The present invention relates to a chemical mechanical polishing conditioner and associated methods. The method for manufacturing a chemical mechanical polishing conditioner comprises: (A) providing a non-planar substrate; (B) providing a bonding layer is disposed on the surface of the non-planar substrate; (C) providing a plurality of abrasive particles, wherein it is embedded in a surface of the bonding layer, and (D) heating and curing the bonding layer, a planar substrate is formed by compensation for the deformation of non-planar substrate during the bonding layer curing, and the abrasive particles are fixed by bonding layer to the surface of the planar substrate; wherein, after step (D), the tips of the abrasive particles with a leveled height. Therefore, the present can effectively improve the problem of thermal deformation of the substrate of the chemical mechanical polishing conditioner during heating and curing process, and enhance the surface flatness of chemical mechanical polishing conditioner.