专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2005040917A3 SYSTEM AND METHOD FOR LITHOGRAPHY SIMULATION 审中-公开
标题翻译：系统和方法进行算术仿真
公开(公告)号：WO2005040917A3
公开(公告)日：2006-02-23
申请号：PCT/US2004028864
申请日：2004-09-07
申请人： BRION TECH INC , YE JUN , LU YEN-WEN , CAO YU , CHEN LUOQI , CHEN XUN
发明人： YE JUN , LU YEN-WEN , CAO YU , CHEN LUOQI , CHEN XUN
IPC分类号： G03B27/54 , G03F20060101 , G03F7/20 , G06F17/50 , G06K9/00 , G06T7/00 , G03F1/02 , G06F19/00 , G06K9/20 , G06K9/36
CPC分类号： G06F17/5009 , G03F1/00 , G03F7/004 , G03F7/705 , G03F7/70666 , G06F17/5081 , G06F19/00 , G06F2217/12 , G06F2217/14 , G06T7/0004 , G06T2207/30148 , G21K5/00
摘要： There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture (110), including application-specific hardware accelerators (116a 116n), and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system (110) includes: general purpose-type computing device(s) (114a, 142a, 142b) to perform the case-based logic having branches and interdependency in the data handling and accelerator subsystems (146a1 146ax, , 146n1 146nx) to perform a majority of the computation intensive tasks.
摘要翻译：这里描述和说明了许多发明。在一个方面，本发明涉及用于模拟，验证，检查，表征，确定和/或评估光刻设计，技术和/或系统的技术和系统，和/或由其执行的各个功能或使用的组件在其中。在一个实施例中，本发明是加速光刻特性和/或性质的光刻模拟，检查，表征和/或评估以及光刻系统和处理技术的效果和/或相互作用的系统和方法。在这方面，在一个实施例中，本发明采用包括特定于应用的硬件加速器（116a 116n）的光刻仿真系统架构（110），以及用于加速和促进掩模的验证，表征和/或检查的处理技术设计，例如，RET设计，包括整个光刻工艺的详细的仿真和表征，以验证设计在最终的晶片图案上实现和/或提供期望的结果。系统（110）包括：通用目的型计算设备（114a，142a，142b），用于执行在数据处理和加速器子系统（146a1 146ax，146n1 146nx）中具有分支和相互依赖性的基于情况的逻辑，执行大部分计算密集型任务。

IPRDB

热门服务

关于我们

友情链接

联系方式