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1. 发明申请

WO2009005581A1 MULTI-LAYER MASKING FILM 审中-公开
标题翻译：多层掩膜
公开(公告)号：WO2009005581A1
公开(公告)日：2009-01-08
申请号：PCT/US2008/007387
申请日：2008-06-13
申请人： EASTMAN KODAK COMPANY , COK, Ronald, Steven , RIDER, Christopher, Barrie
发明人： COK, Ronald, Steven , RIDER, Christopher, Barrie
IPC分类号： G03F7/34 , G03F7/09 , B41M5/42 , G03F1/06
CPC分类号： G03F7/34 , G03F1/92 , Y10T428/14 , Y10T428/31504
摘要： A multi-layer, disposable, and patternable masking film, includes a flexible carrier layer at least partially transparent to a pre-determined frequency of light; a first adhesive layer having adhesion states that change in response to the application of the pre-determined frequency of light and that is coated on the flexible carrier layer; and a first masking layer located next to the first adhesive layer on the side of the first adhesive layer opposite the flexible carrier layer.
摘要翻译：多层，一次性和可图案化的掩模膜包括对预定频率的光至少部分透明的柔性载体层; 第一粘合剂层，其具有响应于施加预定频率的光而变化并且被涂覆在柔性载体层上的粘附状态; 以及位于与柔性载体层相对的第一粘合剂层侧的第一粘合剂层旁边的第一掩模层。

2. 发明申请

WO2012027050A2 MASK FOR NEAR-FIELD LITHOGRAPHY AND FABRICATION THE SAME 审中-公开
标题翻译：用于近场成像和制造的掩模
公开(公告)号：WO2012027050A2
公开(公告)日：2012-03-01
申请号：PCT/US2011/045197
申请日：2011-07-25
申请人： ROLITH, INC. , KOBRIN, Boris
发明人： KOBRIN, Boris
IPC分类号： G03F1/08 , G03F1/92 , G03F1/00
CPC分类号： G03F1/00 , B82Y10/00 , B82Y40/00 , G03F1/92 , G03F7/0002 , G03F7/24
摘要： Methods for fabricating nanopatterned cylindrical photomasks are disclosed. A master pattern having features ranging in size from about 1 nanometer to about 100 microns may be formed on a master substrate. A layer of an elastomer material may be formed on a surface of a transparent cylinder. The master pattern may be transferred from the master to the layer of elastomer material on the surface of the transparent cylinder. Alternatively, a nanopatterned cylindrical photomask may be fabricated by forming a pattern having nanometer scale features on an elastomer substrate and laminating the patterned elastomer substrate to a surface of a cylinder. In another method, a layer of elastomer material may be formed on a surface of a transparent cylinder and a pattern having nanometer scale features may be formed on the elastomer material by a direct patterning process.
摘要翻译：公开了制备纳米图案圆柱形光掩模的方法。可以在主衬底上形成具有尺寸从约1纳米至约100微米范围内的特征的母版图案。可以在透明圆筒的表面上形成弹性体材料层。主图案可以从主体转移到透明圆柱体表面上的弹性体材料层。或者，可以通过在弹性体基底上形成具有纳米尺度特征的图案并将图案化的弹性体基底层压到圆柱体的表面上来制造纳米图案化圆柱形光掩模。在另一种方法中，可以在透明圆柱体的表面上形成弹性体材料层，并且可以通过直接图案化工艺在弹性体材料上形成具有纳米尺度特征的图案。

3. 发明申请

WO2014209427A1 METHOD OF MANUFACTURING A PHOTOMASK WITH FLEXOGRAPHY 审中-公开
标题翻译：用光学制作光电子的方法
公开(公告)号：WO2014209427A1
公开(公告)日：2014-12-31
申请号：PCT/US2013/078297
申请日：2013-12-30
申请人： UNI-PIXEL DISPLAYS, INC.
发明人： RAMAKRISHNAN, Ed , PETCAVICH, Robert
IPC分类号： G03F1/76 , G03F1/78 , G03F1/68 , H01L21/027
CPC分类号： G03F1/92 , B41C1/05 , B41N1/12 , G03F1/68 , G03F7/202 , G03F7/2032 , G03F7/24
摘要： A method of manufacturing a flexographic printing plate includes designing a photomask patterned design. The photomask patterned designed is laser-ablated into a thermal imaging layer. The laser-ablated thermal imaging layer is laminated to a top side of a flexographic printing plate substrate. A bottom side of the flexographic printing plate substrate is exposed to UV-A radiation. The top side of the flexographic printing plate substrate is exposed to UV-A radiation. The thermal imaging layer is removed. The flexographic printing plate substrate is developed. A flexographic printing system for printing a photomask includes an ink roll, an anilox roll, a printing plate cylinder, a flexographic printing plate disposed on the printing plate cylinder, and an impression cylinder. The flexographic printing plate comprises patterns corresponding to a photomask patterned design. The flexographic printing plate may be used in a flexographic printing system to manufacture a photomask with flexography.
摘要翻译：柔版印刷版的制造方法包括设计光掩模图案化设计。图案图案设计的光掩模被激光烧蚀成热成像层。激光烧蚀的热成像层被层压到柔性版印刷基板的顶侧。柔性版印刷基板的底侧暴露于UV-A辐射。柔性版印刷基板的顶侧暴露于UV-A辐射。去除热成像层。印刷柔版印刷版基板。用于印刷光掩模的柔性版印刷系统包括墨辊，网纹辊，印版滚筒，设置在印版滚筒上的柔版印刷印版和压印滚筒。柔性版印刷版包括对应于光掩模图案设计的图案。柔性版印刷版可以用于柔性版印刷系统中以用柔版印刷制造光掩模。

4. 发明申请

WO2012027050A3 MASK FOR NEAR-FIELD LITHOGRAPHY AND FABRICATION THE SAME 审中-公开
标题翻译：用于近场光刻和掩模制作的掩模
公开(公告)号：WO2012027050A3
公开(公告)日：2012-06-07
申请号：PCT/US2011045197
申请日：2011-07-25
申请人： ROLITH INC , KOBRIN BORIS
发明人： KOBRIN BORIS
IPC分类号： G03F1/00 , G03F1/92
CPC分类号： G03F1/00 , B82Y10/00 , B82Y40/00 , G03F1/92 , G03F7/0002 , G03F7/24
摘要： Methods for fabricating nanopatterned cylindrical photomasks are disclosed. A master pattern having features ranging in size from about 1 nanometer to about 100 microns may be formed on a master substrate. A layer of an elastomer material may be formed on a surface of a transparent cylinder. The master pattern may be transferred from the master to the layer of elastomer material on the surface of the transparent cylinder. Alternatively, a nanopatterned cylindrical photomask may be fabricated by forming a pattern having nanometer scale features on an elastomer substrate and laminating the patterned elastomer substrate to a surface of a cylinder. In another method, a layer of elastomer material may be formed on a surface of a transparent cylinder and a pattern having nanometer scale features may be formed on the elastomer material by a direct patterning process.
摘要翻译：公开了用于制造纳米图案化的圆柱形光掩模的方法。具有大小从大约1纳米到大约100微米的特征的主图案可以形成在主基底上。一层弹性体材料可以形成在透明圆柱体的表面上。主图案可以从主模转移到透明圆筒表面上的弹性体材料层。或者，可以通过在弹性体基底上形成具有纳米级特征的图案并将图案化的弹性体基底层压到圆柱体的表面来制造纳米图案化的圆柱形光掩模。在另一种方法中，可以在透明圆柱体的表面上形成一层弹性体材料，并且可以通过直接图案化工艺在弹性体材料上形成具有纳米级特征的图案。

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