PURPOSE: A resist composition and a resist pattern manufacturing method using the same are provided to achieve wide depth of focus in resist patterns. CONSTITUTION: A resist composition includes a resin, an acid generator represented by chemical formula II, and a compound represented by chemical formula I. The resin is insoluble or hardly soluble to an alkali aqueous solution and becomes soluble to the alkali aqueous solution by the action of acid. In chemical formula I, R1 and R2 are respectively C1-C12 hydrocarbon groups, C1-C6 alkoxy groups, C2-C7 acyl groups, C2-C7 acyloxy groups, C2-C7 alkoxycarbonyl groups, nitro groups, or halogen atoms; and m and n are the integer of 0 to 4, respectively. In chemical formula II, Q1 and Q2 are respectively fluorine atoms or C1-C6 perfluoroalkyl groups; L1 is *-CO-O-L or *-CH2-O-L, and * is a bond to -CQ1Q2; La and Lb are respectively C1-C15 divalent saturated hydrocarbon groups, and one or more -CH_2- in the divalent hydrocarbon groups are substitutable with -O- or -CO-; a cyclic W1 is a C2-C36 heterocyclic group; and Z+ is an organic cation.