基本信息:
- 专利标题: 測定システム
- 专利标题(英):MEASUREMENT SYSTEM
- 申请号:JP2019207851 申请日:2019-11-18
- 公开(公告)号:JP2021082679A 公开(公告)日:2021-05-27
- 发明人: 奥田 通孝 , 斎藤 祐貴 , 成田 寿男 , 原子 翔 , 福士 樹希也
- 申请人: 株式会社日本マイクロニクス
- 申请人地址: 東京都武蔵野市吉祥寺本町2丁目6番8号
- 专利权人: 株式会社日本マイクロニクス
- 当前专利权人: 株式会社日本マイクロニクス
- 当前专利权人地址: 東京都武蔵野市吉祥寺本町2丁目6番8号
- 代理人: 三好 秀和; 伊藤 正和; 松永 宣行
- 主分类号: H01L21/66
- IPC分类号: H01L21/66
To provide a measurement system capable of suppressing increase in a measurement time of an optical semiconductor element formed on a semiconductor substrate.SOLUTION: A measurement system 1 comprises: an optical probe array 12 in which an optical probe group 111 to optical probe group 11m that each include an optical probe 101 to 10n are arranged (n, m: an integer of 2 or more); an optical signal selector 211 to optical signal selector 21m, each of which corresponds on one-to-one basis to any of the optical probe group 111 to optical probe group 11m and selects and outputs one optical signal from optical signals from respective optical probes 101 to 10n of the corresponding probe group; and a control circuit 50 for controlling the optical signal selector 211 to optical signal selector 21m. The measurement system 1, by control of the control circuit 50, repeats switching of optical signal selection by the optical signal selector 211 to optical signal selector 21m until optical signals output from all optical probes 101 to 10n included in the optical probe group 111 to optical probe group 11m are selected.SELECTED DRAWING: Figure 1
信息查询:
EspacenetIPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L21/00 | 专门适用于制造或处理半导体或固体器件或其部件的方法或设备 |
--------H01L21/66 | .在制造或处理过程中的测试或测量 |