基本信息:
- 专利标题： 微影用塗布膜之形成方法
- 专利标题（英）：Method for forming coating film for lithography
- 专利标题（中）：微影用涂布膜之形成方法
- 申请号：TW105110683 申请日：2016-04-06
- 公开(公告)号：TW201641166A 公开(公告)日：2016-12-01
- 发明人： 荻原勤 , OGIHARA, TSUTOMU , 森澤拓 , MORISAWA, TAKU
- 申请人： 信越化學工業股份有限公司 , SHIN-ETSU CHEMICAL CO., LTD.
- 专利权人： 信越化學工業股份有限公司,SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人： 信越化學工業股份有限公司,SHIN-ETSU CHEMICAL CO., LTD.
- 代理人： 周良謀; 周良吉
- 优先权： 2015-079618 20150408
- 主分类号： B05C11/10
- IPC分类号： B05C11/10 ; B05D1/40 ; B01D11/04
The present invention provides a method for forming a coating film for a lithography, comprising the steps of: performing spin coating of a composition for forming a coating film for a lithography onto a substrate for producing a semiconductor device by using a spin coating device provided with an integrated filter in which a filtration membrane and a housing are integrated; and heating the substrate coated with the composition for forming a coating film for a lithography; thereby forming a coating film for a lithography on the substrate, wherein the integrated filter is a filter in which eluting material is in an amount of 3 mg or less per a filter, the eluting material being extracted by circulating an organic solvent at a rate of 10 ml/min for 24 hours. This method enables to form a coating film for a lithography with its coating defects are extremely reduced.
公开/授权文献:
- TWI583453B 微影用塗布膜之形成方法 公开/授权日：2017-05-21
信息查询:
EspacenetIPC结构图谱:
| B | 作业；运输 |
| --B05 | 一般喷射或雾化；对表面涂覆液体或其他流体的一般方法 |
| ----B05C | 一般对表面涂布液体或其他流体的装置 |
| ------B05C11/00 | 在B05C1/00至B05C9/00中没有专门列入的部件、零件及附件 |
| --------B05C11/10 | .液体或其他流体的存贮、供给或控制，过量液体或其他流体的回收 |