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1. 发明申请

WO2013049367A3 PLASMONIC LITHOGRAPHY USING PHASE MASK 审中-公开
标题翻译：使用相位掩模的PLASMONIC光刻
公开(公告)号：WO2013049367A3
公开(公告)日：2013-05-23
申请号：PCT/US2012057590
申请日：2012-09-27
申请人： ROLITH INC
发明人： KOBRIN BORIS , BRONGERSMA MARK , BARBARD EDWARD
IPC分类号： G03C1/00
CPC分类号： G03F7/20 , G03F1/00 , G03F1/26 , G03F1/50 , G03F7/0035 , G03F7/70283
摘要： In the proposed plasmonic nanolithography technique a transparent mask is brought into physical contact with a metal on a substrate that is coated with a photoresist. The mask is not made of metal or other material that supports surface plasmons. The metal layer is exposed to radiation of a characteristic vacuum wavelength through the mask and the photoresist or through the substrate. The mask features and the vacuum wavelength of the radiation are chosen so that the radiation excites surface plasmons at the interface between the metal and the photoresist. The excitation of surface plasmons allows for the exposure and generation of features which are well-below the free space diffraction limit and small compared to the size of the features in the mask.
摘要翻译：在所提出的等离子体纳米光刻技术中，使透明掩模与涂覆有光致抗蚀剂的基板上的金属物理接触。面罩不是由金属或其他支持表面等离子体的材料制成。金属层通过掩模和光刻胶或通过衬底暴露于特征真空波长的辐射。选择掩模特征和辐射的真空波长，使得辐射在金属和光致抗蚀剂之间的界面处激发表面等离子体激元。表面等离子体激元的激发允许曝光和产生远低于自由空间衍射极限且小于掩模中的特征尺寸的特征。

2. 发明申请

WO2009094009A1 LARGE AREA NANOPATTERNING METHOD AND APPARATUS 审中-公开
标题翻译：大面积纳米技术方法和装置
公开(公告)号：WO2009094009A1
公开(公告)日：2009-07-30
申请号：PCT/US2008/012901
申请日：2008-11-18
申请人： ROLITH, INC. , KOBRIN, Boris , LANDAU, Igor , VOLF, Boris
发明人： KOBRIN, Boris , LANDAU, Igor , VOLF, Boris
IPC分类号： H01L21/027
CPC分类号： B29C33/424 , G03F1/50 , G03F1/60 , G03F7/20 , G03F7/2014 , G03F7/24
摘要： Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation- sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in dynamic contact with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.
摘要翻译：本发明的实施例涉及在大面积基板的纳米图案中有用的方法和装置，其中使用可旋转掩模来对辐射敏感材料成像。通常，可旋转掩模包括圆筒。纳米图案技术利用近场光刻技术，其中用于图案化基板的掩模与基板动态接触。近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中旋转圆柱表面包括金属纳米孔或纳米颗粒。

3. 发明申请

WO2012027050A2 MASK FOR NEAR-FIELD LITHOGRAPHY AND FABRICATION THE SAME 审中-公开
标题翻译：用于近场成像和制造的掩模
公开(公告)号：WO2012027050A2
公开(公告)日：2012-03-01
申请号：PCT/US2011/045197
申请日：2011-07-25
申请人： ROLITH, INC. , KOBRIN, Boris
发明人： KOBRIN, Boris
IPC分类号： G03F1/08 , G03F1/92 , G03F1/00
CPC分类号： G03F1/00 , B82Y10/00 , B82Y40/00 , G03F1/92 , G03F7/0002 , G03F7/24
摘要： Methods for fabricating nanopatterned cylindrical photomasks are disclosed. A master pattern having features ranging in size from about 1 nanometer to about 100 microns may be formed on a master substrate. A layer of an elastomer material may be formed on a surface of a transparent cylinder. The master pattern may be transferred from the master to the layer of elastomer material on the surface of the transparent cylinder. Alternatively, a nanopatterned cylindrical photomask may be fabricated by forming a pattern having nanometer scale features on an elastomer substrate and laminating the patterned elastomer substrate to a surface of a cylinder. In another method, a layer of elastomer material may be formed on a surface of a transparent cylinder and a pattern having nanometer scale features may be formed on the elastomer material by a direct patterning process.
摘要翻译：公开了制备纳米图案圆柱形光掩模的方法。可以在主衬底上形成具有尺寸从约1纳米至约100微米范围内的特征的母版图案。可以在透明圆筒的表面上形成弹性体材料层。主图案可以从主体转移到透明圆柱体表面上的弹性体材料层。或者，可以通过在弹性体基底上形成具有纳米尺度特征的图案并将图案化的弹性体基底层压到圆柱体的表面上来制造纳米图案化圆柱形光掩模。在另一种方法中，可以在透明圆柱体的表面上形成弹性体材料层，并且可以通过直接图案化工艺在弹性体材料上形成具有纳米尺度特征的图案。

4. 发明申请

WO2015183243A1 ANTI-COUNTERFEITING FEATURES AND METHODS OF FABRICATION AND DETECTION 审中-公开
标题翻译：防伪特征及其制作与检测方法
公开(公告)号：WO2015183243A1
公开(公告)日：2015-12-03
申请号：PCT/US2014/039602
申请日：2014-05-27
申请人： ROLITH, INC. , KOBRIN, Boris
发明人： KOBRIN, Boris
IPC分类号： B42D25/30 , G01N27/02 , G07D7/02
CPC分类号： G07D7/02 , B42D25/351 , B42D25/36 , B42D25/373 , B42D25/378 , B42D25/42 , G07D7/003 , G07D7/005 , G07D7/12
摘要： Aspects of the present disclosure include an anti-counterfeiting pattern that is identifiable by sheet resistance mapping metrology, a method of fabricating such an anti-counterfeiting device, and a method of detecting such an anti-counterfeiting device by imaging the pattern with sheet resistance mapping metrology. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：本公开的方面包括通过薄片电阻映射计量学可识别的防伪图案，制造这种防伪装置的方法以及通过用薄层电阻映射对图案进行成像来检测这种防伪装置的方法计量。提供本摘要是为了符合要求摘要的规则，允许搜索者或其他读者快速确定技术公开内容的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

5. 发明申请

WO2013165915A1 CYLINDRICAL POLYMER MASK AND METHOD OF FABRICATION 审中-公开
标题翻译：圆柱聚合物掩模和制造方法
公开(公告)号：WO2013165915A1
公开(公告)日：2013-11-07
申请号：PCT/US2013/038675
申请日：2013-04-29
申请人： ROLITH,INC. , KOBRIN, Boris , SIETZ, Oliver , RICHARDSON, Bruce , MCMACKIN, Ian , ARYAL, Mukti , GRIGSBY, Bryant
发明人： KOBRIN, Boris , SIETZ, Oliver , RICHARDSON, Bruce , MCMACKIN, Ian , ARYAL, Mukti , GRIGSBY, Bryant
IPC分类号： G03F7/12 , G03F1/00
CPC分类号： G03F7/24 , G03F7/0002
摘要： A cylindrical mask may be fabricated using a hollow casting cylinder and a mask cylinder. The casting cylinder has an inner diameter that is larger than the outer diameter of the mask cylinder. The casting and mask cylinders are coaxially assembled and a liquid polymer inserted in a space surrounding the mask cylinder between the inner surface of the casting cylinder and the outer surface of the mask cylinder. After curing the liquid polymer, the casting cylinder is removed. A surface of the cured polymer can be patterned. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：可以使用中空铸造圆筒和掩模筒来制造圆柱形掩模。铸造圆筒的内径大于荫罩圆筒的外径。铸造和掩模气缸同轴组装，并且液体聚合物插入在铸塑缸的内表面和掩模缸的外表面之间围绕掩模缸的空间中。在固化液体聚合物之后，移去铸造圆筒。固化的聚合物的表面可以被图案化。要强调的是，该摘要被提供以符合要求抽象的规则，允许搜索者或其他读者快速确定技术公开内容的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

6. 发明申请

WO2013062755A1 LITHOGRAPHY WITH REDUCED FEATURE PITCH USING ROTATING MASK TECHNIQUES 审中-公开
标题翻译：使用旋转掩码技术的降低特征点的算术
公开(公告)号：WO2013062755A1
公开(公告)日：2013-05-02
申请号：PCT/US2012/059388
申请日：2012-10-09
申请人： ROLITH, INC.
发明人： KOBRIN, Boris , BRONGERSMA, Mark , BARNARD, Edward
IPC分类号： G03C1/00
CPC分类号： G03F7/40 , G03F7/201 , G03F7/2014 , G03F7/2035 , G03F7/22 , G03F7/703 , G03F7/70325
摘要： Embodiments of the present invention are directed to techniques for obtaining patterns of features. One set of techniques uses multiple-pass rolling mask lithography to obtain the desired feature pattern. Another technique uses a combination of rolling mask lithography and a self-aligned plasmonic mask lithography to obtain a desired feature pitch.
摘要翻译：本发明的实施例涉及用于获得特征图案的技术。一组技术使用多遍轧制掩模光刻来获得所需的特征图案。另一种技术使用滚动掩模光刻和自对准等离子体掩模光刻的组合来获得期望的特征间距。

7. 发明申请

WO2013049367A2 PLASMONIC LITHOGRAPHY USING PHASE MASK 审中-公开
标题翻译：使用相位掩模的PLASMONIC LITHOGRAPHY
公开(公告)号：WO2013049367A2
公开(公告)日：2013-04-04
申请号：PCT/US2012/057590
申请日：2012-09-27
申请人： ROLITH, INC.
发明人： KOBRIN, Boris , BRONGERSMA, Mark , BARBARD, Edward
IPC分类号： H01L21/306
CPC分类号： G03F7/20 , G03F1/00 , G03F1/26 , G03F1/50 , G03F7/0035 , G03F7/70283
摘要： In the proposed plasmonic nanolithography technique a transparent mask is brought into physical contact with a metal on a substrate that is coated with a photoresist. The mask is not made of metal or other material that supports surface plasmons. The metal layer is exposed to radiation of a characteristic vacuum wavelength through the mask and the photoresist or through the substrate. The mask features and the vacuum wavelength of the radiation are chosen so that the radiation excites surface plasmons at the interface between the metal and the photoresist. The excitation of surface plasmons allows for the exposure and generation of features which are well-below the free space diffraction limit and small compared to the size of the features in the mask.
摘要翻译：在所提出的等离子体激光纳米光刻技术中，透明掩模与涂覆有光致抗蚀剂的基底上的金属物理接触。掩模不是由支撑表面等离子体的金属或其他材料制成。金属层通过掩模和光致抗蚀剂或通过基底暴露于特征真空波长的辐射。选择掩模特征和辐射的真空波长，使得辐射在金属和光致抗蚀剂之间的界面处激发表面等离子体激元。表面等离子体激元的激发允许暴露和产生远低于自由空间衍射极限的特征，并且与掩模中特征的尺寸相比较小。

8. 发明申请

WO2012027050A3 MASK FOR NEAR-FIELD LITHOGRAPHY AND FABRICATION THE SAME 审中-公开
标题翻译：用于近场光刻和掩模制作的掩模
公开(公告)号：WO2012027050A3
公开(公告)日：2012-06-07
申请号：PCT/US2011045197
申请日：2011-07-25
申请人： ROLITH INC , KOBRIN BORIS
发明人： KOBRIN BORIS
IPC分类号： G03F1/00 , G03F1/92
CPC分类号： G03F1/00 , B82Y10/00 , B82Y40/00 , G03F1/92 , G03F7/0002 , G03F7/24
摘要： Methods for fabricating nanopatterned cylindrical photomasks are disclosed. A master pattern having features ranging in size from about 1 nanometer to about 100 microns may be formed on a master substrate. A layer of an elastomer material may be formed on a surface of a transparent cylinder. The master pattern may be transferred from the master to the layer of elastomer material on the surface of the transparent cylinder. Alternatively, a nanopatterned cylindrical photomask may be fabricated by forming a pattern having nanometer scale features on an elastomer substrate and laminating the patterned elastomer substrate to a surface of a cylinder. In another method, a layer of elastomer material may be formed on a surface of a transparent cylinder and a pattern having nanometer scale features may be formed on the elastomer material by a direct patterning process.
摘要翻译：公开了用于制造纳米图案化的圆柱形光掩模的方法。具有大小从大约1纳米到大约100微米的特征的主图案可以形成在主基底上。一层弹性体材料可以形成在透明圆柱体的表面上。主图案可以从主模转移到透明圆筒表面上的弹性体材料层。或者，可以通过在弹性体基底上形成具有纳米级特征的图案并将图案化的弹性体基底层压到圆柱体的表面来制造纳米图案化的圆柱形光掩模。在另一种方法中，可以在透明圆柱体的表面上形成一层弹性体材料，并且可以通过直接图案化工艺在弹性体材料上形成具有纳米级特征的图案。

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