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    • 4. 发明申请
    • 精製モノフルオロメタンの製造方法
    • 生产纯化单氟代甲烷的方法
    • WO2012077561A1
    • 2012-06-14
    • PCT/JP2011/077745
    • 2011-12-01
    • セントラル硝子株式会社岡本 正宗高田 直門井村 英明
    • 岡本 正宗高田 直門井村 英明
    • C07C17/395C07C19/08
    • C07C17/395C07C19/08
    •  本発明の精製モノフルオロメタンの製造方法は、トリフルオロメタンを少なくとも含有する粗モノフルオロメタンを下記一般式(1)で表されるアミドおよび塩基を含むトリフルオロメタン処理液と接触させる処理工程を含む。 (式中、R 1 、R 2 およびR 3 は、それぞれ独立に水素原子またはアルキル基を表し、互いに結合して環を形成してもよく、環炭素は酸素原子、窒素原子もしくは硫黄原子で置換してもよい。) 該処理工程により、沸点が近接して蒸留では効率的に分離することのできないトリフルオロメタン含有モノフルオロメタンから実質上トリフルオロメタンを含まないモノフルオロメタンを得ることができる。
    • 该纯化单氟甲烷的制造方法包括将含有至少三氟甲烷的粗一氟甲烷与含有通式(1)表示的酰胺和碱的三氟甲烷处理流体接触的处理工序。 在通式中,R 1,R 2和R 3各自独立地为氢原子或烷基,或者可以彼此键合形成环,其中环碳原子可被氧原子,氮原子或硫原子代替 。 通过处理步骤,可以从含三氟甲烷的一氟甲烷获得基本上不含三氟甲烷的单氟甲烷。 顺便提及,三氟甲烷的沸点接近于单氟甲烷的沸点,因此两者不能通过蒸馏有效分离。
    • 5. 发明申请
    • SELECTIVELY REACTING OLEFINS HAVING A TERMINAL CF2 GROUP IN A MIXTURE
    • 具有末端CF2基团的混合物的选择性反应烯烃
    • WO2007123786A1
    • 2007-11-01
    • PCT/US2007/008050
    • 2007-04-03
    • E. I. DU PONT DE NEMOURS AND COMPANYNAPPA, Mario, JosephSIEVERT, Allen, CapronDELYAGINA, Nina, IvanovnaCHERSTKOV, Victor, Filippovich
    • NAPPA, Mario, JosephSIEVERT, Allen, CapronDELYAGINA, Nina, IvanovnaCHERSTKOV, Victor, Filippovich
    • C07C17/395C07C21/18
    • C07C17/395C07C303/24C07C305/06
    • A process is disclosed for reducing the mole ratio of (1) compounds of the formula Y 1 Y 2 C=CF 2 wherein Y 1 and Y 2 are each independently H, F, CI, Br, C 1 -C 6 alkyl or C 1 -C 6 haloalkyl containing no more than 3 chlorine substituents, 2 bromine substituents and 1 iodo substituent to (2) saturated compounds of the formula C d H e F f CI g Br h I k wherein d is an integer from 1 to 10, and e+f+g+h+k is equal to 2d+2, provided that g is 0, 1, 2 or 3, h is 0, 1 or 2 and k is 0 or 1 and/or unsaturated compounds of the formula Y 3 Y 4 C=CY 5 Y 6 , wherein Y 3 , Y 5 and Y 6 are each independently H, F, CI Br, C1-C6 alkyl or C1-C6 haloalkyl containing no more than 3 chlorine substituents, 2 bromine substituents and 1 iodo substituent, provided that Y 5 and Y 6 are not both F, and Y 4 is C 1 -C 6 alkyl or C 1 -C 6 haloalkyl containing no more than 3 chlorine substituents, 2 bromine substituents and 1 iodo substituent, in a mixture. The process involves contacting the mixture with at least one selective removal agent selected from the group consisting of SO 3 and RSO 3 H, wherein R is selected from the group consisting of F, CI, OH, C 1 -C 8 alkyl, C 1 -C 8 fluoroalkyl, and C 1 -C 8 fluoroalkoxyalkyl containing no more than two ether oxygens to selectively react the formula Y 1 Y 2 C=CF 2 compounds.
    • 公开了一种降低式(1)化合物的摩尔比的方法,其中Y 2 C = CF 2 > 1和Y 2各自独立地为H,F,Cl,Br,C 1 -C 6烷基或C 1 -C 6烷基, 含有不多于3个氯取代基,2个溴取代基和1个碘取代基的(3)C 1 -C 6卤代烷基,(2)式C d的饱和化合物 其中d是一个或多个,其中d是一个或多个 如果g为0,1,2或3,则h为0,1或2,且k为0或1,和/或1为1,并且e + f + g + h + 或下式的不饱和化合物:其中Y 1,Y 2,X 3,X 3, 3,Y 5和Y 6各自独立地为H,F,Cl Br,C 1 -C 6烷基或含有不超过3个氯的C 1 -C 6卤代烷基 取代基,2个溴取代基和1个碘取代基,条件是Y 5和Y 6是n F和Y都是C 1 -C 6 -C 6烷基或C 1 -C 6烷基, 6个含有不超过3个氯取代基的卤代烷基,2个溴取代基和1个碘取代基。 该方法包括使混合物与选自SO 3 3和RSO 3 H的至少一种选择性去除剂接触,其中R选自F ,Cl,OH,C 1 -C 8烷基,C 1 -C 8氟烷基,C 1 -C 8 - 含有不超过两个醚氧的亚烷基-C 8氟烷氧基烷基选择性地使式Y 1→2→C = CF 2 CO 2化合物。
    • 8. 发明申请
    • PROCESS FOR PURIFYING OCTAFLUOROCYCLOBUTANE, PROCESS FOR PREPARING THE SAME, AND USE THEREOF
    • 净化OCTAFLUOROCYCLOBUTANE的方法,其制备方法及其用途
    • WO02055458A2
    • 2002-07-18
    • PCT/JP2002/000148
    • 2002-01-11
    • C07C17/269C07C17/389C07C17/395C07C23/06H01L21/3065C11D7/50
    • C07C23/06C07C17/269C07C17/389C07C17/395
    • A process for purifying octafluorocyclobutane according to the present invention is characterized by contacting a crude octafluorocyclobutane containing impurities with an impurity decomposing agent under elevated temperature and then with an adsorbent to substantially remove the impurities from the crude octafluorocyclobutane. According to the purification process or preparation process of octafluorocyclobutane of the present invention, the impurities such as fluorocarbon can be substantially removed and a high-purity octafluorocyclobutane can be easily obtained. The octafluorocyclobutane obtained by the purification process of the present invention is substantially free of impurities and therefore, can be used as an etching or cleaning gas for use in the production process of a semiconductor device or the like.
    • 根据本发明的纯化八氟环丁烷的方法的特征在于使含有杂质的粗八氟环丁烷与杂质分解剂在升高的温度下接触,然后与吸附剂接触以从粗八氟环丁烷中基本上除去杂质。 根据本发明的八氟环丁烷的纯化方法或制备方法,可以基本除去碳氟化合物等杂质,容易得到高纯度的八氟环丁烷。 通过本发明的纯化方法获得的八氟环丁烷基本上不含杂质,因此可以用作半导体装置等的制造方法中使用的蚀刻或清洗气体。
    • 9. 发明申请
    • PROCESS FOR PURIFYING OCTAFLUOROPROPANE, PROCESS FOR PREPARING THE SAME, AND USE THEREOF
    • 净化OCTAFLORORROPANE的方法,其制备方法及其用途
    • WO02055457A2
    • 2002-07-18
    • PCT/JP2002/000147
    • 2002-01-11
    • C01B7/00C07C17/04C07C17/389C07C17/395C07C19/08C11D7/50H01L21/3065
    • C07C19/08C07C17/04C07C17/389C07C17/395
    • A process for purifying octafluoropropane according to the present invention comprises the step of contacting a crude octafluoropropane containing impurities with an impurity decomposing agent under elevated temperature and then with an adsorbent to substantially remove the impurities from the crude octafluoropropane. According to the pruification process or preparation process of octafluoropropane of the present invention, the impurities such as chlorine compounds can be substantially removed and a high-purity octafluoropropane can be easily obtained. The octafluoropropane obtained by the purification process of the present invention is substantially free of impurities and therefore, can be used as an etching or cleaning gas for use in the production process of a semiconductor device and the like.
    • 根据本发明的纯化八氟丙烷的方法包括使含有杂质的粗八氟丙烷与杂质分解剂在升高的温度下接触,然后与吸附剂接触以从粗八氟丙烷基本上除去杂质的步骤。 根据本发明的八氟丙烷的制备方法或制备方法,可以基本除去氯化合物等杂质,容易得到高纯度的八氟丙烷。 通过本发明的纯化方法获得的八氟丙烷基本上不含杂质,因此可以用作半导体装置等的制造方法中使用的蚀刻或清洗气体。