基本信息:
- 专利标题: 間接加熱蒸着源
- 专利标题(英):INDIRECT HEATING VAPOR DEPOSITION SOURCE
- 申请号:JP2017116089 申请日:2017-06-13
- 公开(公告)号:JP2019002038A 公开(公告)日:2019-01-10
- 发明人: SUGAWARA KOJI , KAMIOKA MASANORI , SUZUKI KOSUKE , TAKASHIMA TORU
- 申请人: JEOL LTD
- 专利权人: JEOL LTD
- 当前专利权人: JEOL LTD
- 优先权: JP2017116089 2017-06-13
- 主分类号: C23C14/30
- IPC分类号: C23C14/30 ; C23C14/24
To provide an indirect heating vapor deposition source capable of reducing the amount of deposition of a deposit to an outer liner.SOLUTION: An indirect heating vapor deposition source 21 for heating a vessel (a liner 22) charged with a vapor deposition material 4 by thermo-electrons emitted from an electron source 6 to heat and evaporate the vapor deposition material 4 includes an outer liner 31, an inner liner 32, the electron source 6 and a reflector 23. The inner liner 32 is arranged on the inner side of the outer liner 31 and is charged with the vapor deposition material 4; the electron source 6 supplies electrons for heating the outer liner by electron bombardment; and the reflector 23 is arranged between the inner liner 32 and the outer liner 31 and reflects radiant heat emitted from the outer liner 31.SELECTED DRAWING: Figure 2
公开/授权文献:
- JP6901328B2 間接加熱蒸着源 公开/授权日:2021-07-14