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    • 1. 发明申请
    • SEMICONDUCTOR THIN FILMS
    • 半导体薄膜
    • WO2010131011A1
    • 2010-11-18
    • PCT/GB2010/000972
    • 2010-05-14
    • UNIVERSITY OF WARWICKJONES, TimothyHATTON, RossSCHUMANN, Stefan
    • JONES, TimothyHATTON, RossSCHUMANN, Stefan
    • H01L51/42
    • H01L51/0003H01L51/0036H01L51/0037H01L51/4253Y02E10/549Y02P70/521
    • A process for the production of an organic semiconductor thin film structure. Nanoparticles (11 ) of a removable material such as polystyrene are co-deposited with an organic semiconductor on a substrate electrode (9) from a mixture (10) of a colloidal suspension of the nanoparticles and a solution of the organic semiconductor. By self assembly, the nanoparticles form an ordered structure (15) defining a network of interstitial spaces which are infiltrated by the organic semiconductor material. The nanoparticles are removed by hot solvent vapour so as to leave a three dimensional ordered macroporous structure of the organic semiconductor material. A second semiconductor material can then be infiltrated into the pores left by removal of the nanoparticles, and a second electrode added to make a photo-sensitive cell.
    • 一种制备有机半导体薄膜结构的方法。 可去除材料如聚苯乙烯的纳米颗粒(11)与来自纳米颗粒的胶体悬浮液和有机半导体溶液的混合物(10)的底物电极(9)上的有机半导体共沉积。 通过自组装,纳米颗粒形成定义由有机半导体材料渗透的间隙空间网络的有序结构(15)。 通过热溶剂蒸气除去纳米颗粒,以留下有机半导体材料的三维有序大孔结构。 然后可以通过去除纳米颗粒而将第二半导体材料渗透到残留的孔中,并且添加第二电极以制备感光细胞。
    • 5. 发明申请
    • STABILISING THIN METAL FILMS ON SUBSTRATES
    • 在基板上稳定薄金属膜
    • WO2013179028A2
    • 2013-12-05
    • PCT/GB2013/051422
    • 2013-05-29
    • THE UNIVERSITY OF WARWICK
    • HATTON, RossSTEC, Helena
    • H01L51/00
    • H01L51/0021H01L31/022491H01L51/4253H01L51/442Y02E10/549
    • A method of producing a thin film structure such as a transparent electrode. A transparent thin film of a first metal such as gold or silver is deposited on a substrate. There is then deposited on the thin film of the first metal a compound of a second metal which forms a continuous, transparent thin film of an oxide of the second metal on the film of the first metal. The substrate carrying the thin films is annealed at a temperature of at least about 300 °C. The compound of a second metal that is deposited on the first metal may be a precursor that is treated, for example by heat, so as to produce the oxide of the second metal. The precursor may be an organometallic compound of the second metal; or a hydroxide of the second metal; or a sol of nanoparticles of the oxide of the second metal mixed with an organometallic precursor of the oxide of the second metal. The precursor may be deposited as a liquid. The oxide may be TiO x , WO x , MoO x , VO x , TaO x , ZnO x , NiO x or AIOx..
    • 制造透明电极等薄膜结构体的方法。 第一金属如金或银的透明薄膜沉积在基底上。 然后在第一金属的薄膜上沉积第二金属的化合物,该第二金属的化合物在第一金属的膜上形成第二金属的氧化物的连续的透明薄膜。 承载薄膜的基板在至少约300℃的温度下退火。 沉积在第一金属上的第二金属的化合物可以是例如通过加热处理的前体,以便产生第二金属的氧化物。 前体可以是第二金属的有机金属化合物; 或第二金属的氢氧化物; 或第二金属的氧化物的纳米颗粒的溶胶与第二金属的氧化物的有机金属前体混合。 前体可以作为液体沉积。 氧化物可以是TiOx,WOx,MoOx,VOx,TaOx,ZnOx,NiOx或AIOx。