基本信息:
- 专利标题： 더블 패터닝 공정을 위한 디자인 레이아웃 디콤포지션 방법
- 专利标题（英）：Method of decomposing design layout for double patterning process
- 申请号：KR1020140014295 申请日：2014-02-07
- 公开(公告)号：KR102253129B1 公开(公告)日：2021-05-18
- 发明人： 서상욱 , 이정훈 , 신혜수
- 申请人： 삼성전자주식회사
- 申请人地址： , Samsung-ro, Yeongtong-gu...
- 专利权人： 삼성전자주식회사
- 当前专利权人： 삼성전자주식회사
- 当前专利权人地址： , Samsung-ro, Yeongtong-gu...
- 代理人： 특허법인 고려
- 主分类号： G06F30/00
- IPC分类号： G06F30/00
摘要：
컴퓨팅시스템에의해폴리곤형상의디자인레이아웃을커브드형상의디자인레이아웃으로변환하고, 상기커브드형상의디자인레이아웃에컬러링을진행하며, 상기컬러링된커브드형상의디자인레이아웃의스티칭영역에아큐트코너방지용스티칭형상을생성하며, 상기아큐트코너방지용스티칭형상이생성된커브드형상의디자인레이아웃을컬러에따라각각분리하며, 및상기분리된각각의커브드형상의디자인레이아웃을폴리곤형상의디자인레이아웃으로변환하는것을포함하는더블패터닝공정을위한디자인레이아웃디콤포지션방법을제공한다.
摘要（英）：
A method of decomposing a design layout for a double patterning process is provided. The method includes changing, by a computing system, a design layout of a first polygon type to a design layout of a curved polygon type; coloring the design layout of the curved polygon type; generating stitching shapes for preventing acute corners in stitching areas of the colored design layout of the curved polygon type; separating the design layout including the stitching shapes for preventing the acute corners into separated design layouts of curved polygon type according to colors; and changing the separated design layouts of the curved polygon type to design layouts of a second polygon type.
公开/授权文献:
- KR1020150093472A 더블 패터닝 공정을 위한 디자인 레이아웃 디콤포지션 방법 公开/授权日：2015-08-18