012030846A3 公开(公告)日：2012-08-16
- 发明人： ROWAN JASON KEITH , CHEN LI-MIN , ROBINZON RONI , OHANIAN CHRISTOPHER VREJE
- 申请人： KLA TENCOR CORP , ROWAN JASON KEITH , CHEN LI-MIN , ROBINZON RONI , OHANIAN CHRISTOPHER VREJE
- 专利权人： KLA TENCOR CORP,ROWAN JASON KEITH,CHEN LI-MIN,ROBINZON RONI,OHANIAN CHRISTOPHER VREJE
- 当前专利权人： KLA TENCOR CORP,ROWAN JASON KEITH,CHEN LI-MIN,ROBINZON RONI,OHANIAN CHRISTOPHER VREJE
- 优先权： US87572010 2010-09-03
- 主分类号： H01L21/677
- IPC分类号： H01L21/677
摘要：
One embodiment relates to an apparatus for vacuum-compatible substrate thermal management. The apparatus includes a load-lock chamber coupled to a vacuum chamber, a light-emitting diode array, and a substrate stage. The load-lock chamber is configured to hold a substrate prior to the substrate being transferred into the vacuum chamber, and a substrate stage is configured to hold the substrate in the vacuum chamber. The light-emitting diode array is configured to warm the substrate while the substrate is in the load-lock chamber. Other features, aspects and embodiments are also disclosed.
摘要（中）：
一个实施例涉及用于真空兼容衬底热管理的设备。 该设备包括耦合到真空室，发光二极管阵列和衬底台的负载锁定室。 负载锁定腔室被配置成在基板被传送到真空腔室之前保持基板，并且基板台被配置为将基板保持在真空腔室中。 发光二极管阵列被配置为在衬底处于加载锁定室中时加热衬底。 其他特征，方面和实施例也被公开。