发明公开
EP2299237A3 Gantry stage orthogonality error measurement method and error compensation method
审中-公开
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基本信息:
- 专利标题: Gantry stage orthogonality error measurement method and error compensation method
- 专利标题(中):一种用于测量正交性用于与门户和误差补偿方法的平台方法
- 申请号:EP10009314.5 申请日:2010-09-08
- 公开(公告)号:EP2299237A3 公开(公告)日:2011-03-30
- 发明人: Ko, Byoung gwan
- 申请人: Soonhan Engineering Corp.
- 申请人地址: 333-11 Sangdaewon-Dong Jungwon-Gu Sungnam-City Kyungki do 482-806 KR
- 专利权人: Soonhan Engineering Corp.
- 当前专利权人: Soonhan Engineering Corp.
- 当前专利权人地址: 333-11 Sangdaewon-Dong Jungwon-Gu Sungnam-City Kyungki do 482-806 KR
- 代理机构: Hofmann, Ernst
- 优先权: KR20090086527 20090914
- 主分类号: G01B21/04
- IPC分类号: G01B21/04 ; H01L21/68
摘要:
The present invention relates to a Gantry stage orthogonality error measurement method and error compensation method for homing processing: more specifically, it relates to a Gantry stage orthogonality error measurement method and error compensation method for homing processing with an enhanced level of homing processing repeatability and a capability for minimizing orthogonality errors at the time of Gantry stage homing processing used with semiconductors, FPD equipment or precision machining equipment (Fig. 4).
公开/授权文献:
IPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01B | 长度、厚度或类似线性尺寸的计量;角度的计量;面积的计量;不规则的表面或轮廓的计量 |
------G01B21/00 | 不适合于本小类其他组中所列的特定类型计量装置的计量设备或其零部件 |
--------G01B21/02 | .用于计量长度、宽度或厚度 |
----------G01B21/04 | ..通过测量各点的坐标 |