基本信息:
- 专利标题： 블록공중합체 정렬을 이용한 나노 구조물 제조방법
- 专利标题（英）：Method for fabricating nano-structure using alignment of block copolymer
- 专利标题（中）：使用嵌段共聚物配对制备纳米结构的方法
- 申请号：KR1020110070576 申请日：2011-07-15
- 公开(公告)号：KR101299559B1 公开(公告)日：2013-09-04
- 发明人： 최대근 , 정준호 , 이지혜 , 최준혁 , 정주연 , 이응숙
- 申请人： 한국기계연구원
- 申请人地址： 대전광역시 유성구 가정북로 *** (장동)
- 专利权人： 한국기계연구원
- 当前专利权人： 한국기계연구원
- 当前专利权人地址： 대전광역시 유성구 가정북로 *** (장동)
- 代理人： 조영현; 나승택
- 主分类号： B82B3/00
- IPC分类号： B82B3/00 ; B82B1/00 ; B82Y40/00
이에 의하여, 단일 공정으로 블록공중합체를 원하는 형태로 정렬하여 나노 구조물을 제조할 수 있는 블록공중합체 정렬을 이용한 나노 구조물 제조방법이 제공된다.
The present invention relates to a block copolymer manufacturing method using nanostructure alignment, nano-structure manufacturing method using a block copolymer according to the invention is arranged reaction layer lamination step of laminating a reaction layer on a substrate; The convex portion formed to be spaced apart from each other to form a plurality of projections on said reaction layer; By irradiating the ion beam to the reaction layer between the convex portions adjacent to but etching the reaction layer, the pre-patterns to the at least a portion of the reaction layer that is etched by the ion beam to be re-deposited on the convex portion side wall surface to form a pre-pattern forming step; Convex portion removing step of removing parts of the projection; Reaction layer removing step of removing the reaction layer remaining on the substrate between the neighboring pattern-free; And it characterized in that it comprises a; on the substrate block copolymer pattern formation step of aligning the block copolymer pattern between the neighboring pattern-free.
Accordingly, there is provided a nano-structure manufacturing method using a block copolymer by block aligned in a single alignment process the copolymer into a desired shape to produce the nanostructure.
公开/授权文献:
- KR1020130009448A 블록공중합체 정렬을 이용한 나노 구조물 제조방법 公开/授权日：2013-01-23
信息查询:
EspacenetIPC结构图谱:
| B | 作业；运输 |
| --B82 | 超微技术 |
| ----B82B | 超微结构；超微结构的制造或处理 |
| ------B82B3/00 | 超微结构的制造或处理 |